| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/12/2006 | US20060006329 Charged particle guide |
| 01/12/2006 | US20060005930 Substrate supporting structure for semiconductor processing, and plasma processing device |
| 01/12/2006 | US20060005929 Plasma processing device and plasma generating method |
| 01/12/2006 | US20060005928 Apparatus and methods for improving the stability of RF power delivery to a plasma load |
| 01/12/2006 | US20060005769 Plasma processing device |
| 01/12/2006 | US20060005768 Doping method, doping apparatus, and control system for doping apparatus |
| 01/12/2006 | DE102004030344A1 Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD) An apparatus for coating optical glasses by means of plasma enhanced chemical vapor deposition (CVD) |
| 01/12/2006 | DE102004029526A1 Vorrichtung zur Kohlenstoffabschiebung Apparatus for carbon removal |
| 01/12/2006 | DE102004029525A1 Befestigungseinheit für Zündeinheiten und Vorrichtung zur Kohlenstoffabscheidung Mounting unit for ignition units and apparatus for carbon capture |
| 01/11/2006 | EP1614770A1 Microwave plasma processing method |
| 01/11/2006 | EP1614139A1 Sputtering chamber comprising a liner |
| 01/11/2006 | EP1614138A2 High frequency plasma jet source and method for irradiating a surface |
| 01/11/2006 | EP1614137A2 Secondary electron detector unit for a scanning electron microscope |
| 01/11/2006 | EP1614136A2 Plasma generation using multi-step ionization |
| 01/11/2006 | EP1613788A1 Method and apparatus for depositing material on a substrate |
| 01/11/2006 | CN1720598A Method and apparatus for monitoring a plasma in a material processing system |
| 01/11/2006 | CN1720538A Method and apparatus for three-dimensional imaging in the Fourier domain |
| 01/11/2006 | CN1720532A Method and apparatus for monitoring a material processing system |
| 01/11/2006 | CN1720349A Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
| 01/11/2006 | CN1720348A Blocker plate bypass design to improve clean rate at the edge of the chamber |
| 01/11/2006 | CN1719964A Rotary corona discharge low temp plasma source apparatus |
| 01/11/2006 | CN1236657C Plasma process apparatus and method |
| 01/11/2006 | CN1236482C Device for checking semiconductor device |
| 01/11/2006 | CN1235771C Production device for DLC film-coated plastic container and production method therefor |
| 01/10/2006 | US6985787 Method and apparatus for monitoring parts in a material processing system |
| 01/10/2006 | US6985425 Electron beam recorder and method thereof |
| 01/10/2006 | US6985215 Plasma processing method and plasma processing apparatus |
| 01/10/2006 | US6984835 Irradiation apparatus and irradiation method |
| 01/10/2006 | US6984833 Ion implanter and method for controlling the same |
| 01/10/2006 | US6984832 Beam angle control in a batch ion implantation system |
| 01/10/2006 | US6984831 Gas flow restricting cathode system for ion implanter and related method |
| 01/10/2006 | US6984823 Electron microscope and method for controlling focus position thereof |
| 01/10/2006 | US6984822 Apparatus and method for secondary electron emission microscope |
| 01/10/2006 | US6984288 Plasma processor in plasma confinement region within a vacuum chamber |
| 01/10/2006 | US6983718 Electron beam physical vapor deposition apparatus |
| 01/10/2006 | CA2116805C Mask and method for manufacturing the same |
| 01/05/2006 | WO2006002315A2 Electron beam enhanced nitriding system (ebens) |
| 01/05/2006 | WO2006002138A2 Etch and deposition control for plasma implantation |
| 01/05/2006 | WO2006000862A1 Coating device for coating a substrate and coating method |
| 01/05/2006 | WO2006000846A1 System for low-energy plasma-enhanced chemical vapor deposition |
| 01/05/2006 | US20060004544 Monitoring device and monitoring method for vacuum device |
| 01/05/2006 | US20060000986 Liquid crystal alignment using electron beam exposure |
| 01/05/2006 | US20060000804 Specimen surface processing apparatus and surface processing method |
| 01/05/2006 | US20060000803 Plasma processing method and apparatus |
| 01/05/2006 | US20060000800 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 01/05/2006 | DE19714346B4 Verfahren und Vorrichtung zur optischen Mikroskopie mit Subwellenlängenauflösung mittels eines Tieftemperatur-Nahfeldmikroskops Method and apparatus for optical microscopy by means of a low-temperature Subwellenlängenauflösung near-field microscope |
| 01/05/2006 | DE102004029466A1 Medieninjektor Medieninjektor |
| 01/05/2006 | DE102004027897A1 Vorrichtung und Verfahren zur Zerstäubung mit einem bewegbaren planaren Target Apparatus and method for atomization with a movable planar target |
| 01/04/2006 | EP1612857A1 Cvd apparatus and method for cleaning cvd apparatus |
| 01/04/2006 | EP1612853A1 Cooling device for vacuum treatment device |
| 01/04/2006 | EP1612840A2 Method and apparatus for photomask plasma etching |
| 01/04/2006 | EP1612839A2 Electron beam lithography method |
| 01/04/2006 | EP1612838A2 Electron beam lithography method |
| 01/04/2006 | EP1612837A1 Method for the removal of a microscopic sample from a substrate |
| 01/04/2006 | EP1612836A2 Method for the removal of a microscopic sample from a substrate |
| 01/04/2006 | EP1612835A1 Method for Reducing the Fogging Effect |
| 01/04/2006 | EP1612834A1 A process for controlling the proximity effect correction |
| 01/04/2006 | EP1612833A1 Method for reducing the fogging effect |
| 01/04/2006 | EP1611608A2 Real-time in-line testing of semiconductor wafers |
| 01/04/2006 | EP1611604A2 A method and apparatus for process control in time division multiplexed tdm etch processes |
| 01/04/2006 | EP1611592A2 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
| 01/04/2006 | EP0990061B1 Method and device for vacuum-coating a substrate |
| 01/04/2006 | EP0755547B1 Ultrahigh vacuum focused ion beam micromill and articles therefrom |
| 01/04/2006 | CN1717961A Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 01/04/2006 | CN1717790A Plasma processing method and apparatus |
| 01/04/2006 | CN1717789A Plasma processing apparatus and method, and electrode plate for plasma processing apparatus |
| 01/04/2006 | CN1717788A Plasma processing method and apparatus |
| 01/04/2006 | CN1717637A Method and apparatus for monitoring parts in a material processing system |
| 01/04/2006 | CN1717631A 光刻系统 Lithography system |
| 01/04/2006 | CN1716539A Doping device |
| 01/04/2006 | CN1716526A Method of cleaning an interior of a remote plasma generating tube and apparatus and method for processing a substrate using the same |
| 01/04/2006 | CN1716524A Refurbishment of a coated chamber component |
| 01/04/2006 | CN1716512A Particle-optical apparatus provided with lenses with permanent-magnetic material |
| 01/04/2006 | CN1715863A Method for the removal of a microscopic sample from a substrate |
| 01/04/2006 | CN1715862A Apparatus for evacuating a sample |
| 01/04/2006 | CN1715442A Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition |
| 01/04/2006 | CN1235449C Induction coupling plasma generater combined with two-layer coil antenna |
| 01/04/2006 | CN1235272C Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 01/04/2006 | CN1235092C Electron beam exposure method and system therefor |
| 01/03/2006 | US6983215 RF metrology characterization for field installation and serviceability for the plasma processing industry |
| 01/03/2006 | US6982429 Transmission electron microscope sample preparation |
| 01/03/2006 | US6982427 Electron beam apparatus with aberration corrector |
| 01/03/2006 | US6982420 Sample observation method and transmission electron microscope |
| 01/03/2006 | US6982175 End point detection in time division multiplexed etch processes |
| 12/29/2005 | WO2005124844A1 Plasma processing device amd method |
| 12/29/2005 | WO2005124820A1 Device for coating optical glass by means of plasma-supported chemical vapour deposition (cvd) |
| 12/29/2005 | WO2005124819A1 Media injector |
| 12/29/2005 | WO2005124818A1 Device for carbon deposition |
| 12/29/2005 | WO2005124817A1 Ion beam scanning systems and methods for improved ion implantation uniformity |
| 12/29/2005 | WO2005124816A1 Aberration correction device and method for operating same |
| 12/29/2005 | WO2005124815A1 Electron beam source, and electron-beam application device |
| 12/29/2005 | WO2005124467A1 Electron beam drawing device |
| 12/29/2005 | WO2005123979A2 Method and device for plasma-treating workpieces |
| 12/29/2005 | WO2005123977A1 Fastening unit for ignition units, and device for eliminating carbon |
| 12/29/2005 | WO2005104307A3 Laser atom probes |
| 12/29/2005 | WO2005074002A3 Focusing system and method for a charged particle imaging system |
| 12/29/2005 | WO2005024892A3 Coating device and related method |
| 12/29/2005 | WO2004107411A3 Deposition apparatus and method |
| 12/29/2005 | US20050287824 ECR-plasma source and methods for treatment of semiconductor structures |
| 12/29/2005 | US20050287775 Film formation apparatus and method for semiconductor process |