Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2014
12/09/2014US8906791 Method of improving film non-uniformity and throughput
12/09/2014US8906708 Method for checking ion implantation condition and method for manufacturing semiconductor wafer
12/09/2014US8906249 Plasma processing apparatus and plasma processing method
12/09/2014US8906208 Sputtering apparatus, sputtering method, and electronic device manufacturing method
12/09/2014US8906207 Control of film composition in co-sputter deposition by using collimators
12/09/2014US8906197 Plasma processing chamber having electrodes for cleaning chamber
12/09/2014US8906196 Plasma processing apparatus and method for controlling the same
12/09/2014US8906195 Tuning hardware for plasma ashing apparatus and methods of use thereof
12/09/2014US8906161 Semiconductor producing device and semiconductor device producing method
12/09/2014US8905369 Vibration isolation module and substrate processing system
12/09/2014US8904957 Plasma processor and plasma processing method
12/09/2014US8904956 Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
12/04/2014US20140359542 Method and system for dimensional uniformity using charged particle beam lithography
12/04/2014US20140356985 Temperature controlled substrate support assembly
12/04/2014US20140356550 Film forming apparatus, film forming method and non-transitory storage medium
12/04/2014US20140356547 System and method of improving implant quality in a plasma-based implant system
12/04/2014US20140356229 Uv devices, systems and methods for uv sterilization
12/04/2014US20140354969 Methods and Apparatus for Measuring A Property of a Substrate
12/04/2014US20140354173 Impedance matching device
12/04/2014US20140354149 Apparatus for generating a hollow cathode arc discharge plasma
12/04/2014US20140353527 Using Wafer Geometry to Improve Scanner Correction Effectiveness for Overlay Control
12/04/2014US20140353526 Method and system for forming high accuracy patterns using charged particle beam lithography
12/04/2014US20140353525 Control module for an ion implanter
12/04/2014US20140353517 High-energy ion implanter
12/04/2014US20140353500 Charged particle beam microscope, sample holder for charged particle beam microscope, and charged particle beam microscopy
12/04/2014US20140353499 Sample holder for electron microscope
12/04/2014US20140353498 System and Method of SEM Overlay Metrology
12/04/2014US20140353151 Charged particle beam irradiation apparatus
12/04/2014US20140353150 Sputtering apparatus
12/04/2014US20140353142 Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect element
12/04/2014US20140352890 Substrate processing apparatus
12/02/2014US8901523 Apparatus for protecting EUV optical elements
12/02/2014US8901520 Particle beam irradiation apparatus
12/02/2014US8901510 Particle beam device having a detector arrangement
12/02/2014US8901494 Sample analyzer
12/02/2014US8901493 Electron microscope
12/02/2014US8901492 Three-dimensional semiconductor image reconstruction apparatus and method
12/02/2014US8900982 Techniques for processing a substrate
12/02/2014US8900778 Method for forming circular patterns on a surface
12/02/2014US8900471 In situ plasma clean for removal of residue from pedestal surface without breaking vacuum
12/02/2014US8900428 Sputtering apparatus
12/02/2014US8900427 Homing device for magnetron rotating on two arms
12/02/2014US8900419 Method of switching magnetic flux distribution
12/02/2014US8900405 Plasma immersion ion implantation reactor with extended cathode process ring
12/02/2014US8900404 Plasma processing systems with mechanisms for controlling temperatures of components
12/02/2014US8900403 Semiconductor processing system having multiple decoupled plasma sources
12/02/2014US8900402 Semiconductor processing system having multiple decoupled plasma sources
12/02/2014US8900401 Plasma processing method and apparatus
12/02/2014US8900398 Local plasma confinement and pressure control arrangement and methods thereof
12/02/2014US8898889 Chuck assembly for plasma processing
11/2014
11/27/2014US20140350324 Particle beam irradiation apparatus and particle beam therapy system
11/27/2014US20140349493 Methods and apparatuses for energetic neutral flux generation for processing a substrate
11/27/2014US20140349418 Plasma processing method
11/27/2014US20140349235 Drawing apparatus, and method of manufacturing article
11/27/2014US20140349073 Aerosol deposition coating for semiconductor chamber components
11/27/2014US20140347038 Method of Reconstructing Electrical Probes
11/27/2014US20140346952 Remote plasma system having self-management function and self management method of the same
11/27/2014US20140346875 Method and apparatus for providing power
11/27/2014US20140346369 Multi charged particle beam writing apparatus, and multi charged particle beam writing method
11/27/2014US20140346355 Electron microscope
11/27/2014US20140346354 Generation of charged particle vortex waves
11/27/2014US20140346353 Charged particle vortex wave generation
11/27/2014US20140346352 Sample supporting member for observing scanning electron microscopic image and method for observing scanning electron microscopic image
11/27/2014US20140346351 Orientation imaging using wide angle convergent beam diffraction in transmission electron microscopy
11/27/2014US20140346350 Multi-column Electron Beam Inspection that uses custom printing methods
11/27/2014US20140346349 Drawing apparatus, and method of manufacturing article
11/27/2014US20140346040 Substrate processing apparatus
11/27/2014US20140346038 Crystalline alloy having glass-forming ability, preparation method thereof, alloy target for sputtering, and preparation method thereof
11/27/2014US20140346037 Sputter device
11/27/2014US20140345802 Plasma processing apparatus
11/27/2014US20140345645 Copper residue chamber clean
11/27/2014US20140345644 Method For Cleaning Reaction Chamber Using Pre-cleaning Process
11/25/2014US8897910 Particle beam-assisted ultra-precision machining method for single-crystal brittle materials
11/25/2014US8896211 Physical means and methods for inducing regenerative effects on living tissues and fluids
11/25/2014US8896210 Plasma processing apparatus and method
11/25/2014US8896195 Filament for electron source
11/25/2014US8895945 Dose measurement device for plasma-immersion ion implantation
11/25/2014US8895944 Scan head and scan arm using the same
11/25/2014US8895943 Lithography system and method of processing substrates in such a lithography system
11/25/2014US8895923 System and method for non-contact microscopy for three-dimensional pre-characterization of a sample for fast and non-destructive on sample navigation during nanoprobing
11/25/2014US8895922 Electron beam apparatus
11/25/2014US8895921 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus
11/25/2014US8895889 Methods and apparatus for rapidly responsive heat control in plasma processing devices
11/25/2014US8895212 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
11/25/2014US8895116 Manufacturing method of crystalline semiconductor film and manufacturing method of semiconductor device
11/25/2014US8894806 Plasma processing apparatus and plasma processing method
11/25/2014US8894805 Electron beam plasma source with profiled magnet shield for uniform plasma generation
11/25/2014US8894804 Plasma unconfinement sensor and methods thereof
11/25/2014US8894796 Nanopore fabrication and applications thereof
11/25/2014US8894767 Flow control features of CVD chambers
11/25/2014US8894522 Drive end-block for a rotatable magnetron
11/20/2014US20140339981 Antenna for plasma generation, plasma processing apparatus and plasma processing method
11/20/2014US20140339980 Electron beam plasma source with remote radical source
11/20/2014US20140339545 Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device
11/20/2014US20140339436 Back scattered electron detector
11/20/2014US20140339435 System for detecting and counting ions
11/20/2014US20140339425 Scanning electron beam device and dimension measurement method using same
11/20/2014US20140339424 Device for mass selective determination of an ion
11/20/2014US20140339193 Plasma Processing Method
11/20/2014US20140339073 Sputtering Target and Oxide Semiconductor Film
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