| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/15/2005 | US20050199810 Electron beam device having a specimen holder |
| 09/15/2005 | US20050199808 Method and apparatus for collecting defect images |
| 09/15/2005 | US20050199806 Apparatus and method for directing gas towards a specimen |
| 09/15/2005 | US20050199491 Shields usable with an inductively coupled plasma reactor |
| 09/15/2005 | US20050199485 vacuum plasma surface treatment for improving the ion density, homogeneity of plasma density distribution on silicon wafers |
| 09/15/2005 | US20050199341 Method and system for analyzing data from a plasma process |
| 09/15/2005 | US20050199340 processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 09/15/2005 | DE4443740B4 Vorrichtung zum Beschichten von Substraten Apparatus for coating substrates |
| 09/15/2005 | DE10195251B4 Plasmaverarbeitungssystem und Verfahren Plasma processing system and method |
| 09/14/2005 | EP1575343A1 Plasma generation device, plasma control method, and substrate manufacturing method |
| 09/14/2005 | EP1575078A1 Method for surface treatment of substrates |
| 09/14/2005 | EP1573795A1 A system and method for controlling plasma with an adjustable coupling to ground circuit |
| 09/14/2005 | EP1573775A2 Gas distribution apparatus and method for uniform etching |
| 09/14/2005 | EP1573085A2 Magnetron sputtering systems including anodic gas distribution systems |
| 09/14/2005 | EP1572786A2 Process and apparatus for depositing plasma coating onto a container |
| 09/14/2005 | EP1044458B1 Dual face shower head magnetron, plasma generating apparatus and method of coating a substrate |
| 09/14/2005 | EP0871972B1 Electron beam device with single crystal window and matching anode |
| 09/14/2005 | EP0801810B1 Specimen holder for an electron microscope and device and method for mounting a specimen in an electron microscope |
| 09/14/2005 | CN1669369A Discharging power source, sputtering power source, and sputtering device |
| 09/14/2005 | CN1669121A Transfer mask for exposure and pattern exchanging method of the same |
| 09/14/2005 | CN1669111A Planetary magnetron |
| 09/14/2005 | CN1669110A Plasma implantation system and method with target movement |
| 09/14/2005 | CN1669109A Plasma processing apparatus and plasma processing method |
| 09/14/2005 | CN1669108A Capacitively coupled plasma reactor with magnetic plasma control |
| 09/14/2005 | CN1669107A Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 09/14/2005 | CN1668979A Pattern size correcting device and pattern size correcting method |
| 09/14/2005 | CN1668915A Method and apparatus for measuring critical size |
| 09/14/2005 | CN1667791A Ion implant dose control |
| 09/14/2005 | CN1667377A Method and apparatus for measuring beam spot of scanning light |
| 09/14/2005 | CN1219312C Femtosecond heavy-current high-brightness electronic microscope device |
| 09/13/2005 | US6943945 Two axis state for microscope |
| 09/13/2005 | US6943568 Charging voltage measuring device for substrate and ion beam irradiating device |
| 09/13/2005 | US6943507 Device and method for controlling focussed electron beams |
| 09/13/2005 | US6943360 Twisted-compensated low-energy electron microscope |
| 09/13/2005 | US6943356 Tip for nanoscanning electron microscope |
| 09/13/2005 | US6943352 Particle detectors |
| 09/13/2005 | US6943351 Multi-column charged particle optics assembly |
| 09/13/2005 | US6943349 Multi beam charged particle device |
| 09/13/2005 | US6943345 Soft ionization device and applications thereof |
| 09/13/2005 | US6943053 System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes |
| 09/13/2005 | US6942929 Process chamber having component with yttrium-aluminum coating |
| 09/09/2005 | WO2005084087A2 Methods and apparatus for generating high-density plasmas with ionizational instabilities |
| 09/09/2005 | WO2005083741A1 Higher power density downstream plasma |
| 09/09/2005 | WO2005083740A1 Characterizing an electron beam treatment apparatus |
| 09/09/2005 | WO2005081940A2 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 09/09/2005 | WO2005036583A3 Detector system of secondary and backscattered electrons for a scanning electron microscope |
| 09/09/2005 | WO2005022577A3 Shaped sputter shields for improved ion column operation |
| 09/09/2005 | WO2005019493A3 Target/backing plate constructions, and methods of forming them |
| 09/08/2005 | US20050196712 Irradiating electron beams onto a film on a surface of an object to be processed to modify a quality of the film; measuring an intensity of the emission spectrum; detecting an end point of the process based on the intensity of the emission spectrum |
| 09/08/2005 | US20050196549 Microwave enhanced CVD method and apparatus |
| 09/08/2005 | US20050195551 Compensation of magnetic fields |
| 09/08/2005 | US20050194910 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition |
| 09/08/2005 | US20050194550 Gas flow restricting cathode system for ion implanter and related method |
| 09/08/2005 | US20050194548 Electron beam treatment apparatus |
| 09/08/2005 | US20050194536 Charged particle beam apparatus |
| 09/08/2005 | US20050194535 Sample surface inspection method and inspection system |
| 09/08/2005 | US20050194534 Method of operating a probe microscope |
| 09/08/2005 | US20050194355 Method for adjusting voltage on a powered faraday shield |
| 09/08/2005 | US20050194094 Window type probe, plasma monitoring device, and plasma processing device |
| 09/08/2005 | DE4435043B4 Verfahren zur Herstellung einer elektrostatischen Miniaturlinse A process for preparing an electrostatic miniature lens |
| 09/08/2005 | DE102005000644A1 Elektronenstrahlprüfvorrichtung und Verfahren zum Überprüfen von Durchgangsöffnungen unter Verwendung von geclusterten Nanoröhren-Arrays Elektronenstrahlprüfvorrichtung and method for checking of through holes using clustered nanotube arrays |
| 09/08/2005 | DE102004008425A1 Gas distribution system for vacuum coating plant with lengthy magnetron, includes structural component with depressed planar surface |
| 09/08/2005 | DE102004007813A1 Sputtervorrichtung mit einem Magnetron und einem Target A magnetron sputtering apparatus and a target |
| 09/08/2005 | DE102004006419A1 Energie- und Medienanschluss für eine aus mehreren Kammern bestehende Beschichtungsanlage Energy and media port for a multiple chambers coating plant |
| 09/07/2005 | EP1571691A2 Point source for electron field emission with local shielding. |
| 09/07/2005 | EP1261394B1 Ion beam system for irradiating tumour tissues |
| 09/07/2005 | EP1071833B1 Method and apparatus for modifying the profile of high-aspect-ratio gaps using differential plasma power |
| 09/07/2005 | CN1666322A Plasma processing device |
| 09/07/2005 | CN1666316A Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 09/07/2005 | CN1666315A Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 09/07/2005 | CN1666314A Method and apparatus for non-invasive measurement and analys of semiconductor plasma parameters |
| 09/07/2005 | CN1666313A Ion source providing ribbon beam with controllable density profile |
| 09/07/2005 | CN1666101A Charged particle beam apparatus and method for inspecting samples |
| 09/07/2005 | CN1665955A Method and system for arc suppression in a plasma processing system |
| 09/07/2005 | CN1664995A Plasma processing method and plasma processing device |
| 09/07/2005 | CN1664163A Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation |
| 09/06/2005 | US6941186 Semiconductor manufacturing apparatus |
| 09/06/2005 | US6941008 for fine small pattern, with high accuracy and throughput; semiconductor integrated circuits; combined light and electronic beam exposure |
| 09/06/2005 | US6941006 Method and system for calibrating the scan amplitude of an electron beam lithography instrument |
| 09/06/2005 | US6940582 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 09/06/2005 | US6940080 Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device |
| 09/06/2005 | US6940079 Method of correction for wafer crystal cut error in semiconductor processing |
| 09/06/2005 | US6940074 Devices incorporating soft ionization membrane |
| 09/06/2005 | US6940069 Pattern inspection method and apparatus using electron beam |
| 09/06/2005 | US6939813 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 09/06/2005 | US6939434 Externally excited torroidal plasma source with magnetic control of ion distribution |
| 09/01/2005 | WO2005081302A1 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning |
| 09/01/2005 | WO2005081287A2 Matching dose and energy of multiple ion implanters |
| 09/01/2005 | WO2005080627A1 Formation of photoconductive and photovoltaic films |
| 09/01/2005 | WO2005038855A3 Ion implanter electrodes |
| 09/01/2005 | WO2005009089A3 Plasma processing apparatus |
| 09/01/2005 | WO2004095500A8 Vacuum chamber with recessed viewing tube and imaging device situated therein |
| 09/01/2005 | US20050191830 Plasma immersion ion implantation process |
| 09/01/2005 | US20050191828 Method for ion implanting insulator material to reduce dielectric constant |
| 09/01/2005 | US20050191827 Plasma immersion ion implantation process |
| 09/01/2005 | US20050191409 Ion beam monitoring arrangement |
| 09/01/2005 | US20050190310 Inspection method and apparatus using charged particle beam |
| 09/01/2005 | US20050189501 Charged particle system and a method for measuring image magnification |
| 09/01/2005 | US20050189500 Modulating ion beam current |
| 09/01/2005 | US20050189496 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor |