Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2005
10/13/2005WO2005042141A3 Method and device for ion beam processing of surfaces
10/13/2005US20050227500 Method for producing material of electronic device
10/13/2005US20050227118 Plasma resistant member
10/13/2005US20050227020 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
10/13/2005US20050225248 Honeycomb optical window deposition shield and method for a plasma processing system
10/13/2005US20050225011 Device and method for maskless afm microlithography
10/13/2005US20050224726 Direct write lithography system
10/13/2005US20050224725 System and method for proximity effect correction in imaging systems
10/13/2005US20050224724 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/13/2005US20050224723 Ion beam apparatus and method of implanting ions
10/13/2005US20050224722 Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to large area electron beam
10/13/2005US20050224344 Plasma processing apparatus and method
10/13/2005US20050224343 Power coupling for high-power sputtering
10/13/2005US20050224342 Target support assembly
10/13/2005US20050224337 Plasma processing apparatus and method
10/13/2005US20050224182 Plasma processing apparatus
10/13/2005US20050224181 Method and apparatus for in-situ film stack processing
10/13/2005US20050224180 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
10/13/2005US20050224179 Baffle plate and plasma etching device having same
10/13/2005US20050224178 Heating jacket for plasma etching reactor, and etching method using same
10/13/2005US20050223991 Faraday dose and uniformity monitor for plasma based ion implantation
10/13/2005US20050223990 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process
10/13/2005US20050223986 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
10/13/2005US20050223973 EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
10/13/2005DE202005011974U1 Sputter target for target base plate in vacuum coating unit has oval shape with central aperture and inner and outer peripheral grooves in which locking strips are positioned, bores above groove allowing base plate to be bolted to it
10/13/2005DE102005013904A1 Elektrostatische Haltevorrichtung und dieselbe verwendendes Substrathalteverfahren An electrostatic chuck and the same-use substrate holding method
10/13/2005DE102004012848A1 Device for optionally reactive plasma etching of mostly flat objects including a hollow cathode, an anode and a magnetic device useful useful in coating technology for production of clean surfaces prior to coating
10/13/2005DE102004012847A1 Device for optionally reactive plasma etching of flat objects useful in coating technology for production of clean surfaces prior to coating
10/12/2005EP1585166A2 Controlled charge neutralization of Ion-implanted articles
10/12/2005EP1585165A2 Electron microscope
10/12/2005EP1585164A2 Flood gun for charge neutralization
10/12/2005EP1584707A1 Power coupling for high-power sputtering
10/12/2005EP1584104A2 Re-crystallization of semiconductor surface film and doping of semiconductor by energetic cluster irradiation
10/12/2005CN1682345A Method and apparatus for an improved bellows shield in a plasma processing system
10/12/2005CN1682344A Method and apparatus for the compensation of edge ring wear in a plasma processing chamber
10/12/2005CN1682343A Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
10/12/2005CN1682342A Upper electrode plate with deposition shield in a plasma processing system
10/12/2005CN1682341A Method and apparatus for an improved baffle plate in a plasma processing system
10/12/2005CN1682340A Optical window deposition shield for use in a plasma processing system
10/12/2005CN1682339A Method and apparatus for an improved baffle plate in a plasma processing system
10/12/2005CN1682338A Method and system for analyzing data from a plasma process
10/12/2005CN1681092A Plasma processing apparatus and method
10/12/2005CN1681085A Electron beam drawing system, method and program, and method for manufacture of semiconductors by drawing directly
10/12/2005CN1681079A In-situ dry clean chamber for front end of line fabrication
10/12/2005CN1680619A Power coupling for high-power sputtering
10/12/2005CN1223242C Apparatus for fixing electrode in plasma polymerizing apparatus
10/12/2005CN1223088C Method for controlling generator output
10/12/2005CN1222980C Optical column for charged particle beam device
10/12/2005CN1222958C Septum electra magnet of deflection and split beam, electromagnet and deflection beam method
10/12/2005CN1222832C Electronic photoetching equipment with pattern emitter
10/12/2005CN1222762C Apparatus for detecting plasma anomalous discharge and method of detecting the same
10/11/2005US6954077 Apparatus and method for improving microwave coupling to a resonant cavity
10/11/2005US6954033 Plasma processing apparatus
10/11/2005US6953946 Emitter for electron-beam projection lithography system and manufacturing method thereof
10/11/2005US6953944 Scanning device and method including electric charge movement
10/11/2005US6953942 Ion beam utilization during scanned ion implantation
10/11/2005US6953939 Testing apparatus using scanning electron microscope
10/11/2005US6953938 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
10/11/2005US6953908 Plasma processing apparatus
10/11/2005US6953644 Method for compensating for scatter/reflection effects in particle beam lithography
10/11/2005US6953143 Explosion welded design for cooling components
10/11/2005US6953005 Plasma processing apparatus utilizing a surface wave plasma
10/11/2005US6952949 Arrangement for coupling microwave energy into a treatment chamber
10/06/2005WO2005094140A1 Plasma generating equipment
10/06/2005WO2005094139A1 Electrode for plasma generation, plasma generator and plasma processing apparatus
10/06/2005WO2005094138A1 Plasma generation power supply apparatus
10/06/2005WO2005093810A1 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film and base material
10/06/2005WO2005093806A1 Semiconductor manufacturing equipment and method for manufacturing semiconductor device
10/06/2005WO2005093800A1 Method of impurity introduction, impurity introduction apparatus and semiconductor device produced with use of the method
10/06/2005WO2005093797A1 Method and equipment for forming crystalline silicon thin film
10/06/2005WO2005093781A1 Method and arrangement for production of gradient layers or layer sequences by means of physical vacuum atomisation
10/06/2005WO2005093780A2 Rf plasma source with conductive top section
10/06/2005WO2005093777A2 Ion sources
10/06/2005WO2005093123A1 Process for forming thin film and system for forming thin film
10/06/2005WO2005093122A1 Process for forming thin film and system for forming thin film
10/06/2005WO2005093119A1 Silicon film forming equipment
10/06/2005WO2005092025A2 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005WO2005091990A2 Method and apparatus for improved processing with a gas-cluster ion beam
10/06/2005WO2005034183A3 Method and apparatus for determining plasma impedance
10/06/2005WO2005031788A3 A source of liquid metal ions and a method for controlling the source
10/06/2005WO2004079764B1 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
10/06/2005US20050221617 Inductively coupled plasma chamber attachable to a processing chamber for analysis of process gases
10/06/2005US20050221552 Substrate support for in-situ dry clean chamber for front end of line fabrication
10/06/2005US20050221229 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221204 control the writing dimension of a pattern; correction of foggy effect; manufacturing a semiconductor device and a liquid crystal display with fine and complicated patterns
10/06/2005US20050221021 Method and system for performing atomic layer deposition
10/06/2005US20050221020 Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
10/06/2005US20050220984 Method and system for control of processing conditions in plasma processing systems
10/06/2005US20050219516 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
10/06/2005US20050219015 Low reflection microwave window
10/06/2005US20050218816 High current density ion source
10/06/2005US20050218777 Electron beam apparatus and high-voltage discharge prevention method
10/06/2005US20050218507 Lid assembly for front end of line fabrication
10/06/2005US20050218346 System and method for passing particles on selected areas on a wafer
10/06/2005US20050218345 Ion implantation apparatus and method
10/06/2005US20050218344 Controlled charge neutralization of ion-implanted articles
10/06/2005US20050218343 Method and apparatus for selective pre-dispersion of extracted ion beams in ion implantation systems
10/06/2005US20050218337 Vacuum processing apparatus and vacuum processing method
10/06/2005US20050218336 Wafer scanning device
10/06/2005US20050218325 Inspection method and inspection system using charged particle beam
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