| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/03/2005 | CN1648281A Arc coating deposition method and apparatus |
| 08/03/2005 | CN1213469C Apparatus and method for contact failure inspection in semiconductor devices |
| 08/03/2005 | CN1213290C Detection method of dynamic micronic dust in etching reaction chamber |
| 08/03/2005 | CN1213163C Sputting film-plating apparatus and vacuum surface treating device |
| 08/02/2005 | US6925629 Reticle fabrication method |
| 08/02/2005 | US6925423 Monitoring device and monitoring method for vacuum device |
| 08/02/2005 | US6924494 Method of exposing a target to a charged particle beam |
| 08/02/2005 | US6924493 Ion beam lithography system |
| 08/02/2005 | US6924489 Device for reducing the impact of distortions in a microscope |
| 08/02/2005 | US6924488 Charged-particle beam apparatus equipped with aberration corrector |
| 08/02/2005 | US6924484 Void characterization in metal interconnect structures using X-ray emission analyses |
| 08/02/2005 | US6924481 Scanning microscope with brightness control |
| 08/02/2005 | US6924480 Apparatus and method for using a volume conductive electrode with ion optical elements for a time-of-flight mass spectrometer |
| 08/02/2005 | US6924455 Integrated plasma chamber and inductively-coupled toroidal plasma source |
| 08/02/2005 | US6924235 Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method |
| 08/02/2005 | US6924215 Method of monitoring high tilt angle of medium current implant |
| 08/02/2005 | US6924001 diamond-like carbon (DLC) films |
| 08/02/2005 | US6923885 Plasma processing system and apparatus and a sample processing method |
| 07/28/2005 | WO2005069703A2 Plasma treatment of large-scale components |
| 07/28/2005 | WO2005069701A1 Plasma processing apparatus |
| 07/28/2005 | WO2005069346A1 Projection electron microscope, electron microscope, specimen surface observing method, and micro device producing method |
| 07/28/2005 | WO2005069345A1 Electron beam device |
| 07/28/2005 | WO2005069344A2 Gas distribution plate assembly for plasma reactors |
| 07/28/2005 | WO2004102638A3 Rf pulsing of a narrow gap capacitively coupled reactor |
| 07/28/2005 | WO2004079764A3 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 07/28/2005 | US20050164513 Plasma etch reactor and method |
| 07/28/2005 | US20050164506 Method and apparatus for backside polymer reduction in dry-etch process |
| 07/28/2005 | US20050164028 not encumbered with noble gas inclusions and is a deposition product from a noble-gas-free getter metal alloy plasma; high take-up capacity for residual gases and permits a high number of pumping cycles before the volume is filled with reactive residual gases; alloy of titanium, zirconium and vanadium |
| 07/28/2005 | US20050163517 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 07/28/2005 | US20050162805 Holding mechanism of object to be processed |
| 07/28/2005 | US20050162335 Plasma device |
| 07/28/2005 | US20050162175 Charging voltage measuring device for substrate and ion beam irradiating device |
| 07/28/2005 | US20050161621 Charged particle beamlet exposure system |
| 07/28/2005 | US20050161620 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/28/2005 | US20050161619 Method of correction for wafer crystal cut error in semiconductor processing |
| 07/28/2005 | US20050161616 Method and apparatus for simultaneously depositing and observing materials on a target |
| 07/28/2005 | US20050161602 Method of measurement accuracy improvement by control of pattern shrinkage |
| 07/28/2005 | US20050161601 Electron beam system and electron beam measuring and observing method |
| 07/28/2005 | US20050161600 Sample electrification measurement method and charged particle beam apparatus |
| 07/28/2005 | US20050161322 Replaceable target sidewall insert with texturing |
| 07/28/2005 | US20050161317 Plasma processing system |
| 07/28/2005 | US20050161160 Dry etching method and apparatus |
| 07/28/2005 | US20050160986 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
| 07/28/2005 | US20050160985 Compact, distributed inductive element for large scale inductively-coupled plasma sources |
| 07/28/2005 | DE10359508A1 Verfahren und Vorrichtung zum Magnetronsputtern Method and apparatus for magnetron sputtering |
| 07/28/2005 | DE10044199B9 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles |
| 07/27/2005 | EP1557885A1 Image pickup device and manufacturing method thereof |
| 07/27/2005 | EP1557872A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 07/27/2005 | EP1557869A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 07/27/2005 | EP1557867A1 Focussing lens for charged particle beams |
| 07/27/2005 | EP1557866A1 Beam optical component having a charged particle lens |
| 07/27/2005 | EP1556883A2 Method for magnetron sputtering |
| 07/27/2005 | EP1556882A2 High-power pulsed magnetically enhanced plasma processing |
| 07/27/2005 | EP1556881A2 Electron beam exposure system |
| 07/27/2005 | CN1647593A ECR plasma source and ECR plasma device |
| 07/27/2005 | CN1647256A Plasma processing device and baffle plate thereof |
| 07/27/2005 | CN1647252A Window type probe, plasma monitoring device, and plasma processing device |
| 07/27/2005 | CN1647238A Faraday shields and plasma wafer processing |
| 07/27/2005 | CN1647237A Multirate processing for metrology of plasma RF source |
| 07/27/2005 | CN1647236A A method of implanting a substrate and an ion implanter for performing the method |
| 07/27/2005 | CN1647235A Multi-directional scanning of movable member and ion beam monitoring arrangement therefor |
| 07/27/2005 | CN1645549A Electron-beam inspection apparatus and methods of inspecting through-holes using clustered nanotube arrays |
| 07/27/2005 | CN1645548A Charged particle beam device, its control method, substrate inspecting method and manufacture of semiconductor device |
| 07/27/2005 | CN1645257A Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 07/27/2005 | CN1212658C Monitoring system and method for monitoring process condition change by electron beam |
| 07/26/2005 | US6922019 Microwave ion source |
| 07/26/2005 | US6921907 Substrate positioning system |
| 07/26/2005 | US6921906 Mass spectrometer |
| 07/26/2005 | US6921722 Coating, modification and etching of substrate surface with particle beam irradiation of the same |
| 07/22/2005 | WO2006008541A2 Electronic apparatus |
| 07/21/2005 | WO2005067023A1 Substrate processing apparatus |
| 07/21/2005 | WO2005067022A1 Shower plate, plasma processing system, and process for producing product |
| 07/21/2005 | WO2005067005A1 Small volume process chamber with hot inner surfaces |
| 07/21/2005 | WO2005066998A1 Interference instrument |
| 07/21/2005 | WO2005066997A2 Dual frequency rf match |
| 07/21/2005 | WO2005066991A1 Stabilizing plasma and generator interactions |
| 07/21/2005 | WO2005066658A1 Ion beam measuring method and ion implanting apparatus |
| 07/21/2005 | WO2005066385A1 Ion implantation system and ion implantation system |
| 07/21/2005 | WO2005065186A2 Showerhead electrode assembly for plasma processing apparatuses |
| 07/21/2005 | WO2005024911A3 Unipolar electrostatic quadrupole lens and switching methods for charged beam transport |
| 07/21/2005 | WO2005010938A3 Impedance matching network with termination of secondary rf frequencies |
| 07/21/2005 | WO2005006376A3 Electronic device with aperture and wide lens for small emission spot size |
| 07/21/2005 | US20050160383 Combined e-beam and optical exposure semiconductor lithography |
| 07/21/2005 | US20050159010 Plasma processing apparatus |
| 07/21/2005 | US20050158886 Method for processing semiconductor |
| 07/21/2005 | US20050156530 Inductively coupled plasma generator having lower aspect ratio |
| 07/21/2005 | US20050156117 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor |
| 07/21/2005 | US20050155952 Emission spectroscopic processing apparatus and plasma processing method using it |
| 07/21/2005 | US20050155855 Vacuum sputtering cathode |
| 07/21/2005 | US20050155556 Method and device for coating substrates |
| 07/21/2005 | US20050155555 Semiconductor manufacturing apparatus |
| 07/21/2005 | US20050155373 Processing apparatus and processing apparatus maintenance method |
| 07/21/2005 | DE10392996T5 Verbesserungen für Duschköpfe Improvements for shower heads |
| 07/21/2005 | DE102004026636B3 Plasma jet process to modify the surface of a metal component by exposure to high-pressure jet in the presence of a carrier gas |
| 07/20/2005 | EP1555676A2 Method of operating a probe microscope |
| 07/20/2005 | EP1554634A2 Lithography system |
| 07/20/2005 | EP1554412A2 Beam plasma source |
| 07/20/2005 | EP1064713A4 Exposure device having a planar motor |
| 07/20/2005 | CN1643666A Plasma processor electrode and plasma processor |
| 07/20/2005 | CN1643663A Plasma processing apparatus |