| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/18/2006 | US7078862 plasma generating chamber, an antenna for generating plasma, a first and second electrode in the chamber, both antenna and second electrode facing first electrode; power supply for applying a voltage between the first electrode and the second electrode to extract particles from the generated plasma |
| 07/18/2006 | US7078852 Method and apparatus for simultaneously depositing and observing materials on a target |
| 07/18/2006 | US7078714 Ion implanting apparatus |
| 07/18/2006 | US7078713 Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams |
| 07/18/2006 | US7078712 In-situ monitoring on an ion implanter |
| 07/18/2006 | US7078711 Matching dose and energy of multiple ion implanters |
| 07/18/2006 | US7078710 Ion beam system |
| 07/18/2006 | US7078708 Lithographic apparatus and method of manufacturing a device and method of performing maintenance |
| 07/18/2006 | US7078707 Ion beam scanning control methods and systems for ion implantation uniformity |
| 07/18/2006 | US7078691 Standard reference for metrology and calibration method of electron-beam metrology system using the same |
| 07/18/2006 | US7078689 Integrated electron beam and contaminant removal system |
| 07/18/2006 | US7078688 Shape measuring device and shape measuring method |
| 07/18/2006 | US7078687 Thin film analyzing method |
| 07/18/2006 | US7078344 Stress free etch processing in combination with a dynamic liquid meniscus |
| 07/18/2006 | US7077971 Methods for detecting the endpoint of a photoresist stripping process |
| 07/13/2006 | WO2006074489A1 Low-frequency bias power in hdp-cvd processes |
| 07/13/2006 | WO2006074200A2 Ion beam scanning methods and system for ion implantation |
| 07/13/2006 | WO2006074050A2 Electrically enhancing the confinement of plasma |
| 07/13/2006 | WO2006073063A1 Method and apparatus for measuring thin film sample, and method and apparatus for manufacturing thin film sample |
| 07/13/2006 | WO2006072717A1 Device and method for controlling etching depth during alternate plasma etching of semiconductor substrates |
| 07/13/2006 | WO2006044419A3 Magnetic-field concentration in inductively coupled plasma reactors |
| 07/13/2006 | WO2006041634A3 Method and apparatus to improve plasma etch uniformity |
| 07/13/2006 | WO2005098544A3 Device and method for producing resist profiled elements |
| 07/13/2006 | WO2004023510A3 Capacitively coupled plasma reactor with uniform radial distribution of plasma |
| 07/13/2006 | US20060155414 Semiconductor manufacturing apparatus |
| 07/13/2006 | US20060152162 Beam plasma source |
| 07/13/2006 | US20060151786 Ion doping system, ion doping method and semiconductor device |
| 07/13/2006 | US20060151720 Electromagnetic focusing method for electron-beam lithography system |
| 07/13/2006 | US20060151719 Electron beam duplication lithography method |
| 07/13/2006 | US20060151710 Exposure device, exposure method, and semiconductor device manufacturing method |
| 07/13/2006 | US20060151699 Method and an apparatus of an inspection system using an electron beam |
| 07/13/2006 | US20060150914 Plasma process device |
| 07/13/2006 | US20060150908 Method for the treatment of a web-type material in a plasma-assisted process |
| 07/12/2006 | EP1679741A1 Method of quartz etching |
| 07/12/2006 | EP1679734A2 Multiple lens assembly and charged particle beam device comprising the same |
| 07/12/2006 | EP1679733A2 X-ray microscopic inspection apparatus |
| 07/12/2006 | EP1679548A1 Apparatus and method for measuring etch depth of a substrate |
| 07/12/2006 | EP1678735A2 Kinematic ion implanter electrode mounting |
| 07/12/2006 | EP1678734A1 Electron detection system for a scanning electron microscope |
| 07/12/2006 | EP1678480A2 Method and apparatus for etch endpoint detection |
| 07/12/2006 | EP1678075A1 Etch masks based on template-assembled nanoclusters |
| 07/12/2006 | EP0873431A4 Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| 07/12/2006 | CN2796083Y Scanning generator |
| 07/12/2006 | CN2796082Y Faraday device for detecting bundle |
| 07/12/2006 | CN1802729A Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 07/12/2006 | CN1802724A High frequency plasma jet source and method for irradiating a surface |
| 07/12/2006 | CN1802723A System and method for inductive coupling of an expanding thermal plasma |
| 07/12/2006 | CN1802722A Plasma ashing apparatus and endpoint detection process |
| 07/12/2006 | CN1802450A Target/backing plate constructions, and methods of forming them |
| 07/12/2006 | CN1802066A Plasma processing apparatus |
| 07/12/2006 | CN1800442A Coating substrates plating method |
| 07/11/2006 | US7076761 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 07/11/2006 | US7075771 Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system |
| 07/11/2006 | US7075094 System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps |
| 07/11/2006 | US7075093 Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation |
| 07/11/2006 | US7075092 Charged particle beam microscope with minicolumn |
| 07/11/2006 | US7075078 Scanning electron microscope |
| 07/11/2006 | US7075077 Method of observing a specimen using a scanning electron microscope |
| 07/11/2006 | US7075076 Inspection system, inspection method, and process management method |
| 07/11/2006 | US7075075 Charged particle deflecting system |
| 07/11/2006 | US7075072 Detecting apparatus and device manufacturing method |
| 07/11/2006 | US7075031 enclosures having substrate holders, consumable electrode housings having radio frequency transmission feeds and resistors, used for reactive ion etching of semiconductor wafers |
| 07/11/2006 | US7074720 Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device |
| 07/11/2006 | US7074298 High density plasma CVD chamber |
| 07/06/2006 | WO2006071596A1 Oscillating shielded cylindrical target assemblies and their methods of use |
| 07/06/2006 | WO2006070744A1 Charged particle generator and accelerator |
| 07/06/2006 | WO2006070555A1 Beam recording method and device |
| 07/06/2006 | WO2006070107A1 Device for gaseous plasma sterilization |
| 07/06/2006 | WO2006039724A3 Bellows liner for an ion beam implanter |
| 07/06/2006 | WO2006031559A3 Controlled dose ion implantation |
| 07/06/2006 | WO2005115104A3 Methods for stable and repeatable plasma ion implantation |
| 07/06/2006 | US20060147822 Appartus and method for forming pattern |
| 07/06/2006 | US20060147648 Generating atmospheric glow discharge plasma (APG), wherein plurality of electrodes are arranged defining a discharge space for forming said plasma; stable uniform low-temperature glow discharge plasma at high operating frequencies of AC-voltage with outstanding surface treatment capabilities |
| 07/06/2006 | US20060145585 Electron gun |
| 07/06/2006 | US20060145096 Ion beam scanning control methods and systems for ion implantation uniformity |
| 07/06/2006 | US20060145095 Methods and apparatus for ion implantation with control of incidence angle by beam deflection |
| 07/06/2006 | US20060145090 Metal ion emission device and process for producing the same, ion beam irradiation device, processing apparatus and analyzing apparatus provided with emission device |
| 07/06/2006 | US20060144520 Viewing window cleaning apparatus |
| 07/06/2006 | US20060144519 Coaxial type impedance matching device and impedance detecting method for plasma generation |
| 07/06/2006 | US20060144518 Plasma processing apparatus and plasma processing method |
| 07/06/2006 | US20060144517 Plasma producing apparatus and doping apparatus |
| 07/06/2006 | US20060144334 Method and apparatus for deposition of low dielectric constant materials |
| 07/06/2006 | DE102004060068A1 Mikrowellenplasmaquelle Microwave plasma source |
| 07/06/2006 | CA2594004A1 Device for gaseous plasma sterilization |
| 07/06/2006 | CA2593063A1 Oscillating shielded cylindrical target assemblies and their methods of use |
| 07/05/2006 | EP1677338A1 Apparatus and method for controlling etch depth during plasma alternating etching of semiconductor substrates |
| 07/05/2006 | EP1677146A2 Device for manufacturing a mask by plasma etching of a semiconductor substrate |
| 07/05/2006 | EP1507892B1 High-power microwave window |
| 07/05/2006 | EP0841838B1 Plasma treatment apparatus and plasma treatment method |
| 07/05/2006 | CN1799127A Plasma processing apparatus and plasma processing method |
| 07/05/2006 | CN1799124A Ion doping device, ion doping method and semiconductor device |
| 07/05/2006 | CN1798867A Deposition chamber surface enhancement and resulting deposition chambers |
| 07/05/2006 | CN1798863A Adaptable processing element for a processing system and a method of making the same |
| 07/05/2006 | CN1796967A Clamp for preparing detection sample in use for electron microscope |
| 07/05/2006 | CN1796966A Clamp for preparing detection sample in use for electron microscope |
| 07/05/2006 | CN1263102C Plasma etching method and equipment for making semiconductor device |
| 07/05/2006 | CN1263097C Film processing method and film processing system |
| 07/05/2006 | CN1263080C 离子源 Ion source |
| 07/04/2006 | US7072798 Semiconductor fabricating apparatus |
| 07/04/2006 | US7071595 Translation and rotation positioning motor |