| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/16/2006 | WO2005091990A3 Method and apparatus for improved processing with a gas-cluster ion beam |
| 03/16/2006 | US20060057854 High frequency power supply device and plasma generator |
| 03/16/2006 | US20060057304 Biased pulse DC reactive sputtering of oxide films |
| 03/16/2006 | US20060057283 Biased pulse DC reactive sputtering of oxide films |
| 03/16/2006 | US20060055321 Hetero-junction electron emitter with group III nitride and activated alkali halide |
| 03/16/2006 | US20060055089 Zoned radiation crosslinked elastomeric materials |
| 03/16/2006 | US20060054840 Focused ion beam apparatus and aperture |
| 03/16/2006 | US20060054817 Dual detector optics for simultaneous collection of secondary and backscattered electrons |
| 03/16/2006 | US20060054816 System and method for voltage contrast analysis of a wafer |
| 03/16/2006 | US20060054814 Scanning electron microscope having multiple detectors and a method for multiple detector based imaging |
| 03/16/2006 | US20060054596 Multifrequency plasma reactor and method of etching |
| 03/16/2006 | US20060054496 Biased pulse DC reactive sputtering of oxide films |
| 03/16/2006 | US20060054493 Method for the production of a substrate and unit for the same |
| 03/16/2006 | US20060054280 Apparatus of manufacturing display substrate and showerhead assembly equipped therein |
| 03/16/2006 | DE10201992B4 Vorrichtung zur plasmagestützten Bearbeitung von Oberflächen planarer Substrate Apparatus for plasma-assisted processing of surfaces of planar substrates |
| 03/16/2006 | DE102005038796A1 System for illuminating an article, especially for microlithography, comprises devices for producing a parallel annular beam without any parts of the beam crossing |
| 03/15/2006 | EP1635374A1 Electron beam device, electron beam inspection method, electron beam inspection device, pattern inspection method and exposure condition determination method |
| 03/15/2006 | EP1635373A2 Method of correcting chromatic aberrations in charged particle beam and charged particle beam systems |
| 03/15/2006 | EP1634317A2 Deposition apparatus and method |
| 03/15/2006 | EP1634316A2 A hybrid magnetic/electrostatic deflector for ion implantation systems |
| 03/15/2006 | EP1449233B1 Microwave plasma generator |
| 03/15/2006 | EP1137054B1 Exposure system comprising a parallel link mechaniam and exposure method |
| 03/15/2006 | CN1747133A Method and apparatus for controlling the volume of a plasma |
| 03/15/2006 | CN1747131A Charged particle beam application system |
| 03/15/2006 | CN1747019A Electronic beam exposure device |
| 03/15/2006 | CN1245606C Process for measuring substance length by means of electron microscope |
| 03/14/2006 | US7012419 Fast Faraday cup with high bandwidth |
| 03/14/2006 | US7012268 Gas-shield electron-beam gun for thin-film curing application |
| 03/14/2006 | US7012266 MEMS-based two-dimensional e-beam nano lithography device and method for making the same |
| 03/14/2006 | US7012264 Lithographic apparatus and device manufacturing method |
| 03/14/2006 | US7012263 Ion source apparatus and electronic energy optimized method therefor |
| 03/14/2006 | US7012262 Corrector for correcting first-order chromatic aberrations of the first degree |
| 03/14/2006 | US7012261 Multipole lens, charged-particle beam instrument fitted with multipole lenses, and method of fabricating multipole lens |
| 03/14/2006 | US7012254 Method and device for observing a specimen in a field of view of an electron microscope |
| 03/14/2006 | US7012253 Transmission electron microscope and three-dimensional observing method |
| 03/14/2006 | US7012252 Method and an apparatus of an inspection system using an electron beam |
| 03/14/2006 | US7012251 Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method |
| 03/14/2006 | US7011927 Electron beam duplication lithography method and apparatus |
| 03/14/2006 | US7011915 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
| 03/14/2006 | US7011039 Multi-purpose processing chamber with removable chamber liner |
| 03/09/2006 | WO2006026765A2 Plasma ashing process for increasing photoresist removal rate and plasma apparatus wuth cooling means |
| 03/09/2006 | WO2006025737A1 Method and apparatus for the formation of nanometer-scale electrodes, and such electrodes |
| 03/09/2006 | WO2006025452A1 Ion beam irradiation apparatus and ion beam irradiation method |
| 03/09/2006 | US20060051966 In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber |
| 03/09/2006 | US20060051213 Restricted getter |
| 03/09/2006 | US20060049348 Charged particle beam column and method of its operation |
| 03/09/2006 | US20060049138 Plasma generation device, plasma control method, and substrate manufacturing method |
| 03/09/2006 | US20060048894 Dry etching apparatus, etching method, and method of forming a wiring |
| 03/09/2006 | US20060048893 Atmospheric pressure plasma processing reactor |
| 03/09/2006 | US20060048891 Method and apparatus for determining an etch property using an endpoint signal |
| 03/09/2006 | US20060048697 Monitoring and control of a fabrication process |
| 03/09/2006 | DE10358909B4 Plasma-CVD-Vorrichtung sowie Beschichtungsverfahren und Verfahren zur Herstellung eines Halbleiterbauteils unter Verwendung derselben Plasma CVD coating method and apparatus as well as method of manufacturing a semiconductor device using the same |
| 03/09/2006 | DE10352842B4 Bewegungsantrieb für eine Ionenstrahlbearbeitungsanlage Motion drive for an ion beam processing plant |
| 03/09/2006 | DE10313561B4 Verfahren zum Bearbeiten eines Drahtes A method for processing a wire |
| 03/09/2006 | DE10215193B4 Verfahren zur Kompensation von Streu-/Reflexionseffekten in der Teilchenstrahllithographie A method for compensating for scattering / reflection effects in the Teilchenstrahllithographie |
| 03/09/2006 | DE10203146B4 Einspannfutteranordnung eines Ätzgerätes zum Verhindern von Nebenprodukten Einspannfutteranordnung a Ätzgerätes for preventing by-products |
| 03/08/2006 | EP1632995A2 Oxygen free plasma stripping process |
| 03/08/2006 | EP1632994A1 Plasma processing apparatus and plasma processing method |
| 03/08/2006 | EP1632980A2 Scanning particle beam instrument |
| 03/08/2006 | EP1632006A2 Antenna for producing uniform process rates |
| 03/08/2006 | EP1300878B1 Device for plasma processing |
| 03/08/2006 | CN2763965Y Long service life ion source cathode |
| 03/08/2006 | CN1745453A Method and apparatus for plasma treatment of surface in vacuum |
| 03/08/2006 | CN1743859A Detection and suppression circuit and method of electrical arcing |
| 03/08/2006 | CN1244713C Sputtering device utilizing magnetic field to form metal film |
| 03/07/2006 | US7009411 Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam |
| 03/07/2006 | US7009281 Small volume process chamber with hot inner surfaces |
| 03/07/2006 | US7009193 Utilization of an ion gauge in the process chamber of a semiconductor ion implanter |
| 03/07/2006 | US7009192 Charged particle beam application apparatus |
| 03/07/2006 | US7009188 Lift-out probe having an extension tip, methods of making and using, and analytical instruments employing same |
| 03/07/2006 | US7009187 Particle detector suitable for detecting ions and electrons |
| 03/07/2006 | US7009178 Scanning electron microscope |
| 03/07/2006 | US7009177 Apparatus and method for tilted particle-beam illumination |
| 03/07/2006 | US7008862 Regular array of microscopic structures on a substrate and devices incorporating same |
| 03/07/2006 | US7008520 Sputtering device |
| 03/07/2006 | US7008484 Method and apparatus for deposition of low dielectric constant materials |
| 03/02/2006 | WO2006021958A2 Directed multi-deflected ion beam milling of a work piece and determining and controlling extent thereof |
| 03/02/2006 | WO2005114692A3 In-situ process chamber preparation methods for plasma ion implantation systems |
| 03/02/2006 | WO2005050705A3 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 03/02/2006 | WO2005038077A3 Modular device for coating surfaces |
| 03/02/2006 | US20060043982 Method and apparatus for inspecting integrated circuit pattern |
| 03/02/2006 | US20060043317 Cluster-ion beam irradiation apparatus and method for manufacturing magnetic head element using the same |
| 03/02/2006 | US20060043316 Ion implanter having enhanced low energy ion beam transport |
| 03/02/2006 | US20060043312 Enhanced scanning control of charged particle beam systems |
| 03/02/2006 | US20060043311 Thermal compensation in magnetic field influencing of an electron beam |
| 03/02/2006 | US20060043291 Electron spectroscopic metrology system |
| 03/02/2006 | US20060042546 Plasma processing apparatus and controlling method therefor |
| 03/02/2006 | US20060042545 Plasma treatment apparatus, method of producing reaction vessel for plasma generation, and plasma treatment method |
| 03/02/2006 | DE102004019835A1 Beleuchtungskondensor für ein Partikeloptik-Projektionssystem Illumination condenser for a particle optics projection system |
| 03/01/2006 | EP1631128A1 Plasma processing apparatus and method for producing same |
| 03/01/2006 | EP1630862A1 Sample inspection device and method, and device manufacturing method using the sample inspection device and method |
| 03/01/2006 | EP1630849A2 Localized plasma processing |
| 03/01/2006 | EP1630848A1 Process and apparatus for plasma coating of workpieces with spectral evaluation of process parameters |
| 03/01/2006 | EP1630250A1 Chemical vapor deposition film formed by plasma cvd process and method for forming same |
| 03/01/2006 | EP1438735B1 Methods and apparatus for plasma doping by anode pulsing |
| 03/01/2006 | EP1397525B1 Device for vacuum metallising large surfaces by plasma activation |
| 03/01/2006 | EP1044113B1 Plasma discharge device and method with dynamic tuning |
| 03/01/2006 | CN1742522A Plasma processor and plasma processing method |
| 03/01/2006 | CN1742356A Arc evaporation device |
| 03/01/2006 | CN1244138C Method for estimating plasma process quality and monitoring plasma technology |