| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/19/2006 | US7109660 Plasma processing device and baffle plate thereof |
| 09/19/2006 | US7109502 Device for irradiating a target with a hadron-charged beam, use in hadrontherapy |
| 09/19/2006 | US7109501 Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device |
| 09/19/2006 | US7109499 Apparatus and methods for two-dimensional ion beam profiling |
| 09/19/2006 | US7109494 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/19/2006 | US7109493 Particle beam generator |
| 09/19/2006 | US7109487 Particle beam device |
| 09/19/2006 | US7109486 Layered electron beam column and method of use thereof |
| 09/19/2006 | US7109485 Charged particle beam apparatus |
| 09/19/2006 | US7109484 Sheet beam-type inspection apparatus |
| 09/19/2006 | US7109483 Method for inspecting substrate, substrate inspecting system and electron beam apparatus |
| 09/19/2006 | US7109482 Object inspection and/or modification system and method |
| 09/19/2006 | US7109123 Silicon etching method |
| 09/19/2006 | US7109122 Method and apparatus for reducing substrate charging damage |
| 09/19/2006 | US7108751 Method and apparatus for determining consumable lifetime |
| 09/19/2006 | US7107929 Ion implantation ion source, system and method |
| 09/14/2006 | WO2006096818A1 Methods and apparatus for enabling multiple process steps on a single substrate |
| 09/14/2006 | WO2006096674A1 Gas baffle and distributor for semiconductor processing chamber |
| 09/14/2006 | WO2006096618A1 High conductance ion source |
| 09/14/2006 | WO2006094905A1 Single, right-angled end-block |
| 09/14/2006 | WO2006034130B1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 09/14/2006 | US20060205190 Semiconductor etching apparatus and method of etching semiconductor devices using same |
| 09/14/2006 | US20060205188 Plasma igniting method and substrate processing method |
| 09/14/2006 | US20060202119 Semiconductor device tester |
| 09/14/2006 | US20060201533 Cvd apparatus and method for cleaning cvd apparatus |
| 09/13/2006 | EP1701376A1 Vacuum plasma generator |
| 09/13/2006 | CN1833296A Antenna for producing uniform process rates |
| 09/13/2006 | CN1833050A Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 09/13/2006 | CN1832100A One-dimensional mechanical scaning device of ion implantation apparatus |
| 09/13/2006 | CN1275295C Surface modification method |
| 09/13/2006 | CN1274875C Cylindrical magnetron target and apparatus for affixing target to rotatable spindle assembly |
| 09/12/2006 | US7105844 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems |
| 09/12/2006 | US7105843 Method and system for controlling focused ion beam alignment with a sample |
| 09/12/2006 | US7105842 Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 09/12/2006 | US7105841 Photolithographic techniques for producing angled lines |
| 09/12/2006 | US7105840 Ion source for use in an ion implanter |
| 09/12/2006 | US7105839 Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams |
| 09/12/2006 | US7105838 Multi directional mechanical scanning in an ion implanter |
| 09/12/2006 | US7105836 Method and apparatus for cooling a reticle during lithographic exposure |
| 09/12/2006 | US7105833 Deflection system for a particle beam device |
| 09/12/2006 | US7105816 Electron beam device |
| 09/12/2006 | US7105815 Method and apparatus for collecting defect images |
| 09/12/2006 | US7105814 Electron microscopy system and electron microscopy method |
| 09/12/2006 | US7105813 Method and apparatus for analyzing the composition of an object |
| 09/12/2006 | US7105208 Methods and processes utilizing microwave excitation |
| 09/12/2006 | US7105199 Depositing a drug onto a surface of a medical device;forming a gas cluster ion beam in a vacuum chamber, irradiating the deposited drug and the surface of the medical device with the beam to adhere the drug to the surface of the medical device; coronary stents, implantable prostheses |
| 09/12/2006 | US7105102 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 09/12/2006 | US7105100 System and method for gas distribution in a dry etch process |
| 09/12/2006 | US7105080 Digital, programmable unit with storage means for the operating programs |
| 09/12/2006 | US7104217 Plasma processing apparatus |
| 09/08/2006 | WO2006093953A1 Sputtering target with an insulating ring and a gap between the ring and the target |
| 09/08/2006 | WO2006093268A1 Projection electron beam apparatus and defect inspection system using the apparatus |
| 09/08/2006 | WO2006093076A1 Ion source |
| 09/08/2006 | WO2006092975A1 Processing stage, focused beam processing apparatus, and focused beam processing method |
| 09/08/2006 | WO2006078340A3 Method and apparatus for processing metal bearing gases |
| 09/08/2006 | WO2005089459A3 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system |
| 09/07/2006 | US20060197457 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition |
| 09/07/2006 | US20060197037 Beam neutralization in low-energy high-current ribbon-beam implanters |
| 09/07/2006 | US20060197030 Apparatus with permanent magnetic lenses |
| 09/07/2006 | US20060197017 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus |
| 09/07/2006 | US20060197016 Method of implanting a substrate and an ion implanter for performing the method |
| 09/07/2006 | DE10344492B4 Teilchenstrahlgerät Particle beam |
| 09/06/2006 | EP1699077A1 Plasma processing apparatus |
| 09/06/2006 | EP1699076A1 Plasma generator and plasma etching device |
| 09/06/2006 | EP1699067A2 Method of controlling an ion beam |
| 09/06/2006 | EP1697973A1 Small volume process chamber with hot inner surfaces |
| 09/06/2006 | EP1697962A1 Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma |
| 09/06/2006 | EP1697961A1 Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions |
| 09/06/2006 | EP1697556A2 Rotating sputtering magnetron |
| 09/06/2006 | EP1697555A2 Method and device for magnetron sputtering |
| 09/06/2006 | EP1044379A4 Method for optimizing the magnetic field of a periodic permanent magnet focusing device |
| 09/06/2006 | EP1000425B1 Method for nano-structuring amorphous carbon layers |
| 09/06/2006 | CN1830055A Sliding anode magnetron sputtering source |
| 09/06/2006 | CN1830054A Ion implanter having enhanced low energy ion beam transport |
| 09/06/2006 | CN1830053A A method for manufacturing a lens assembly of microcolumn and a lens assembly of microcolumn manufactured by the same |
| 09/06/2006 | CN1829945A Modulator circuitry |
| 09/06/2006 | CN1828843A Dielectric etch method with high source and low bombardment plasma providing high etch rates |
| 09/06/2006 | CN1828825A Gas supply member and plasma processing apparatus |
| 09/06/2006 | CN1828818A Apparatus and method for ion production enhancement |
| 09/06/2006 | CN1828817A Scan type ion gun |
| 09/06/2006 | CN1273640C Fullerene coated component of semiconductor processing equipment |
| 09/05/2006 | US7103443 Directed gas injection apparatus for semiconductor processing |
| 09/05/2006 | US7102732 Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element |
| 09/05/2006 | US7102656 Electrostatically driven lithography |
| 09/05/2006 | US7102292 Method and device for removing harmonics in semiconductor plasma processing systems |
| 09/05/2006 | US7102243 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/05/2006 | US7102147 Charged particle beam exposure method and method for producing charged particle beam exposure data |
| 09/05/2006 | US7102146 Dose cup located near bend in final energy filter of serial implanter for closed loop dose control |
| 09/05/2006 | US7102140 Radiation source assembly and radiation source module containing same |
| 09/05/2006 | US7101805 Envelope follower end point detection in time division multiplexed processes |
| 09/05/2006 | US7101466 Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
| 09/05/2006 | US7101458 Plasma processing method and apparatus |
| 09/05/2006 | US7100532 Plasma production device and method and RF driver circuit with adjustable duty cycle |
| 08/31/2006 | WO2006090787A1 Ion implantation device control method, control system thereof, control program thereof, and ion implantation device |
| 08/31/2006 | WO2006090556A1 Interferometer |
| 08/31/2006 | WO2006090037A1 Microwave plasma exciters |
| 08/31/2006 | WO2006060124A3 Optimization of beam utilization |
| 08/31/2006 | WO2006055296A3 Ion source with substantially planar design |
| 08/31/2006 | US20060194437 Use of pulsed grounding source in a plasma reactor |
| 08/31/2006 | US20060193759 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction |