| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/20/2005 | CN1643178A Low contamination components for semiconductor processing apparatus and methods for making components |
| 07/20/2005 | CN1641841A Plasma processing method and apparatus |
| 07/20/2005 | CN1641368A Method and device for controlling high-voltage discharge measuring instrument |
| 07/20/2005 | CN1640832A Apparatus and method for manufacturing a preform by plasma chemical vapour deposition |
| 07/20/2005 | CN1211828C Apparatus and method for charging ions on target |
| 07/20/2005 | CN1211825C Ferroelectric emitter body |
| 07/19/2005 | US6920368 Method and device for correcting proximity effects |
| 07/19/2005 | US6920312 RF generating system with fast loop control |
| 07/19/2005 | US6919952 Direct write lithography system |
| 07/19/2005 | US6919689 Method for toolmatching and troubleshooting a plasma processing system |
| 07/19/2005 | US6919577 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| 07/19/2005 | US6919574 Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method |
| 07/19/2005 | US6919570 Electron beam sensor |
| 07/19/2005 | US6919563 Defect evaluation apparatus utilizing positrons |
| 07/19/2005 | US6919281 Method of manufacturing semiconductor device using flexible tube |
| 07/19/2005 | US6919279 Endpoint detection for high density plasma (HDP) processes |
| 07/19/2005 | US6919278 Method for etching silicon carbide |
| 07/19/2005 | US6919107 Method and device for treating surfaces using a glow discharge plasma |
| 07/19/2005 | US6918352 Method for producing coated workpieces, uses and installation for the method |
| 07/19/2005 | US6918351 Apparatus for ion beam implantation |
| 07/14/2005 | WO2005064998A1 Plasma processing apparatus |
| 07/14/2005 | WO2005064650A2 Method and apparatus for performing a limited area spectral analysis |
| 07/14/2005 | WO2005064036A1 Copper or copper alloy target/copper alloy backing plate assembly |
| 07/14/2005 | WO2005062758A2 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 07/14/2005 | WO2005045091A3 Vacuum coating system for coating elongate substrates |
| 07/14/2005 | WO2005043599A3 Electron beam treatment apparatus |
| 07/14/2005 | WO2005017949A3 Method for high-resolution processing of thin layers with electron beams |
| 07/14/2005 | WO2005008223A3 Methods for defect detection and process monitoring based on sem images |
| 07/14/2005 | WO2004112077A3 Rf current return path for a large area substrate plasma reactor |
| 07/14/2005 | WO2004095500A3 Vacuum chamber with recessed viewing tube and imaging device situated therein |
| 07/14/2005 | US20050154482 Plasma processing method and apparatus |
| 07/14/2005 | US20050151544 Sensor array for measuring plasma characteristics in plasma processing environments |
| 07/14/2005 | US20050151479 Method for toolmatching and troubleshooting a plasma processing system |
| 07/14/2005 | US20050151456 Electron-beam inspection apparatus and methods of inspecting through-holes using clustered nanotube arrays |
| 07/14/2005 | US20050151284 Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 07/14/2005 | US20050151096 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151089 Manipulator assembly in ion implanter |
| 07/14/2005 | US20050151078 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor |
| 07/14/2005 | US20050150866 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 07/14/2005 | US20050150601 Gas distribution plate assembly for plasma reactors |
| 07/14/2005 | US20050150459 Full glass substrate deposition in plasma enhanced chemical vapor deposition |
| 07/14/2005 | US20050150458 Reduced volume reactor |
| 07/14/2005 | US20050150457 Plasma-Assisted Sputter Deposition System |
| 07/14/2005 | US20050150456 Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism |
| 07/14/2005 | US20050150455 Processing apparatus and processing method |
| 07/14/2005 | DE10358505A1 Plasmaquelle zur Erzeugung eines induktiv gekoppelten Plasmas Plasma source for generating an inductively coupled plasma |
| 07/14/2005 | DE10358182A1 Specimen for electron microscopic investigations has coating for draining away charge that has opening at point at which electron beam is incident on specimen |
| 07/14/2005 | DE10358099A1 Electrochemical etching process for a semiconductor probe preferably gallium nitride measures surface current at electrolyte contact and applies jet of fresh electrolyte |
| 07/14/2005 | DE102004059664A1 Semiconductor wafer measurement point focusing method for semiconductor manufacturing process, involves regulating lens current value to perform focusing while widening focus depth, if evaluation value is less than preset level |
| 07/13/2005 | EP1553446A1 Pattern size correcting device and pattern size correcting method |
| 07/13/2005 | EP1553207A2 Two dimensional magnetron scanning for planar sputtering |
| 07/13/2005 | EP1553206A1 Reactive sputtering method and device |
| 07/13/2005 | EP1552727A1 Inductively coupled plasma generator having lower aspect ratio |
| 07/13/2005 | EP1552544A1 Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 07/13/2005 | EP1552543A2 Method for toolmatching and troubleshooting a plasma processing system |
| 07/13/2005 | CN1640211A Plasma surface treating method and apparatus therefor |
| 07/13/2005 | CN1640210A Inductively coupled plasma generator having lower aspect ratio |
| 07/13/2005 | CN1639831A Tunable multi-zone gas injection system |
| 07/13/2005 | CN1639830A Method and device for aligning a charged particle beam column |
| 07/13/2005 | CN1639638A Mask repair with electron beam-induced chemical etching |
| 07/13/2005 | CN1638814A Device for sterilizing objects |
| 07/13/2005 | CN1638813A Portable radiant energy sterilizer |
| 07/13/2005 | CN1638598A Plasma treatment device and substrate surface treatment device |
| 07/13/2005 | CN1638015A Improvements relating to ion implantation |
| 07/13/2005 | CN1638014A Ion beam monitoring arrangement |
| 07/13/2005 | CN1638013A Ion beam irradiation device |
| 07/13/2005 | CN1210999C Plasma etching reactor |
| 07/13/2005 | CN1210768C Plasma processing device |
| 07/13/2005 | CN1210756C 法拉第装置 Faraday device |
| 07/13/2005 | CN1210750C Magnetic filter for ion source |
| 07/12/2005 | US6917508 Apparatus for manufacturing semiconductor device |
| 07/12/2005 | US6917433 Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process |
| 07/12/2005 | US6917419 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen |
| 07/12/2005 | US6917204 Adjusting the parameters of the supplemental signal with respect to the primary signal, the user can control the parameter of resultant plasma and thus control the non-uniformities induced in the semiconductor wafer |
| 07/12/2005 | US6917048 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus |
| 07/12/2005 | US6917046 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 07/12/2005 | US6917045 Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method |
| 07/12/2005 | US6917043 Individually addressable cathodes with integrated focusing stack or detectors |
| 07/12/2005 | US6916678 Surface modification method |
| 07/12/2005 | US6916512 Method and device for coating substrates |
| 07/12/2005 | US6916407 Method for high frequency sputtering dielectric target in a vacuum chamber with high frequency gas discharge; for coating optical storage disks |
| 07/12/2005 | US6916401 Adjustable segmented electrode apparatus and method |
| 07/12/2005 | US6916400 Device for the plasma treatment of gases |
| 07/12/2005 | US6916399 Temperature controlled window with a fluid supply system |
| 07/07/2005 | WO2005062362A1 Plasma processing apparatus |
| 07/07/2005 | WO2005062339A1 Rf metrology characterization for field installation and serviceability of plasma processing systems |
| 07/07/2005 | WO2005062338A1 Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma |
| 07/07/2005 | WO2005062337A1 Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions |
| 07/07/2005 | WO2005062335A2 Device for producing excited and/or ionised particles in a plasma and method for producing ionised particles |
| 07/07/2005 | WO2005061753A1 Compensation of spacing between magnetron and sputter target |
| 07/07/2005 | WO2005060602A2 Controlling the flow of vapors sublimated from solids |
| 07/07/2005 | WO2004095138A3 Micromachining process, system and product |
| 07/07/2005 | WO2004088708A3 System and method for generating an electorn beam |
| 07/07/2005 | US20050148167 Method and apparatus for forming insulating layer |
| 07/07/2005 | US20050147852 Chemical and corrosion resist protective coatings; multilayer composite comprising a metal alloy undercoatings, yttrium oxide overcoatings which was formed by spraying under depressurization |
| 07/07/2005 | US20050147742 Control of particle generation from such components due to thermal changes or cycling in semiconductor manufacture to prevent defects; cladding a layer of higher thermoconductivity such as copper unto a low thermoconductive base layer such as stainless steel in contact with a heat sink |
| 07/07/2005 | US20050147150 Thermography test method and apparatus for bonding evaluation in sputtering targets |
| 07/07/2005 | US20050146709 Plasma processing method and plasma processing apparatus |
| 07/07/2005 | US20050146277 Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system |
| 07/07/2005 | US20050145835 Emitter for electron-beam projection lithography system and manufacturing method thereof |