| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/23/2005 | US6933507 Controlling the characteristics of implanter ion-beams |
| 08/23/2005 | US6933501 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method |
| 08/23/2005 | US6933500 Electron microscope |
| 08/23/2005 | US6933499 Electron microscope, method for operating the same, and computer-readable medium |
| 08/23/2005 | US6933460 Method and device for plasma treatment of moving metal substrates |
| 08/23/2005 | US6933025 Chamber having components with textured surfaces and method of manufacture |
| 08/23/2005 | US6933021 Diffusion barrier; protective coatings; reacting titanium nitride with organosilicon compound |
| 08/23/2005 | US6932664 Improving discharge, by injecting a coating solution into a tube, coating the entire inner wall, sealing, drying, burning the magnesium hexanoate film to form a uniform magnesium oxide film, applying voltage from exterior two discharge electrodes |
| 08/18/2005 | WO2005076349A1 System and method for stress free conductor removal |
| 08/18/2005 | WO2005076348A1 System and method for surface reduction, passivation, corrosion prevention and activation of copper surface |
| 08/18/2005 | WO2005076347A1 Stress free etch processing in combination with a dynamic liquid meniscus |
| 08/18/2005 | WO2005076329A1 Ion doping apparatus, ion doping method, semiconductor device, and method of fabricating semiconductor device |
| 08/18/2005 | WO2005076146A1 Method and system for monitoring component consumption |
| 08/18/2005 | WO2005076039A1 Beam measuring equipment and beam measuring method using the same |
| 08/18/2005 | WO2005026404A3 Thermography test method and apparatus for evaluating a bond interface of a sputtering target/backing plate assembly |
| 08/18/2005 | WO2005004188A3 Far-field imaging in electron microscopy |
| 08/18/2005 | WO2004111604A3 High resolution atom probe |
| 08/18/2005 | WO2004102307A3 Method and system for monitoring and control of a chamber process |
| 08/18/2005 | US20050181584 Ion implantation |
| 08/18/2005 | US20050181524 Matching dose and energy of multiple ion implanters |
| 08/18/2005 | US20050181314 Light emitting diodes; semiconductor lasers |
| 08/18/2005 | US20050180877 Apparatus and method for irradiating electron beam |
| 08/18/2005 | US20050178983 Electron beam lithography device and drawing method using electron beams |
| 08/18/2005 | US20050178982 Particle source with selectable beam current and energy spread |
| 08/18/2005 | US20050178981 Ion beam neutral detection |
| 08/18/2005 | US20050178980 Method, system and device for microscopic examination employing fib-prepared sample grasping element |
| 08/18/2005 | US20050178966 Light weight portable scanning electron microscope |
| 08/18/2005 | US20050178965 Scanning electron microscope |
| 08/18/2005 | US20050178748 Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface |
| 08/18/2005 | US20050178746 Higher power density downstream plasma |
| 08/18/2005 | US20050178662 Rotating tubular cathode |
| 08/18/2005 | US20050178660 Sputter arrangement with a magnetron and a target |
| 08/18/2005 | US20050178654 Electrolytic cells; ionization source; supplying electricity; vapor deposition |
| 08/18/2005 | US20050178505 Electrode for dry etching a wafer |
| 08/18/2005 | US20050178331 Electrode assembly and method for producing an electrode plate |
| 08/18/2005 | US20050178329 Formation of photoconductive and photovoltaic films |
| 08/18/2005 | DE4227631B4 Verfahren und Vorrichtung zur Oberflächenbehandlung Method and apparatus for surface treatment |
| 08/18/2005 | DE19719718B4 Szintillator, Bildaufnahmevorrichtung unter Verwendung desselben sowie Untersuchungs-Vorrichtung The same scintillator image pickup apparatus using and examination apparatus |
| 08/18/2005 | DE10018858B4 Magnetronanordnung Magnetron |
| 08/17/2005 | EP1564794A1 Method and system for making uniform high frequency plasma over larger area in plasma-activated cvd system |
| 08/17/2005 | EP1564793A1 Exposure device, exposure method, and semiconductor device manufacturing method |
| 08/17/2005 | EP1564774A1 High brightness thermionic cathode |
| 08/17/2005 | EP1563381A2 Defect analyzer |
| 08/17/2005 | EP1089001B1 Static pressure gas bearing, stage device using it, and optical device using it |
| 08/17/2005 | EP1029231A4 Method and apparatus employing external light source for endpoint detection |
| 08/17/2005 | EP0950258B1 Method and device for treating a semiconductor surface |
| 08/17/2005 | EP0873573B1 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 08/17/2005 | CN1656593A Method and apparatus for vhf plasma processing with load mismatch reliability and stability |
| 08/17/2005 | CN1656373A Element-specific x-ray fluorescence microscope and method of operation |
| 08/17/2005 | CN1656244A Sputter method or device for the production of natural voltage optimized coatings |
| 08/17/2005 | CN1655660A Power supply unit for generating plasma and plasma apparatus including the same |
| 08/17/2005 | CN1655328A Plasma control using dual cathode frequency mixing |
| 08/17/2005 | CN1654704A Device for connecting energy and medium of coating means with a plurality of cavities |
| 08/17/2005 | CN1215546C Methods and apparatus for determining an etch endpoint in a plasma processing system |
| 08/17/2005 | CN1215525C Semiconductor processing equipment having tiled ceramic liner |
| 08/17/2005 | CN1215520C Ion source |
| 08/16/2005 | US6931620 Inspection method and inspection system using charged particle beam |
| 08/16/2005 | US6931337 Lithography tool image quality evaluating and correcting |
| 08/16/2005 | US6930756 Electron beam exposure apparatus and semiconductor device manufacturing method |
| 08/16/2005 | US6930317 Charged particle beam apparatus, charged particle beam irradiation method, and method of manufacturing semiconductor device |
| 08/16/2005 | US6930316 Ion implantation system and ion implantation method |
| 08/16/2005 | US6930313 Emission source having carbon nanotube, electron microscope using this emission source, and electron beam drawing device |
| 08/16/2005 | US6930312 Charged-particle beam instrument and method of correcting aberration therein |
| 08/16/2005 | US6930309 Dual-energy electron flooding for neutralization of charged substrate |
| 08/16/2005 | US6930306 Electron microscope |
| 08/16/2005 | US6930049 Endpoint control for small open area by RF source parameter Vdc |
| 08/16/2005 | US6930047 Dry etching apparatus, etching method, and method of forming a wiring |
| 08/16/2005 | US6930041 Photo-assisted method for semiconductor fabrication |
| 08/16/2005 | US6929830 Plasma treatment method and method of manufacturing optical parts using the same |
| 08/16/2005 | US6929727 Rectangular cathodic arc source and method of steering an arc spot |
| 08/16/2005 | US6929721 Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes |
| 08/16/2005 | US6929712 Plasma processing apparatus capable of evaluating process performance |
| 08/11/2005 | WO2005074016A1 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate |
| 08/11/2005 | WO2005074002A2 Focusing system and method for a charged particle imaging system |
| 08/11/2005 | WO2005074001A2 Divergence-controlled hybrid multiple electron beam -emitting device |
| 08/11/2005 | WO2005074000A2 Compact, distributed inductive element for large scale inductively-coupled plasma sources |
| 08/11/2005 | WO2005010955A3 Method and apparatus for real-time in-situ ion implantation with closed loop control |
| 08/11/2005 | WO2004107414A3 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
| 08/11/2005 | US20050177268 Design system for delivering data, system for fabricating a semiconductor device, method of communicating writing data, method for fabricating a semiconductor device |
| 08/11/2005 | US20050176258 Pressure control method and processing device |
| 08/11/2005 | US20050176225 Method of manufacturing electronic device capable of controlling threshold voltage and ion implanter controller and system that perform the method |
| 08/11/2005 | US20050176221 Plasma CVD apparatus |
| 08/11/2005 | US20050174553 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 08/11/2005 | US20050174062 Plasma reactor and purification equipment |
| 08/11/2005 | US20050174030 HIgh brightness thermionic cathode |
| 08/11/2005 | US20050173657 Contact opening metrology |
| 08/11/2005 | US20050173656 Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beams |
| 08/11/2005 | US20050173655 Multi directional mechanical scanning in an ion implanter |
| 08/11/2005 | US20050173651 Cathode and counter-cathode arrangement in an ion source |
| 08/11/2005 | US20050173650 Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure f |
| 08/11/2005 | US20050173649 Electronic optical lens barrel and production method therefor |
| 08/11/2005 | US20050173644 Detector for variable pressure areas and an electron microscope comprising a corresponding detector |
| 08/11/2005 | US20050173633 Method of measuring dimensions of pattern |
| 08/11/2005 | US20050173632 Methods for sem inspection of fluid containing samples |
| 08/11/2005 | US20050173382 Plasma processing apparatus |
| 08/11/2005 | US20050173376 Method for etching a wafer in a plasma etch reactor |
| 08/11/2005 | US20050173375 Apparatus and method for use of optical system with a plasma processing system |
| 08/11/2005 | US20050173239 End point detection for sputtering and resputtering |
| 08/11/2005 | US20050173070 Power supply unit for generating plasma and plasma apparatus including the same |
| 08/11/2005 | US20050173069 Plasma generating apparatus and plasma processing apparatus |