Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2005
11/09/2005CN1226777C Plasma device and plasma generating method
11/09/2005CN1226454C Method and device of monitoring ion concentration in etching cavity body in sputtering etching process
11/09/2005CN1226450C Processing method and apparatus for plasma
11/08/2005US6963069 Charged particle beam device
11/08/2005US6963068 Method for the manufacture and transmissive irradiation of a sample, and particle-optical system
11/08/2005US6963067 Scanning electron microscope and sample observing method using it
11/08/2005US6963043 for normalizing pressure gradients across semiconductor/integrated circuit wafers; vacuum pumping
11/08/2005US6962664 modifying plasma density profile in plasma reactor to achieve an improved etch, deposition or other plasma process uniformity without design complexities and shortcomings associated with present-day segmented electrodes
11/08/2005US6962648 Back-biased face target sputtering
11/03/2005WO2005104634A2 Method and system for performing atomic layer deposition
11/03/2005WO2005104307A2 Laser atom probes
11/03/2005WO2005104203A1 Substrate processing system and process for fabricating semiconductor device
11/03/2005WO2005104193A1 Method for correcting electron beam exposure data
11/03/2005WO2005104186A2 Method and processing system for plasma-enhanced cleaning of system components
11/03/2005WO2005104175A1 Faraday dose and uniformity monitor for plasma based ion implantation
11/03/2005WO2005104174A1 Low reflection microwave window
11/03/2005WO2005104173A1 Selective absorber for converting sunlight into heat, and method and device for the production thereof
11/03/2005WO2005104172A1 Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams
11/03/2005WO2005104171A2 Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams
11/03/2005WO2005104170A1 Illumination condenser for a particle optical projection system
11/03/2005WO2005104169A1 Correction lens system for a particle beam projection device
11/03/2005WO2005104164A2 Honeycomb optical window deposition shield and method for a plasma processing system
11/03/2005WO2005103327A1 Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
11/03/2005WO2005103319A2 Device for introducing an electric arc source into a coating chamber for large-size substrates or strips
11/03/2005US20050244989 Ion implantation apparatus and method
11/03/2005US20050244875 Sequencing preferential nucleotide sequences; obtain nucleotide sequences, insert preferential heavy elements into compound, insert into microscope, monitor base preferential labels, determine nucleotide sequence
11/03/2005US20050244457 Irradiated implantable bone material
11/03/2005US20050242303 Advanced pattern definition for particle-beam exposure
11/03/2005US20050242302 Advanced pattern definition for particle-beam processing
11/03/2005US20050242299 Diagnostic system for profiling micro-beams
11/03/2005US20050242295 Apertured plate support mechanism and charged-particle beam instrument equipped therewith
11/03/2005US20050242294 Controlling the characteristics of implanter ion-beams
11/03/2005US20050242293 Mounting mechanism for plasma extraction aperture
11/03/2005US20050242286 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
11/03/2005US20050242284 Electron microscope
11/03/2005US20050242061 Self-cleaning method for plasma CVD apparatus
11/03/2005US20050241770 Substrate cleaning apparatus and method
11/03/2005US20050241769 Plasma processing apparatus and plasma processing method
11/03/2005US20050241768 High frequency plasma generator and high frequency plasma generating method
11/03/2005US20050241767 Multi-piece baffle plate assembly for a plasma processing system
11/03/2005US20050241766 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
11/03/2005US20050241765 Apparatus including showerhead electrode and heater for plasma processing
11/03/2005US20050241762 Alternating asymmetrical plasma generation in a process chamber
11/03/2005US20050241583 Method for the production of a disk-form workpiece based on a dielectric substrate as well as vacuum treatment installation for same
11/03/2005US20050241582 Atmospheric pressure plasma assembly
11/03/2005US20050241579 Face shield to improve uniformity of blanket CVD processes
11/03/2005DE19983211B4 System und Verfahren der Substratverarbeitung sowie deren Verwendung zur Hartscheibenherstellung System and method of substrate processing and the use thereof for the hard disk producing
11/03/2005DE102004018679A1 Prüfkörper für Elektronenmikroskope und Verfahren zur Herstellung eines Prüfkörpers Test specimens for electron microscopes and methods for producing a test specimen
11/03/2005DE102004018147A1 Einrichtung und Verfahren zur Erzeugung von Resistprofilen Apparatus and method for producing resist profiles
11/03/2005DE102004015090A1 Bogenentladungserkennungseinrichtung Arc discharge detection device
11/03/2005CA2562747A1 Mass spectrometer
11/02/2005EP1592043A2 Device for measuring pressure for vacuum systems
11/02/2005EP1592040A1 Electron source
11/02/2005EP1590826A1 Plasma reactor including helical electrodes
11/02/2005EP1590825A2 Method and device for producing corpuscular radiation systems
11/02/2005EP1590497A2 Method and apparatus for layer by layer deposition of thin films
11/02/2005CN1692498A Image pickup device and manufacturing method thereof
11/02/2005CN1692476A Plasma processing apparatus
11/02/2005CN1692475A Plasma etching chamber and plasma etching system using same
11/02/2005CN1691505A Plasma controller
11/02/2005CN1691270A Ion implantation apparatus and method
11/02/2005CN1691269A Method of implanting a substrate and an ion implanter for performing the method
11/01/2005US6960887 Method and apparatus for tuning a plasma reactor chamber
11/01/2005US6960775 first illumination system for beam of ultraviolet radiation, support structure for patterning device, projection system and second illumination system for a compensating beam; critical dimension profile correction; integrated circuit maufacture
11/01/2005US6960774 Fault detection and control methodologies for ion implantation processes, and system for performing same
11/01/2005US6960772 Mask carrier
11/01/2005US6960766 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
11/01/2005US6960765 Probe driving method, and probe apparatus
11/01/2005US6960764 Method of measuring the performance of a scanning electron microscope
11/01/2005US6960763 Energy filter and electron microscope
11/01/2005US6960534 Method for controlling the temperature of a gas distribution plate in a process reactor
11/01/2005US6960498 Doping method, doping apparatus, and control system for doping apparatus
11/01/2005US6960284 Rotational and reciprocal radial movement of a sputtering magnetron
11/01/2005CA2272100C Method for preparation of metal intercalated fullerene-like metal chalcogenides
10/2005
10/27/2005WO2005101461A1 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
10/27/2005WO2005101451A1 Apparatus and method for investigating or modifying a surface with beam of charged particles
10/27/2005WO2005101100A2 Method and apparatus for in-situ film stack processing
10/27/2005WO2005100636A2 Techniques for packaging and encapsulating components of diagnostic plasma measurement devices
10/27/2005WO2005100633A1 Coatings, and methods and devices for the manufacture thereof
10/27/2005WO2005100630A1 Selectable dual position magnetron
10/27/2005WO2005059197A3 Method and device for magnetron sputtering
10/27/2005US20050238818 Plasma processing method and plasma processing apparatus
10/27/2005US20050238807 Refurbishment of a coated chamber component
10/27/2005US20050237069 Semiconductor device test method and semiconductor device tester
10/27/2005US20050236648 Inspection method and inspection system using charged particle beam
10/27/2005US20050236587 Ion beam device and ion beam processing method, and holder member
10/27/2005US20050236583 Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench
10/27/2005US20050236578 Method of selecting ions in an ion storage device
10/27/2005US20050236570 Charged particle beam adjusting method and charged particle beam apparatus
10/27/2005US20050236569 Scanning electron microscope
10/27/2005US20050236568 Apparatus with permanent magnetic lenses
10/27/2005US20050236567 Lithography tool image quality evaluating and correcting
10/27/2005US20050236377 Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
10/27/2005US20050236267 Methods and apparatus for controlling rotating magnetic fields
10/27/2005US20050236266 Sputter target monitoring system
10/27/2005US20050236111 Processing apparatus
10/27/2005US20050236109 Plasma etching apparatus and plasma etching method
10/27/2005US20050235916 Universal mid-frquency matching network
10/27/2005US20050235915 Plasma surface treatment electrode assembly and arrangement
10/27/2005DE102005013532A1 EUV-Lithographiesystem und Chuck zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and Chuck for solving reticles in a vacuum-insulated environment
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