| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/07/2005 | US20050145805 Lithographic apparatus and device manufacturing method |
| 07/07/2005 | US20050145793 Electron microscope |
| 07/07/2005 | US20050145792 Electron microscope |
| 07/07/2005 | US20050145791 Scanning electron microscope |
| 07/07/2005 | US20050145488 Tube magnetron |
| 07/07/2005 | US20050145487 Coating installation |
| 07/07/2005 | US20050145478 Two dimensional magnetron scanning for flat panel sputtering |
| 07/07/2005 | US20050145341 Plasma processing apparatus |
| 07/07/2005 | US20050145340 For generating uniform, low-electron-temperature plasma under a low pressure; comprises a gas supply device, an exhaust device, a high-frequency power source, an electrode, a dielectric, a multiple-vortex-type conductor and a second conductor |
| 07/07/2005 | US20050145339 Ecr plasma source and ecr plasma device |
| 07/07/2005 | US20050145336 Plasma processor electrode and plasma processor |
| 07/07/2005 | US20050145334 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 07/07/2005 | US20050145178 Microwave-excited plasma processing apparatus |
| 07/07/2005 | US20050145176 Semiconductor processing equipment having improved process drift control |
| 07/07/2005 | US20050145174 Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method |
| 07/07/2005 | US20050145173 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 07/07/2005 | DE10392235T5 Vorrichtung zur Plasmabearbeitung The plasma processing apparatus |
| 07/07/2005 | DE10358329A1 Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen An apparatus for generating excited and / or ionized particles in a plasma and method for generating ionized particles |
| 07/07/2005 | DE10358036A1 Verfahren und Vorrichtung zum Charakterisieren einer Tiefenstruktur in einem Substrat Method and apparatus for characterizing a deep structure in a substrate, |
| 07/07/2005 | DE10352144A1 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten Vacuum coating plant for coating elongate substrates |
| 07/07/2005 | DE10053885B4 Verfahren zur Erzeugung von Maskendaten für die Einzelaufnahme-Teilbelichtung sowie zugehöriges Belichtungsverfahren A method for generating mask data for the individual female part as well as associated exposure exposure method |
| 07/06/2005 | EP1550640A1 Apparatus and method for manufacturing a preform by plasma chemical vapour deposition |
| 07/06/2005 | EP1550144A1 System for and method of gas cluster ion beam processing |
| 07/06/2005 | EP1549923A2 Fragmentation methods for mass spectrometry |
| 07/06/2005 | EP0948805B1 Wafer electrical discharge control |
| 07/06/2005 | CN1636261A Monitoring substrate processing using reflected radiation |
| 07/06/2005 | CN1636076A Magnetron negative ion sputter source |
| 07/06/2005 | CN1635627A Low energy dosage monitoring using wafer impregnating machine |
| 07/06/2005 | CN1635604A Sweep electron microscope having non-slip sample take-and-place device |
| 07/06/2005 | CN1635600A Method for preparing transmission electron microscope test piece |
| 07/06/2005 | CN1635599A Method for preparing transmission electron microscope test piece |
| 07/06/2005 | CN1209788C Method and apparatus for electron beam irradiation |
| 07/06/2005 | CN1209491C Method and special apparatus for modifying inner surface of tubular workpiece |
| 07/06/2005 | CN1209201C Negative pressure plasma device and cleaning method |
| 07/05/2005 | US6915179 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 07/05/2005 | US6914444 Semiconductor device test method and semiconductor device tester |
| 07/05/2005 | US6914441 Detection of defects in patterned substrates |
| 07/05/2005 | US6914386 Source of liquid metal ions and a method for controlling the source |
| 07/05/2005 | US6914252 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/05/2005 | US6914249 Particle-optical apparatus, electron microscopy system and electron lithography system |
| 07/05/2005 | US6914248 Particle-optical apparatus and method for operating the same |
| 07/05/2005 | US6914244 Ion beam milling system and method for electron microscopy specimen preparation |
| 07/05/2005 | US6914207 Plasma processing method |
| 07/05/2005 | US6914005 Plasma etching method |
| 07/05/2005 | US6913861 Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device |
| 07/05/2005 | US6913703 Method of adjusting the thickness of an electrode in a plasma processing system |
| 06/30/2005 | WO2005059986A1 Film-forming method, method for generating plasma, and substrate processing apparatus |
| 06/30/2005 | WO2005059974A1 Edge flow faceplate for improvement of cvd film properties |
| 06/30/2005 | WO2005059962A2 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 06/30/2005 | WO2005059960A2 Segmented radio frequency electrode apparatus and method for uniformity control |
| 06/30/2005 | WO2005059948A1 Apparatus and method for plasma processing |
| 06/30/2005 | WO2005059942A2 Method and apparatus for extending equipment uptime in ion implantation |
| 06/30/2005 | WO2005059197A2 Method and device for magnetron sputtering |
| 06/30/2005 | WO2005038856A3 Kinematic ion implanter electrode mounting |
| 06/30/2005 | WO2005004186A3 Particle detector suitable for detecting lons and electrons |
| 06/30/2005 | WO2004077479A3 Deflecting acceleration/deceleration gap |
| 06/30/2005 | WO2004042798A3 Apparatus and method for treating objects with radicals generated from plasma |
| 06/30/2005 | US20050143952 Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus |
| 06/30/2005 | US20050142671 Low energy dose monitoring of implanter using implanted wafers |
| 06/30/2005 | US20050142000 Plasma-based gas treatment system integrated in a vacuum pump |
| 06/30/2005 | US20050140531 Method of verifying proximity effect correction in electron beam lithography |
| 06/30/2005 | US20050139789 Charged particle beam apparatus, charged particle detection method, and method of manufacturing semiconductor device |
| 06/30/2005 | US20050139784 Lithographic apparatus and method of manufacturing a device and method of performing maintenance |
| 06/30/2005 | US20050139773 Scanning electron microscope |
| 06/30/2005 | US20050139771 Thin film transistor array inspection apparatus |
| 06/30/2005 | US20050139768 Method and apparatus for the characterization of a depth structure in a substrate |
| 06/30/2005 | US20050139467 Sputtering device |
| 06/30/2005 | US20050139322 Plasma processing device |
| 06/30/2005 | US20050139321 Plasma processing apparatus |
| 06/30/2005 | US20050139320 Thin-film magnetic recording head manufacture using selective imaging |
| 06/30/2005 | US20050139317 Shielding plate in plasma for uniformity improvement |
| 06/30/2005 | DE202004020458U1 Plasma device for producing linearly expanded, inductively coupled plasma uses a vacuum chamber to treat or coat substrates with plasma |
| 06/29/2005 | EP1548808A1 High frequency plasma generator and high frequency plasma generating method |
| 06/29/2005 | EP1548806A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 06/29/2005 | EP1548795A1 Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions |
| 06/29/2005 | EP1548150A1 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process |
| 06/29/2005 | EP1547124A1 Device for the treatment of a web-type material in a plasma-assisted process |
| 06/29/2005 | EP1547123A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (apg) |
| 06/29/2005 | EP1547122A2 Methods and apparatus for precise measurement of time delay between two signals |
| 06/29/2005 | EP1547121A1 A scanning electron microscope |
| 06/29/2005 | EP1547120A1 Load lock vacuum conductance limiting aperture |
| 06/29/2005 | EP1547119A1 Device with foil corrector for electron optical aberrations at low energy |
| 06/29/2005 | EP1547117A2 Transducer package for process control |
| 06/29/2005 | EP1546434A1 Device for carrying out a plasma-assisted process |
| 06/29/2005 | EP1490528B1 Rotating tubular cathode |
| 06/29/2005 | EP1273025B1 Device for plasma-treating the surface of substrates by ion etching |
| 06/29/2005 | EP1114434A4 Ac glow plasma discharge device having an electrode covered with apertured dielectric |
| 06/29/2005 | EP1016121B1 Vapour deposition coating apparatus |
| 06/29/2005 | EP1007762B1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 06/29/2005 | EP0946414B1 Microwave plasma chemical synthesis of ultrafine powders |
| 06/29/2005 | CN1633707A Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring |
| 06/29/2005 | CN1633524A Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method |
| 06/29/2005 | CN1632920A Method for accurately controlling ion implantation concentration and pressure compensating factor synchronous control method |
| 06/29/2005 | CN1632906A Ion source device for low-energy ion beam material preparing method |
| 06/29/2005 | CN1632905A Vacuum cathode arc straight tube filter |
| 06/29/2005 | CN1208997C Methods and appts. for operating high energy accelerator in low energy mode |
| 06/29/2005 | CN1208814C RF probe with thermal conducting sleeve |
| 06/29/2005 | CN1208802C Ion source evaporator |
| 06/28/2005 | US6911832 Focused ion beam endpoint detection using charge pulse detection electronics |
| 06/28/2005 | US6911789 Power supply for a hot-filament cathode |