| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/28/2005 | US6911780 Electron beam, generating device, and testing device |
| 06/28/2005 | US6911779 Magnetic mirror plasma source |
| 06/28/2005 | US6911661 Electron beam exposure apparatus |
| 06/28/2005 | US6911660 Method of measuring ion beam angles |
| 06/28/2005 | US6911656 Rotational stage for high speed, large area scanning in focused beam systems |
| 06/28/2005 | US6911617 Receivers comprising radiation surfaces having slits in radial or helical layouts for supplying electromagnetic waves into vessels, used for generating gases used in crystallization, etching and combustion of electrical and electronic apparatus |
| 06/28/2005 | US6911391 Integration of titanium and titanium nitride layers |
| 06/28/2005 | US6911350 Real-time in-line testing of semiconductor wafers |
| 06/28/2005 | US6911157 Plasma processing method and apparatus using dynamic sensing of a plasma environment |
| 06/28/2005 | US6911123 Facing-targets-type sputtering apparatus and method |
| 06/28/2005 | US6911093 Lid liner for chemical vapor deposition chamber |
| 06/28/2005 | US6910440 Apparatus for plasma processing |
| 06/23/2005 | WO2005057632A1 Umbilical cord facilities connection for an ion beam implanter |
| 06/23/2005 | WO2005057607A2 Plasma source for producing an inductively coupled plasma |
| 06/23/2005 | WO2005056874A1 Arrangement for the thermal processing of silicon wafers in a process chamber |
| 06/23/2005 | WO2005017942A3 High-frequency excitation system comprising a limiting circuit |
| 06/23/2005 | WO2005004314A3 Dual magnetrong sputtering apparatus utilizing control means for delivering balanced power |
| 06/23/2005 | WO2004102642A3 Envelope follower end point detection in time division multiplexed processes |
| 06/23/2005 | US20050136694 Method and apparatus for forming thin film |
| 06/23/2005 | US20050136691 Method and apparatus for depositing dielectric films |
| 06/23/2005 | US20050136604 Semiconductor on insulator vertical transistor fabrication and doping process |
| 06/23/2005 | US20050136188 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 06/23/2005 | US20050134834 Method and apparatus for performing limited area spectral analysis |
| 06/23/2005 | US20050134418 Magnet assemblies |
| 06/23/2005 | US20050134186 Stabilizing plasma and generator interactions |
| 06/23/2005 | US20050133927 Field-enhanced electrodes for additive-injecton non-thermal plasma (NTP) processor |
| 06/23/2005 | US20050133739 Charged beam writing method and writing tool |
| 06/23/2005 | US20050133738 Ion source and ion implanter having the same |
| 06/23/2005 | US20050133737 Ion implanting apparatus and ion implanting method using the same |
| 06/23/2005 | US20050133736 Ion implantation apparatus and partical collection structure thereof |
| 06/23/2005 | US20050133734 Exposure apparatus, exposure method and semiconductor device production method |
| 06/23/2005 | US20050133733 Electron beam system and method of manufacturing devices using the system |
| 06/23/2005 | US20050133728 Method and system for in-situ calibration of a dose controller for ion implantation |
| 06/23/2005 | US20050133719 Scanning electron microscope |
| 06/23/2005 | US20050133718 Method and apparatus for observing a specimen |
| 06/23/2005 | US20050133366 Cathode for vacuum sputtering treatment machine |
| 06/23/2005 | US20050133365 Mechanism for varying the spacing between sputter magnetron and target |
| 06/23/2005 | US20050133361 Compensation of spacing between magnetron and sputter target |
| 06/23/2005 | US20050133165 Apparatus for the prevention of arcing in a CVD-TiN chamber |
| 06/23/2005 | US20050133164 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 06/23/2005 | US20050133163 Dual frequency RF match |
| 06/23/2005 | US20050133162 Plasma processing apparatus and plasma processing method |
| 06/23/2005 | US20050133160 Showerhead electrode assembly for plasma processing apparatuses |
| 06/23/2005 | US20050132962 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor device manufacturing factory |
| 06/22/2005 | EP1544895A2 Exposure apparatus, exposure method and semiconductor device production method |
| 06/22/2005 | EP1544894A2 Method of automatically correcting aberrations in charged-particle beam and apparatus thereof |
| 06/22/2005 | EP1544893A2 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor |
| 06/22/2005 | EP1543537A1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 06/22/2005 | EP1543176A1 A method for depositing multilayer coatings |
| 06/22/2005 | EP1543175A1 High peak power plasma pulsed supply with arc handling |
| 06/22/2005 | EP1018137B1 Charged particle beam emitting assembly |
| 06/22/2005 | CN1630936A Device for producing inductively coupled plasma and method thereof |
| 06/22/2005 | CN1630926A Swinging retarding immersion type lens electron optics focusing, deflection and signal collection system and method |
| 06/22/2005 | CN1630925A Device for applying electromagnetic microwave radiation in a plasma cavity |
| 06/22/2005 | CN1630041A Mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism |
| 06/22/2005 | CN1630030A Plasma processing device and semiconductor mfg. device |
| 06/22/2005 | CN1630026A Microwave-excited plasma processing apparatus |
| 06/22/2005 | CN1207943C Method and device for radio frequency metering |
| 06/22/2005 | CN1207761C Gas projector and etching device comprising said projector |
| 06/21/2005 | US6909490 Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure |
| 06/21/2005 | US6909103 Ion irradiation of a target at very high and very low kinetic ion energies |
| 06/21/2005 | US6909102 Ion implanter system, method and program product including particle detection |
| 06/21/2005 | US6909092 Electron beam apparatus and device manufacturing method using same |
| 06/21/2005 | US6909087 Method of processing a surface of a workpiece |
| 06/21/2005 | US6909086 Neutral particle beam processing apparatus |
| 06/21/2005 | US6908864 Pressure control method and processing device |
| 06/21/2005 | US6908836 Method of implanting a substrate and an ion implanter for performing the method |
| 06/21/2005 | US6908566 Local dry etching method |
| 06/21/2005 | US6908530 Microwave plasma processing apparatus |
| 06/21/2005 | US6908529 Plasma processing apparatus and method |
| 06/21/2005 | US6908255 Remote clamping mechanism via vacuum feedthrough |
| 06/21/2005 | CA2174507C A method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
| 06/16/2005 | WO2005055304A1 Plasma generator and plasma etching device |
| 06/16/2005 | WO2005055298A1 Plasma processing apparatus and multi-chamber system |
| 06/16/2005 | WO2005055271A1 Ion beam device |
| 06/16/2005 | WO2005054950A2 Method for creating a control command for a mask writing device |
| 06/16/2005 | WO2005054880A1 Method for toolmatching and troubleshooting a plasma processing system |
| 06/16/2005 | WO2005035437A3 High-precision feedback control for ion sculpting of solid state features |
| 06/16/2005 | WO2005027595A3 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening |
| 06/16/2005 | WO2004114355A3 Method and design for sputter target attachment to a backing plate |
| 06/16/2005 | WO2004059405A3 Method and apparatus for monitoring parts in a material processing system |
| 06/16/2005 | US20050130620 Segmented radio frequency electrode apparatus and method for uniformity control |
| 06/16/2005 | US20050130450 Device for producing inductively coupled plasma and method thereof |
| 06/16/2005 | US20050130330 Method for etch processing with end point detection thereof |
| 06/16/2005 | US20050128160 Antenna for plasma processor apparatus |
| 06/16/2005 | US20050127844 High-frequency power supply structure and plasma cvd device using the same |
| 06/16/2005 | US20050127843 Device for treating surfaces of containers with plasma |
| 06/16/2005 | US20050127307 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 06/16/2005 | US20050127304 Liquid metal ion gun |
| 06/16/2005 | US20050127295 Electron microscope |
| 06/16/2005 | US20050127294 Scanning electron microscope |
| 06/16/2005 | US20050127293 Auto focusing apparatus and method |
| 06/16/2005 | US20050127292 Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles |
| 06/16/2005 | US20050127036 Method of cleaning a reaction chamber |
| 06/16/2005 | US20050126904 Includes a chamber, a target back plate, a wafer base, a target and a mobile magnetron device; asymmetric deposition |
| 06/16/2005 | US20050126712 Plasma processing method |
| 06/16/2005 | US20050126711 Plasma processing apparatus |
| 06/16/2005 | US20050126488 Plasma processing apparatus and evacuation ring |
| 06/16/2005 | US20050126487 Surface treatment apparatus |
| 06/16/2005 | US20050126484 Edge flow faceplate for improvement of CVD film properties |