| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/30/2006 | US20060065854 Ion beam system and machining method |
| 03/30/2006 | US20060065853 Apparatus and method for manipulating sample temperature for focused ion beam processing |
| 03/30/2006 | US20060065635 Deposition chamber surface enhancement and resulting deposition chambers |
| 03/30/2006 | US20060065624 Irradiating the photoresist layer through a mask to generate a photoacid in the resist, heating to evaporate water from the resist; heating to deprotects the resist; immersion lithography for lowering the water variation in a resist |
| 03/30/2006 | US20060065517 Target and method of diffusion bonding target to backing plate |
| 03/30/2006 | US20060065195 Microwave plasma generating device |
| 03/30/2006 | DE102005046188A1 Mask for irradiating with electron beams in a lithographic process for producing semiconductor components has opening sections for correcting a proximity effect |
| 03/30/2006 | DE102004044357A1 Component surface treatment executing device, has process chamber attached to one of openings, vacuum pump attached to chamber, and connection supplying electrical energy into receiving chambers for treatment of component |
| 03/30/2006 | DE102004044083A1 Verfahren zur Strukturierung eines Substrats und Vorrichtung hierzu A process for patterning a substrate and device for this purpose |
| 03/30/2006 | CA2580814A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/29/2006 | EP1641034A2 Pattern film repair using a gas assisted focused particle beam system |
| 03/29/2006 | EP1641020A2 Corrector for the correction of first-order colour aberrations, first grade |
| 03/29/2006 | EP1640712A1 Time resolution measurement device and position detection electron multiplier |
| 03/29/2006 | EP1640711A1 Time-resolved measurement apparatus |
| 03/29/2006 | EP1640474A1 Thin film forming device and thin film forming method |
| 03/29/2006 | EP1639620A2 Method and design for sputter target attachment to a backing plate |
| 03/29/2006 | EP1639619A1 Method and device for removing layers in some areas of glass plates |
| 03/29/2006 | EP1639618A2 High resolution atom probe |
| 03/29/2006 | EP0953204B1 Capacitively coupled rf-plasma reactor and method for manufacturing workpieces |
| 03/29/2006 | CN1754409A Plasma processing system |
| 03/29/2006 | CN1754249A Neutral particle beam lithography |
| 03/29/2006 | CN1754245A An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/29/2006 | CN1754128A Method for producing resist substrates |
| 03/29/2006 | CN1753130A Electron source apparatus |
| 03/29/2006 | CN1248549C Induction coupling plasma generating equipment containing zigzag coil antenna |
| 03/29/2006 | CN1248289C Inductive coupling type plasma device |
| 03/28/2006 | US7019908 Modulator circuitry |
| 03/28/2006 | US7019543 Impedance monitoring system and method |
| 03/28/2006 | US7019316 High-energy ion implanter and method of operation thereof |
| 03/28/2006 | US7019315 System and method for serial ion implanting productivity enhancements |
| 03/28/2006 | US7019314 Systems and methods for ion beam focusing |
| 03/28/2006 | US7019313 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 03/28/2006 | US7019308 Thermal compensation in magnetic field influencing of an electron beam |
| 03/28/2006 | US7019294 Inspection method and apparatus using charged particle beam |
| 03/28/2006 | US7019293 Position detecting system and method |
| 03/28/2006 | US7019292 E-beam detection of defective contacts/vias with flooding and energy filter |
| 03/28/2006 | US7019253 includes chamber and coil system for converting field-generating current into radio frequency magnetic field in the chamber containing ionized gas which reacts with the magnetic plasma |
| 03/28/2006 | US7018940 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 03/28/2006 | US7018553 Optical monitoring and control system and method for plasma reactors |
| 03/28/2006 | US7018515 Selectable dual position magnetron |
| 03/28/2006 | US7018506 Plasma processing apparatus |
| 03/28/2006 | US7018505 Apparatus including chuck and matching box |
| 03/28/2006 | US7017269 Suspended gas distribution plate |
| 03/23/2006 | WO2006031559A2 Controlled dose ion implantation |
| 03/23/2006 | WO2006031104A1 Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof |
| 03/23/2006 | WO2006007062A3 Msvd coating process |
| 03/23/2006 | WO2006000186A3 Device for providing a special atmosphere with a media connection |
| 03/23/2006 | WO2005119361A3 Apparatus for blanking a charged particle beam |
| 03/23/2006 | WO2005111268A3 Apparatus including showerhead electrode and heater for plasma processing |
| 03/23/2006 | WO2005104171A3 Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams |
| 03/23/2006 | WO2005020264A3 Multiple frequency plasma etch reactor |
| 03/23/2006 | US20060063078 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
| 03/23/2006 | US20060062931 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 03/23/2006 | US20060060800 Variably shaped beam EB writing system |
| 03/23/2006 | US20060060797 Ion implanters having an arc chamber that affects ion current density |
| 03/23/2006 | US20060060796 Method and apparatus for plasma source ion implantation in metals and non-metals |
| 03/23/2006 | US20060060795 Ion beam irradiation device and insulating spacer for the device |
| 03/23/2006 | US20060060794 Method of preventing charging, and apparatus for charged particle beam using the same |
| 03/23/2006 | US20060060789 Focusing system and method for a charged particle imaging system |
| 03/23/2006 | US20060060783 Scanning particle beam instrument |
| 03/23/2006 | US20060060566 Method and device for substrate etching with very high power inductively coupled plasma |
| 03/23/2006 | US20060060465 Apparatus for forming nanoholes and method for forming nanoholes |
| 03/23/2006 | US20060060303 Plasma processing system and method |
| 03/23/2006 | US20060060141 Process gas introducing mechanism and plasma processing device |
| 03/23/2006 | DE4326100B4 Verfahren und Vorrichtung zum Beschichten von Substraten in einer Vakuumkammer, mit einer Einrichtung zur Erkennung und Unterdrückung von unerwünschten Lichtbögen Method and device for coating substrates in a vacuum chamber, with a device for detection and suppression of unwanted arcs |
| 03/23/2006 | DE102004063643A1 Ions implantation apparatus for use during transistor manufacture, has beam parallelizer to rotate converged/diverged ion beam in synchronization with quadrupole magnet assembly, to implant ions into wafer |
| 03/22/2006 | EP1638376A1 Plasma generating electrode, plasma generation device, and exhaust gas purifying apparatus |
| 03/22/2006 | EP1638139A1 Plasma processing device |
| 03/22/2006 | EP1637624A1 Thin film forming device and thin film forming method |
| 03/22/2006 | EP1636821A2 Electrostatic parallelizing lens for ion beams |
| 03/22/2006 | EP1636820A2 Thin magnetron structures for plasma generation in ion implantation systems |
| 03/22/2006 | EP1636819A2 Particle detector suitable for detecting lons and electrons |
| 03/22/2006 | EP1479090B1 Channel spark source for generating a stably focussed electron beam |
| 03/22/2006 | EP1279183B1 A nanotube-based electron emission device and systems using the same |
| 03/22/2006 | CN1751384A Plasma process device |
| 03/22/2006 | CN1751376A Power supply control unit |
| 03/22/2006 | CN1751375A Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
| 03/22/2006 | CN1750231A Method and apparatus for removing material from a substrate surface |
| 03/22/2006 | CN1246887C Plasma processing device and semiconductor mfg. device |
| 03/22/2006 | CN1246881C Method and equipment of ion implantation |
| 03/22/2006 | CN1246699C High resolution analytical probe station |
| 03/22/2006 | CN1246681C Method for forming nano gas layer on pyrolytic graphite surface based on alcohol-water substitution |
| 03/21/2006 | US7015487 Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose |
| 03/21/2006 | US7015483 Focused ion beam system |
| 03/21/2006 | US7015482 Electron beam writing equipment using plural beams and method |
| 03/21/2006 | US7015481 Charged-particle optical system |
| 03/21/2006 | US7015469 Electron holography method |
| 03/21/2006 | US7015468 Methods of stabilizing measurement of ArF resist in CD-SEM |
| 03/21/2006 | US7015467 Generating electrons with an activated photocathode |
| 03/21/2006 | US7015415 Higher power density downstream plasma |
| 03/21/2006 | US7015414 Method and apparatus for determining plasma impedance |
| 03/21/2006 | US7015413 Plasma generation system having a refractor |
| 03/21/2006 | US7014889 Process and apparatus for plasma activated depositions in a vacuum |
| 03/21/2006 | US7014787 Etching method of organic insulating film |
| 03/21/2006 | US7014741 Cylindrical magnetron with self cleaning target |
| 03/21/2006 | US7014738 Enhanced macroparticle filter and cathode arc source |
| 03/21/2006 | US7013834 Plasma treatment system |
| 03/16/2006 | WO2006028619A1 System and method for optimizing data acquisition of plasma using a feedback control module |
| 03/16/2006 | WO2006028402A1 Analytic head for detecting trace contaminants in gases |
| 03/16/2006 | WO2005098895A9 Method and system for ultrafast photoelectron microscope |