Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2005
08/11/2005US20050173067 Plasma etching chamber and plasma etching system using same
08/11/2005US20050172903 Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate for plasma processing apparatus
08/11/2005US20050172902 PCVD apparatus and method of manufacturing a preform
08/11/2005US20050172901 Plasma processing device
08/11/2005DE102004002508A1 Control and regulation of the profile of an ion beam used in surface coating uses a pulsed beam control process
08/10/2005EP1562220A1 Integrated power modules for plasma processing systems
08/10/2005EP1562076A2 Mask, exposure method and production method of semiconductor device
08/10/2005EP1561840A1 Method of forming metal oxide film and microwave power source unit for use in the method
08/10/2005EP1561838A1 Energy and medium supply for a coating device that consists of several chambers
08/10/2005EP1561836A1 Method for making a target.
08/10/2005EP1561491A1 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation
08/10/2005EP1561234A2 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
08/10/2005EP1560943A2 High deposition rate sputtering
08/10/2005EP1420876B1 Method of producing powder with composite grains and the device for carrying out said method
08/10/2005CN1653870A Plasma-assisted joining
08/10/2005CN1653869A Plasma-assisted decrystallization
08/10/2005CN1653868A 等离子体催化剂 Plasma catalyst
08/10/2005CN1653867A Plasma-assisted coating
08/10/2005CN1653866A Plasma generation and processing with multiple radiation sources
08/10/2005CN1653851A Plasma-assisted heat treatment
08/10/2005CN1653599A Plasma processing device and plasma generating method
08/10/2005CN1653589A Silicon parts for plasma reaction chambers
08/10/2005CN1653581A Stabilization of electronegative plasmas with feedback control of RF generator systems
08/10/2005CN1653580A Apparatus and methods for minimizing arcing in a plasma processing chamber
08/10/2005CN1653579A Multi directional mechanical scanning in an ion implanter
08/10/2005CN1653574A Plasma-assisted gas generation
08/10/2005CN1653248A Plasma-assisted engine exhausting process
08/10/2005CN1653207A Laser drilled surfaces for substrate processing chambers
08/10/2005CN1653206A System and apparatus for control of sputter deposition process
08/10/2005CN1653205A Plasma-assisted reinforced coating
08/10/2005CN1653204A Plasma-assisted nitrogen surface treatment
08/10/2005CN1653161A Plasma-assisted joining
08/10/2005CN1652996A Inductively coupled plasma reactor for producing nano-powder
08/10/2005CN1652893A Plasma-assisted process in production line
08/10/2005CN1652889A Plasma-assisted sintering
08/10/2005CN1652867A Plasma-assisted carbon structure forming
08/10/2005CN1652866A Plasma-assisted carburizing
08/10/2005CN1652661A Plasma generating apparatus and plasma processing apparatus
08/10/2005CN1652283A Field emitting electronic source device and its preparing process
08/10/2005CN1214523C Method for heat conversion plasma tuner
08/10/2005CN1214334C Integrated full wavelengh spectrometer for wafer processing
08/10/2005CN1214285C Method and device for designing electron beam mask
08/09/2005US6927400 Sample manipulation system
08/09/2005US6927391 Method and apparatus for processing a micro sample
08/09/2005US6927358 Vacuum seal protection in a dielectric break
08/09/2005US6927174 Site-specific method for large area uniform thickness plan view transmission electron microscopy sample preparation
08/09/2005US6927173 Plasma processing method
08/09/2005US6927148 Ion implantation method and method for manufacturing SOI wafer
08/09/2005US6926935 Proximity deposition
08/09/2005US6926934 Method and apparatus for deposited film
08/09/2005US6926844 Plasma etching method having pulsed substrate electrode power
08/09/2005US6926811 Arc-coating process with rotating cathodes
08/09/2005US6926803 Confinement ring support assembly
08/09/2005US6926802 Exhaust ring of dry etching device
08/09/2005US6926800 Plasma etching method and apparatus
08/09/2005US6926799 Etching apparatus using neutral beam
08/06/2005CA2496099A1 Mass spectrometer
08/06/2005CA2496013A1 Mass spectrometer
08/04/2005WO2005071716A2 Method of correction for wafer crystal cut error in semiconductor processing
08/04/2005WO2005071710A1 Method and system for the directional detection of electrons in a scanning electron microscope
08/04/2005WO2005071709A2 Beam optical component having a charged particle lens
08/04/2005WO2005071708A2 Focussing lens for charged particle beams
08/04/2005WO2005069945A2 Ion implanter system, method and program product including particle detection
08/04/2005WO2005069748A2 Mems nanoindenter
08/04/2005WO2005019495A3 Control system for a sputtering system
08/04/2005WO2004066333A3 Method and device for producing corpuscular radiation systems
08/04/2005US20050171730 Method and system for monitoring component consumption
08/04/2005US20050170553 Apparatus for controlled alignment of catalytically grown nanostructures
08/04/2005US20050170268 Circuit patterning substrate, providing mask, collimating incident direction of particles, irradiating
08/04/2005US20050170265 Mask, exposure method and production method of semiconductor device
08/04/2005US20050168153 Sterilizer for medical equipment using a low-pressure plasma in an evacuable chamber connected to a conduit for ionized gas; alternating current plasma by a high-frequency transmitting device with an antenna having two plasma generating coils spaced apart; lo-temperature sterilization of grafted plastic
08/04/2005US20050168152 Termination of secondary frequencies in RF power delivery
08/04/2005US20050168076 Wafer stage operable in a vacuum environment
08/04/2005US20050167651 Controlled alignment catalytically grown nanostructures
08/04/2005US20050167615 Charged beam writing apparatus and writing method
08/04/2005US20050167614 Gas blowingnozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method
08/04/2005US20050167607 Multipole field-producing apparatus in charged-particle optical system and aberration corrector
08/04/2005US20050167589 Electron microscope
08/04/2005US20050167398 Vacuum processing apparatus and control method therefor
08/04/2005US20050167396 A measurement to determine plasma leakage
08/04/2005US20050167263 High-power pulsed magnetically enhanced plasma processing
08/04/2005US20050167262 Passive bipolar arc control system and method
08/04/2005US20050167052 Plasma processing device and baffle plate thereof
08/04/2005US20050167051 Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
08/04/2005US20050167049 Vacuum processing apparatus and control method therefor
08/04/2005DE19841528B4 Verfahren und Gerät zum Erzeugen von Halbleiterbelichtungsdaten A method and apparatus for producing semiconductor exposure data
08/03/2005EP1560262A1 Plasma etching chamber and plasma etching system using same
08/03/2005EP1560253A2 Apparatus for coating a substrate, the apparatus comprising a gettering device
08/03/2005EP1560252A2 Deposition apparatus
08/03/2005EP1560071A1 Electron beam exposure method and electron beam exposure system
08/03/2005EP1559809A2 Apparatus and method for coating substrate
08/03/2005EP1559128A1 Methods and apparatus for generating high-density plasma
08/03/2005EP1559127A2 Methods and apparatus for ion beam neutralization in magnets
08/03/2005EP1559126A2 Energy filter image generator for electrically charged particles and the use thereof
08/03/2005EP1559124A2 Method and apparatus for stabilizing of the glow plasma discharges
08/03/2005EP1264004B1 Method and device for coating substrates
08/03/2005EP1105703A4 Method and apparatus for monitoring plasma processing operations
08/03/2005EP0840939B1 Correction device for the correction of lens aberrations in particle-optical apparatus
08/03/2005CN1649077A Long life ionic source of ion injection machine
08/03/2005CN1649071A External magnetic insulation ion diode for prdoucing large area strong flow pulse ionic beam
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