| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/27/2005 | US6949745 Electron beam apparatus |
| 09/27/2005 | US6949744 Electron microscopy system, electron microscopy method and focusing system for charged particles |
| 09/27/2005 | US6949737 Device for collecting ions in a mass spectrometer |
| 09/27/2005 | US6949735 Beam source |
| 09/27/2005 | US6949450 Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber |
| 09/27/2005 | US6949399 Method of reducing contamination-induced process variations during ion implantation |
| 09/27/2005 | US6949320 Preparation method of exposure original plate |
| 09/27/2005 | US6949204 Deformation reduction at the main chamber |
| 09/27/2005 | US6949174 Milling apparatus |
| 09/27/2005 | US6949170 Deposition methods and apparatus |
| 09/27/2005 | US6949165 Plasma processing apparatus |
| 09/27/2005 | US6949144 Low pressure plasma processing apparatus and method |
| 09/27/2005 | US6948448 Apparatus and method for depositing large area coatings on planar surfaces |
| 09/22/2005 | WO2005089031A1 Plasma generator |
| 09/22/2005 | WO2005088763A1 Distributor and distributing method, plasma processing system and method, and process for fabricating lcd |
| 09/22/2005 | WO2005088670A2 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source |
| 09/22/2005 | WO2005069748A3 Mems nanoindenter |
| 09/22/2005 | WO2005038879A3 Boron ion delivery system |
| 09/22/2005 | WO2004093158A3 Explosion welded design for cooling components |
| 09/22/2005 | WO2004050939A3 Plasma-assisted melting |
| 09/22/2005 | US20050208395 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 09/22/2005 | US20050208217 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms |
| 09/22/2005 | US20050206887 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process |
| 09/22/2005 | US20050206290 Method and apparatus for stabilizing of the glow plasma discharges |
| 09/22/2005 | US20050205809 Electron beam exposure apparatus |
| 09/22/2005 | US20050205808 Ion implanter and method of preventing undesirable ions from implanting a target wafer |
| 09/22/2005 | US20050205807 In-situ monitoring on an ion implanter |
| 09/22/2005 | US20050205802 Method and apparatus for improved processing with a gas-cluster ion beam |
| 09/22/2005 | US20050205801 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system |
| 09/22/2005 | US20050205800 Flood gun for charge neutralization |
| 09/22/2005 | US20050205783 Electron beam apparatus and device manufacturing method using same |
| 09/22/2005 | US20050205782 Method and an apparatus of an inspection system using an electron beam |
| 09/22/2005 | US20050205780 Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same |
| 09/22/2005 | US20050205413 Reactive sputtering method and device |
| 09/22/2005 | US20050205412 Deposition station with a cathode, two opposing targets defining the plasma field, permanent magnets or coils to generate a magnetic field, yokes to direct the magnetic field and two independent power supplies connected to each target; magnets can be repositioned without losing functionality |
| 09/22/2005 | US20050205411 An electromagnet magnetron positioned above and outside the reaction chamber reverses the magnetic dipoles in situ to improve uniformity and symmetry of deposited thim films on the walls of the opening; semiconductors |
| 09/22/2005 | US20050205212 RF Plasma Source With Conductive Top Section |
| 09/22/2005 | US20050205211 Plasma immersion ion implantion apparatus and method |
| 09/22/2005 | US20050205208 Plasma processing apparatus and control method thereof |
| 09/22/2005 | US20050205110 Removing native oxides from a substrate surface (semiconductor) in a vacuum chamber by generating reactive species from a gas mixture(NH3 + NF3), cooling surface and reacting with gas to form a film (ammonium hexafluorosilicate), and annealing to vaporize film; dry etching |
| 09/22/2005 | US20050205016 Plasma treatment apparatus and plasma treatment method |
| 09/22/2005 | US20050205015 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus |
| 09/22/2005 | DE102005002537A1 System für geladene Teilchen und Verfahren zum Messen der Abbildungsvergrösserung System for charged particles and methods for measuring the imaging magnification |
| 09/22/2005 | DE102004010261A1 Plasma generator for vacuum coating processes uses arc generation controlled by anode current measurement |
| 09/21/2005 | EP1577929A2 Electron beam exposure apparatus |
| 09/21/2005 | EP1577928A2 Electron beam recorder, electron beam irradiation position detecting method and electron beam irradiation position controlling method |
| 09/21/2005 | EP1577927A2 Charged particle beam system |
| 09/21/2005 | EP1577926A1 High current density particle beam system |
| 09/21/2005 | EP1577420A1 Vacuum processing apparatus with showerhead |
| 09/21/2005 | EP1576716A2 Apparatus for processing an object with high position accuracy |
| 09/21/2005 | EP1576641A2 Vacuum arc source comprising a device for generating a magnetic field |
| 09/21/2005 | EP1285455B1 Method and apparatus for particle detection using a sensor structure having a moveable portion |
| 09/21/2005 | CN1672252A Integrated stepwise statistical process control in a plasma processing system |
| 09/21/2005 | CN1672237A Method for adjusting voltage on a powered faraday shield |
| 09/21/2005 | CN1672235A Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam |
| 09/21/2005 | CN1672234A Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 09/21/2005 | CN1672233A Charged particle beam column and method for directing a charged particle beam |
| 09/21/2005 | CN1672232A Ion source and coaxial inductive coupler for ion implantation system |
| 09/21/2005 | CN1671884A Reduced volume, high conductance process chamber |
| 09/21/2005 | CN1670920A Vacuum processing apparatus |
| 09/21/2005 | CN1670913A Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus |
| 09/21/2005 | CN1670912A Plasma treatment apparatus and plasma treatment method |
| 09/21/2005 | CN1669796A Device for manufacturing display basic board and blow head combination assemblaging therein |
| 09/21/2005 | CN1220410C Plasma processing device with very-high frequency parallel resonance antenna |
| 09/21/2005 | CN1220252C Plasma processing apparatus capable of evaluating processing property |
| 09/20/2005 | US6946857 Semiconductor device tester |
| 09/20/2005 | US6946668 Electron beam lithography device and drawing method using electron beams |
| 09/20/2005 | US6946667 Apparatus to decelerate and control ion beams to improve the total quality of ion implantation |
| 09/20/2005 | US6946665 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 09/20/2005 | US6946663 multiple polar elements and an annular holding member with radial through-holes in the held portions of the polar elements, epoxy resin to fix the held portions to holding member; aberations controlled with lens; scanning electron microscope |
| 09/20/2005 | US6946662 Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 09/20/2005 | US6946657 Electron microscopy system |
| 09/20/2005 | US6946656 Sample electrification measurement method and charged particle beam apparatus |
| 09/20/2005 | US6946655 Spot grid array electron imaging system |
| 09/20/2005 | US6946654 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 09/20/2005 | US6946408 Method and apparatus for depositing dielectric films |
| 09/20/2005 | US6946394 Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process |
| 09/20/2005 | US6946167 Deposited film forming apparatus and deposited film forming method |
| 09/20/2005 | US6946064 Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool |
| 09/20/2005 | US6946054 Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing |
| 09/20/2005 | US6946053 Plasma reactor |
| 09/20/2005 | US6946034 Electron beam physical vapor deposition apparatus |
| 09/20/2005 | US6945100 Scanning probe microscope with improved probe tip mount |
| 09/15/2005 | WO2005086204A2 Modulating ion beam current |
| 09/15/2005 | WO2005085936A1 An optical system for producing differently focused images |
| 09/15/2005 | WO2005010935A3 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 09/15/2005 | WO2004066333B1 Method and device for producing corpuscular radiation systems |
| 09/15/2005 | US20050202575 Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process |
| 09/15/2005 | US20050202183 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 09/15/2005 | US20050201261 Optical disc and apparatus for manufacturing a master disc therefor |
| 09/15/2005 | US20050201246 Particle-optical projection system |
| 09/15/2005 | US20050200841 Detection of defects in patterned substrates |
| 09/15/2005 | US20050199983 Method and system of forming semiconductor wiring, method and system of fabricating semiconductor device, and wafer |
| 09/15/2005 | US20050199828 Method and apparatus for processing a micro sample |
| 09/15/2005 | US20050199827 Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
| 09/15/2005 | US20050199822 Mems based charged particle deflector design |
| 09/15/2005 | US20050199821 Compact microcolumn for automated assembly |
| 09/15/2005 | US20050199820 Particle beam generator |
| 09/15/2005 | US20050199814 Method and apparatus for measuring beam spot of scanning light |
| 09/15/2005 | US20050199811 Image evaluation method and microscope |