Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2014
11/04/2014US8877301 Plasma processing including asymmetrically grounding a susceptor
11/04/2014US8877299 Method for enhancing a substrate using gas cluster ion beam processing
11/04/2014US8877081 Etching method and etching apparatus
11/04/2014US8877080 Using vacuum ultra-violet (VUV) data in microwave sources
11/04/2014US8877079 Method and apparatus for manufacturing a semiconductor device
11/04/2014US8877019 Sputtering apparatus, sputter deposition method, and analysis apparatus
11/04/2014US8877005 Plasma processing apparatus and electrode used therein
11/04/2014US8877004 Plasma processing apparatus and plasma processing method
11/04/2014US8877003 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
11/04/2014US8877002 Internal member of a plasma processing vessel
11/04/2014US8877000 Shower head gas injection apparatus with secondary high pressure pulsed gas injection
11/04/2014US8876024 Heated showerhead assembly
10/2014
10/30/2014US20140324186 Medical Implants with Enhanced Osseointegration
10/30/2014US20140322927 Drawing apparatus and method of manufacturing article
10/30/2014US20140322833 Irradiation apparatus for irradiating charged particle beam, method for irradiation of charged particle beam, and method for manufacturing article
10/30/2014US20140322831 Lithography apparatus, lithography method, and method of manufacturing article
10/30/2014US20140322655 Stage apparatus, lithography apparatus, and method of manufacturing article
10/30/2014US20140322654 Lithography apparatus, and method for manufacturing article
10/30/2014US20140322653 Drawing apparatus, and method of manufacturing article
10/30/2014US20140322525 Surface polymer coatings
10/30/2014US20140320017 Plasma generating device, method of controlling the same, and substrate processing device including the plasma generating device
10/30/2014US20140320016 Plasma generating apparatus and substrate treating apparatus
10/30/2014US20140320015 Reducing stored electrical energy in a lead inductance
10/30/2014US20140320014 Pulse mode capability for operation of an rf/vhf impedance matching network with 4 quadrant, vrms/irms responding detector circuitry
10/30/2014US20140320013 Multiple Radio Frequency Power Supply Control of Frequency and Phase
10/30/2014US20140320012 Self-cleaning radio frequency plasma source
10/30/2014US20140319994 Flourine and HF Resistant Seals for an Ion Source
10/30/2014US20140319384 Charged particle beam drawing apparatus, format check apparatus and format check method
10/30/2014US20140319373 Charged particle beam drawing apparatus and charged particle beam drawing method
10/30/2014US20140319372 Mask cover, charged particle beam drawing apparatus and charged particle beam drawing method
10/30/2014US20140319371 Sample holder and charged particle beam apparatus using same
10/30/2014US20140319370 Ion beam device
10/30/2014US20140319369 Ion source and a method for in-situ cleaning thereof
10/30/2014US20140319368 Particle beam irradiation apparatus
10/30/2014US20140319367 Drawing apparatus, and method of manufacturing article
10/30/2014US20140319347 Mounting structures for multi-detector electron microscopes
10/30/2014US20140319346 Inspection system by charged particle beam and method of manufacturing devices using the system
10/30/2014US20140319345 Inspection apparatus
10/30/2014US20140319344 Multiple image metrology
10/30/2014US20140319343 Circuit tracing using a focused ion beam
10/30/2014US20140319342 Method and System for Adaptively Scanning a Sample During Electron Beam Inspection
10/30/2014US20140319341 Charged particle microscope apparatus and image acquisition method of charged particle microscope apparatus
10/30/2014US20140319339 Nanopore Fabrication And Applications Thereof
10/30/2014US20140319098 Inert-dominant pulsing in plasma processing systems
10/30/2014US20140318956 Sputtering target and method for producing the same
10/30/2014US20140318955 Fept-based sputtering target
10/30/2014US20140318954 Fept-based sputtering target
10/30/2014US20140318953 Sputtering target and manufacturing method therefor
10/30/2014US20140318948 Silicon target for sputtering film formation and method for forming silicon-containing thin film
10/30/2014US20140318947 Sputter target and sputtering methods
10/30/2014US20140318710 Apparatus for generating plasma using electromagnetic field applicator and apparatus for treating substrate comprising the same
10/30/2014US20140318318 Non-plugging d.c. plasma gun
10/28/2014US8872525 System, method and apparatus for detecting DC bias in a plasma processing chamber
10/28/2014US8872144 System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
10/28/2014US8872141 Charged particle beam writing apparatus and charged particle beam writing method
10/28/2014US8872140 Target for generating carbon ions and treatment apparatus using the same
10/28/2014US8872139 Settling time acquisition method
10/28/2014US8872129 Microscopy support structures
10/28/2014US8872128 Sample holder providing interface to semiconductor device with high density connections
10/28/2014US8872106 Pattern measuring apparatus
10/28/2014US8872105 In situ reactivation of fluorescence marker
10/28/2014US8872059 Etching system and method of controlling etching process condition
10/28/2014US8871066 Sample receiving device for sample materials in ultra-high vacuum chambers
10/28/2014US8871064 Electromagnet array in a sputter reactor
10/28/2014US8870164 Substrate processing method and storage medium
10/28/2014US8869742 Plasma processing chamber with dual axial gas injection and exhaust
10/28/2014US8869741 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
10/23/2014US20140315043 Sputtering target for forming protective film, and laminated wiring film
10/23/2014US20140314968 Ionisation device
10/23/2014US20140313561 Electrochromic devices
10/23/2014US20140312767 Dielectric window for plasma treatment device, and plasma treatment device
10/23/2014US20140312766 Symmetrical plural-coil plasma source with side rf feeds and rf distribution plates
10/23/2014US20140312761 Plasma source and vacuum plasma processing apparatus provided with same
10/23/2014US20140312246 Sample positioning apparatus, sample stage, and charged particle beam apparatus
10/23/2014US20140312245 Multi-source plasma focused ion beam system
10/23/2014US20140312227 Inspection apparatus
10/23/2014US20140312226 Charged-particle microscope providing depth-resolved imagery
10/23/2014US20140312225 Defect inspection apparatus and defect inspection method
10/23/2014US20140312224 Pattern inspection method and pattern inspection apparatus
10/23/2014US20140311902 Magnetic Material Sputtering Target and Manufacturing Method Thereof
10/23/2014US20140311901 Magnetron sputtering target and method for manufacturing the same
10/23/2014US20140311900 Silicon sputtering target with special surface treatment and good particle performance and methods of making the same
10/23/2014US20140311899 Ferromagnetic Material Sputtering Target
10/23/2014US20140311895 Glow Discharge Apparatus and Method with Lateral Rotating Arc Cathodes
10/23/2014US20140311893 Sputtering system and method using direction-dependent scan speed or power
10/23/2014US20140311676 Substrate mounting table and plasma treatment device
10/21/2014US8867818 Method of creating template for matching, as well as device for creating template
10/21/2014US8866102 Electron beam device with tilting and dispersion compensation, and method of operating same
10/21/2014US8866080 Faraday cup array integrated with a readout IC and method for manufacture thereof
10/21/2014US8866078 Scanning transmission type electron microscope
10/21/2014US8866075 Apparatus preparing samples to be supplied to an ion mobility sensor
10/21/2014US8865008 Two step method to fabricate small dimension devices for magnetic recording applications
10/21/2014US8864959 Method for manufacturing workpieces with ion-etched surface
10/21/2014US8864958 Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index
10/21/2014US8864956 Multi-component deposition
10/21/2014US8864936 Apparatus and method for processing substrate
10/21/2014US8864932 Plasma processing apparatus, electrode temperature adjustment device and electrode temperature adjustment method
10/16/2014US20140308461 Microwave plasma reactor for manufacturing synthetic diamond material
10/16/2014US20140306607 Methods and Structures for Rapid Switching Between Different Process Gases in an Inductively-Coupled Plasma (ICP) Ion Source
10/16/2014US20140306603 Method and apparatus for irradiating a semi-conductor wafer with ultraviolet light
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