| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/17/2006 | WO2005104186A3 Method and processing system for plasma-enhanced cleaning of system components |
| 08/17/2006 | US20060183344 Barrier layer for a processing element and a method of forming the same |
| 08/17/2006 | DE112004001895T5 Elektonenspektroskop mit Emission, die durch einen monochromatischen Elektronenstrahl induziert wird Elektonenspektroskop emission induced by a monochromatic electron beam |
| 08/17/2006 | DE102005005801A1 Elektrostatisches Ablenksystem für Korpuskularstrahlung An electrostatic deflection system for corpuscular |
| 08/17/2006 | DE102005005709A1 Verfahren und Einrichtung zur Bearbeitung von Materialoberflächen Method and apparatus for processing of material surfaces |
| 08/17/2006 | DE10200279B4 Gasinjektor-Anordnung mit Gasinjektoren aus einem Keramikmaterialblock mit Gasinjektorlöchern, die sich durch diesen erstrecken, und ein die Gasinjektor-Anordnung enthaltenes Ätzgerät Gas injector assembly with gas injectors of a ceramic block with Gasinjektorlöchern extending therethrough, and the gas injector arrangement contained etcher |
| 08/16/2006 | EP1691396A2 Plasma reactor with overhead electrode having cylindrical gas outlets |
| 08/16/2006 | EP1691395A1 Ion beam device |
| 08/16/2006 | EP1690626A2 Electron beam welding method and apparatus with a slit plate and measuring device for determining a location of the electron beam |
| 08/16/2006 | EP1690279A2 Plasma source with segmented magnetron cathode |
| 08/16/2006 | EP1690278A1 Rf metrology characterization for field installation and serviceability of plasma processing systems |
| 08/16/2006 | EP1690264A2 Method and apparatus for modifying object with electrons generated from cold cathode electron emitter |
| 08/16/2006 | EP1504405A4 Optical projection imaging system and method for automatically detecting cells with molecular marker compartmentalization associated with disease |
| 08/16/2006 | EP1488443B1 Device for confinement of a plasma within a volume |
| 08/16/2006 | EP1387897B1 Electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo |
| 08/16/2006 | EP1348227B1 Charging control and dosimetry system and method for gas cluster ion beam |
| 08/16/2006 | EP1018088A4 System and method for monitoring and controlling gas plasma processes |
| 08/16/2006 | CN1820347A High resolution atom probe |
| 08/16/2006 | CN1820346A Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 08/16/2006 | CN1820194A Scanning electron microscope having multiple detectors and a method for multiple detector based imaging |
| 08/16/2006 | CN1270419C Ionization system for low-voltage modularized room |
| 08/16/2006 | CN1270349C Device and method for generating local plasma by micro-structure electrode discharges with microwaves |
| 08/16/2006 | CN1269989C Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 08/15/2006 | US7091504 Electron beam exposure system |
| 08/15/2006 | US7091503 Measuring plasma uniformity in-situ at wafer level |
| 08/15/2006 | US7091499 Ultraviolet irradiating method and an apparatus using the same |
| 08/15/2006 | US7091498 Rotating specimen holder |
| 08/15/2006 | US7091497 Particle-optical device for irradiating an object |
| 08/15/2006 | US7091496 Electron microscopic inspection apparatus |
| 08/15/2006 | US7091492 Imaging device comprising optically coupled fiber optic plate assembly |
| 08/15/2006 | US7091485 Methods and systems for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles |
| 08/15/2006 | US7091484 Method and apparatus for crystal analysis |
| 08/15/2006 | US7091054 Manufacturing method for emitter for electron-beam projection lithography |
| 08/15/2006 | US7090754 Sputtering device |
| 08/15/2006 | US7090742 Device for producing inductively coupled plasma and method thereof |
| 08/15/2006 | US7090705 Electronic device, production method thereof, and plasma process apparatus |
| 08/10/2006 | WO2006084143A2 Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery |
| 08/10/2006 | WO2006084001A1 Sputter targets with expansion grooves for reduced separation |
| 08/10/2006 | WO2006083886A2 Ion source for use in an ion implanter |
| 08/10/2006 | WO2006083754A2 Radiantly heated cathode for an electron gun and heating assembly |
| 08/10/2006 | WO2006083627A1 Plasma sensors for endpoint and end-of-life detection with self-diagnostic sensor |
| 08/10/2006 | WO2006083415A2 Improving beam neutralization in low-energy high-current ribbon-beam implanters |
| 08/10/2006 | WO2006083332A1 Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece |
| 08/10/2006 | WO2006082758A1 Interferometer |
| 08/10/2006 | WO2006082714A1 Scan beam irradiation device |
| 08/10/2006 | WO2006054086A3 Focussing mask |
| 08/10/2006 | WO2006004399A3 Method and means for generation of a plasma at atmospheric pressure |
| 08/10/2006 | US20060176045 Plasma reactor and method of determining abnormality in plasma reactor |
| 08/10/2006 | US20060175548 Charged particle beam apparatus |
| 08/10/2006 | US20060175292 System and method for anisotropically etching a recess in a silicon substrate |
| 08/10/2006 | US20060175197 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
| 08/10/2006 | US20060175190 Vacuum arc source comprising a device for generating a magnetic field |
| 08/10/2006 | US20060175015 Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| 08/10/2006 | DE10237829B4 Verfahren und Gerät zur Sicherstellung einer richtigen Orientierung eines Objektes für eine Ionenimplantation Method and apparatus for ensuring proper orientation of an object for an ion implantation |
| 08/10/2006 | DE10210739B4 Probenhalter, Hilfsvorrichtung zum Halten der Probe in diesem Probenhalter und Verfahren zum Halten der Probe unter Verwendung derselben Sample holder, auxiliary means for holding the sample in the sample holder and method of holding the specimen by using the same |
| 08/10/2006 | DE102006003422A1 Muster-Festlegungsverfahren und Muster-Festlegungsvorrichtung Pattern determination method and pattern-setting device |
| 08/10/2006 | DE102005020089A1 Lithography method for semiconductor manufacturing area, involves specifying strips of substrate arranged with distance from one of strips with part of sample, where third strip has distance, from former strip, smaller than latter strip |
| 08/09/2006 | CN1816893A RF pulsing of a narrow gap capacitively coupled reactor |
| 08/09/2006 | CN1816892A Beam uniformity and angular distribution measurement system |
| 08/09/2006 | CN1815162A Bombarding reaction method for quick thinning transmissive electric mirror |
| 08/09/2006 | CN1269187C Electronic projection photoetching device using secondary electronic |
| 08/09/2006 | CN1269178C Wafer area pressure control |
| 08/09/2006 | CN1268782C Ion electroplating apparatus and ion electroplating method |
| 08/08/2006 | US7088048 Device and process for switching and controlling an electron dose emitted by a micro-emitter |
| 08/08/2006 | US7088047 reduced electron temperature for etching oxide film, ensure high selectivity by reducing a volume of chamber, can accurately fabricate a large-diameter semiconductor wafer by establishing rotation symmetry of a plasma density profile; ground end of antenna elements is positioned close to the chamber |
| 08/08/2006 | US7088046 Integrated process tube and electrostatic shield, assembly thereof and manufacture thereof |
| 08/08/2006 | US7087913 Ion implanter electrodes |
| 08/08/2006 | US7087912 Ion beam irradiation apparatus for suppressing charge up of substrate and method for the same |
| 08/08/2006 | US7087910 Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method |
| 08/08/2006 | US7087899 Sample electrification measurement method and charged particle beam apparatus |
| 08/08/2006 | US7086347 Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 08/03/2006 | WO2006049817A3 Systems and methods for ion beam focusing |
| 08/03/2006 | WO2006034130A3 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 08/03/2006 | WO2005100636A3 Techniques for packaging and encapsulating components of diagnostic plasma measurement devices |
| 08/03/2006 | US20060172544 Member for plasma etching device and method for manufacture thereof |
| 08/03/2006 | US20060169928 Radiantly heated cathode for an electron gun and heating assembly |
| 08/03/2006 | US20060169926 Electron beam lithography apparatus and lithography method |
| 08/03/2006 | US20060169924 Controlling the characteristics of implanter ion-beams |
| 08/03/2006 | US20060169923 Sample holder and ion-beam processing system |
| 08/03/2006 | US20060169922 Ion implant ion beam parallelism and direction integrity determination and adjusting |
| 08/03/2006 | US20060169921 Ion source for use in an ion implanter |
| 08/03/2006 | US20060169920 Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators |
| 08/03/2006 | US20060169918 Information acquistion method and apparatus for information acquistion |
| 08/03/2006 | US20060169910 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens |
| 08/03/2006 | US20060169900 Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 08/03/2006 | US20060169896 Pattern specification method and pattern specification apparatus |
| 08/03/2006 | US20060169673 Plasma processing method and apparatus |
| 08/03/2006 | US20060169670 Method for etching a sample and etching system |
| 08/03/2006 | DE10317894B4 Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Focusing of charged particles, electron microscopy and electron microscopy system method |
| 08/03/2006 | DE102006003108A1 Electron-beam deposition system, has trailing-indicator monitor measuring past evaporation performance of evaporation source, and leading-indicator monitor measuring future evaporation performance of evaporation source |
| 08/03/2006 | DE10156275B4 Detektoranordnung und Detektionsverfahren Detector array and detection method |
| 08/03/2006 | DE10048646B4 Element zur Bestrahlung in einer Bearbeitungsvorrichtung mit geladenem Strahl und Elektronenstrahl-Belichtungsvorrichtung Element in a processing apparatus for irradiating with a charged beam, and electron beam exposure apparatus |
| 08/02/2006 | EP1686612A1 Plasma reactor with D. C. coils |
| 08/02/2006 | EP1686611A1 Apparatus and method for plasma processing with enhanced confinement and flow conductance |
| 08/02/2006 | EP1686610A2 Aberration adjusting method, device fabrication method, and charged particle beam lithography machine |
| 08/02/2006 | EP1686609A2 Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus |
| 08/02/2006 | EP1684966A1 Unit for the continuous treatment of the surface of objects, and treatment method |
| 08/02/2006 | EP1684915A1 Method and device for continuous treatment of the surface of an elongate object |
| 08/02/2006 | EP1262093A4 Apparatus for fixing an electrode in plasma polymerizing apparatus |
| 08/02/2006 | EP1095217A4 Plasma vacuum pumping cell |