| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/01/2006 | US20060113491 Beam space-charge compensation device and ion implantation system having the same |
| 06/01/2006 | US20060113490 Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system |
| 06/01/2006 | US20060113489 Optimization of beam utilization |
| 06/01/2006 | US20060113488 Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method |
| 06/01/2006 | US20060113474 Scanning electron microscope |
| 06/01/2006 | US20060113473 Method and apparatus for measuring the physical properties of micro region |
| 06/01/2006 | US20060113471 Contact opening metrology |
| 06/01/2006 | US20060113470 High resolution atom probe |
| 06/01/2006 | US20060112878 System and method for controlling plasma with an adjustable coupling to ground circuit |
| 06/01/2006 | DE102004055149A1 Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat Apparatus and method for imaging a multiple particle beam onto a substrate |
| 06/01/2006 | CA2588505A1 Inductively coupled plasma processing apparatus |
| 05/31/2006 | EP1662848A2 Electromagnetic induced accelerator based on coil-turn modulation |
| 05/31/2006 | EP1662847A2 Driving frequency modulation system and method for plasma accelerator |
| 05/31/2006 | EP1662546A1 Inductively coupled plasma processing apparatus |
| 05/31/2006 | EP1662545A2 Ion beam irradiation system and method for enhancing the accuracy thereof |
| 05/31/2006 | EP1662544A2 Ion beam irradiation system and related method |
| 05/31/2006 | EP1662543A2 Ion beam irradiation system for ion implantation |
| 05/31/2006 | EP1662542A2 Irradiation system with ion beam/charged particle beam |
| 05/31/2006 | EP1662541A2 Beam space-charge compensation device and ion implanation system having the same |
| 05/31/2006 | EP1662540A2 Wafer charge compensation device and ion implantation system employing the same |
| 05/31/2006 | EP1662539A2 Irradiation system with ion beam/charged particle beam |
| 05/31/2006 | EP1662538A2 Method and apparatus for correcting drift during automated fib processing |
| 05/31/2006 | EP1661171A2 Multiple frequency plasma etch reactor |
| 05/31/2006 | EP1661155A2 Unipolar electrostatic quadrupole lens and switching methods for charged beam transport |
| 05/31/2006 | EP1661154A2 Particle optical apparatus |
| 05/31/2006 | EP1660945A2 Modulator circuitry |
| 05/31/2006 | EP1021592B1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 05/31/2006 | CN1781181A Substrate support having temperature controlled surface |
| 05/31/2006 | CN1257999C Apparatus for exhaust white powder elimination in substrate processing |
| 05/30/2006 | US7054786 Operation monitoring method for treatment apparatus |
| 05/30/2006 | US7054257 AFM-based data storage and microscopy |
| 05/30/2006 | US7053394 Recording device of master disk for information recording medium |
| 05/30/2006 | US7053388 Dual-mode electron beam lithography machine |
| 05/30/2006 | US7053387 Pattern drawing method by scanning beam and pattern drawing apparatus |
| 05/30/2006 | US7053386 Method and apparatus for implanting semiconductor wafer substrates |
| 05/30/2006 | US7053383 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 05/30/2006 | US7053372 Standard sample for transmission electron microscope (TEM) elemental mapping and TEM elemetal mapping method using the same |
| 05/30/2006 | US7053371 Scanning electron microscope with measurement function |
| 05/30/2006 | US7053370 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus |
| 05/30/2006 | US7053366 Desalting plate for MALDI mass spectrometry |
| 05/30/2006 | US7052731 Plasma processing apparatus, protecting layer therefor and installation of protecting layer |
| 05/30/2006 | US7052583 Magnetron cathode and magnetron sputtering apparatus comprising the same |
| 05/30/2006 | US7051671 Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article |
| 05/26/2006 | WO2006055296A2 Ion source with substantially planar design |
| 05/26/2006 | WO2006054528A1 Ion implantation device |
| 05/26/2006 | WO2006054086A2 Focussing mask |
| 05/26/2006 | WO2006053360A1 Registering device and method for a pattern lock system in a particle-beam exposure apparatus |
| 05/26/2006 | WO2006053359A1 Pattern lock system for maskless particle-beam exposure apparatus |
| 05/26/2006 | WO2006053358A1 Pattern lock system for particle-beam exposure apparatus |
| 05/26/2006 | WO2005119731A3 Vacuum plasma processor including control in response to dc bias voltage |
| 05/26/2006 | CA2585050A1 Focussing mask |
| 05/25/2006 | US20060110546 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 05/25/2006 | US20060110535 Metal film production apparatus |
| 05/25/2006 | US20060108547 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems |
| 05/25/2006 | US20060108544 Power sag detection and control in ion implanting system |
| 05/25/2006 | US20060108543 Weakening focusing effect of acceleration-deceleration column of ion implanter |
| 05/25/2006 | US20060108542 Electron beam exposure method and electron beam exposure system |
| 05/25/2006 | US20060108541 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 05/25/2006 | US20060108531 Method and apparatus for multiple charged particle beams |
| 05/25/2006 | US20060108527 Scanning electron microscope |
| 05/25/2006 | US20060108524 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method |
| 05/25/2006 | US20060108331 Plasma processing apparatus and plasma processing method |
| 05/24/2006 | EP1659611A1 Plasma control method and plasma control apparatus |
| 05/24/2006 | EP1547124B1 Device for the treatment of a web-type material in a plasma-assisted process |
| 05/24/2006 | EP1374270B1 Device for generating an ion beam |
| 05/24/2006 | DE10341239B4 ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung ECR plasma source having a linear plasma discharge opening |
| 05/24/2006 | DE102004055256A1 Electron source for superconducting resonator, has resonator made of superconducting material, and coupler cell arranged with coaxial conductor, which is attached outside resonator on cathode side in direct proximity of resonator |
| 05/24/2006 | CN1777984A Real-time in-line testing of semiconductor wafers |
| 05/24/2006 | CN1777974A Critical dimension variation compensation across a wafer by means of local wafer temperature control |
| 05/24/2006 | CN1777973A Process endpoint detection in processing chambers |
| 05/24/2006 | CN1777972A Deflecting acceleration/deceleration gap |
| 05/24/2006 | CN1777698A Microwave plasma processing method |
| 05/24/2006 | CN1777695A Film-forming apparatus and film-forming method |
| 05/24/2006 | CN1777691A Method and apparatus for reducing substrate backside deposition during processing |
| 05/24/2006 | CN1776006A Method of producing flat panels for display of film transistor or plasma |
| 05/24/2006 | CN1257527C Apparutus for varying magnetic field to control volume of plasma |
| 05/24/2006 | CN1257524C Ion source, operating method of ion source, and ion source system |
| 05/23/2006 | US7050957 Projection electron beam lithography apparatus and method employing an estimator |
| 05/23/2006 | US7049834 Semiconductor device test method and semiconductor device tester |
| 05/23/2006 | US7049751 Termination of secondary frequencies in RF power delivery |
| 05/23/2006 | US7049739 Field emission device |
| 05/23/2006 | US7049616 Methods, apparatus, and software for adjusting the focal spot of an electron beam |
| 05/23/2006 | US7049612 Electron beam treatment apparatus |
| 05/23/2006 | US7049611 Charged-particle beam lithographic system |
| 05/23/2006 | US7049610 Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method |
| 05/23/2006 | US7049609 Method of verifying proximity effect correction in electron beam lithography |
| 05/23/2006 | US7049608 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/23/2006 | US7049607 Electron beam writing equipment and electron beam writing method |
| 05/23/2006 | US7049606 Electron beam treatment apparatus |
| 05/23/2006 | US7049591 Scanning electron microscope |
| 05/23/2006 | US7049588 Device for measuring the emission of X-rays produced by an object exposed to an electron beam |
| 05/23/2006 | US7049585 Sheet beam-type testing apparatus |
| 05/23/2006 | US7049210 Method of implanting a substrate and an ion implanter for performing the method |
| 05/23/2006 | US7049035 electrochemically depositing an additive material on exposed sidewalls of an etched first layer of the mask whose top remains covered by a hardmask used during the etching of the first layer; a second layer beneath the etched first layer is resistant to the electrochemical deposition of the additive |
| 05/23/2006 | US7048869 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature |
| 05/23/2006 | US7048837 generating a plasma, sputtering metal material from a target, etching a portiton of the metal from the substrate, monitoring the emitted radiation through a folded radiation path in chamber, and terminating etching in response to monitored radiation |
| 05/23/2006 | US7047903 Method and device for plasma CVD |
| 05/18/2006 | WO2006050613A1 System and method for focused ion beam data analysis |
| 05/18/2006 | WO2005069703A3 Plasma treatment of large-scale components |
| 05/18/2006 | WO2005065186A3 Showerhead electrode assembly for plasma processing apparatuses |