Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2006
08/02/2006EP1038046A4 Plasma reactor with a deposition shield
08/02/2006CN1813332A Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith
08/02/2006CN1813331A Electrostatic lens for ion beams
08/02/2006CN1812687A Atmospheric radio-frequency discharging high-speed cold plasma array generator
08/02/2006CN1812686A Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure
08/02/2006CN1812685A Plasma processing device
08/02/2006CN1812684A Plasma reactor overhead source power electrode
08/02/2006CN1812683A Plasma reactor for improving plasma uniformity and device damage reduction
08/02/2006CN1812682A Plasma processing device
08/02/2006CN1268178C Plasma generation system
08/02/2006CN1267965C Plasma processing system with dynamic gas distribution control
08/02/2006CN1267769C Plasma chamber
08/02/2006CN1267200C Contaminant collector trap for ion implanter
08/01/2006US7084832 Plasma production device and method and RF driver circuit with adjustable duty cycle
08/01/2006US7084573 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
08/01/2006US7084414 Charged particle beamlet exposure system
08/01/2006US7084413 Compact design; rotating adjustment of optics; forming image; calibration
08/01/2006US7084411 Pattern-definition device for maskless particle-beam exposure apparatus
08/01/2006US7084408 Vaporization and ionization of metals for use in semiconductor processing
08/01/2006US7084406 Detector arrangement and detection method
08/01/2006US7084400 Lattice strain measuring system and method
08/01/2006US7084399 Ion beam apparatus and sample processing method
08/01/2006US7084369 Harmonic multiplexer
08/01/2006US7083992 Method of observation by transmission electron microscopy
08/01/2006US7083702 RF current return path for a large area substrate plasma reactor
08/01/2006US7083701 Device and method for plasma processing, and slow-wave plate
07/2006
07/27/2006WO2006078526A1 In-situ cleaning of beam defining apertures in an ion implanter
07/27/2006WO2006077390A1 Improved method and apparatus for monitoring a microstructure etching process
07/27/2006WO2006060231A3 Electron confinement inside magnet of ion implanter
07/27/2006WO2006050632A3 Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates
07/27/2006WO2005112072A3 Segmented baffle plate assembly for a plasma processing system
07/27/2006US20060163498 Semiconductor device manufacturing method and ion implanter used therein
07/27/2006US20060163497 Ion beam device and ion beam processing method
07/27/2006US20060163494 Ion implantation method and method for manufacturing semiconductor device
07/27/2006US20060163490 Ion implantation cooling system
07/27/2006US20060163488 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
07/27/2006US20060163480 Inspection method and apparatus using charged particle beam
07/27/2006US20060163479 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method
07/27/2006US20060163478 Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system
07/27/2006US20060163469 Ion optics systems
07/27/2006US20060163201 Plasma processing system and plasma treatment process
07/27/2006US20060163059 Sputtering cathode, production method and corresponding cathode
07/27/2006US20060163054 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases
07/27/2006US20060162656 Reduced volume, high conductance process chamber
07/27/2006DE10329383B4 Ionenstrahldetektor für Ionenimplantationsanlagen, Faraday-Behälter dafür und Verfahren zur Steuerung der Eigenschaften eines Ionenstrahls mittels des Ionenstrahldetektors Ion beam detector for ion implantation systems, Faraday container therefor and method for controlling the properties of an ion beam using the ion beam detector
07/26/2006EP1684327A2 Sample holder and ion-beam processing system
07/26/2006EP1683994A2 Gas panel
07/26/2006EP1683889A1 Surface treatment method and device
07/26/2006EP1683888A2 Method and apparatus for cathodic arc deposition
07/26/2006EP1683178A2 Filtered cathodic arc plasma source
07/26/2006EP1683177A1 Gas port assembly
07/26/2006EP1683176A2 Ion implanter electrodes
07/26/2006EP1683163A2 Charged particle extraction device and method of design there for
07/26/2006EP1682445A1 Device and method for patterning structures on a substrate
07/26/2006EP1682254A2 Method and apparatus for rapid sample preparation in a focused ion beam microscope
07/26/2006EP1214459A4 Pulsed plasma processing method and apparatus
07/26/2006EP1016122B1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
07/26/2006EP0809719A4 Apparatus and method for a reliable return current path for sputtering processes
07/26/2006CN1809911A A high density plasma reactor
07/26/2006CN1809910A Thin magnetron structures for plasma generation in ion implantation systems
07/26/2006CN1809742A Time resolution measurement device and position detection electron multiplier
07/26/2006CN1809741A Time-resolved measurement apparatus
07/26/2006CN1808683A Electron source and charged particle device having same
07/26/2006CN1266304C Physical gas phase deposition target and method for producing metal material
07/25/2006US7081710 Elementary plasma source and plasma generation apparatus using the same
07/25/2006US7081634 Variably shaped beam EB writing system
07/25/2006US7081633 Apparatus, method and program for ion implantation simulation, and computer readable storage medium having stored therein the program
07/25/2006US7081630 Compact microcolumn for automated assembly
07/25/2006US7081625 Charged particle beam apparatus
07/20/2006WO2006076345A2 Reduced maintenance sputtering chambers
07/20/2006WO2006075715A1 Electron source manufacturing method
07/20/2006WO2006075691A1 Plasma source, ion source and method of ion generation
07/20/2006WO2006075575A1 Stage apparatus and exposure apparatus
07/20/2006WO2006075008A1 Microplasma array
07/20/2006WO2006074625A1 Compartment system of a longitudinally extending vacuum coating assembly
07/20/2006WO2006074624A1 Pumping duct of a longitudinally extending vacuum coating assembly
07/20/2006WO2005074001A3 Divergence-controlled hybrid multiple electron beam -emitting device
07/20/2006US20060159946 Member having plasma-resistance for semiconductor manufacturing apparatus and method for producing the same
07/20/2006US20060157649 Method for non-destructive trench depth measurement using electron beam source and X-ray detection
07/20/2006US20060157449 Plasma processing apparatus and a plasma processing method
07/20/2006US20060157346 Rotating tubular sputter target assembly
07/20/2006US20060157344 Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization
07/20/2006US20060157341 Thin piece specimen preparing method and composite charged particle beam device
07/20/2006US20060157201 Capacitively coupled plasma reactor with magnetic plasma control
07/20/2006US20060156984 Plasma processing apparatus and plasma processing method
07/20/2006DE102005000813A1 Verfahren zur Strahlkalibrierung und Verwendungen eines Kalibrierungskörpers Method for beam calibration and uses a calibration body
07/20/2006CA2594751A1 Reduced maintenance sputtering chambers
07/19/2006EP1681715A1 Plasma processing apparatus
07/19/2006EP1681706A1 Plasma processing apparatus
07/19/2006EP1681705A1 Plasma processing apparatus
07/19/2006EP1680810A2 Methods and apparatus for optimizing a substrate in a plasma processing system
07/19/2006EP1680800A2 Method and device for ion beam processing of surfaces
07/19/2006CN1806310A Method and device for removing layers in some areas of glass plates
07/19/2006CN1806309A A hybrid magnetic/electrostatic deflector for ion implantation systems
07/19/2006CN1806063A Deflection magnetic field type vacuum arc vapor deposition device
07/19/2006CN1265437C Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position
07/19/2006CN1265185C Organic luminescent diode electronic microscope test block and making process thereof
07/18/2006US7079994 Method and system for producing semiconductor devices
07/18/2006US7079085 Antenna structure for inductively coupled plasma generator
07/18/2006US7078994 Constant power and temperature coil