| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/01/2005 | US20050189218 Cathodic arc coating apparatus |
| 09/01/2005 | US20050189075 Pre-clean chamber with wafer heating apparatus and method of use |
| 09/01/2005 | US20050189071 Processing apparatus and method for removing particles therefrom |
| 09/01/2005 | US20050189069 Plasma processing system and method |
| 09/01/2005 | US20050188923 Substrate carrier for parallel wafer processing reactor |
| 09/01/2005 | US20050188922 Plasma processing unit |
| 09/01/2005 | DE102004006849A1 Apparatus for coating turbine blades with ceramic has crucibles which can be rotated with respect to electron beam guns, bars of material to be vaporized being positioned with their upper ends in crucibles and exposed to beams |
| 09/01/2005 | DE102004005663A1 Verfahren zum Herstellen einer Targetanordnung A method of producing a target assembly |
| 08/31/2005 | EP1569268A1 Plasma processing system and method and electrode plate of plasma processing system |
| 08/31/2005 | EP1568797A2 In-situ dry clean chamber for front end of line fabrication |
| 08/31/2005 | EP1568061A2 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 08/31/2005 | EP1568060A2 One dimensional beam blanker array |
| 08/31/2005 | EP1228522B1 Vacuum circuit for a device for treating a receptacle with low pressure plasma |
| 08/31/2005 | CN1663029A Magnetron plasma processing apparatus |
| 08/31/2005 | CN1663017A Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 08/31/2005 | CN1663016A Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode |
| 08/31/2005 | CN1663015A Showerhead electrode design for semiconductor processing reactor |
| 08/31/2005 | CN1663013A A particle beam generator |
| 08/31/2005 | CN1663012A Particle beam processing apparatus and materials treatable using the apparatus |
| 08/31/2005 | CN1662839A Modular manipulation system for manipulating a sample under study with a microscope |
| 08/31/2005 | CN1662838A Manipulation system for manipulating a sample under study with a microscope |
| 08/31/2005 | CN1662298A Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| 08/31/2005 | CN1662114A Plasma antenna |
| 08/31/2005 | CN1661763A Ion implantation method and apparatus |
| 08/31/2005 | CN1661762A Ion beam irradiation apparatus and insulating spacer for the same |
| 08/31/2005 | CN1661433A Processing apparatus and method for removing particles therefrom |
| 08/31/2005 | CN1661363A Electro-probe micro analyzer |
| 08/31/2005 | CN1217390C Device and method for plasma processing and slow-wave plate |
| 08/31/2005 | CN1217388C Plasma processing device and exhaust ring |
| 08/30/2005 | US6937127 Apparatus for manipulating magnetic fields |
| 08/30/2005 | US6936981 Retarding electron beams in multiple electron beam pattern generation |
| 08/30/2005 | US6936842 Method and apparatus for process monitoring |
| 08/30/2005 | US6936831 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same |
| 08/30/2005 | US6936826 Vibration-isolating coupling including an elastomer diaphragm for scanning electron microscope and the like |
| 08/30/2005 | US6936818 Charged particle beam apparatus |
| 08/30/2005 | US6936817 Optical column for charged particle beam device |
| 08/30/2005 | US6936228 suppresses an influence on a magnetic field due to heat generated from discharge plasma, and can stably manufacture a high-purity carbon nanotube with excellent industrial efficiency |
| 08/30/2005 | US6936145 Coating method and apparatus |
| 08/30/2005 | US6936144 High frequency plasma source |
| 08/30/2005 | US6936135 Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber |
| 08/30/2005 | US6935269 Apparatus for treating the surface with neutral particle beams |
| 08/30/2005 | US6935167 Harmonic cantilevers and imaging methods for atomic force microscopy |
| 08/25/2005 | WO2005078782A1 Plasma processing apparatus and plasma processing method |
| 08/25/2005 | WO2005078758A1 Ion implantation method and ion implantation apparatus |
| 08/25/2005 | WO2005064650A3 Method and apparatus for performing a limited area spectral analysis |
| 08/25/2005 | WO2005031787A3 Ribbon-shaped ion beam with mass separation |
| 08/25/2005 | WO2005020273B1 Control of plasma transitions in sputter processing systems |
| 08/25/2005 | WO2005013341A3 Method and system for ion beam containment using photoelectrons in an ion beam guide |
| 08/25/2005 | US20050186789 Photo-assisted method for semiconductor fabrication |
| 08/25/2005 | US20050186753 FIB exposure of alignment marks in MIM technology |
| 08/25/2005 | US20050185562 Method and apparatus for constant linear velocity electron beam substrate processing |
| 08/25/2005 | US20050185171 Real-time monitoring apparatus for plasma process |
| 08/25/2005 | US20050184670 Device for confinement of a plasma within a volume |
| 08/25/2005 | US20050184669 Methods and Apparatus for Generating Strongly-Ionized Plasmas with Ionizational Instabilities |
| 08/25/2005 | US20050184668 Integrated vi probe |
| 08/25/2005 | US20050184258 Method of exposing using electron beam |
| 08/25/2005 | US20050184257 Characterizing an electron beam treatment apparatus |
| 08/25/2005 | US20050184256 Method and apparatus for a formatter following electron beam substrate processing system |
| 08/25/2005 | US20050184255 Apparatus, method and program for ion implantation simulation, and computer readable storage medium having stored therein the program |
| 08/25/2005 | US20050184254 Ion implantation method and apparatus |
| 08/25/2005 | US20050184253 Wafer 2D scan mechanism |
| 08/25/2005 | US20050184252 Image noise removing method in FIB/SEM complex apparatus |
| 08/25/2005 | US20050184251 FIB-SEM complex apparatus |
| 08/25/2005 | US20050184237 Charged particle beam apparatus |
| 08/25/2005 | US20050184236 Probe current imaging |
| 08/25/2005 | US20050184235 Image processing method, image processing apparatus and semiconductor manufacturing method |
| 08/25/2005 | US20050184234 Standard reference for metrology and calibration method of electron-beam metrology system using the same |
| 08/25/2005 | US20050184233 Standard sample for transmission electron microscope (TEM) elemental mapping and TEM elemetal mapping method using the same |
| 08/25/2005 | US20050184028 Probe tip processing |
| 08/25/2005 | US20050183945 creating a magnetic field so that the film-forming surface portion is placed in the magnetic field with the magnetic field induced normal to the substrate surface portion; back-biasing the back portion of the substrate; sputtering alloyed thin film |
| 08/25/2005 | US20050183943 Energy and media connection for a coating installation comprising several chambers |
| 08/25/2005 | US20050183827 Showerhead mounting to accommodate thermal expansion |
| 08/25/2005 | US20050183826 Showerheads for providing a gas to a substrate and apparatus and methods using the showerheads |
| 08/25/2005 | US20050183822 Plasma processing method and plasma processing apparatus |
| 08/25/2005 | US20050183821 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 08/25/2005 | US20050183668 Plasma antenna |
| 08/25/2005 | US20050183667 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 08/25/2005 | US20050183666 Shower plate having projections and plasma CVD apparatus using same |
| 08/25/2005 | DE102005004801A1 Massenspektrometer Mass spectrometer |
| 08/25/2005 | DE102004015226B3 Plasma cleaning method suitable for interior surfaces of e.g. bulbs for discharge lamps, forms back pressure and ignites plasma only inside bulb |
| 08/25/2005 | DE102004004844A1 Vorrichtung zum Beschichten eines Substrats mit einer Absorberanordnung Apparatus for coating a substrate with an absorber assembly |
| 08/24/2005 | EP1566827A1 Magnetron sputtering apparatus |
| 08/24/2005 | EP1566826A1 Particle source with selectable beam current and energy spread |
| 08/24/2005 | EP1566766A1 Image evaluation method and microscope |
| 08/24/2005 | EP1566647A1 Particle beam device probe operation |
| 08/24/2005 | EP1566081A1 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 08/24/2005 | EP1565929A2 Method for the production of a substrate and unit for the same |
| 08/24/2005 | CN1659934A 等离子体处理装置 Plasma processing apparatus |
| 08/24/2005 | CN1659690A Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus, and c |
| 08/24/2005 | CN1659679A Secondary electron detector, especially in a scanning electron microscope |
| 08/24/2005 | CN1659678A Electronic optical lens barrel and production method therefor |
| 08/24/2005 | CN1659444A Sensor and method for measuring a current of charged particles |
| 08/24/2005 | CN1659309A Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 08/24/2005 | CN1658331A Particle source with selectable beam current and energy spread |
| 08/24/2005 | CN1657646A Sputter arrangement with a magnetron and a target |
| 08/24/2005 | CN1216394C Field emission type electron source |
| 08/23/2005 | US6934142 Device and method for charge removal from dielectric surfaces |
| 08/23/2005 | US6933512 Charged particle beam instrument |
| 08/23/2005 | US6933511 Ion implanting apparatus |
| 08/23/2005 | US6933508 Method of surface texturizing |