| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 11/22/2005 | US6967340 Ion beam irradiation device and operating method thereof |
| 11/22/2005 | US6967337 Toothbrush cleaning assembly |
| 11/22/2005 | US6967336 System for precise position registration |
| 11/22/2005 | US6967335 Manipulation system for manipulating a sample under study with a microscope |
| 11/22/2005 | US6967334 Ion source and ion beam device |
| 11/22/2005 | US6967328 Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor |
| 11/22/2005 | US6967305 Control of plasma transitions in sputter processing systems |
| 11/22/2005 | US6967109 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 11/22/2005 | US6967067 coherent radiation is reflected off the reflector surface including information that corresponds to an inverse of the holographic projection of the desired image, to provide a holographic projection of a desired image |
| 11/22/2005 | US6967007 Plurality of anodes and cathodes having surfaces defining a meandering flow path for gas; plurality of electroconductive fins |
| 11/17/2005 | WO2005109466A1 Method for depositing carbide coatings of high-fusion metals |
| 11/17/2005 | WO2005108646A2 Rotary target locking ring assembly |
| 11/17/2005 | WO2005091342A3 In-situ monitoring on a spinning-disk ion implanter |
| 11/17/2005 | WO2005057607A3 Plasma source for producing an inductively coupled plasma |
| 11/17/2005 | WO2005054950A3 Method for creating a control command for a mask writing device |
| 11/17/2005 | WO2005034163A3 Apparatus and method for plasma treating a substrate |
| 11/17/2005 | WO2004102610A3 Generation of uniformly-distributed plasma |
| 11/17/2005 | WO2004088711A3 Method and system for generating a plasma |
| 11/17/2005 | US20050256669 Measurement system and method and computer program for processing measurement data |
| 11/17/2005 | US20050256600 Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing |
| 11/17/2005 | US20050255700 Controlled multi-step magnetron sputtering process |
| 11/17/2005 | US20050255691 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 11/17/2005 | US20050255257 Method of controlling the film properties of PECVD-deposited thin films |
| 11/17/2005 | US20050255255 Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus |
| 11/17/2005 | US20050253093 Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation |
| 11/17/2005 | US20050253089 Ion implanting apparatus |
| 11/17/2005 | US20050253084 Ion generation apparatus used in ion implanter |
| 11/17/2005 | US20050253083 Charged particle beam apparatus and charged particle beam irradiation method |
| 11/17/2005 | US20050253082 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/17/2005 | US20050253069 Method and system for ultrafast photoelectron microscope |
| 11/17/2005 | US20050253067 Method for controlling charged particle beam, and charged particle beam apparatus |
| 11/17/2005 | US20050253066 Electron beam apparatus |
| 11/17/2005 | US20050253065 Methods, apparatus, and software for adjusting the focal spot of an electron beam |
| 11/17/2005 | US20050252885 Plasma etching method and apparatus |
| 11/17/2005 | US20050252768 Coater with a large-area assembly of rotatable magnetrons |
| 11/17/2005 | US20050252766 Cathode apparatus to selectively bias pallet during sputtering |
| 11/17/2005 | US20050252763 increased sputtering yield increases the deposition rate; without an occurrence of arcing between the anode and the cathode assembly; increase density of ions in the strongly ionized plasma |
| 11/17/2005 | US20050252610 Plasma processor |
| 11/17/2005 | US20050252452 Polynuclear metal molecular beam apparatus |
| 11/17/2005 | US20050252451 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 11/17/2005 | US20050252447 Gas blocker plate for improved deposition |
| 11/17/2005 | US20050251990 Plasma uniformity control by gas diffuser hole design |
| 11/17/2005 | DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity |
| 11/17/2005 | DE102004019834A1 Korrekturlinsen-System für ein Partikelstrahl-Projektionsgerät Correction lens system for a particle beam projection device |
| 11/17/2005 | DE102004019833A1 Objektivlinse für einen geladenen Partikelstrahl Objective lens for a charged particle beam |
| 11/17/2005 | DE102004019741A1 Plasmareaktor zu Oberflächenmodifikation von Gegenständen Plasma reactor for surface modification of objects |
| 11/17/2005 | DE102004019169A1 Verfahren zum Abscheiden von Karbidschichten hochschmelzender Metalle A method of separating carbide refractory metals |
| 11/16/2005 | EP1596419A2 High rate etching using fluorine plasma |
| 11/16/2005 | EP1596418A1 Electron gun |
| 11/16/2005 | EP1595974A2 Plasma uniformity control by gas diffuser hole design |
| 11/16/2005 | EP1595003A2 Apparatus and methods for ionized deposition of a film or thin layer |
| 11/16/2005 | EP1493172B1 An atmospheric pressure plasma assembly |
| 11/16/2005 | EP1274875B1 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 11/16/2005 | EP1121706B1 Integrated power modules for plasma processing systems |
| 11/16/2005 | EP1108216A4 High resolution analytical probe station |
| 11/16/2005 | EP1060498B1 A method and apparatus that determines charged particle beam shape codes in lithography systems |
| 11/16/2005 | CN1698177A Method for toolmatching and troubleshooting a plasma processing system |
| 11/16/2005 | CN1698176A An atmospheric pressure plasma assembly |
| 11/16/2005 | CN1696652A Particle beam device probe operation |
| 11/16/2005 | CN1227710C Method and apparatus for producing uniform process rates |
| 11/16/2005 | CN1227703C Apparatus and method for producing indium ion beam |
| 11/16/2005 | CN1227390C Surface treatment devices |
| 11/16/2005 | CN1227389C In-situ monitoring plasma etching apparatus and method |
| 11/16/2005 | CN1227385C Apparatus for surface modification of polymer, metal and ceramic materials using ion bean |
| 11/15/2005 | US6965287 Low reflection microwave window |
| 11/15/2005 | US6965153 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/15/2005 | US6965116 Method of determining dose uniformity of a scanning ion implanter |
| 11/15/2005 | US6965115 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus |
| 11/15/2005 | US6965114 Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer |
| 11/15/2005 | US6965112 Specimen holder, observation system, and method of rotating specimen |
| 11/10/2005 | WO2005106917A1 Method for the production of a disk-shaped workpiece based on a dielectric substrate, and vacuum processing system therefor |
| 11/10/2005 | WO2005106508A2 Diagnostic system for profiling micro-beams |
| 11/10/2005 | WO2005088670A3 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source |
| 11/10/2005 | WO2004093165A3 A method and apparatus for process control in time division multiplexed tdm etch processes |
| 11/10/2005 | US20050250347 Method and apparatus for maintaining by-product volatility in deposition process |
| 11/10/2005 | US20050250338 Plasma device |
| 11/10/2005 | US20050250299 Method for implanting ions in semiconductor device |
| 11/10/2005 | US20050247889 Movable inclination-angle measuring apparatus for ion beam, and method of use |
| 11/10/2005 | US20050247886 Lift-out probe having an extension tip, methods of making and using, and analytical instruments employing same |
| 11/10/2005 | US20050247884 Automated method of correcting aberrations in electron beam, method of visualizing aberrations, and automated aberration corrector |
| 11/10/2005 | US20050247876 Sample dimension measuring method and scanning electron microscope |
| 11/10/2005 | US20050247860 Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system |
| 11/10/2005 | US20050247554 Pulsed magnetron for sputter deposition |
| 11/10/2005 | US20050247404 Plasma processing apparatus and plasma processing method |
| 11/09/2005 | EP1594161A1 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 11/09/2005 | EP1594153A1 Coating device with rotatable magnetrons covering large area |
| 11/09/2005 | EP1593756A1 CVD process. |
| 11/09/2005 | EP1593753A2 Method for ion implantation |
| 11/09/2005 | EP1593751A1 Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment |
| 11/09/2005 | EP1593143A2 Power supply control unit |
| 11/09/2005 | EP1593142A2 Plasma processing installation |
| 11/09/2005 | EP1593141A2 End point detection in time division multiplexed etch processes |
| 11/09/2005 | EP1145273B1 Low contamination high density plasma etch chambers and methods for making the same |
| 11/09/2005 | EP1082750B1 Pulsed ion source for ion trap mass spectrometer |
| 11/09/2005 | CN1695222A Particle-optical device and detection means |
| 11/09/2005 | CN1694977A High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 11/09/2005 | CN1694228A Electric liquid chamber and method of processing substrate in the chamber |
| 11/09/2005 | CN1693537A Very low temp. chamical gas-phase deposite technology of variable component independent of conformal, stress and chamical gas-phase deposite layer |
| 11/09/2005 | CN1693536A Very low temp. chamical gas-phase deposite technology of varible component independent of conformal, stress and chamical gas-phase deposite layer |
| 11/09/2005 | CN1693532A Coating device with rotatable magnetrons covering large area |