| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/15/2006 | US20060124243 Disturbance-free, recipe-controlled plasma processing system and method |
| 06/15/2006 | US20060124059 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution |
| 06/14/2006 | EP1670048A1 Method and device for flattening surface of solid |
| 06/14/2006 | EP1670033A1 Electron beam detector and electron tube |
| 06/14/2006 | EP1670028A2 Method and apparatus for automatically correcting a charged-particle beam and method of controlling an aberration corrector for a charged-particle beam |
| 06/14/2006 | EP1670027A2 Beam deflecting method, beam deflector, ion implantation method, and ion implantation system |
| 06/14/2006 | EP1668664A2 Control of plasma transitions in sputter processing systems |
| 06/14/2006 | EP1668663A2 Apparatus and method for plasma treating a substrate |
| 06/14/2006 | EP1668662A2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 06/14/2006 | EP1668168A2 Control system for a sputtering system |
| 06/14/2006 | EP1523755B1 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 06/14/2006 | EP1278825B1 Methods of producing membrane vesicles |
| 06/14/2006 | DE19738009B4 Elektronenstrahlkanone mit einer indirekt beheizten Kathode Electron gun with an indirectly heated cathode |
| 06/14/2006 | DE102005057069A1 Sample e.g. semiconductor wafer, examining and analyzing device, has ultraviolet radiation unit to irradiate ultraviolet rays into sample chamber before the sample that is in temporarily evacuated state is transported into sample chamber |
| 06/14/2006 | CN2788450Y 偏转扫描放大器 Scanning deflection amplifiers |
| 06/14/2006 | CN2788351Y Target room warehouse nitrogen-inflating device |
| 06/14/2006 | CN2788348Y Scan deflexion device |
| 06/14/2006 | CN2788347Y Static ion accelerating tube against X ray |
| 06/14/2006 | CN2788346Y Parallel bundle measurement and parallel degree rectification control system |
| 06/14/2006 | CN2788345Y Ion source outlet device capable of being adjusted in X direction |
| 06/14/2006 | CN1788104A Thin film forming device and thin film forming method |
| 06/14/2006 | CN1787162A Cold cathode Penning ion source capable of extracting low smelting point metallic ion |
| 06/14/2006 | CN1787161A 离子源 Ion source |
| 06/14/2006 | CN1785440A Method of preparing scaling less bioactive ceramic layer on titanium material surface |
| 06/13/2006 | US7062347 Maintenance method and system for plasma processing apparatus |
| 06/13/2006 | US7061184 Plasma electron density measuring and monitoring device |
| 06/13/2006 | US7060995 Ion-implantation machine, control method thereof, and process for manufacturing integrated devices |
| 06/13/2006 | US7060990 Stage base, substrate processing apparatus, and maintenance method for stage |
| 06/13/2006 | US7060989 Method and apparatus for improved processing with a gas-cluster ion beam |
| 06/13/2006 | US7060988 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system |
| 06/13/2006 | US7060986 Automated method of correcting aberrations in electron beam, method of visualizing aberrations, and automated aberration corrector |
| 06/13/2006 | US7060985 Multipole field-producing apparatus in charged-particle optical system and aberration corrector |
| 06/13/2006 | US7060984 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 06/13/2006 | US7060978 Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system |
| 06/13/2006 | US7060397 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 06/13/2006 | US7060196 supplying charge particle beams; using oxidizer; removal of copper |
| 06/13/2006 | US7060167 Vacuum arc vapor deposition apparatus |
| 06/13/2006 | US7059268 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 06/13/2006 | US7059267 Use of pulsed grounding source in a plasma reactor |
| 06/08/2006 | WO2006060827A2 Methods and apparatus for downstream dissociation of gases |
| 06/08/2006 | WO2006060231A2 Electron confinement inside magnet of ion implanter |
| 06/08/2006 | WO2006060124A2 Optimization of beam utilization |
| 06/08/2006 | WO2006059803A1 Phase plate for phase-contrast electron microscope, method for manufacturing the same and phase-contrast electron microscope |
| 06/08/2006 | WO2006037991A3 Microwave plasma apparatus with vorticular gas flow |
| 06/08/2006 | WO2005124827A3 Improved method and apparatus for the etching of microstructures |
| 06/08/2006 | WO2005093780A3 Rf plasma source with conductive top section |
| 06/08/2006 | US20060120579 Imaging apparatus and method |
| 06/08/2006 | US20060118719 Electron beam inspection system and inspection method and method of manufacturing devices using the system |
| 06/08/2006 | US20060118518 High aspect ratio etch using modulation of RF powers of various frequencies |
| 06/08/2006 | US20060118412 Magnetron sputter cathode |
| 06/08/2006 | US20060118241 Plasma processing apparatus |
| 06/08/2006 | US20060118043 Method for producing coated workpieces, uses and installation for the method |
| 06/08/2006 | DE19633496B4 Monchromator für die Elektronenoptik, insbesondere Elketronenmikroskopie Monochromator for the electron optics, in particular Elketronenmikroskopie |
| 06/08/2006 | DE102005054401A1 Verfahren zum Treffen einer Entscheidung über einen Messwert A method for making a decision on a reading |
| 06/07/2006 | EP1667199A1 Microwave plasma source |
| 06/07/2006 | EP1667198A2 Gas cluster ion beam emitting apparatus and method for ionization of gas cluster |
| 06/07/2006 | EP1667189A1 Charged particle window, window assembly, and particle gun |
| 06/07/2006 | EP1665908A1 Adaptively plasma source for generating uniform plasma |
| 06/07/2006 | EP1665324A2 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening |
| 06/07/2006 | EP1665323A2 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 06/07/2006 | EP1665322A2 Ribbon-shaped ion beam with mass separation |
| 06/07/2006 | EP1665321A1 A method for measuring diffraction patterns from a transmission electron microscopy to determine crystal structures and a device therefor |
| 06/07/2006 | EP1665320A2 Method for preparing a sample for electron microscope examination and a sample carrier and transport holder used therefor |
| 06/07/2006 | EP1665319A2 Shaped sputter shields for improved ion column operation |
| 06/07/2006 | EP1664924A2 Method for high-resolution processing of thin layers with electron beams |
| 06/07/2006 | EP1664378A2 Replaceable plate expanded thermal plasma apparatus and method |
| 06/07/2006 | EP1349682A4 Low temperature sputter target/backing plate joining technique and assemblies made thereby |
| 06/07/2006 | EP1261752A4 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 06/07/2006 | EP1065502B1 Method for analyzing the breakdown characteristics of a gaseous dielectric in a highly non-uniform field |
| 06/07/2006 | CN1784778A Envelope follower end point detection in time division multiplexed processes |
| 06/07/2006 | CN1783431A Plasma processing apparatus |
| 06/07/2006 | CN1783430A Capacitive coupling plasma processing apparatus |
| 06/07/2006 | CN1783429A Plasma control method and plasma control apparatus |
| 06/07/2006 | CN1783415A Semiconductor processing equipment |
| 06/07/2006 | CN1782690A Method and apparatus for sample formation and microanalysis in a vacuum chamber |
| 06/07/2006 | CN1258805C Semiconductor process chamber electrode and method for making the same |
| 06/07/2006 | CN1258616C Sputter device and sputter film forming method |
| 06/06/2006 | US7057353 Electronic device with wide lens for small emission spot size |
| 06/06/2006 | US7057193 Exposure apparatus |
| 06/06/2006 | US7057192 Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beams |
| 06/06/2006 | US7057191 Method of controlling implant dosage and pressure compensation factor in-situ |
| 06/06/2006 | US7057184 Scanning electron microscope |
| 06/06/2006 | US7057167 Mass analyzer allowing parallel processing one or more analytes |
| 06/06/2006 | US7056831 Plasma processing apparatus and plasma processing method |
| 06/06/2006 | US7056446 Method of manufacturing nano-gap electrode |
| 06/06/2006 | US7056388 Reaction chamber with at least one HF feedthrough |
| 06/01/2006 | WO2006057867A2 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems |
| 06/01/2006 | WO2006056619A1 Low-temperature cryostat |
| 06/01/2006 | WO2006056573A1 Inductively coupled plasma processing apparatus |
| 06/01/2006 | WO2006056091A1 Vacuum processing chamber for very large area substrates |
| 06/01/2006 | WO2006003322A3 Ion implanter operating in pulsed plasma mode |
| 06/01/2006 | US20060116858 Projection electron beam lithography apparatus and method employing an estimator |
| 06/01/2006 | US20060115966 Method and apparatus for the improvement of material/voltage contrast |
| 06/01/2006 | US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system |
| 06/01/2006 | US20060113916 Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode |
| 06/01/2006 | US20060113496 Method and equipment for specimen preparation |
| 06/01/2006 | US20060113495 Apparatus and methods for ion beam implantation |
| 06/01/2006 | US20060113494 Apparatus and methods for ion beam implantation using ribbon and spot beams |
| 06/01/2006 | US20060113493 Irradiation system ion beam and method to enhance accuracy of irradiation |
| 06/01/2006 | US20060113492 Wafer charge compensation device and ion implantation system having the same |