| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/03/2006 | EP1651378A2 Method and device for non-vacuum electron beam welding metallic materials |
| 05/03/2006 | EP1218919B1 Electron image detector coupled by optical fibers with absorbing outer cladding to reduce blurring |
| 05/03/2006 | EP1105917B1 Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 05/03/2006 | EP1019942B1 Electron beam microscope using electron beam patterns |
| 05/03/2006 | CN1768341A A method for adjoining adjacent coatings on a processing element |
| 05/03/2006 | CN1254844C Method and device for separating ion mass, and ion doping device |
| 05/02/2006 | US7039487 Exposure apparatus and exposure method |
| 05/02/2006 | US7038767 Three-dimensional micropattern profile measuring system and method |
| 05/02/2006 | US7038389 Magnetron plasma source |
| 05/02/2006 | US7038364 Processor and method for processing |
| 05/02/2006 | US7038226 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 05/02/2006 | US7038225 Method and apparatus for electron beam processing of substrates |
| 05/02/2006 | US7038224 Contact opening metrology |
| 05/02/2006 | US7038223 Controlled charge neutralization of ion-implanted articles |
| 05/02/2006 | US7038218 Inspection by a transmission electron microscope of a sample |
| 05/02/2006 | US7038204 Method for reducing proximity effects in electron beam lithography |
| 05/02/2006 | US7037846 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 05/02/2006 | US7037813 Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| 05/02/2006 | US7037735 Apparatus and method for testing defects |
| 05/02/2006 | US7036980 Apparatus and method for forming pattern |
| 04/27/2006 | WO2006044722A2 Apparatus and methods for improving the stability of rf power delivery to a plasma load |
| 04/27/2006 | WO2006044419A2 Magnetic-field concentration in inductively coupled plasma reactors |
| 04/27/2006 | WO2006044021A1 Substrate carrier for parallel wafer processing reactor |
| 04/27/2006 | WO2006043366A1 Voltage division resistor for acceleration tubes, acceleration tube, and accelerator |
| 04/27/2006 | WO2005123979A3 Method and device for plasma-treating workpieces |
| 04/27/2006 | WO2005099320A3 Method and device for producing low-pressure plasma and the use thereof |
| 04/27/2006 | US20060088989 Method of introducing impurity, device and element |
| 04/27/2006 | US20060086605 Method for magnetron sputtering |
| 04/27/2006 | US20060086322 Device for production of a plasma sheet |
| 04/27/2006 | DE4405747B4 Magnetfeldunterstützte Zerstäubungsanordnung und hiermit ausgerüstete Vakuumbehandlungsanlage Magnetic field-assisted atomization system and hereby equipped vacuum treatment plant |
| 04/27/2006 | DE102004019741B4 Plasmareaktor zur Oberflächenmodifikation von Gegenständen A plasma reactor for surface modification of articles |
| 04/27/2006 | DE102004010535B4 Movement drive for use in e.g. ion processing equipment, has pendulum holding devices with axles that intersect at right angles, such that oscillating motion of torque motors, arranged outside vacuum container, is directly realized at axles |
| 04/26/2006 | EP1650326A2 Plasma processing apparatus |
| 04/26/2006 | EP1650324A2 Sputter coating system and method of sputter coating |
| 04/26/2006 | EP1650321A2 A sputtering system |
| 04/26/2006 | EP1649485A2 Laser stimulated atom probe characterization of semiconductor and dielectric structures |
| 04/26/2006 | EP1649484A1 Sliding anode for a magnetron sputtering source |
| 04/26/2006 | EP1649483A1 A method for manufacturing a lens assembly of microcolumn and a lens assembly of microcolumn manufactured by the same |
| 04/26/2006 | EP1649269A2 Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system |
| 04/26/2006 | EP1626433A9 Magnetron sputtering device, cylinder cathode and a method of applying thin multi-component films to a substrate |
| 04/26/2006 | EP1012865A4 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 04/26/2006 | CN1765008A Plasma igniting method and substrate processing method |
| 04/26/2006 | CN1765007A Production method for antenna and production device for antenna |
| 04/26/2006 | CN1764738A Apparatus and method for depositing large area coating on explanate surface |
| 04/26/2006 | CN1764736A Apparatus and methods for ionized deposition of a film or thin layer |
| 04/26/2006 | CN1764596A Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| 04/26/2006 | CN1253918C Plasma processing system and method therefor |
| 04/26/2006 | CN1253917C Vacuum circuit for device for treating receptacle with low pressure plasma |
| 04/25/2006 | US7034543 Method of predicting a lifetime of filament in ion source and ion source device |
| 04/25/2006 | US7034321 Electron beam exposure apparatus and electron beam measurement module |
| 04/25/2006 | US7034319 Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium |
| 04/25/2006 | US7034318 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 04/25/2006 | US7034316 Sample carrier for carrying a sample to be irradiated with an electron beam |
| 04/25/2006 | US7034315 Particle source with selectable beam current and energy spread |
| 04/25/2006 | US7034314 Projection apparatus for projecting a pattern formed on a mask onto a substrate and a control method for a projection apparatus |
| 04/25/2006 | US7034299 Transmission electron microscope system and method of inspecting a specimen using the same |
| 04/25/2006 | US7034298 Inspection method and apparatus using an electron beam |
| 04/25/2006 | US7034297 Method and system for use in the monitoring of samples with a charged particle beam |
| 04/25/2006 | US7034296 Method of forming a sample image and charged particle beam apparatus |
| 04/25/2006 | US7034295 Photoemission electron microscopy and measuring method using the microscopy |
| 04/25/2006 | US7034285 Beam source and beam processing apparatus |
| 04/25/2006 | US7033937 Apparatus and method for use in manufacturing a semiconductor device |
| 04/25/2006 | US7033462 Generation and control of a magnetic field by a magnetic filter. |
| 04/25/2006 | US7032536 Thin film formation apparatus including engagement members for support during thermal expansion |
| 04/20/2006 | WO2006042167A1 Ion beam implant current, spot width and position tuning |
| 04/20/2006 | WO2006040559A1 A particle beam generating device |
| 04/20/2006 | WO2006014632A3 Improved magnet for scanning ion beams |
| 04/20/2006 | WO2005048284A3 Rotating sputtering magnetron |
| 04/20/2006 | US20060084269 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same |
| 04/20/2006 | US20060082755 Stage system, exposure apparatus, and device manufacturing method |
| 04/20/2006 | US20060082225 Linear motor, moving stage system, exposure apparatus, and device manufacturing method |
| 04/20/2006 | US20060081564 Method and system for arc suppression in a plasma processing system |
| 04/20/2006 | US20060081558 Plasma immersion ion implantation process |
| 04/20/2006 | US20060081183 Plasma treatment processing apparatus |
| 04/20/2006 | US20060080851 Process for monitoring measuring device performance |
| 04/20/2006 | DE19853943B4 Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode Cathode atomization or Bogenaufdampfung and apparatus for coating or ion implantation with such a cathode |
| 04/20/2006 | DE102005049233A1 Verfahren und Vorrichtung zum Zerstäuben Method and apparatus for atomizing |
| 04/20/2006 | DE102005049066A1 Elektronenstrahl-Einrichtung und Verfahren zum Herstellen einer Halbleitervorrichtung Electron beam device and method of manufacturing a semiconductor device |
| 04/20/2006 | DE102005048677A1 Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben The same transmission electron microscope and image viewing method using |
| 04/20/2006 | DE102004048892A1 Beleuchtungssystem für eine Korpuskularstrahleinrichtung und Verfahren zur Beleuchtung mit einem Korpuskularstrahl An illumination system for a corpuscular beam device and method of illuminating with a particle beam |
| 04/20/2006 | DE102004014430A1 Vorrichtung und Verfahren zur nasschemischen Präparation von hochreinen Festkörperoberflächen Apparatus and method for wet chemical preparation of highly pure solid surfaces |
| 04/20/2006 | DE10038145B4 Einrichtung zur Behandlung von Werkstücken mit Elektronenstrahlen Apparatus for the treatment of work pieces using electron beams |
| 04/19/2006 | EP1648018A1 Focussing lens and charged particle beam device for non zero landing angle operation |
| 04/19/2006 | EP1647054A2 Plasma processing apparatus |
| 04/19/2006 | EP1647049A2 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 04/19/2006 | EP1579027B1 Plasma-enhanced film deposition |
| 04/19/2006 | EP1392883A4 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies |
| 04/19/2006 | CN1762087A Power supply unit for gas discharge processes |
| 04/19/2006 | CN1762044A Substrate processor and method of manufacturing device |
| 04/19/2006 | CN1762039A Method and apparatus for cleaning of native oxide with hydrogen-containing radicals |
| 04/19/2006 | CN1761832A Universal vacuum coupling for cylindrical target |
| 04/19/2006 | CN1252792C Electrode assembly |
| 04/19/2006 | CN1252544C Proximity effect correction method of electronic beam exposure and use thereof |
| 04/19/2006 | CN1252313C Method of cleaning and conditioning plasma reaction chamber |
| 04/18/2006 | USRE39064 Electronic device manufacturing apparatus and method for manufacturing electronic device |
| 04/18/2006 | US7030979 Microwave plasma source |
| 04/18/2006 | US7030964 Stage system, exposure apparatus, and device manufacturing method |
| 04/18/2006 | US7030396 Medical particle irradiation apparatus |
| 04/18/2006 | US7030395 Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough |
| 04/18/2006 | US7030394 Charged particle beam apparatus and automatic astigmatism adjustment method |