| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/16/2005 | DE10352842A1 Agitating movement device for an ion-processing installation treats curved lens surfaces coated with radiation from a source of ions agitated by the movement device |
| 06/16/2005 | DE10351276A1 Teilchenstrahlgerät Particle beam |
| 06/16/2005 | DE10351059A1 Verfahren und Vorrichtung zur Ionenstrahlbearbeitung von Oberflächen Method and device for ion beam processing of surfaces |
| 06/16/2005 | DE10151823B4 Vorrichtung und Verfahren zur strahlenchemischen Modifizierung von flächigen schmelzbaren Polymerproben mittels eines Elektronenstrahls Apparatus and method for radiation modification of flat fusible polymer samples using an electron beam |
| 06/15/2005 | EP1542264A1 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 06/15/2005 | EP1542263A1 Electron beam exposure method and system therefor |
| 06/15/2005 | EP1542262A1 Processing method and apparatus for removing oxide film |
| 06/15/2005 | EP1542259A1 Method for automatic alignment of tilt series in an electron microscope |
| 06/15/2005 | EP1540695A2 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 06/15/2005 | EP1540694A1 Method and apparatus for producing uniform processing rates |
| 06/15/2005 | EP1540693A2 Charged particle beam system |
| 06/15/2005 | EP1540692A2 Particle-optical device and detection means |
| 06/15/2005 | EP1540665A2 Photolithography mask repair |
| 06/15/2005 | EP1072054B1 Retaining ring and target and method for producing same |
| 06/15/2005 | EP1055013A4 Cathode arc vapor deposition |
| 06/15/2005 | EP0875072B1 Conical baffle for reducing charging drift in a particle beam system |
| 06/15/2005 | CN1628495A Plasma processing equipment |
| 06/15/2005 | CN1628381A System and method for inspecting charged particle responsive resist |
| 06/15/2005 | CN1206698C Device for producing excited/ionized particles in plasma |
| 06/15/2005 | CN1206697C Micro grating for transmissive electron microscope and its making process |
| 06/14/2005 | US6906469 Radio frequency ion source with maneuverable electrode(s) |
| 06/14/2005 | US6906453 Method and apparatus for simultaneously depositing and observing materials on a target |
| 06/14/2005 | US6906336 Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography |
| 06/14/2005 | US6906335 Lens for a scanning electron microscope |
| 06/14/2005 | US6906334 Curved I-core |
| 06/14/2005 | US6906318 Ion detector |
| 06/14/2005 | US6906303 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 06/14/2005 | US6905969 Plasma etch reactor and method |
| 06/14/2005 | US6905947 Monatomic boron ion source and method |
| 06/14/2005 | US6905625 Plasma processing method and apparatus |
| 06/14/2005 | US6905624 Interferometric endpoint detection in a substrate etching process |
| 06/14/2005 | US6905623 Precise, in-situ endpoint detection for charged particle beam processing |
| 06/14/2005 | US6905582 Configurable vacuum system and method |
| 06/14/2005 | US6905579 Cylindrical magnetron target and spindle apparatus |
| 06/14/2005 | CA2271990C Process and device for forming a coating on a substrate by cathode sputtering |
| 06/09/2005 | WO2005053365A1 Neutral particle beam processing apparatus |
| 06/09/2005 | WO2005052982A1 Plasma processing system with locally-efficient inductive plasma coupling |
| 06/09/2005 | WO2005052981A1 Method and apparatus for improved electrode plate |
| 06/09/2005 | WO2005052980A1 Gas port assembly |
| 06/09/2005 | WO2005052979A2 Plasma source with segmented magnetron cathode |
| 06/09/2005 | WO2005052978A2 Method and apparatus for modifying object with electrons generated from cold cathode electron emitter |
| 06/09/2005 | WO2005029538A3 A plasma generating apparatus and an alignment process for liquid crystal displays using the apparatus |
| 06/09/2005 | WO2005024891A3 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 06/09/2005 | WO2005017937A3 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 06/09/2005 | WO2005011907A3 Method and device for non-vacuum electron beam welding metallic materials |
| 06/09/2005 | WO2005010479A3 Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system |
| 06/09/2005 | WO2005008760A3 Method for anisotropically etching a recess in a silicon substrate and use of a plasma etching system |
| 06/09/2005 | WO2004095502A3 Plasma processing system and method |
| 06/09/2005 | WO2004090943A3 Plasma uniformity |
| 06/09/2005 | WO2004072754A3 Power supply control unit |
| 06/09/2005 | US20050122050 Multi-phase alternating current plasma generator |
| 06/09/2005 | US20050121628 Pattern size correcting device and pattern size correcting method |
| 06/09/2005 | US20050121627 System and method for serial ion implanting productivity enhancements |
| 06/09/2005 | US20050121626 System and method for multi-wafer scanning in ion implanters |
| 06/09/2005 | US20050121623 Electron beam duplication lithography method and apparatus |
| 06/09/2005 | US20050121611 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former |
| 06/09/2005 | US20050121610 Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus |
| 06/09/2005 | US20050121423 Heating in a vacuum atmosphere in the presence of a plasma |
| 06/09/2005 | US20050121321 Ignition device |
| 06/09/2005 | US20050121311 Film thickness measuring instrument comprises a light emitter for radiating measuring light onto film, generating an electrical signal in response; control the sio2 film thickness with high precision and have excellent productivity; magnetron sputtering |
| 06/09/2005 | US20050121305 Irradiating a surface with plasma of a corona discharge produced by a pulse voltage between pointed ends of the discharge electrodes where a magnetic field and charged particles are formed; activated plasma becomes a pushing force moving the particles to the treated surface; uniformcoatings; efficiency |
| 06/09/2005 | US20050121143 Pump baffle and screen to improve etch uniformity |
| 06/09/2005 | US20050120960 Substrate holder for plasma processing |
| 06/09/2005 | US20050120805 Method and apparatus for substrate temperature control |
| 06/08/2005 | EP1538656A1 System for plasma treatment of gases in a vacuum pump |
| 06/08/2005 | EP1538655A2 Ion implantation ion source |
| 06/08/2005 | EP1537766A1 Generation of diffuse non-thermal atmospheric plasmas |
| 06/08/2005 | EP1537597A1 Sputtering cathode, production method and corresponding cathode |
| 06/08/2005 | EP1537596A1 Plasma processing apparatus and plasma processing method |
| 06/08/2005 | EP1537595A1 Secondary electron detector, especially in a scanning electron microscope |
| 06/08/2005 | EP1536910A1 Radial pulsed arc discharge gun for synthesizing nanopowders |
| 06/08/2005 | CN1625921A Heating in a vacuum atmosphere in the presence of a plasma |
| 06/08/2005 | CN1205646C Charged particle emitting element and welding equipment with it and charged particle beam element |
| 06/08/2005 | CN1205467C Control method of electron probe differential analyzer |
| 06/08/2005 | CN1205353C Method and device for vacuum arc vapour deposition |
| 06/07/2005 | US6903807 Stage apparatus and its driving method, exposure apparatus and device manufacturing method |
| 06/07/2005 | US6903800 Capable of optimally processing a film such as an insulation film between layers on a surface of an object to be processed, e.g., a semiconductor wafer |
| 06/07/2005 | US6903511 For plasma processes such as those used in the semiconductor manufacturing industry, for example, plasma sputter etching, pure chemical etching, ion energy driven etching, and ion inhibitor etching; plasma generator |
| 06/07/2005 | US6903499 Electron gun and a method for using the same |
| 06/07/2005 | US6903355 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method |
| 06/07/2005 | US6903353 Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus |
| 06/07/2005 | US6903352 Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method |
| 06/07/2005 | US6903350 Ion beam scanning systems and methods for improved ion implantation uniformity |
| 06/07/2005 | US6903349 Ion implanter and a method of implanting ions |
| 06/07/2005 | US6903348 Wafer holding apparatus for ion implanting system |
| 06/07/2005 | US6903346 Stage assembly having a follower assembly |
| 06/07/2005 | US6903345 Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 06/07/2005 | US6903338 Automated electron-beam inspection systems for semiconductor manufacturing |
| 06/07/2005 | US6903337 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| 06/07/2005 | US6903336 Polarity exchanger and ion implanter having the same |
| 06/07/2005 | US6902774 Method of manufacturing a device |
| 06/07/2005 | US6902683 Plasma processing apparatus and plasma processing method |
| 06/07/2005 | US6902648 Plasma etching device |
| 06/07/2005 | US6902646 Sensor array for measuring plasma characteristics in plasma processing environments |
| 06/02/2005 | WO2005050726A1 Plasma processing method and plasma processing apparatus |
| 06/02/2005 | WO2005050725A1 Method for manufacturing semiconductor device and substrate processing apparatus |
| 06/02/2005 | WO2005050723A1 Plasma film-forming apparatus and plasma film-forming method |
| 06/02/2005 | WO2005050705A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 06/02/2005 | WO2005050696A1 Method and apparatus for reactive solid-gas plasma deposition |
| 06/02/2005 | WO2005050694A2 Liquid metal ion source and its production; processing and analyzing devices provided with said source |