Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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08/02/2006 | EP1038046A4 Plasma reactor with a deposition shield |
08/02/2006 | CN1813332A Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
08/02/2006 | CN1813331A Electrostatic lens for ion beams |
08/02/2006 | CN1812687A Atmospheric radio-frequency discharging high-speed cold plasma array generator |
08/02/2006 | CN1812686A Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure |
08/02/2006 | CN1812685A Plasma processing device |
08/02/2006 | CN1812684A Plasma reactor overhead source power electrode |
08/02/2006 | CN1812683A Plasma reactor for improving plasma uniformity and device damage reduction |
08/02/2006 | CN1812682A Plasma processing device |
08/02/2006 | CN1268178C Plasma generation system |
08/02/2006 | CN1267965C Plasma processing system with dynamic gas distribution control |
08/02/2006 | CN1267769C Plasma chamber |
08/02/2006 | CN1267200C Contaminant collector trap for ion implanter |
08/01/2006 | US7084832 Plasma production device and method and RF driver circuit with adjustable duty cycle |
08/01/2006 | US7084573 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition |
08/01/2006 | US7084414 Charged particle beamlet exposure system |
08/01/2006 | US7084413 Compact design; rotating adjustment of optics; forming image; calibration |
08/01/2006 | US7084411 Pattern-definition device for maskless particle-beam exposure apparatus |
08/01/2006 | US7084408 Vaporization and ionization of metals for use in semiconductor processing |
08/01/2006 | US7084406 Detector arrangement and detection method |
08/01/2006 | US7084400 Lattice strain measuring system and method |
08/01/2006 | US7084399 Ion beam apparatus and sample processing method |
08/01/2006 | US7084369 Harmonic multiplexer |
08/01/2006 | US7083992 Method of observation by transmission electron microscopy |
08/01/2006 | US7083702 RF current return path for a large area substrate plasma reactor |
08/01/2006 | US7083701 Device and method for plasma processing, and slow-wave plate |
07/27/2006 | WO2006078526A1 In-situ cleaning of beam defining apertures in an ion implanter |
07/27/2006 | WO2006077390A1 Improved method and apparatus for monitoring a microstructure etching process |
07/27/2006 | WO2006060231A3 Electron confinement inside magnet of ion implanter |
07/27/2006 | WO2006050632A3 Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates |
07/27/2006 | WO2005112072A3 Segmented baffle plate assembly for a plasma processing system |
07/27/2006 | US20060163498 Semiconductor device manufacturing method and ion implanter used therein |
07/27/2006 | US20060163497 Ion beam device and ion beam processing method |
07/27/2006 | US20060163494 Ion implantation method and method for manufacturing semiconductor device |
07/27/2006 | US20060163490 Ion implantation cooling system |
07/27/2006 | US20060163488 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
07/27/2006 | US20060163480 Inspection method and apparatus using charged particle beam |
07/27/2006 | US20060163479 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method |
07/27/2006 | US20060163478 Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system |
07/27/2006 | US20060163469 Ion optics systems |
07/27/2006 | US20060163201 Plasma processing system and plasma treatment process |
07/27/2006 | US20060163059 Sputtering cathode, production method and corresponding cathode |
07/27/2006 | US20060163054 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
07/27/2006 | US20060162656 Reduced volume, high conductance process chamber |
07/27/2006 | DE10329383B4 Ionenstrahldetektor für Ionenimplantationsanlagen, Faraday-Behälter dafür und Verfahren zur Steuerung der Eigenschaften eines Ionenstrahls mittels des Ionenstrahldetektors Ion beam detector for ion implantation systems, Faraday container therefor and method for controlling the properties of an ion beam using the ion beam detector |
07/26/2006 | EP1684327A2 Sample holder and ion-beam processing system |
07/26/2006 | EP1683994A2 Gas panel |
07/26/2006 | EP1683889A1 Surface treatment method and device |
07/26/2006 | EP1683888A2 Method and apparatus for cathodic arc deposition |
07/26/2006 | EP1683178A2 Filtered cathodic arc plasma source |
07/26/2006 | EP1683177A1 Gas port assembly |
07/26/2006 | EP1683176A2 Ion implanter electrodes |
07/26/2006 | EP1683163A2 Charged particle extraction device and method of design there for |
07/26/2006 | EP1682445A1 Device and method for patterning structures on a substrate |
07/26/2006 | EP1682254A2 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
07/26/2006 | EP1214459A4 Pulsed plasma processing method and apparatus |
07/26/2006 | EP1016122B1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages |
07/26/2006 | EP0809719A4 Apparatus and method for a reliable return current path for sputtering processes |
07/26/2006 | CN1809911A A high density plasma reactor |
07/26/2006 | CN1809910A Thin magnetron structures for plasma generation in ion implantation systems |
07/26/2006 | CN1809742A Time resolution measurement device and position detection electron multiplier |
07/26/2006 | CN1809741A Time-resolved measurement apparatus |
07/26/2006 | CN1808683A Electron source and charged particle device having same |
07/26/2006 | CN1266304C Physical gas phase deposition target and method for producing metal material |
07/25/2006 | US7081710 Elementary plasma source and plasma generation apparatus using the same |
07/25/2006 | US7081634 Variably shaped beam EB writing system |
07/25/2006 | US7081633 Apparatus, method and program for ion implantation simulation, and computer readable storage medium having stored therein the program |
07/25/2006 | US7081630 Compact microcolumn for automated assembly |
07/25/2006 | US7081625 Charged particle beam apparatus |
07/20/2006 | WO2006076345A2 Reduced maintenance sputtering chambers |
07/20/2006 | WO2006075715A1 Electron source manufacturing method |
07/20/2006 | WO2006075691A1 Plasma source, ion source and method of ion generation |
07/20/2006 | WO2006075575A1 Stage apparatus and exposure apparatus |
07/20/2006 | WO2006075008A1 Microplasma array |
07/20/2006 | WO2006074625A1 Compartment system of a longitudinally extending vacuum coating assembly |
07/20/2006 | WO2006074624A1 Pumping duct of a longitudinally extending vacuum coating assembly |
07/20/2006 | WO2005074001A3 Divergence-controlled hybrid multiple electron beam -emitting device |
07/20/2006 | US20060159946 Member having plasma-resistance for semiconductor manufacturing apparatus and method for producing the same |
07/20/2006 | US20060157649 Method for non-destructive trench depth measurement using electron beam source and X-ray detection |
07/20/2006 | US20060157449 Plasma processing apparatus and a plasma processing method |
07/20/2006 | US20060157346 Rotating tubular sputter target assembly |
07/20/2006 | US20060157344 Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
07/20/2006 | US20060157341 Thin piece specimen preparing method and composite charged particle beam device |
07/20/2006 | US20060157201 Capacitively coupled plasma reactor with magnetic plasma control |
07/20/2006 | US20060156984 Plasma processing apparatus and plasma processing method |
07/20/2006 | DE102005000813A1 Verfahren zur Strahlkalibrierung und Verwendungen eines Kalibrierungskörpers Method for beam calibration and uses a calibration body |
07/20/2006 | CA2594751A1 Reduced maintenance sputtering chambers |
07/19/2006 | EP1681715A1 Plasma processing apparatus |
07/19/2006 | EP1681706A1 Plasma processing apparatus |
07/19/2006 | EP1681705A1 Plasma processing apparatus |
07/19/2006 | EP1680810A2 Methods and apparatus for optimizing a substrate in a plasma processing system |
07/19/2006 | EP1680800A2 Method and device for ion beam processing of surfaces |
07/19/2006 | CN1806310A Method and device for removing layers in some areas of glass plates |
07/19/2006 | CN1806309A A hybrid magnetic/electrostatic deflector for ion implantation systems |
07/19/2006 | CN1806063A Deflection magnetic field type vacuum arc vapor deposition device |
07/19/2006 | CN1265437C Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position |
07/19/2006 | CN1265185C Organic luminescent diode electronic microscope test block and making process thereof |
07/18/2006 | US7079994 Method and system for producing semiconductor devices |
07/18/2006 | US7079085 Antenna structure for inductively coupled plasma generator |
07/18/2006 | US7078994 Constant power and temperature coil |