| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/18/2006 | WO2004102643A3 Contact opening metrology |
| 05/18/2006 | US20060105575 Small volume process chamber with hot inner surfaces |
| 05/18/2006 | US20060104584 Optical elements formed by inducing changes in the index of refraction by utilizing electron beam radiation |
| 05/18/2006 | US20060103076 Sealing mechanism for sealing a vacuum chamber |
| 05/18/2006 | US20060102855 Contaminant removal device and method |
| 05/18/2006 | US20060102848 Corrector for correcting first-order chromatic aberrations of the first degree |
| 05/18/2006 | US20060102840 Scanning electron microscope |
| 05/18/2006 | CA2587747A1 System and method for focused ion beam data analysis |
| 05/17/2006 | EP1657736A1 High current density particle beam system |
| 05/17/2006 | EP1656694A1 High aspect ratio etch using modulation of rf powers of various frequencies |
| 05/17/2006 | EP1325304A4 Afterglow emission spectroscopy monitor |
| 05/17/2006 | EP0946965B1 Device and method for cathodic sputtering |
| 05/17/2006 | CN2781561Y Field emission electronic source device |
| 05/17/2006 | CN1774796A A method and apparatus for process control in time division multiplexed TDM etch processes |
| 05/17/2006 | CN1774787A Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 05/17/2006 | CN1256752C Method for controlling electrostatic lens and ion implantation device |
| 05/17/2006 | CN1256751C High efficiency scanning in ion implanters |
| 05/16/2006 | US7045801 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 05/16/2006 | US7045800 Electron beam drawing apparatus |
| 05/16/2006 | US7045799 Weakening focusing effect of acceleration-deceleration column of ion implanter |
| 05/16/2006 | US7045798 Characterizing an electron beam treatment apparatus |
| 05/16/2006 | US7045794 Stacked lens structure and method of use thereof for preventing electrical breakdown |
| 05/16/2006 | US7045791 Column simultaneously focusing a partilce beam and an optical beam |
| 05/16/2006 | US7045782 Method of measurement accuracy improvement by control of pattern shrinkage |
| 05/16/2006 | US7045781 Charged particle beam apparatus and method for operating the same |
| 05/16/2006 | US7045465 Particle-removing method for a semiconductor device manufacturing apparatus |
| 05/16/2006 | US7045275 Multilayer lithography; focusing particle beams; imaging marking element; determination position; high density storage |
| 05/11/2006 | WO2006050495A2 Method and apparatus for the automated process of in-situ lift-out |
| 05/11/2006 | WO2006050494A2 Apparatus and method of detecting probe tip contact with a surface |
| 05/11/2006 | WO2006049566A1 Method and apparatus for producing electric discharges |
| 05/11/2006 | WO2006048391A1 Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate |
| 05/11/2006 | WO2006048353A1 Device for structuring a particle beam |
| 05/11/2006 | WO2006033834A3 Improved ion beam utilization during scanned ion implantation |
| 05/11/2006 | US20060099341 High frequency plasma jet source and method for irradiating a surface |
| 05/11/2006 | US20060097645 Dual mode ion source for ion implantation |
| 05/11/2006 | US20060097200 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus |
| 05/11/2006 | US20060097198 Column simultaneously focusing a particle beam and an optical beam |
| 05/11/2006 | US20060097197 Focused ion beam system |
| 05/11/2006 | US20060097196 Dose uniformity during scanned ion implantation |
| 05/11/2006 | US20060097195 Apparatus and methods for two-dimensional ion beam profiling |
| 05/11/2006 | US20060097194 Ion beam processing method |
| 05/11/2006 | US20060097193 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 05/11/2006 | US20060097190 Method and apparatus for forming optical elements by inducing changes in the index of refraction by utilizing electron beam radiation |
| 05/11/2006 | US20060097187 Specimen holder for an electron microscope and method for reducing thermal drift in a microscope |
| 05/11/2006 | US20060097186 Liquid metal ion gun |
| 05/11/2006 | US20060097169 Method and device for observing a specimen in a field of view of an electron microscope |
| 05/11/2006 | US20060097166 Charged particle beam apparatus and sample manufacturing method |
| 05/11/2006 | US20060097159 Improved ion detector for ionbeam applications |
| 05/11/2006 | US20060097158 Scanning electron microscope |
| 05/11/2006 | US20060096707 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 05/11/2006 | US20060096706 Dry etching apparatus and a method of manufacturing a semiconductor device |
| 05/11/2006 | US20060096539 Plasma film forming system |
| 05/11/2006 | US20060096538 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 05/11/2006 | US20060096532 Thin film forming apparatus |
| 05/11/2006 | DE4446992B4 Vorrichtung zum Abscheiden von Schichten auf Substraten An apparatus for depositing layers on substrates |
| 05/11/2006 | DE102004052995A1 Vorrichtung zur Strukturierung eines Partikelstrahls A device for structuring a particle beam |
| 05/11/2006 | DE102004052580A1 System und Verfahren zum Zuführen von Vorstufengasen zu einer Implantationsanlage System and method for supplying precursor gases into a implanter |
| 05/11/2006 | DE102004037837B3 Vorrichtung zur Schaffung einer evakuierten Tieftemperaturumgebung für eine Probe und Verwendung der Vorrichtung An apparatus for providing an evacuated cryogenic environment for a sample and using the apparatus |
| 05/10/2006 | EP1655770A1 Plasma processing device and ashing method |
| 05/10/2006 | EP1655762A1 Cathode assembly for sputtering a rotatable tubular target |
| 05/10/2006 | EP1654702A2 Thermography test method and apparatus for evaluating a bond interface of a sputtering target/backing plate assemby |
| 05/10/2006 | EP1654396A1 Work piece processing by pulsed electric discharges in solid-gas plasma |
| 05/10/2006 | EP1654395A2 Target/backing plate constructions, and methods of forming them |
| 05/10/2006 | CN2779603Y Equip-grads accelerative tube |
| 05/10/2006 | CN2779602Y Faraday device with parallel beam measuring function |
| 05/10/2006 | CN2779601Y Rotatable light beam diaphragm apparatus |
| 05/10/2006 | CN2779600Y Ion source heating electron gun apparatus |
| 05/10/2006 | CN2779595Y Lon source magnetic field generating apparatus |
| 05/10/2006 | CN1771579A Ion beam incident angle detector for ion implant systems |
| 05/10/2006 | CN1255851C Appts. for plasma forming inner magnetic bucket to control volume of plasma |
| 05/10/2006 | CN1255850C Correcting method for astigmatism of scanning electronic microscope |
| 05/10/2006 | CN1255669C Scanning electronic microscope standard substance and its making method |
| 05/10/2006 | CN1255574C Apparatus for treatment plasma |
| 05/09/2006 | US7042159 Plasma reactor and purification equipment |
| 05/09/2006 | US7042145 An electron gun with a linear hot cathode for electron beam heating, incorporates a beam guide with an accelerating anode, fastened to it, connected by high-voltage insulators via a cathodic plate to the cathode assembly, which incorporates linear hot cathode, fastened in two cathode holders |
| 05/09/2006 | US7041991 Variably shaped beam EB writing system |
| 05/09/2006 | US7041990 Apparatus for monitoring ion-implantation input parameter in semiconductor fabricating devices and monitoring method thereof |
| 05/09/2006 | US7041988 Electron beam exposure apparatus and electron beam processing apparatus |
| 05/09/2006 | US7041977 Electron microscope |
| 05/09/2006 | US7041512 Electron beam exposure apparatus, electron beam exposing method, semiconductor element manufacturing method, and pattern error detection method |
| 05/09/2006 | US7041341 Process for the fabrication of oxide films |
| 05/09/2006 | US7041205 Sputtering target and method for making composite soft magnetic films with a sintered target |
| 05/09/2006 | US7041202 Timing circuit for synchronizing changes in the target-cathode voltages with changes in the pallet bias voltage; magnetic recording media |
| 05/09/2006 | US7041201 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
| 05/09/2006 | US7041200 Reducing particle generation during sputter deposition |
| 05/04/2006 | WO2006046924A1 Microfabricated cantilever chip |
| 05/04/2006 | WO2006045701A1 Processing device with pressure or vacuum chamber |
| 05/04/2006 | WO2006021958A3 Directed multi-deflected ion beam milling of a work piece and determining and controlling extent thereof |
| 05/04/2006 | WO2006005837A3 Device for microwave plasma deposition of a coating on a surface of a thermoplastic container |
| 05/04/2006 | WO2005098086A3 Remote chamber methods for removing surface deposits |
| 05/04/2006 | WO2005095670A3 Remote chamber methods for removing surface deposits |
| 05/04/2006 | US20060091325 Method and apparatus for the automated process of in-situ lift-out |
| 05/04/2006 | US20060090999 Allows larger coating area; vacuum chamber, prism-shaped sputter target assembly, material to be sputtered forming the outer surface of the target assembly and positioned such that the outer surface is surrounded by the plasma within the vacuum chamber |
| 05/04/2006 | DE19631407B4 Vorrichtung zur plasmachemischen Abscheidung von polykristallinem Diamant Device for the plasma-chemical deposition of polycrystalline diamond |
| 05/04/2006 | DE10233002B4 Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem Objective lens for an electron system and electron microscopy system |
| 05/04/2006 | DE102004053003A1 Method for treating of surfaces and materials by microwave plasma entails producing microwave-excited plasma microwave-conducting waveguide and adapting field construction of plasma movement to defined run length |
| 05/04/2006 | DE102004052994A1 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate |
| 05/04/2006 | DE10018143B4 DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems DLC layer system and method and apparatus for producing such a layer system |
| 05/03/2006 | EP1652209A2 Multi-mode charged particle beam device |
| 05/03/2006 | EP1651794A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |