| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/01/2006 | CN1244134C Plasma processing system, and method for delivering RF power to plasma processing chamber |
| 03/01/2006 | CN1244133C Method and apparatus for particle detection |
| 03/01/2006 | CN1243847C Plasma CVD apparatus |
| 02/28/2006 | US7006235 Methods and systems for determining overlay and flatness of a specimen |
| 02/28/2006 | US7006205 Method and system for event detection in plasma processes |
| 02/28/2006 | US7005845 Power measurement mechanism for a transformer coupled plasma source |
| 02/28/2006 | US7005795 Electron bombardment of wide bandgap semiconductors for generating high brightness and narrow energy spread emission electrons |
| 02/28/2006 | US7005660 Surface processing apparatus |
| 02/28/2006 | US7005659 Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus |
| 02/28/2006 | US7005658 Charged particle beam exposure apparatus and method |
| 02/28/2006 | US7005657 Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery |
| 02/28/2006 | US7005656 Ion implanter with vacuum-maintaining circuit board providing connections to internal faraday cups |
| 02/28/2006 | US7005652 Sample-stand for scanning electron microscope |
| 02/28/2006 | US7005651 Liquid metal ion gun |
| 02/28/2006 | US7005641 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus |
| 02/28/2006 | US7005640 Method and apparatus for the characterization of a depth structure in a substrate |
| 02/28/2006 | US7005638 Apparatus and method for reducing the electron-beam-induced deposition of contamination products |
| 02/28/2006 | US7004234 Vaporizer for generating feed gas for an arc chamber |
| 02/28/2006 | US7004108 Apparatus for fixing an electrode in plasma polymerizing apparatus |
| 02/28/2006 | US7004107 Method and apparatus for monitoring and adjusting chamber impedance |
| 02/23/2006 | WO2006020582A2 Cylinder magnetron with self cleaning target and collar |
| 02/23/2006 | WO2006019416A2 System and method for proximity effect correction in imaging systems |
| 02/23/2006 | WO2006018139A2 Device for producing excited and/or ionised particles in a plasma |
| 02/23/2006 | WO2005059962A3 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 02/23/2006 | US20060040415 Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring |
| 02/23/2006 | US20060040066 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device |
| 02/23/2006 | US20060038138 Apparatus for ion implantation |
| 02/23/2006 | US20060038133 Rotating specimen holder |
| 02/23/2006 | US20060037940 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 02/23/2006 | US20060037538 Holding device for a screen |
| 02/23/2006 | US20060037537 Vacuum-processing chamber-shield and multi-chamber pumping method |
| 02/23/2006 | US20060037182 Method and apparatus for the improvement of material/voltage contrast |
| 02/23/2006 | DE10224019B4 Drehbare Probenträgeraufnahmevorrichtung Rotatable sample holder cradle |
| 02/23/2006 | DE102005036521A1 Verfahren zum Testen von Pixeln für LCD TFT Displays A method for testing of pixels for LCD TFT displays |
| 02/23/2006 | DE102005033443A1 Semiconductor etching apparatus for use in fabrication of semiconductor device, comprises electrostatic chuck, edge ring and ring-shaped spacer within process chamber |
| 02/23/2006 | DE102004037781A1 Elektronenstrahlgerät Electron beam apparatus |
| 02/22/2006 | EP1628335A1 Surface treating method using ion beam and surface treating device |
| 02/22/2006 | EP1628324A2 Magnetron sputtering device |
| 02/22/2006 | EP1628323A2 Anode for sputter coating |
| 02/22/2006 | EP1628322A1 Support structure for a shield |
| 02/22/2006 | EP1628321A2 Method of three-dimensional image reconstruction and transmission electron microscope |
| 02/22/2006 | EP1627414A1 Magnetron sputter cathode comprising a cooling plate |
| 02/22/2006 | EP1627412A2 Charged particle beamlet exposure system |
| 02/22/2006 | EP1627411A2 Method and system for ion beam containment in an ion beam guide |
| 02/22/2006 | EP1627097A2 Deposition chamber surface enhancement and resulting deposition chambers |
| 02/22/2006 | EP1287544B1 Method and apparatus for controlling ion implantation during vacuum fluctuation |
| 02/22/2006 | CN2760749Y Field emission electron source device deflected by magnetic field |
| 02/22/2006 | CN1739185A End point detection in time division multiplexed etch processes |
| 02/22/2006 | CN1738923A Method and apparatus for treating a substrate |
| 02/22/2006 | CN1738920A Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment |
| 02/22/2006 | CN1737991A High productivity plasma processing chamber |
| 02/22/2006 | CN1737987A Emitter for an ion source and method of producing same |
| 02/22/2006 | CN1737532A Method for the removal of a microscopic sample from a substrate |
| 02/22/2006 | CN1736924A Holding device for a screen |
| 02/21/2006 | US7002167 Charged-particle beam writer |
| 02/21/2006 | US7002166 Method and system for single ion implantation |
| 02/21/2006 | US7002165 Apparatus and method for repairing resist latent images |
| 02/21/2006 | US7002152 Sample preparation for transmission electron microscopy |
| 02/21/2006 | US7002151 Scanning electron microscope |
| 02/21/2006 | US7002150 Thin specimen producing method and apparatus |
| 02/21/2006 | US7002149 Delay time modulation femtosecond time-resolved scanning probe microscope apparatus |
| 02/21/2006 | US7002147 Highly sensitive vacuum ion pump current measurement system |
| 02/21/2006 | US7002096 Surface modification process on metal dentures, products produced thereby, and the incorporated system thereof |
| 02/21/2006 | US7001856 Method of calculating a pressure compensation recipe for a semiconductor wafer implanter |
| 02/21/2006 | US7001709 Method of drawing a pattern on a base material by scanning a beam |
| 02/21/2006 | US7001530 Method for detecting the end point by using matrix |
| 02/21/2006 | US7001491 Vacuum-processing chamber-shield and multi-chamber pumping method |
| 02/21/2006 | US7001482 Method and apparatus for improved focus ring |
| 02/21/2006 | US7000565 Plasma surface treatment system and plasma surface treatment method |
| 02/21/2006 | US7000416 Cooling apparatus and plasma processing apparatus having cooling apparatus |
| 02/16/2006 | WO2006017252A1 Electron microscope phase enhancement |
| 02/16/2006 | WO2006017119A2 Inductively-driven plasma light source |
| 02/16/2006 | WO2006016613A1 Scanning type electron microscope |
| 02/16/2006 | WO2006016165A1 Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process |
| 02/16/2006 | WO2006015732A1 Electronic beam device |
| 02/16/2006 | WO2005045873A3 Plasma processing system and plasma treatment process |
| 02/16/2006 | WO2004107413A3 Plasma ashing apparatus and endpoint detection process |
| 02/16/2006 | US20060035396 Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process |
| 02/16/2006 | US20060034344 Apparatus and method for forming pattern |
| 02/16/2006 | US20060033050 Electron-beam drawing apparatus and electron-beam drawing method |
| 02/16/2006 | US20060033047 Method of controlling crystal surface morphology using metal adsorption |
| 02/16/2006 | US20060033046 Scanning systems and methods for providing ions from an ion beam to a workpiece |
| 02/16/2006 | US20060033045 Ion beam measurement systems and methods for ion implant dose and uniformity control |
| 02/16/2006 | US20060033038 Device and method for the examination of samples in a non vacuum environment using a scanning electron microscope |
| 02/16/2006 | US20060032741 Sputtering cathode adapter assembly and method |
| 02/16/2006 | US20060032738 Power delivery control and balancing between multiple loads |
| 02/16/2006 | US20060032586 Reducing electrostatic charge by roughening the susceptor |
| 02/16/2006 | US20060032287 Method and system for electron density measurement |
| 02/16/2006 | DE19837516B9 Verfahren und Vorrichtung zur Ausbildung einer dünnen Schicht Method and apparatus for forming a thin layer |
| 02/16/2006 | DE102004036063A1 Vorrichtung und Verfahren zur Plasmabeschichtung/Sterilisation Apparatus and method for plasma coating / sterilization |
| 02/15/2006 | EP1626613A1 Method and arrangement for controlling a glow discharge plasma under atmospheric conditions |
| 02/15/2006 | EP1626433A1 Magnetron sputtering device, cylinder cathode and a method of applying thin multi-component films to a substrate |
| 02/15/2006 | EP1626432A1 Magnetron sputtering device, cylinder cathode and a method of applying thin films of different materials to a substrate |
| 02/15/2006 | EP1625610A2 Plasma ashing apparatus and endpoint detection process |
| 02/15/2006 | EP1625605A2 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
| 02/15/2006 | EP1625604A1 High resolution separation magnet for ribbon beam ion implanters |
| 02/15/2006 | EP1625603A2 Generation of uniformly-distributed plasma |
| 02/15/2006 | EP0856070B1 Process for cleaning a vacuum processing chamber including the gas injection port |
| 02/15/2006 | CN2758967Y Ion source suspension reflecting electrode |
| 02/15/2006 | CN1735959A Exposure device, exposure method, and semiconductor device manufacturing method |