Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2006
08/31/2006US20060193037 Vacuum chamber with recessed viewing tube and imaging device situated therein
08/31/2006US20060192150 Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam
08/31/2006US20060192149 Parameter control in a lithographic apparatus using polarization
08/31/2006US20060192148 Electron beam irradiating apparatus and irradiating method
08/31/2006US20060192145 Charged particle beam apparatus and method for operating the same
08/31/2006US20060192141 Method and devices for producing corpuscular radiation systems
08/31/2006US20060192140 Process for electron sterilization of a container
08/31/2006US20060192120 Charged-particle-beam mapping projection-optical systems and methods for adjusting same
08/31/2006US20060192119 Method of measurement accuracy improvement by control of pattern shrinkage
08/31/2006US20060192117 Inspection method and apparatus using an electron beam
08/31/2006US20060192116 Charged particle beam device probe operation
08/31/2006US20060192114 Processing probe, processing apparatus, and method of manufacturing the processing probe
08/31/2006US20060192099 Method and apparatus for specimen fabrication
08/31/2006US20060191479 Surface treatment apparatus
08/31/2006US20060191478 High density plasma CVD chamber
08/31/2006DE19651811B4 Vorrichtung zum Belegen eines Substrats mit dünnen Schichten Device to occupy a substrate with thin layers
08/31/2006DE10238347B4 Vorrichtung zum Auffangen von Ionen in einem Massenspektrometer A device for trapping ions in a mass spectrometer
08/30/2006EP1696219A1 Repetitive circumferential milling for sample preparation
08/30/2006EP1695599A1 Neutral particle beam processing apparatus
08/30/2006EP1695370A1 Apparatus and method for plasma processing
08/30/2006EP1695369A2 Method and apparatus for extending equipment uptime in ion implantation
08/30/2006EP1695038A2 Controlling the flow of vapors sublimated from solids
08/30/2006EP1018140A4 Electron sources having shielded cathodes
08/30/2006EP0978137A4 Apparatus and method for a modular electron beam system for the treatment of surfaces
08/30/2006CN1826685A Method and system for electronic spatial filtering of spectral reflectometer optical signals
08/30/2006CN1826679A RF current return path for a large area substrate plasma reactor
08/30/2006CN1826523A Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system
08/30/2006CN1825536A Substrate processing apparatus and substrate processing method
08/29/2006US7098614 Electrostatic accelerator and ion implanting apparatus with the same
08/29/2006US7098599 Plasma generator
08/29/2006US7098468 Raster frame beam system for electron beam lithography
08/29/2006US7098464 Electron beam writing equipment and electron beam writing method
08/29/2006US7098457 Electron beam apparatus and device manufacturing method using same
08/29/2006US7098456 Method and apparatus for accurate e-beam metrology
08/29/2006US7098455 Method of inspecting a circuit pattern and inspecting instrument
08/29/2006US7098453 Scanning probe microscopy system and method of measurement by the same
08/29/2006US7098448 Method and apparatus for measuring beam spot of scanning light
08/29/2006US7098055 Apparatus and method for testing defects
08/29/2006US7097782 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semiconductor substrate deposition apparatus, and microwave plasma generating antenna assembly
08/29/2006US7097744 target device with a sputterable target surface, an alignment surface and a target support movable between a first and second target position and a darkspace shield
08/29/2006US7097735 Plasma processing device
08/29/2006US7096819 Inductive plasma processor having coil with plural windings and method of controlling plasma density
08/24/2006WO2006088486A1 Electron beam diagnostic for profiling high power beams
08/24/2006WO2006088159A1 Electron microscope and composite irradiation lens
08/24/2006WO2006088141A1 Electron beam device
08/24/2006WO2006088114A1 Plasma treatment apparatus
08/24/2006WO2006087558A2 Apparatus and method for the application of a material layer to display devices
08/24/2006WO2006086815A2 Charged-particle exposure apparatus
08/24/2006WO2006065476A3 Imaging device comprising optically coupled fiber optic plate assembly
08/24/2006WO2006063035A3 Plasma ion implantation system with axial electrostatic confinement
08/24/2006WO2006060827A3 Methods and apparatus for downstream dissociation of gases
08/24/2006WO2006035403A3 Cleaning device and process for scanning tunneling microscopy (stm) tip
08/24/2006WO2005101100A3 Method and apparatus for in-situ film stack processing
08/24/2006US20060189006 Method and apparatus for detecting end point
08/24/2006US20060188660 Method for depositing multilayer coatings
08/24/2006US20060186337 Scanning electron microscope
08/24/2006US20060185795 Anodized substrate support
08/24/2006US20060185594 Plasma treating apparatus and its electrode structure
08/24/2006US20060185424 Integrated measuring instrument
08/23/2006EP1693880A2 Diffuser gravity support
08/23/2006EP1693879A2 Scanning electron microscope
08/23/2006EP1693877A1 High current density ion source
08/23/2006EP1693014A1 Apparatus and method for calibration of thermal energy delivery in plasma tissue surface treatment system
08/23/2006EP1692715A1 Umbilical cord facilities connection for an ion beam implanter
08/23/2006EP1692711A1 Method and apparatus for reactive solid-gas plasma deposition
08/23/2006EP1691938A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
08/23/2006EP0758756B2 Transparent heating plate and transparent heating device
08/23/2006CN1823180A Capacitively coupled plasma reactor with uniform radial distribution of plasma
08/23/2006CN1822745A Plasma generation apparatus
08/23/2006CN1822317A Electrode subassembly
08/23/2006CN1822305A 扫描电子显微镜 Scanning electron microscope
08/23/2006CN1271688C Plasma etching of silicon carbide
08/23/2006CN1271665C Ion source operation method, and ion beam radiation device
08/23/2006CN1270871C Reaction bombardment method for improving surface finish degree of diamond
08/22/2006US7095699 Detection apparatus, detection method and electron beam irradiation apparatus
08/22/2006US7095179 generator comprising enclosures for confining gases, anodes, cathodes and power sources, used for ionization
08/22/2006US7095178 Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method
08/22/2006US7095037 Electron beam lithography system having improved electron gun
08/22/2006US7095036 Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter
08/22/2006US7095035 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus
08/22/2006US7095031 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor
08/22/2006US7095024 TEM sample equipped with an identifying function, focused ion beam device for processing TEM sample, and transmission electron microscope
08/22/2006US7095023 Charged particle beam apparatus, charged particle detection method, and method of manufacturing semiconductor device
08/22/2006US7095022 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
08/22/2006US7095021 Method, apparatus and system for specimen fabrication by using an ion beam
08/22/2006US7095020 Sensing mode atomic force microscope
08/22/2006US7094706 Device and method for etching a substrate by using an inductively coupled plasma
08/22/2006US7094685 Integration of titanium and titanium nitride layers
08/22/2006US7094670 doping film comprising semiconductors, by placing electrostatic chuck in reactors, charging doping precursors into the reactor and applying radio frequency power to generate gases, and applying voltage to an electrode of the electrostatic chuck
08/22/2006US7094316 Externally excited torroidal plasma source
08/22/2006US7094315 Chamber configuration for confining a plasma
08/22/2006US7094313 Universal mid-frequency matching network
08/22/2006US7094312 Focused particle beam systems and methods using a tilt column
08/17/2006WO2006086300A2 Control of process gases in specimen surface treatment system using plasma
08/17/2006WO2006085994A2 Multi-component substances and apparatus for preparation thereof
08/17/2006WO2006085576A1 Plasma source, ion source, and ion generating method
08/17/2006WO2006085391A1 Observation technology by coherent wave
08/17/2006WO2006084298A1 Charged-particle exposure apparatus with electrostatic zone plate
08/17/2006WO2006021961A3 Sample enclosure for inspection and methods of use thereof
08/17/2006WO2006014633A3 Electrostatic lens for ion beams