Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2006
07/04/2006US7071478 System and method for passing particles on selected areas on a wafer
07/04/2006US7071475 Method and apparatus for specimen fabrication
07/04/2006US7071442 Plasma processing apparatus
07/04/2006US7071114 efficiency pumping speed of gas flow in vacuum enclosure; etching patterned sidewall; process control; forming semiconductor
06/2006
06/29/2006WO2006068755A1 Electron injection ion implanter magnets
06/29/2006WO2006068754A1 Weakening focusing effect of acceleration-decelaration column of ion implanter
06/29/2006WO2006067004A2 Dual-mode electron beam column
06/29/2006WO2006044722A3 Apparatus and methods for improving the stability of rf power delivery to a plasma load
06/29/2006WO2006026765A3 Plasma ashing process for increasing photoresist removal rate and plasma apparatus wuth cooling means
06/29/2006WO2006009882B1 Methods and devices for atom probe mass resolution enhancement
06/29/2006US20060138357 Method for fabricating a metal-insulator-metal capacitor
06/29/2006US20060138356 Method and apparatus for correcting drift during automated FIB processing
06/29/2006US20060138355 Method for implanter angle verification and calibration
06/29/2006US20060138354 Method for the protection of an optical element, lithographic apparatus, and device manufacturing method
06/29/2006US20060138353 Ion-implanting apparatus, ion-implanting method, and device manufactured thereby
06/29/2006US20060138343 Sheet beam-type testing apparatus
06/29/2006US20060138324 Scanning electron microscope
06/29/2006US20060138099 Method of forming a metal oxide film and microwave power source unit for use in the method
06/29/2006US20060138082 Method and apparatus for determining consumable lifetime
06/29/2006US20060137978 Arc evaporation device
06/29/2006DE202006006403U1 Screw connection element for application in coating, wetting, or sputtering installations has top part of dielectric material, e.g. ceramics, and threaded part of metal or dielectric material
06/29/2006DE10261035B4 Fotomasken-Reparaturverfahren und Vorrichtung Photomask repair method and apparatus
06/29/2006DE102004060377A1 Verfahren und Vorrichtung zum Betrieb einer Plasmaeinrichtung Method and apparatus for operating a plasma device
06/28/2006EP1675156A1 Plasma generating electrode and plasma reactor
06/28/2006EP1675155A1 Plasma excitation system
06/28/2006EP1675154A2 Ion implantation ion source
06/28/2006EP1673797A2 Detector system of secondary and backscattered electrons for a scanning electron microscope
06/28/2006EP1673488A2 Modular device for surface coating
06/28/2006CN1795531A Magnetron sputter cathode
06/28/2006CN1795530A Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
06/28/2006CN1795529A Charged particle beamlet exposure system
06/28/2006CN1795528A Method and system for ion beam containment in an ion beam guide
06/28/2006CN1795287A Thin film forming device and thin film forming method
06/28/2006CN1794431A Plasma apparatus
06/28/2006CN1794411A Ion implanting apparatus and ion implanting method
06/28/2006CN1794410A Cathode anode micro cavity electrode plasma device structure using one-dimensional nanometer material
06/28/2006CN1261984C Method and apparatus for treating plasma
06/27/2006US7067942 Linear motor, moving stage system, exposure apparatus, and device manufacturing method
06/27/2006US7067830 Multi-electron beam exposure method and apparatus
06/27/2006US7067829 Power sag detection and control in ion implanting system
06/27/2006US7067828 Method of and apparatus for measurement and control of a gas cluster ion beam
06/27/2006US7067823 Micro-sample pick-up apparatus and micro-sample pick-up method
06/27/2006US7067821 Flood gun for charge neutralization
06/27/2006US7067820 Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens
06/27/2006US7067809 Method and apparatus for multiple charged particle beams
06/27/2006US7067808 Electron beam system and electron beam measuring and observing method
06/27/2006US7067807 Charged particle beam column and method of its operation
06/27/2006US7067805 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method
06/27/2006US7067761 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
06/27/2006US7067432 Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing
06/27/2006US7067405 Atmospheric glow discharge with concurrent coating deposition
06/27/2006US7067034 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma
06/27/2006US7066107 Shielding system for plasma chamber
06/22/2006WO2006064548A1 Charged particle beam system and method for making sample by using it
06/22/2006WO2006063738A1 Method and device for operating a plasma device
06/22/2006WO2006063721A1 Tubular target comprising a connecting layer that is situated between the tubular target and the tubular support
06/22/2006WO2006020643A3 Ion beam measurement systems and methods for ion implant dose and uniformity control
06/22/2006WO2006009667A3 Highly ionized pvd with moving magnetic field envelope for uniform coverage of structure and wafer
06/22/2006US20060131514 Removing byproducts of physical and chemical reactions in an ion implanter
06/22/2006US20060131272 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles
06/22/2006US20060131269 Object-moving method, object-moving apparatus and production process using the method
06/22/2006US20060130873 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method
06/21/2006EP1672672A2 Charged particle beam apparatus, method of displaying sample image, and method of measuring image shift sensitivity
06/21/2006EP1672093A1 Film-forming apparatus and film-forming method
06/21/2006EP1671347A1 Method and apparatus for preventing instabilities in radio-frequency plasma processing
06/21/2006EP1671346A2 Method, system and device for microscopic examination employing fib-prepared sample grasping element
06/21/2006EP1670968A1 Apparatus for low temperature semiconductor fabrication
06/21/2006EP1121704B1 Electron beam aperture element with beam shielding
06/21/2006EP0839217B1 A plasma enhanced chemical processing reactor and method
06/21/2006CN1791972A 等离子体处理装置 Plasma processing apparatus
06/21/2006CN1791961A High resolution separation magnet for ribbon beam ion implanters
06/21/2006CN1260770C Zirconia toughtened ceramic components and coatings in semiconductor processing equipment and method of manufacturing thereof
06/21/2006CN1260621C Method for removing shading defects of light mask and semiconductor device manufacturing method thereof
06/20/2006US7065735 Method for making an OPC mask and an OPC mask manufactured using the same
06/20/2006US7065034 Optical disc and apparatus for manufacturing a master disc therefor
06/20/2006US7064491 Ion implantation system and control method
06/20/2006US7064477 Low power schottky emitter
06/20/2006US7064340 Method and apparatus for ion beam profiling
06/20/2006US7064339 Charged-particle-beam mapping projection-optical systems and methods for adjusting same
06/20/2006US7064326 Electron microscope
06/20/2006US7064325 Apparatus with permanent magnetic lenses
06/20/2006US7064324 Charged particle beam apparatus
06/20/2006US7064321 Ion funnel with improved ion screening
06/20/2006US7064049 Ion implantation method, SOI wafer manufacturing method and ion implantation system
06/20/2006US7063819 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction
06/20/2006US7063773 High purity sputter targets with target end-of-life indication and method of manufacture
06/15/2006WO2006063102A2 Method of correction for wafer crystal cut error in semiconductor processing
06/15/2006WO2006062132A1 Stereoscopic image reconfiguration device, stereoscopic image reconfiguration method, and stereoscopic image reconfiguration program
06/15/2006US20060127600 Film-forming system and film-forming method
06/15/2006US20060125495 Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam
06/15/2006US20060124868 Method for controlling a vaporizer of ion implantation equipment during indium implantation process
06/15/2006US20060124867 Method and apparatus for ion beam profiling
06/15/2006US20060124866 Electron beam exposure method and system therefor
06/15/2006US20060124865 Energetic neutral particle lithographic apparatus and process
06/15/2006US20060124858 Imaging device comprising optically coupled fiber optic plate assembly
06/15/2006US20060124634 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
06/15/2006US20060124612 Generation of diffuse non-thermal atmosheric plasmas
06/15/2006US20060124455 Thin film forming device and thin film forming method
06/15/2006US20060124446 Method for the production of a substrate with a magnetron sputter coating and unit for the same
06/15/2006US20060124244 Plasma processor and plasma processing method