| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/31/2006 | US6991709 Simultaneously applying direct current power to a metal target, and RF power to pedestal electrode to accelerate the copper ion reaching deeply into narrow hole on wafer; metallization; forming copper interconnect; semiconductors |
| 01/31/2006 | US6991701 Plasma treatment method and apparatus |
| 01/31/2006 | US6990743 Process for monitoring measuring device performance |
| 01/26/2006 | WO2006009667A2 Highly ionized pvd with moving magnetic field envelope for uniform coverage of structure and wafer |
| 01/26/2006 | WO2006009295A1 Electron beam applying apparatus and drawing apparatus |
| 01/26/2006 | WO2006008543A1 Method of determining dose uniformity of a scanning ion implanter |
| 01/26/2006 | WO2006008197A1 Cylindrical target obtained by hot isostatic pressing |
| 01/26/2006 | WO2005090638A9 Remote chamber methods for removing surface deposits |
| 01/26/2006 | WO2005048289A3 Method and apparatus comprising an improved focus ring |
| 01/26/2006 | US20060018232 Device to store and read a data bit in a phase change alloy material |
| 01/26/2006 | US20060017021 Multi-electron beam exposure method and apparatus |
| 01/26/2006 | US20060017018 Super alloy ionization chamber for reactive samples |
| 01/26/2006 | US20060017017 Ion implanter and method of manufacturing semiconductor device |
| 01/26/2006 | US20060017016 Method for the removal of a microscopic sample from a substrate |
| 01/26/2006 | US20060017014 Patterned wafer inspection method and apparatus therefor |
| 01/26/2006 | US20060017002 Non-axisymmetric charged-particle beam system |
| 01/26/2006 | US20060016992 Electron beam apparatus |
| 01/26/2006 | US20060016991 Electron beam apparatus with aberration corrector |
| 01/26/2006 | US20060016990 Charged particle beam apparatus |
| 01/26/2006 | US20060016988 Beam directing system and method for use in a charged particle beam column |
| 01/26/2006 | US20060016987 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 01/26/2006 | US20060016974 Energy filter image generator for electrically charged particles and the use thereof |
| 01/26/2006 | US20060016459 High rate etching using high pressure F2 plasma with argon dilution |
| 01/26/2006 | DE4444647B4 Verfahren zur Detektion und Impulsspektrometrie submikroskopischer Partikel mittels Kraftsensoren Method for the detection of submicroscopic particles and Impulsspektrometrie using force sensors |
| 01/26/2006 | DE102005030359A1 Apparatus for forming thin film on substrate, has chamber with gas inlet, upper electrode, lower electrode, and selective injection plate including selective injection valve for selectively concentrating gas |
| 01/25/2006 | EP1619269A2 Method for enhancing fluorine utilization |
| 01/25/2006 | EP1619266A1 Method and apparatus for chemical plasma processing of plastic container |
| 01/25/2006 | EP1618589A2 High-density plasma source |
| 01/25/2006 | EP1618588A2 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 01/25/2006 | EP1618587A2 Beam uniformity and angular distribution measurement system |
| 01/25/2006 | CN1726630A Apparatus for processing an object with high position accurancy |
| 01/25/2006 | CN1726584A A device and method for controlling plasma with an adjustable coupling to ground circuit |
| 01/25/2006 | CN1725424A Improved ion gun |
| 01/25/2006 | CN1238881C Gas distribution apparatus for semiconductor processing |
| 01/24/2006 | US6989888 Stage system, exposure apparatus, and device manufacturing method |
| 01/24/2006 | US6989546 Particle multibeam lithography |
| 01/24/2006 | US6989545 Device and method for measurement of beam angle and divergence |
| 01/24/2006 | US6989543 Radiation shielding container for radioactive sources |
| 01/24/2006 | US6989542 Device and method for the examination of samples in a non vacuum environment using a scanning electron microscope |
| 01/24/2006 | US6989536 Electron-beam writing device and electron-beam writing method |
| 01/24/2006 | US6989315 SIMOX using controlled water vapor for oxygen implants |
| 01/24/2006 | US6989073 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 01/24/2006 | CA2184432C Apparatus for coating substrates in a vacuum |
| 01/19/2006 | WO2006007355A1 Method for providing uniform removal of organic material |
| 01/19/2006 | WO2006007336A2 Atmospheric glow discharge with concurrent coating deposition |
| 01/19/2006 | WO2006007228A1 Internal antennae for plasma processing with metal plasma |
| 01/19/2006 | WO2006007062A2 Msvd coating process |
| 01/19/2006 | WO2006007055A1 Method and apparatus for using a pressure control system to monitor a plasma processing system |
| 01/19/2006 | WO2006005837A2 Device for microwave plasma deposition of a coating on a surface of a thermoplastic container |
| 01/19/2006 | WO2005114692A9 In-situ process chamber preparation methods for plasma ion implantation systems |
| 01/19/2006 | WO2005004189A3 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
| 01/19/2006 | US20060013747 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 01/19/2006 | US20060012459 Sensor and method for measuring a current of charged particles |
| 01/19/2006 | US20060011867 Method and apparatus for sample formation and microanalysis in a vacuum chamber |
| 01/19/2006 | US20060011866 High-energy ion implanter and method of operation thereof |
| 01/19/2006 | US20060011863 Electron beam method and apparatus for improved melt point temperatures and optical clarity of halogenated optical materials |
| 01/19/2006 | US20060011855 Movable carriage for a lithographic apparatus and device manufacturing method |
| 01/19/2006 | US20060011838 Sample observation method and transmission electron microscope |
| 01/19/2006 | US20060011836 Element mapping unit, scanning transmission electron microscope, and element mapping method |
| 01/19/2006 | US20060011831 Real-time S-parameter imager |
| 01/19/2006 | US20060011591 Control of plasma transitions in sputter processing systems |
| 01/19/2006 | US20060011583 Materials and gas chemistries for processing systems |
| 01/19/2006 | US20060011473 Discharging power source, sputtering power source, and sputtering device |
| 01/19/2006 | DE102005031537A1 Abbildender Energiefilter für Elektronen und andere elektrisch geladene Teilchen und Methode der Energiefilterung der Elektronen und anderen elektrisch geladenen Teilchen mit dem abbildenden Energiefilter in elektrooptischen Geräten The imaging energy filter for electrons and other charged particles and method of energy filtering of the electrons and other electrically charged particles with the imaging filter in electro-optical devices |
| 01/19/2006 | DE102004031528A1 Vorrichtung zur Bereitstellung einer Sonderatmosphäre mit einem Medienanschluss An apparatus for providing a special atmosphere with a media connection |
| 01/19/2006 | CA2567372A1 Cylindrical target with oscillating magnet from magnetron sputtering |
| 01/18/2006 | EP1617457A2 Ultra high speed uniform plasma processing system |
| 01/18/2006 | EP1617456A1 Driving mechanism for a vacuum treating system |
| 01/18/2006 | EP1617290A1 Apparatus and method for maskless lithography |
| 01/18/2006 | EP1616224A2 Micromachining process, system and product |
| 01/18/2006 | CN1723530A Cooled deposition baffle in high density plasma semiconductor processing |
| 01/18/2006 | CN1723529A Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
| 01/18/2006 | CN1723528A Stepped upper electrode for plasma processing uniformity |
| 01/18/2006 | CN1723527A Mounting mechanism for plasma extraction aperture |
| 01/18/2006 | CN1722356A Ferroelectric electron beam source and method for generating electron beams |
| 01/18/2006 | CN1237584C Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
| 01/18/2006 | CN1237204C High-density plasma chemical vapour-phase deposition equipment |
| 01/17/2006 | US6987364 Floating mode ion source |
| 01/17/2006 | US6987272 Work piece transfer system for an ion beam implanter |
| 01/17/2006 | US6987271 Chamber sensor port, chamber and electron beam processor |
| 01/17/2006 | US6987266 Structure determination of materials using electron microscopy |
| 01/17/2006 | US6987265 Method and an apparatus of an inspection system using an electron beam |
| 01/17/2006 | US6986280 Integrated measuring instrument |
| 01/12/2006 | WO2006004673A1 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 01/12/2006 | WO2006004399A2 Method and means for generation of a plasma at atmospheric pressure |
| 01/12/2006 | WO2006004259A1 Plasma chamber having plasma source coil and method for etching the wafer using the same |
| 01/12/2006 | WO2006003322A2 Ion implanter operating in pulsed plasma mode |
| 01/12/2006 | WO2006003321A1 Ion implanter power supply which is intended to limit the loading effect |
| 01/12/2006 | WO2005106508A3 Diagnostic system for profiling micro-beams |
| 01/12/2006 | WO2005062758A3 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 01/12/2006 | WO2005052979A3 Plasma source with segmented magnetron cathode |
| 01/12/2006 | WO2005003731A3 Laser stimulated atom probe characterization of semiconductor and dielectric structures |
| 01/12/2006 | WO2004077608A3 Antenna for producing uniform process rates |
| 01/12/2006 | US20060008929 Method and apparatus for the improvement of material/voltage contrast |
| 01/12/2006 | US20060008593 Device for carrying out a plasma-assisted process |
| 01/12/2006 | US20060007431 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 01/12/2006 | US20060006350 Lithographic projection apparatus and reflector assembly for use therein |
| 01/12/2006 | US20060006349 Optical switching in lithography system |
| 01/12/2006 | US20060006348 Apparatus and method for doping |
| 01/12/2006 | US20060006330 Sample observing apparatus and sample observing method |