Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2005
10/27/2005DE102004018079A1 Sputtering device includes rotation mechanism, sputtering cathode unit, movement mechanism, and sputtering mechanism which sputters when sputtering cathode moves over rotating substrate
10/27/2005DE10143377B4 Mikrowellenreaktor und Verfahren zur Steuerung von Reaktionen von aktivierten Molekülen Microwave reactor and method for controlling reactions of activated molecules
10/26/2005EP1589793A1 High frequency power supply device and plasma generator
10/26/2005EP1589567A1 Member for plasma etching device and method for manufacture thereof
10/26/2005EP1589562A2 Plasma reactor for surface modification of articles
10/26/2005EP1589561A1 Particle-optical apparatus provided with lenses with permanent-magnetic material
10/26/2005EP1589560A1 Objective lens for a charged particle beam
10/26/2005EP1588398A2 Method and apparatus for aerodynamic ion focusing
10/26/2005EP1264329B1 Plasma deposition method and system
10/26/2005CN1689133A Device for the treatment of a web-type material in a plasma-assisted process
10/26/2005CN1689132A Method and apparatus for producing uniform processing rates
10/26/2005CN1688745A Device for carrying out a plasma-assisted process
10/26/2005CN1688737A High peak power plasma pulsed supply with arc handling capacity
10/26/2005CN1225005C Method and apparatus for controlling the volume of a plasma
10/26/2005CN1225004C Ion injection device and method thereof
10/25/2005US6958804 Lithography system
10/25/2005US6958572 Controlled non-normal alignment of catalytically grown nanostructures in a large-scale synthesis process
10/25/2005US6958484 Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
10/25/2005US6958481 Decaborane ion source
10/25/2005US6958477 Electron beam apparatus, and inspection instrument and inspection process thereof
10/25/2005US6958476 coating with a layer of contrast enhancing material, recoating with a second material, ion milling; second material has similar milling characteristics; semiconductors
10/25/2005US6958248 Method and apparatus for the improvement of material/voltage contrast
10/25/2005US6958201 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
10/20/2005WO2005099320A2 Method and device for producing low-pressure plasma and the use thereof
10/20/2005WO2005099072A1 Reciprocating drive system for scanning a workpiece
10/20/2005WO2005098909A2 Drive system for scanning a workpiece through an ion beam
10/20/2005WO2005098898A1 A tubular magnet assembly
10/20/2005WO2005098897A1 Method and system for control of processing conditions in plasma processing systems
10/20/2005WO2005098896A1 Electron beam interference device and electron microscope
10/20/2005WO2005098895A2 Method and system for ultrafast photoelectron microscope
10/20/2005WO2005098894A1 Method and apparatus for selective pre-dispersion of extracted ion beams in ion implantation systems
10/20/2005WO2005098544A2 Device and method for producing resist profiled elements
10/20/2005WO2005098091A2 A method of plasma etch endpoint detection using a v-i probe diagnostics
10/20/2005WO2005098086A2 Remote chamber methods for removing surface deposits
10/20/2005WO2005097945A1 Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device
10/20/2005WO2005097640A2 Method for reciprocating a workpiece through an ion beam
10/20/2005WO2005086204A3 Modulating ion beam current
10/20/2005WO2005083741B1 Higher power density downstream plasma
10/20/2005WO2005062335A3 Device for producing excited and/or ionised particles in a plasma and method for producing ionised particles
10/20/2005US20050233592 Method of manufacturing semiconductor device using flexible tube
10/20/2005US20050233479 CDA controller and method for stabilizing dome temperature
10/20/2005US20050233227 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
10/20/2005US20050233224 Method of improving polysilicon film crystallinity
10/20/2005US20050233089 Sputter method or device for the production of natural voltage optimized coatings
10/20/2005US20050232749 Method for reciprocating a workpiece through an ion beam
10/20/2005US20050232748 Reciprocating drive for scanning a workpiece
10/20/2005US20050232726 Method and apparatus for reducing cross contamination of species during ion implantation
10/20/2005US20050232114 Electron beam recorder, electron beam irradiation position detecting method and electron beam irradiation position controlling method
10/20/2005US20050230830 Method and apparatus for production of metal film or the like
10/20/2005US20050230643 Reciprocating drive for scanning a workpiece through an ion beam
10/20/2005US20050230642 Beam angle control in a batch ion implantation system
10/20/2005US20050230637 System and method for electron-beam lithography
10/20/2005US20050230636 Charged particle beam apparatus and specimen holder
10/20/2005US20050230633 Method and apparatus for multiple charged particle beams
10/20/2005US20050230621 Apparatus and method for investigating or modifying a surface with a beam of charged particles
10/20/2005US20050230620 Secondary electron detector, especially in a scanning electron microscope
10/20/2005US20050230618 Defect inspection apparatus, program, and manufacturing method of semiconductor device
10/20/2005US20050230351 Plasma processing method and apparatus
10/20/2005US20050230350 In-situ dry clean chamber for front end of line fabrication
10/20/2005US20050230049 Method and apparatus for plasma processing
10/20/2005US20050230048 Liner for use in processing chamber
10/20/2005US20050230047 Plasma immersion ion implantation apparatus
10/20/2005US20050230046 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
10/20/2005US20050229849 High productivity plasma processing chamber
10/19/2005EP1587131A2 Plasma reactor with high productivity
10/19/2005EP1587130A1 Charged particle beam column assembly
10/19/2005EP1587129A1 Improvements relating to charged particle beams
10/19/2005EP1587128A1 Apparatus and method for investigating or modifying a surface with a beam of charged particles
10/19/2005EP1586886A2 Calibration standard for electron microscope, and method for its manufacture
10/19/2005EP1586674A1 Coatings, and methods and devices for the manufacture thereof
10/19/2005EP1586106A1 An extractor for an microcoloum, an alignment method for an extractor aperture to an electon emitter, and a measuring method and an alignment method using thereof
10/19/2005EP1585999A2 Methods and apparatus for preparing specimens for microscopy
10/19/2005CN2735537Y 金属离子注入机 Metal ion implanter
10/19/2005CN1685466A Apparatus and method for use of optical system with a plasma processing system
10/19/2005CN1685465A Method and apparatus for an improved deposition shield in a plasma processing system
10/19/2005CN1685464A Method and apparatus for an improved upper electrode plate in a plasma processing system
10/19/2005CN1684224A Methods and array for creating a mathematical model of a plasma processing system
10/19/2005CN1224298C Electric plasma processing device
10/19/2005CN1223698C Power supply device for sputtering and sputtering device using the same
10/19/2005CN1223697C Method and apparatus for low pressure sputtering
10/18/2005US6956333 Hot electron emission array for e-beam photolithography and display screens
10/18/2005US6956329 Apparatus and method for forming a high pressure plasma discharge column
10/18/2005US6956225 Method and apparatus for selective pre-dispersion of extracted ion beams in ion implantation systems
10/18/2005US6956223 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
10/18/2005US6956219 MEMS based charged particle deflector design
10/18/2005US6956212 Electron microscope observation system and observation method
10/18/2005US6956211 Charged particle beam apparatus and charged particle beam irradiation method
10/18/2005US6955930 Method for determining thickness of a semiconductor substrate at the floor of a trench
10/18/2005US6955852 Method of manufacturing sputter targets with internal cooling channels
10/13/2005WO2005096361A1 Silicon electrode plate having excellent durability for plasma etching
10/13/2005WO2005096345A1 Apparatus and method for plasma treating an article
10/13/2005WO2005096344A1 Arc discharge detection device
10/13/2005WO2005096343A1 High current density particle beam system
10/13/2005WO2005096337A1 Method for plasma cleaning a workpiece and a suitable device for carrying out this method
10/13/2005WO2005095670A2 Remote chamber methods for removing surface deposits
10/13/2005WO2005095666A2 Magnetically enhanced capacitive plasma source for ionized physical vapour deposition-ipvd
10/13/2005WO2005094280A2 High-strength backing plates, target assemblies, and methods of forming high-strength backing plates and target assemblies
10/13/2005WO2005094244A2 System, method and apparatus for self-cleaning dry etch
10/13/2005WO2005069945A3 Ion implanter system, method and program product including particle detection
10/13/2005WO2005059942A3 Method and apparatus for extending equipment uptime in ion implantation
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