| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/15/2005 | WO2005119728A2 Electron stream apparatus and method |
| 12/15/2005 | WO2005119723A1 Charged particle gun |
| 12/15/2005 | WO2005119363A2 Assembly for supporting a workpiece or specimen in a charged particle beam system |
| 12/15/2005 | WO2005119361A2 Apparatus for blanking a charged particle beam |
| 12/15/2005 | WO2005118911A1 Plasma cvd equipment |
| 12/15/2005 | WO2005118907A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 12/15/2005 | WO2005118501A1 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating |
| 12/15/2005 | WO2005101461B1 Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
| 12/15/2005 | WO2005074000A3 Compact, distributed inductive element for large scale inductively-coupled plasma sources |
| 12/15/2005 | WO2005071709A3 Beam optical component having a charged particle lens |
| 12/15/2005 | WO2005041623A3 Plasma processing apparatus, control method for plasma processing apparatus, and evaluation method for plasma processing apparatus |
| 12/15/2005 | WO2004008479A3 Vacuum sputtering cathode |
| 12/15/2005 | US20050278057 Enhanced process and profile simulator algorithms |
| 12/15/2005 | US20050277290 Integration of titanium and titanium nitride layers |
| 12/15/2005 | US20050277209 Plasma leak monitoring method, plasma processing apparatus and plasma processing method |
| 12/15/2005 | US20050276928 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 12/15/2005 | US20050276381 Rotary target locking ring assembly |
| 12/15/2005 | US20050274910 Ion beam system |
| 12/15/2005 | US20050274908 Automatically aligning objective aperture for a scanning electron microscope |
| 12/15/2005 | US20050274904 Monatomic boron ion source and method |
| 12/15/2005 | US20050274903 Monatomic dopant ion source and method |
| 12/15/2005 | US20050274902 Ion-optical phase volume compression |
| 12/15/2005 | US20050274889 Electron microscope equipped with magnetic microprobe |
| 12/15/2005 | US20050274888 Charged particle beam detection system |
| 12/15/2005 | US20050274887 RF quadrupole systems with potential gradients |
| 12/15/2005 | US20050274610 Magnetron sputtering apparatus |
| 12/15/2005 | US20050274324 Plasma processing apparatus and mounting unit thereof |
| 12/15/2005 | DE4412915B4 Plasmabehandlungsanlage, Verfahren zu deren Betrieb und Verwendung derselben Plasma treatment equipment, process for their operation and use of the same |
| 12/15/2005 | DE3811372B4 Vorrichtung zum Einschleusen eines Gegenstands in eine Reaktionskammer Means for introducing an object into a reaction chamber |
| 12/15/2005 | DE19747164B4 Anordnung zur Bearbeitung einer Substratscheibe Arrangement for processing a substrate wafer |
| 12/15/2005 | DE102005015829A1 Verfahren zum Reinigen des Inneren einer Fern-Plasmaerzeugungsröhre sowie Vorrichtung und Verfahren zum Verarbeiten eines Substrats unter Verwendung derselben A method for cleaning the interior of a remote plasma generating tube as well as apparatus and method for processing a substrate using the same |
| 12/15/2005 | DE102004025679A1 High-frequency plasma discharge impedance altering device for apparatus used to treat or coat substrate, varies magnetic field generated in discharge chamber to achieve desired impedance measurement |
| 12/14/2005 | EP1605493A1 Plasma processing control |
| 12/14/2005 | EP1605492A1 Charged particle beam device with retarding field analyzer |
| 12/14/2005 | EP1604049A1 Method and apparatus for treating a substrate |
| 12/14/2005 | EP1410416B1 Slit lens arrangement for particle beams |
| 12/14/2005 | CN1708838A Method of etching a silicon-containing dielectric material |
| 12/14/2005 | CN1708830A Thin film forming apparatus |
| 12/14/2005 | CN1708826A 电子束曝光系统 Electron beam exposure system |
| 12/14/2005 | CN1708729A Electron beam exposure method and electron beam exposure system |
| 12/14/2005 | CN1231945C Method and equipment for improving particle pollution and processing error in plasma processing chamber |
| 12/13/2005 | US6975125 Semiconductor device tester |
| 12/13/2005 | US6974960 Exposure system and exposure method |
| 12/13/2005 | US6974950 Positive and negative ion beam merging system for neutral beam production |
| 12/13/2005 | US6974709 Method and device for providing a semiconductor etching end point and for detecting the end point |
| 12/13/2005 | US6974550 Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator |
| 12/13/2005 | US6974523 Hollow anode plasma reactor and method |
| 12/13/2005 | US6974094 Anti-corrosion shower head used in dry etching process and method of manufacturing the same |
| 12/08/2005 | WO2005117083A1 Substrate processing apparatus |
| 12/08/2005 | WO2005117080A1 Plasma generator, plasma processing apparatus using same and electronic device |
| 12/08/2005 | WO2005117077A1 Method for producing solid element plasma and its plasma source |
| 12/08/2005 | WO2005117059A1 Charge neutralization device |
| 12/08/2005 | WO2005116293A1 Thin film forming equipment and thin film forming method |
| 12/08/2005 | WO2005115104A2 Methods for stable and repeatable plasma ion implantation |
| 12/08/2005 | WO2005097640A3 Method for reciprocating a workpiece through an ion beam |
| 12/08/2005 | WO2005093777A3 Ion sources |
| 12/08/2005 | WO2005071708A3 Focussing lens for charged particle beams |
| 12/08/2005 | WO2005033650A3 Method for preparing a sample for electron microscope examination and a sample carrier and transport holder used therefor |
| 12/08/2005 | WO2005024092A3 Particulate reduction using temperature-controlled chamber shield |
| 12/08/2005 | WO2005013309A3 Multi-mode charged particle beam device |
| 12/08/2005 | WO2004088710A3 Method and apparatus for gas plasma treatment with controlled extent of gas plasma, and use thereof |
| 12/08/2005 | US20050272267 Method suitable for batch ion etching of copper |
| 12/08/2005 | US20050272261 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 12/08/2005 | US20050272227 Plasma processing apparatus and method |
| 12/08/2005 | US20050271956 Administering drug aerosol in fluid propellant carrier using a pressurized metered dose inhaler, taking into consideration inspiratory flow rate and volume; diabetes, immune deficiency, asthma, and/or pain treatment |
| 12/08/2005 | US20050271949 Reticle manipulations |
| 12/08/2005 | US20050270857 Semiconductor manufacturing apparatus |
| 12/08/2005 | US20050269528 Charged particle beam exposure system |
| 12/08/2005 | US20050269527 Method of implanting a substrate and an ion implanter for performing the method |
| 12/08/2005 | US20050269526 Dose cup located near bend in final energy filter of serial implanter for closed loop dose control |
| 12/08/2005 | US20050269525 Lithographic apparatus and device manufacturing method |
| 12/08/2005 | US20050269524 Spatial-phase locking of energy beams for determining two-dimensional location and beam shape |
| 12/08/2005 | US20050269520 Icon implantation ion source, system and method |
| 12/08/2005 | US20050269511 Probe driving method, and probe apparatus |
| 12/08/2005 | US20050269292 Plasma processing apparatus and method, and electrode plate for plasma processing apparatus |
| 12/08/2005 | US20050269031 Plasma treatment system |
| 12/08/2005 | US20050268850 Plasma processing system |
| 12/08/2005 | US20050268694 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring |
| 12/07/2005 | EP1603154A2 Apparatus and method for surface finishing a silicon film |
| 12/07/2005 | EP1602748A1 Microwave plasma processing device and plasma processing gas supply member |
| 12/07/2005 | EP1602122A1 Method for etching a sample and etching system |
| 12/07/2005 | EP1602121A2 Apparatus for generating a plurality of beamlets |
| 12/07/2005 | EP1481110B1 Getter metal alloy coating and device and method for the production thereof |
| 12/07/2005 | EP1088327A4 Transmission electron microscope ccd camera |
| 12/07/2005 | EP1072055B1 Means for controlling target erosion and sputtering in a magnetron |
| 12/07/2005 | CN1705561A Method and apparatus for improved fastening hardware |
| 12/07/2005 | CN1231098C Electrostatic accelerator and its ion filling equipment |
| 12/07/2005 | CN1230877C Plasma apparatus and production method thereof |
| 12/07/2005 | CN1230859C Cathode assembly for indirectly heated cathode ion source |
| 12/07/2005 | CN1230802C System and method for controlling passive bipolar electric arc |
| 12/06/2005 | US6972848 Semiconductor fabricating apparatus with function of determining etching processing state |
| 12/06/2005 | US6972840 Method of reducing process plasma damage using optical spectroscopy |
| 12/06/2005 | US6972832 Method of grounding a photoblank to a holding device |
| 12/06/2005 | US6972524 Plasma processing system control |
| 12/06/2005 | US6972418 Ion doping apparatus, and multi-apertured electrode for the same |
| 12/06/2005 | US6972417 Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons |
| 12/06/2005 | US6972412 Particle-optical device and detection means |
| 12/06/2005 | US6972405 Nanoscale standard sample and its manufacturing method |
| 12/06/2005 | US6972165 Electron beam exposure mask and electron beam exposure method using the same |
| 12/06/2005 | US6972079 Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |