| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/01/2005 | WO2005114694A1 Plasma system with isolated radio-frequency powered electrodes |
| 12/01/2005 | WO2005114693A1 Electron microscopic method and electron microscope using the same |
| 12/01/2005 | WO2005114692A2 In-situ process chamber preparation methods for plasma ion implantation systems |
| 12/01/2005 | WO2005098909A3 Drive system for scanning a workpiece through an ion beam |
| 12/01/2005 | WO2005010228A3 High peak power plasma pulsed supply with arc handling |
| 12/01/2005 | WO2004059702A3 Method and apparatus for monitoring a material processing system |
| 12/01/2005 | US20050266322 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |
| 12/01/2005 | US20050266174 Methods and apparatus for reducing arcing during plasma processing |
| 12/01/2005 | US20050264351 Transresistance amplifier for a charged particle detector |
| 12/01/2005 | US20050264219 Vacuum plasma processor including control in response to DC bias voltage |
| 12/01/2005 | US20050264218 Plasma processor with electrode responsive to multiple RF frequencies |
| 12/01/2005 | US20050264148 Multiple electron beam systems |
| 12/01/2005 | US20050263722 Method for reducing proximity effects in electron beam lithography |
| 12/01/2005 | US20050263721 Uniformity control using multiple tilt axes, rotating wafer and variable scan velocity |
| 12/01/2005 | US20050263715 Objective lens, electron beam system and method of inspecting defect |
| 12/01/2005 | US20050263713 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus |
| 12/01/2005 | US20050263712 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |
| 12/01/2005 | US20050263703 Pattern inspection method and apparatus using electron beam |
| 12/01/2005 | US20050263702 Defect inspection and charged particle beam apparatus |
| 12/01/2005 | US20050263701 Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus |
| 12/01/2005 | US20050263485 Method and apparatus for process control in time division multiplexed (TDM) etch processes |
| 12/01/2005 | US20050263484 Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods |
| 12/01/2005 | US20050263390 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions |
| 12/01/2005 | US20050263389 Variable quadruple electromagnet array in plasma processing |
| 12/01/2005 | US20050263248 Blocker plate bypass to distribute gases in a chemical vapor deposition system |
| 12/01/2005 | US20050263247 Plasma processing apparatus and plasma processing method |
| 12/01/2005 | US20050263219 Device and method for remelting metallic surfaces |
| 12/01/2005 | US20050263070 Pressure control and plasma confinement in a plasma processing chamber |
| 12/01/2005 | DE4310941B4 Vacuum treatment chamber - with a low voltage discharge with arcing on treatment chamber walls prevented |
| 12/01/2005 | DE19818840B4 Ladungsteilchenstrahlbelichtungsverfahren und Ladungsteilchenstrahlbelichtungsvorrichtung A charged and charged particle |
| 12/01/2005 | DE102004063691A1 Semiconductor device ion implanting method, involves nonuniformly implanting dose of implanted ions in central portion and edge portions of semiconductor substrate with different scanning speed in different directions |
| 11/30/2005 | EP1599891A2 Critical dimension variation compensation across a wafer by means of local wafer temperature control |
| 11/30/2005 | EP1599411A1 Method and apparatus for controlled manufacturing of nanometer-scale apertures |
| 11/30/2005 | EP1272683B1 Dlc layer system and method for producing said layer system |
| 11/30/2005 | EP1060500B1 An apparatus and method for controlling a beam shape in lithographiy systems |
| 11/30/2005 | EP1002329B1 Semiconductor process compensation utilizing non-uniform ion implantation methodology |
| 11/30/2005 | CN1703771A Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate |
| 11/30/2005 | CN1230045C Plasma processing apparatus |
| 11/30/2005 | CN1230044C Plasma processing apparatus |
| 11/30/2005 | CN1230043C Antenna structure for inductively coupled plasma generator |
| 11/30/2005 | CN1230042C Inductively coupled plasma etching device |
| 11/30/2005 | CN1229855C 等离子体处理装置 Plasma processing apparatus |
| 11/30/2005 | CN1229849C Column for a charged particle beam device |
| 11/29/2005 | US6970700 Power delivery system |
| 11/29/2005 | US6970004 Apparatus for inspecting defects of devices and method of inspecting defects |
| 11/29/2005 | US6969953 System and method for inductive coupling of an expanding thermal plasma |
| 11/29/2005 | US6969868 Method of storing a data bit including melting and cooling a volume of alloy therein |
| 11/29/2005 | US6969862 Charged-particle-beam exposure apparatus and method of controlling same |
| 11/29/2005 | US6969854 Arrangement for holding a particle beam apparatus |
| 11/29/2005 | US6969853 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus |
| 11/29/2005 | US6969571 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 11/24/2005 | WO2005112073A1 Charged particle beam exposure system |
| 11/24/2005 | WO2005112072A2 Segmented baffle plate assembly for a plasma processing system |
| 11/24/2005 | WO2005112043A1 Multi-column charged particle optics assembly |
| 11/24/2005 | WO2005111268A2 Apparatus including showerhead electrode and heater for plasma processing |
| 11/24/2005 | WO2005111267A2 Gas distribution member supplying process gas and rf power for plasma processing |
| 11/24/2005 | WO2005111261A1 Spattering target and method of manufacturing the same |
| 11/24/2005 | WO2005091329A3 Sputtering device for manufacturing thin films |
| 11/24/2005 | WO2005081287A3 Matching dose and energy of multiple ion implanters |
| 11/24/2005 | WO2005069344A3 Gas distribution plate assembly for plasma reactors |
| 11/24/2005 | WO2005052978A3 Method and apparatus for modifying object with electrons generated from cold cathode electron emitter |
| 11/24/2005 | WO2005050694A3 Liquid metal ion source and its production; processing and analyzing devices provided with said source |
| 11/24/2005 | WO2005048322A3 Method and apparatus for improved baffle plate |
| 11/24/2005 | WO2005046851A3 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 11/24/2005 | WO2005008768A3 A system and method for determining a cross sectional feature of a structural element using a reference structural element |
| 11/24/2005 | US20050260837 Methods for stable and repeatable ion implantation |
| 11/24/2005 | US20050260354 In-situ process chamber preparation methods for plasma ion implantation systems |
| 11/24/2005 | US20050258766 Inductively coupled plasma reactor for producing nano-powder |
| 11/24/2005 | US20050258380 High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams |
| 11/24/2005 | US20050258379 Uniformity control using multiple fixed wafer orientations and variable scan velocity |
| 11/24/2005 | US20050258366 Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope |
| 11/24/2005 | US20050258280 Shower plate for plasma processing apparatus and plasma processing apparatus |
| 11/24/2005 | US20050258148 Plasma system with isolated radio-frequency powered electrodes |
| 11/24/2005 | US20050258027 Back-biased face target sputtering based programmable logic device |
| 11/24/2005 | US20050257891 Plasma processing apparatus |
| 11/24/2005 | US20050257890 Method of cleaning an interior of a remote plasma generating tube and appartus and method for processing a substrate using the same |
| 11/24/2005 | US20050257743 Plasma processing apparatus and method |
| 11/24/2005 | DE10312632B4 Magnetron mit zweistufiger Dichtung Magnetron with two-stage seal |
| 11/24/2005 | DE10236880B4 Getriebemechanismus zum Übertragen einer Drehkraft auf eine Waferauflageplatte einer Ionenimplantiervorrichtung Transmission mechanism for transmitting a rotational force to a wafer platen an ion implanter |
| 11/24/2005 | DE102004019061A1 Selectiver Absorber zur Umwandlung von Sonnenlicht in Wärme, ein Verfahren und eine Vorrichtung zu dessen Herstellung Selectiver absorber for the conversion of sunlight into heat, a method and apparatus for its production |
| 11/24/2005 | DE102004019060A1 Vorrichtung zum Einbringen von abschmelzenden Elektroden für Lichtbogenverdampfungsvorrichtungen in eine Beschichtungskammer für große Substrate oder Bänder A device for introducing consumable electrodes for arc evaporation devices in a coating chamber for large substrates or tapes |
| 11/23/2005 | EP1598848A2 Electron microscope |
| 11/23/2005 | EP1598442A1 Amorphous carbon film forming method and device |
| 11/23/2005 | EP1598312A1 Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| 11/23/2005 | EP1597748A2 Deflecting acceleration/deceleration gap |
| 11/23/2005 | EP1597568A2 Method of and apparatus for measurement and control of a gas cluster ion beam |
| 11/23/2005 | EP1597409A1 Apparatus and method for depositing large area coatings on planar surfaces |
| 11/23/2005 | EP0890296B1 Apparatuses for controlling phase difference in plasma processing systems |
| 11/23/2005 | CN1700427A Device and method for plasma processing, and slow-wave plate |
| 11/23/2005 | CN1700404A Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 11/23/2005 | CN1700403A Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 11/23/2005 | CN1700402A Ion implanting apparatus |
| 11/23/2005 | CN1228999C Apparatus for generating low temperature plasma at atmospheric pressure |
| 11/23/2005 | CN1228821C Method and system for processing radio-frequency plasma |
| 11/23/2005 | CN1228810C Method and apparatus for physical vapor phase deposit |
| 11/23/2005 | CN1228809C Charged beam apparatus, pattern testing method and pattern display method |
| 11/22/2005 | US6968531 Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data |
| 11/22/2005 | US6968527 Reticle for transferring an integrated circuit layout to a wafer; efficiency |
| 11/22/2005 | US6967622 Plasma device and plasma generating method |
| 11/22/2005 | US6967491 Spatial and temporal selective laser assisted fault localization |