| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/29/2005 | US20050287451 Method for reducing the fogging effect |
| 12/29/2005 | US20050287450 Process for controlling the proximity effect correction |
| 12/29/2005 | US20050285539 Ion implantation apparatus for use in manufacturing of semiconductor device |
| 12/29/2005 | US20050285054 Charged particle beam drawing apparatus |
| 12/29/2005 | US20050285053 Method and apparatus for electron beam processing of substrates |
| 12/29/2005 | US20050285052 Scanning mechanism of an ion implanter |
| 12/29/2005 | US20050285047 Electron beam diagnostic for profiling high power beams |
| 12/29/2005 | US20050285036 Charged particle beam emitting device and method for adjusting the optical axis |
| 12/29/2005 | US20050285034 Method and apparatus for measuring three-dimensional shape of specimen by using SEM |
| 12/29/2005 | US20050285032 Imaging energy filter for electrons and other electrically charged particles and method for energy filtration of the electrons and other electrically charged particles with the imaging energy filter in electro-optical devices |
| 12/29/2005 | US20050284756 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 12/29/2005 | US20050284576 Method and apparatus for treating wafer edge region with toroidal plasma |
| 12/29/2005 | US20050284573 Bare aluminum baffles for resist stripping chambers |
| 12/29/2005 | US20050284571 Dry-etching method and apparatus |
| 12/29/2005 | US20050284570 Diagnostic plasma measurement device having patterned sensors and features |
| 12/29/2005 | DE19939040B4 Magnetronsputtergerät Magnetronsputtergerät |
| 12/29/2005 | DE102004029677A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces |
| 12/28/2005 | EP1610369A1 Plasma film-forming method and plasma film-forming apparatus |
| 12/28/2005 | EP1610368A1 Plasma processing apparatus and method |
| 12/28/2005 | EP1610358A1 Aberration correction device and method for operating same |
| 12/28/2005 | EP1609884A1 Thin film forming apparatus and method for forming thin film |
| 12/28/2005 | EP1609882A1 Coating device and method by cathodic sputtering |
| 12/28/2005 | EP1609880A1 Sputtering cathod for coating methods |
| 12/28/2005 | EP1609165A2 Ion beam incident angle detector for ion implant systems |
| 12/28/2005 | EP1609164A1 Resistive cantilever spring for probe microscopy |
| 12/28/2005 | EP1078111B1 Sputter deposition method |
| 12/28/2005 | EP0938634B1 Gas panel |
| 12/28/2005 | CN1714422A Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 12/28/2005 | CN1713334A Ion beam system and method for reducing foreign pollution to substrate thereof |
| 12/28/2005 | CN1713078A Bare aluminum baffles for resist stripping chambers |
| 12/28/2005 | CN1712558A Sputtering cathode for coating processes |
| 12/28/2005 | CN1234013C Charging voltage detector for substrate and ion beam radiator |
| 12/27/2005 | US6979954 Inter-stage plasma source |
| 12/27/2005 | US6979831 Method and apparatus for a formatter following electron beam substrate processing system |
| 12/27/2005 | US6979824 Filtered e-beam inspection and review |
| 12/27/2005 | US6979823 Patterned wafer inspection method and apparatus therefor |
| 12/27/2005 | US6979822 Charged particle beam system |
| 12/27/2005 | US6979821 Scanning electron microscope |
| 12/27/2005 | US6979819 Photoelectron emission microscope for wafer and reticle inspection |
| 12/27/2005 | US6979520 Stencil mask for ion implantation |
| 12/27/2005 | CA2196894C Apparatus for and method of manufacturing plastic container coated with carbon film |
| 12/22/2005 | WO2005122212A1 Device and method for atomising with the aid of a displaceable planar target |
| 12/22/2005 | WO2005122211A1 Plasma ion implantation monitoring systems for fault detection and process control |
| 12/22/2005 | WO2005122210A1 Laser atom probe methods |
| 12/22/2005 | WO2005122209A2 Plasma processing control |
| 12/22/2005 | WO2005122208A2 Charged particle beam device with retarding field analyzer |
| 12/22/2005 | WO2005121902A1 Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device |
| 12/22/2005 | WO2005121394A1 Magnetron sputtering method and magnetron sputtering system |
| 12/22/2005 | WO2005024880A3 Floating mode ion source |
| 12/22/2005 | WO2004063421A3 Deposition chamber surface enhancement and resulting deposition chambers |
| 12/22/2005 | US20050283321 Method and apparatus for using a pressure control system to monitor a plasma processing system |
| 12/22/2005 | US20050282034 Ceramic or a metal base covered with a physically vapor deposited film formed from a group 3 compound such as Y2O3, with a value of ratio I400/I222 of peak intensity I400 assignable to (400) plane to peak intensity I222 assignable to (222) plane of X-ray diffraction not higher than 0.5. |
| 12/22/2005 | US20050281959 Plasma generating apparatus and method of forming alignment film of liquid crystal display using the same |
| 12/22/2005 | US20050281958 Electron beam enhanced nitriding system (EBENS) |
| 12/22/2005 | US20050281951 Dielectric barrier discharge method for depositing film on substrates |
| 12/22/2005 | US20050281175 Method of storing and reading a data bit in a phase change alloy material |
| 12/22/2005 | US20050280150 Photolithographic techniques for producing angled lines |
| 12/22/2005 | US20050279938 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 12/22/2005 | US20050279936 Methods of scanning an object that includes multiple regions of interest using an array of scanning beams |
| 12/22/2005 | US20050279935 Methodology and apparatus for leakage detection |
| 12/22/2005 | US20050279934 Charged particle beam system |
| 12/22/2005 | US20050279629 Sputtering cathode for coating processes |
| 12/22/2005 | US20050279628 Internal antennae for plasma processing with metal plasma |
| 12/22/2005 | US20050279624 Plasma vapor deposition; etching; semiconductors; integrated circuits |
| 12/22/2005 | US20050279457 Plasma processing apparatus and method, and plasma control unit |
| 12/22/2005 | US20050279456 Plasma reactor with high productivity |
| 12/22/2005 | US20050279455 Plasma reactor for surface modification of objects |
| 12/22/2005 | US20050279282 Method and apparatus for processing a semiconductor substrate |
| 12/22/2005 | DE19928053C5 Anordnung zur Erzeugung eines Niedertemperaturplasmas durch eine magnetfeldgestützte Kathodenentladung Arrangement for generating a low temperature plasma by a magnetic field-supported cathode discharge |
| 12/22/2005 | DE19745771B4 Verfahren für den Betrieb eines Hochleistungs-Elektronenstrahls A method for operating a high-performance electron beam |
| 12/22/2005 | DE10356966A1 Verfahren zum Erstellen einer Steueranweisung für ein Maskenschreibgerät Procedure to create a control statement for a mask writing tool |
| 12/22/2005 | DE10230729B4 Verfahren zum Erfassen des Endpunktes eines Ätzverfahrens in einem Halbleiterherstellungsgerät und Detektor dafür A method for detecting the endpoint of an etching process in a semiconductor manufacturing apparatus and the detector for |
| 12/22/2005 | DE102004026344A1 Verfahren zum Herstellen einer hydrophoben Beschichtung, Vorrichtung zum Durchführen des Verfahrens und Substrat mit einer hydrophoben Beschichtung A method for producing a hydrophobic coating apparatus for performing the method and substrate with a hydrophobic coating |
| 12/21/2005 | EP1608000A2 RF plasma processor |
| 12/21/2005 | EP1606977A2 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 12/21/2005 | EP1606872A1 Power supply unit for a gas discharge process |
| 12/21/2005 | EP1606543A1 Universal vacuum coupling for cylindrical target |
| 12/21/2005 | EP1102616B1 Esrf coolant degassing process |
| 12/21/2005 | EP0977904A4 Plasma processing system utilizing combined anode/ion source |
| 12/21/2005 | CN1711621A Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 12/21/2005 | CN1233019C Method of adjusting thickness of electrode in plasma processing system |
| 12/21/2005 | CN1233018C An atmospheric pressure plasma system |
| 12/21/2005 | CN1232676C Method for forming electric conductive region by ion implantation |
| 12/20/2005 | US6978215 Method of determining of true nonlinearity of scan along a selected direction X or Y in scan microscope |
| 12/20/2005 | US6977386 Angular aperture shaped beam system and method |
| 12/20/2005 | US6977384 Shaped sputter shields for improved ion column operation |
| 12/20/2005 | US6977382 Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device |
| 12/20/2005 | US6977381 Gating grid and method of making same |
| 12/20/2005 | US6977377 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus |
| 12/20/2005 | US6977376 Method of prevention charging, and apparatus for charged particle beam using the same |
| 12/20/2005 | US6977375 Multi-beam multi-column electron beam inspection system |
| 12/20/2005 | US6977184 Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring |
| 12/20/2005 | US6977128 Multi-layered semiconductor structure |
| 12/20/2005 | CA2319364C Apparatus and method for sputtering a magnetron target |
| 12/15/2005 | WO2005119745A1 Impurity introducing method |
| 12/15/2005 | WO2005119735A1 Pressure control and plasma confinement in a plasma processing chamber |
| 12/15/2005 | WO2005119734A1 Plasma processor with electrode responsive to multiple rf frequencies |
| 12/15/2005 | WO2005119733A1 Blocker plate bypass to distribute gases in a chemical vapor deposition system |
| 12/15/2005 | WO2005119732A2 Non-axisymmetric charged-particle beam system |
| 12/15/2005 | WO2005119731A2 Vacuum plasma processor including control in response to dc bias voltage |