| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/18/2006 | US7030393 Compact self-shielded irradiation system and method |
| 04/18/2006 | US7030389 Electron beam apparatus having electron analyzer and method of controlling lenses |
| 04/18/2006 | US7030388 Illuminant, and, electron beam detector, scanning electron microscope and mass spectroscope each including the same |
| 04/18/2006 | US7030376 Electron beam apparatus and method for production of its specimen chamber |
| 04/18/2006 | US7030335 overhead electrode has a reactance that forms a resonance with the plasma at an electrode-plasma resonant frequency which is at or near frequency of generator |
| 04/18/2006 | US7029594 Plasma processing method |
| 04/18/2006 | US7028696 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method |
| 04/13/2006 | WO2006039724A2 Bellows liner for an ion beam implanter |
| 04/13/2006 | WO2006039677A2 Semiconductor doping using substrate tilting |
| 04/13/2006 | WO2006037991A2 Microwave plasma apparatus with vorticular gas flow |
| 04/13/2006 | WO2006037704A1 Device and method for characterizing plasma |
| 04/13/2006 | WO2006037675A1 Lighting system for a corpuscular radiation device, and method for lighting by means of a corpuscular beam |
| 04/13/2006 | WO2005122208A3 Charged particle beam device with retarding field analyzer |
| 04/13/2006 | WO2005103319A3 Device for introducing an electric arc source into a coating chamber for large-size substrates or strips |
| 04/13/2006 | WO2005090638A3 Remote chamber methods for removing surface deposits |
| 04/13/2006 | WO2004095626A3 Plasma production device and method and rf driver circuit with adjustable duty cycle |
| 04/13/2006 | US20060078688 Methods of making orthodontic appliances |
| 04/13/2006 | US20060077397 Semiconductor fabricating apparatus with function of determining etching processing state |
| 04/13/2006 | US20060076904 Power supply unit for gas discharge processes |
| 04/13/2006 | US20060076866 Electron source |
| 04/13/2006 | US20060076512 Ion implantation apparatus |
| 04/13/2006 | US20060076510 Ion beam implant current, spot width and position tuning |
| 04/13/2006 | US20060076491 Mask inspection apparatus, mask inspection method, and electron beam exposure system |
| 04/13/2006 | US20060076490 Inspection method and inspection apparatus using electron beam |
| 04/13/2006 | US20060076232 Variable positioning of the magnetron creating a magnetic field to enhance sputtering; two-steps of depositing a barrier metal on a substrate while scanning the outer edge of a target with a small magnetron moving in an outer circular path; cleaning by moving the magnetron towards the center |
| 04/13/2006 | US20060075966 Apparatus and method for plasma assisted deposition |
| 04/13/2006 | DE19951317B4 Dichtmechanismus zum Abdichten einer Vakkumkammer Sealing mechanism for sealing a Vakkumkammer |
| 04/12/2006 | EP1646067A2 Charged particle beam apparatus and dimension measuring method |
| 04/12/2006 | EP1644954A2 Method for anisotropically etching a recess in a silicon substrate and use of a plasma etching system |
| 04/12/2006 | EP1644559A1 Method for the production of polymer moulded bodies |
| 04/12/2006 | CN1759474A Plasma processing apparatus and method |
| 04/12/2006 | CN1759473A Substrate supporting structure for semiconductor processing, and plasma processing device |
| 04/12/2006 | CN1759465A Apparatus for generating a plurality of beamlets |
| 04/12/2006 | CN1759204A Microwave plasma processing device and plasma processing gas supply member |
| 04/12/2006 | CN1759203A Hybrid ball-lock attachment apparatus |
| 04/12/2006 | CN1758409A Ion sources and ion implanters and methods including the same |
| 04/12/2006 | CN1251294C Temperature control system for plasma processing apparatus |
| 04/12/2006 | CN1251293C Materials and gas chemistries for processing systems |
| 04/11/2006 | US7027888 Semiconductor manufacturing apparatus |
| 04/11/2006 | US7026830 Method and apparatus for inspecting integrated circuit pattern |
| 04/11/2006 | US7026764 carbon nano tube is used for cathode electrode of plasma producing apparatus, typically, a doping apparatus, etching apparatus, and film forming apparatus; for producing stable plasma of high density |
| 04/11/2006 | US7026634 Method and apparatus for forming optical materials and devices |
| 04/11/2006 | US7026633 Ion implantation system with an interlock function |
| 04/11/2006 | US7026628 Advanced ion beam detector for ion implantation tools |
| 04/11/2006 | US7026615 Semiconductor inspection system |
| 04/11/2006 | US7026614 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument |
| 04/11/2006 | US7026173 Method and apparatus for detecting end point |
| 04/11/2006 | US7026098 Accurate, uniform, high speed; micropatterns; entire disk surface; unidirectional rotation |
| 04/11/2006 | US7025895 Plasma processing apparatus and method |
| 04/11/2006 | US7025863 Vacuum system with separable work piece support |
| 04/11/2006 | US7025857 Plasma treatment apparatus, matching box, impedance matching device, and coupler |
| 04/11/2006 | US7025856 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 04/11/2006 | US7024925 3-axis straight-line motion stage and sample test device using the same |
| 04/06/2006 | WO2006036846A1 Apparatus for generating high-current electrical discharges |
| 04/06/2006 | WO2006036221A1 Spatial-phase locking of energy beams for determining two-dimensional location and beam shape |
| 04/06/2006 | WO2006034598A1 Method for the production of magnetron-coated substrates and magnetron sputter source |
| 04/06/2006 | WO2006019416A3 System and method for proximity effect correction in imaging systems |
| 04/06/2006 | WO2006009882A3 Methods and devices for atom probe mass resolution enhancement |
| 04/06/2006 | US20060073685 Method for implanting dopants within a substrate by tilting the substrate relative to the implant source |
| 04/06/2006 | US20060073683 Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| 04/06/2006 | US20060073619 Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process |
| 04/06/2006 | US20060072807 Methods and systems for determining a presence of macro and micro defects on a specimen |
| 04/06/2006 | US20060071183 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 04/06/2006 | US20060071182 Method of processing semiconductor apparatus |
| 04/06/2006 | US20060071181 Bellows liner for an ion beam implanter |
| 04/06/2006 | US20060071176 Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials |
| 04/06/2006 | US20060071175 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof |
| 04/06/2006 | US20060071167 Scanning electron microscope |
| 04/05/2006 | EP1643535A2 Method and equipment for specimen preparation |
| 04/05/2006 | EP1643232A1 Thin piece specimen preparing method and composite charged particle beam device |
| 04/05/2006 | EP1643001A1 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 04/05/2006 | EP1642328A1 Traps for particle entrapment in deposition chambers |
| 04/05/2006 | EP1642314A2 System and method for inductive coupling of an expanding thermal plasma |
| 04/05/2006 | EP1642313A2 Detector system for a scanning electron microscope and scanning electron microscope with a corresponding detector system |
| 04/05/2006 | EP1641956A1 Rotating tubular sputter target assembly |
| 04/05/2006 | CN1757266A Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 04/05/2006 | CN1757091A Vacuum sputtering cathode |
| 04/05/2006 | CN1756859A Tubular workpiece internal surface modifying method and its special-purpose device |
| 04/05/2006 | CN1754978A Methods and apparatus for reducing arcing during plasma processing |
| 04/05/2006 | CN1249789C Plasma processing container internal parts |
| 04/05/2006 | CN1249786C Method and apparatus for plasma cleaning of workpieces |
| 04/05/2006 | CN1249401C Method and apparatus for wall film monitoring |
| 04/04/2006 | US7023530 Dual source lithography for direct write application |
| 04/04/2006 | US7023003 Ion implanter and method of preventing undesirable ions from implanting a target wafer |
| 04/04/2006 | US7023002 Surface treating device and surface treating method |
| 04/04/2006 | US7022999 Ion implantation ion source, system and method |
| 04/04/2006 | US7022989 Method and device for observing a specimen in a field of view of an electron microscope |
| 04/04/2006 | US7022988 Method and apparatus for measuring physical properties of micro region |
| 04/04/2006 | US7022987 Particle-optical arrangements and particle-optical systems |
| 04/04/2006 | US7022986 Apparatus and method for wafer pattern inspection |
| 04/04/2006 | US7022983 Monochromator and scanning electron microscope using the same |
| 04/04/2006 | US7022616 High speed silicon etching method |
| 04/04/2006 | US7022615 Plasma processing method |
| 04/04/2006 | US7022439 Receiving the mask layout, and examining the polygon to determine if the polygon includes a hole exit route next to a notch; and if so, moving an exit route from the hole so that a resulting fracturing of the polygon does not create a sliver with a width less than a pre-specified minimum size |
| 04/04/2006 | US7022209 PVD method and PVD apparatus |
| 03/30/2006 | WO2006033834A2 Improved ion beam utilization during scanned ion implantation |
| 03/30/2006 | WO2006032925A1 Material deposition apparatus and method |
| 03/30/2006 | WO2005122209A3 Plasma processing control |
| 03/30/2006 | WO2005094244A3 System, method and apparatus for self-cleaning dry etch |
| 03/30/2006 | US20060068081 Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program |