| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/06/2005 | US20050218116 Process for reducing particle formation during etching |
| 10/06/2005 | US20050217992 Magnetron sputtering source and chamber therefor |
| 10/06/2005 | US20050217798 Plasma processing apparatus |
| 10/06/2005 | US20050217797 Methods and array for creating a mathematical model of a plasma processing system |
| 10/06/2005 | US20050217796 Techniques for packaging and encapsulating components of diagnostic plasma measurement devices |
| 10/06/2005 | US20050217795 Method of plasma etch endpoint detection using a V-I probe diagnostics |
| 10/06/2005 | US20050217794 Semiconductor manufacturing apparatus and method for assisting monitoring and analysis of the same |
| 10/06/2005 | US20050217579 Method and apparatus for production of metal film or the like |
| 10/06/2005 | US20050217576 Vacuum Processing Apparatus |
| 10/06/2005 | DE102004011118A1 External electrode for a plasma beam source preferably a high frequency source has hole pattern in a screen |
| 10/05/2005 | EP1583133A2 Wafer scanning device |
| 10/05/2005 | EP1581964A2 Method and apparatus for monitoring a material processing system |
| 10/05/2005 | EP1581963A1 Mid span support for a magnetic array of a cylindrical magnetron sputter device |
| 10/05/2005 | EP1581962A2 Mounting mechanism for plasma extraction aperture |
| 10/05/2005 | EP1518006B1 Target support assembly |
| 10/05/2005 | CN1679153A Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions and negative ions |
| 10/05/2005 | CN1679148A 等离子体处理方法及等离子体处理装置 The plasma processing method and a plasma processing apparatus |
| 10/05/2005 | CN1679137A Cathode for vacuum sputtering treatment machine |
| 10/05/2005 | CN1679136A Gas tube end cap for a microwave plasma generator |
| 10/05/2005 | CN1677624A Plasma processing device and method thereof |
| 10/05/2005 | CN1677528A Electron beam recorder, electron beam irradiation position detecting method and electron beam irradiation position controlling method |
| 10/05/2005 | CN1676666A Method and apparatus for maintaining by-product volatility in deposition process |
| 10/05/2005 | CN1676662A Two dimensional magnetron scanning for planar sputtering |
| 10/05/2005 | CN1222197C Ion beam radiation device and method for choking basis charge accumulation |
| 10/05/2005 | CN1222011C Objective lens for a charged particle beam device |
| 10/05/2005 | CN1222007C Control system for indirectly heated cathode ion source |
| 10/04/2005 | US6952105 Inspection method and apparatus for circuit pattern of resist material |
| 10/04/2005 | US6951129 Scanning probe microscope with improved probe head mount |
| 09/29/2005 | WO2005091342A2 In-situ monitoring on a spinning-disk ion implanter |
| 09/29/2005 | WO2005091329A2 Sputtering device for manufacturing thin films |
| 09/29/2005 | WO2005091328A1 Apparatus and method for directing gas towards a specimen |
| 09/29/2005 | WO2005091079A1 Electron beam lithography system |
| 09/29/2005 | WO2005090940A1 Device and method for the wet-chemical preparation of highly pure solid body surfaces |
| 09/29/2005 | WO2005090638A2 Remote chamber methods for removing surface deposits |
| 09/29/2005 | WO2005090632A1 Deposition by magnetron cathodic pulverization in a pulsed mode with preionization |
| 09/29/2005 | WO2005089818A1 Microwave plasma sterilizing method and device |
| 09/29/2005 | WO2005089459A2 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system |
| 09/29/2005 | WO2005066997A3 Dual frequency rf match |
| 09/29/2005 | US20050214958 Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method |
| 09/29/2005 | US20050214955 Method to control a management system to control semiconductor manufacturing equipment |
| 09/29/2005 | US20050214654 ESD-resistant photomask and method of preventing mask ESD damage |
| 09/29/2005 | US20050213279 Electrostatic chuck and substrate fixing method using the same |
| 09/29/2005 | US20050212503 Fast faraday cup with high bandwidth |
| 09/29/2005 | US20050212450 Method and system for detecting electrical arcing in a plasma process powered by an AC source |
| 09/29/2005 | US20050212440 Field emission gun and electron beam instruments |
| 09/29/2005 | US20050212395 Electron beam generator device and method for producing the same |
| 09/29/2005 | US20050212181 Thermoforming of ink jet printed media for the decoration of soft grained automotive interior components |
| 09/29/2005 | US20050212179 Method and apparatus for reforming laminated films and laminated films manufactured thereby |
| 09/29/2005 | US20050211929 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device |
| 09/29/2005 | US20050211928 Charged-particle-beam lithographic system |
| 09/29/2005 | US20050211927 Method and apparatus for processing a micro sample |
| 09/29/2005 | US20050211926 Ion beam irradiation apparatus and insulating spacer for the same |
| 09/29/2005 | US20050211925 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method |
| 09/29/2005 | US20050211924 Ion implantation apparatus and ion implanting method |
| 09/29/2005 | US20050211923 Ion sources |
| 09/29/2005 | US20050211922 Minute three dimensional structure producing apparatus and method |
| 09/29/2005 | US20050211921 Electron beam exposure system |
| 09/29/2005 | US20050211898 Device for measuring the emission of x rays produced by an object exposed to an electron beam |
| 09/29/2005 | US20050211897 Pattern measuring method |
| 09/29/2005 | US20050211896 Pt coating initiated by indirect electron beam for resist contact hole metrology |
| 09/29/2005 | US20050211690 RF stand offs |
| 09/29/2005 | US20050211681 Charged-particle beam system |
| 09/29/2005 | US20050211548 Selectable dual position magnetron |
| 09/29/2005 | US20050211547 Reactive sputter deposition plasma reactor and process using plural ion shower grids |
| 09/29/2005 | US20050211546 applying a radio frequency power source to generate plasma gases from deposition precursor species sputtered from semiconductor targets, creating a flux of ions and providing gases into chemcial reactors for combining with semiconductor atoms to form molecules that deposit on the workpiece surfaces |
| 09/29/2005 | US20050211544 Electrical biasing of gas introduction means of plasma apparatus |
| 09/29/2005 | US20050211543 Generation of uniformly-distributed plasma |
| 09/29/2005 | US20050211384 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 09/29/2005 | US20050211383 Magnetron plasma-use magnetic field generation device |
| 09/29/2005 | US20050211382 Plasma processing apparatus |
| 09/29/2005 | US20050211380 Plasma etching apparatus |
| 09/29/2005 | US20050211264 Method and processing system for plasma-enhanced cleaning of system components |
| 09/29/2005 | US20050211171 Chemical vapor deposition plasma reactor having an ion shower grid |
| 09/29/2005 | US20050211170 Chemical vapor deposition plasma reactor having plural ion shower grids |
| 09/29/2005 | DE112004000057T5 Plasmabehandlungsapparat, Verfahren zur Herstellung eines Reaktionsgefäßes zur Plasmaerzeugung und Plasmabehandlungsverfahren Plasma processing apparatus, method for the preparation of a reaction vessel for the plasma generation and plasma treatment process |
| 09/29/2005 | DE102004012520A1 Punktquelle für Elektronen-Feldemissionen mit lokaler Abschirmung Point source for electron field emission with local shielding |
| 09/29/2005 | DE102004011178A1 Verfahren zur Oberflächenbehandlung von Substraten A process for the surface treatment of substrates |
| 09/29/2005 | DE102004010535A1 Movement drive for use in e.g. ion processing equipment, has pendulum holding devices with axles that intersect at right angles, such that oscillating motion of torque motors, arranged outside vacuum container, is directly realized at axles |
| 09/29/2005 | CA2501737A1 Thermoforming of ink jet printed media for the decortion of soft grained automotive interior components |
| 09/28/2005 | EP1580789A2 Ion implantation method and apparatus |
| 09/28/2005 | EP1580788A2 Cathode and counter-cathode arrangement in an ion source |
| 09/28/2005 | EP1580298A1 Process and apparatus for pulsed magnetron sputtering |
| 09/28/2005 | EP1579481A2 An ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 09/28/2005 | EP1579471A2 Vacuum sputtering cathode |
| 09/28/2005 | EP1579470A2 Method and apparatus for monitoring a plasma in a material processing system |
| 09/28/2005 | EP1579368A2 Method and apparatus for monitoring a material processing system |
| 09/28/2005 | EP1579280A2 Method and apparatus for monitoring parts in a material processing system |
| 09/28/2005 | EP1579027A1 Plasma-enhanced film deposition |
| 09/28/2005 | EP1579023A2 Plasma-assisted melting |
| 09/28/2005 | CN1675750A Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method |
| 09/28/2005 | CN1675738A Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| 09/28/2005 | CN1675737A Plasma processor with electrode simultaneously responsive to plural frequencies |
| 09/28/2005 | CN1675406A Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| 09/28/2005 | CN1673410A Showerhead mounting to accommodate thermal expansion |
| 09/28/2005 | CN1221008C Voltage allocation mode of piezoelectric scanner for scanning-probe microscope |
| 09/27/2005 | US6950196 Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
| 09/27/2005 | US6949895 Unipolar electrostatic quadrupole lens and switching methods for charged beam transport |
| 09/27/2005 | US6949756 Shaped and low density focused ion beams |
| 09/27/2005 | US6949752 Electron beam apparatus and high-voltage discharge prevention method |
| 09/27/2005 | US6949751 Slit lens arrangement for particle beams |