| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/04/2006 | EP1708241A1 Capacitively coupled plasma processing apparatus and method |
| 10/04/2006 | EP1708240A1 Capacitively coupled plasma processing apparatus and method for using the same |
| 10/04/2006 | EP1708239A1 Vacuum plasma generator |
| 10/04/2006 | EP1706898A2 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 10/04/2006 | EP1706896A2 Method of correction for wafer crystal cut error in semiconductor processing |
| 10/04/2006 | EP1706892A2 Segmented radio frequency electrode apparatus and method for uniformity control |
| 10/04/2006 | EP1706889A2 Gas distribution plate assembly for plasma reactors |
| 10/04/2006 | EP1706888A2 Mems nanoindenter |
| 10/04/2006 | EP1706887A1 Method and system for the directional detection of electrons in a scanning electron microscope |
| 10/04/2006 | EP1523757B1 Cathode for vacuum sputtering treatment machine |
| 10/04/2006 | EP1015657A4 Apparatus and method for sputtering a magnetron target |
| 10/04/2006 | CN1842887A Electron beam irradiation device and drawing device |
| 10/04/2006 | CN1842613A Spattering target and method of manufacturing the same |
| 10/04/2006 | CN1842243A Plasma processing apparatus and method for using the same |
| 10/04/2006 | CN1842242A Plasma processing apparatus and method |
| 10/04/2006 | CN1841665A Implanting a substrate using an ion beam |
| 10/04/2006 | CN1278392C Plasma processor and plasma processing method |
| 10/03/2006 | US7117127 Monitoring device and monitoring method for vacuum device |
| 10/03/2006 | US7116816 Method of inspecting a pattern and an apparatus thereof and a method of processing a specimen |
| 10/03/2006 | US7116398 Lithographic apparatus and device manufacturing method |
| 10/03/2006 | US7115865 Method of applying micro-protection in defect analysis |
| 10/03/2006 | US7115863 Probe for scanning probe lithography and making method thereof |
| 10/03/2006 | US7115520 Method and apparatus for process control in time division multiplexed (TDM) etch process |
| 10/03/2006 | US7115490 Apparatus and method for interlocking a power supply to ion implantation equipment, method and apparatus for generating an interlocking signal, method and apparatus for interrupting an ion implantation process, and an interlocking system |
| 10/03/2006 | US7115210 Measurement to determine plasma leakage |
| 10/03/2006 | US7115194 Magnetron sputtering apparatus |
| 10/03/2006 | US7115184 Plasma processing device |
| 10/03/2006 | US7114643 Friction fit target assembly for high power sputtering operation |
| 10/03/2006 | US7114532 Liner for use in processing chamber |
| 09/28/2006 | WO2006101116A1 Electron beam device |
| 09/28/2006 | WO2006100487A1 Cathode and counter-cathode arrangement in an ion source |
| 09/28/2006 | WO2006099754A1 Hard material layer |
| 09/28/2006 | WO2006086815A3 Charged-particle exposure apparatus |
| 09/28/2006 | WO2005104186B1 Method and processing system for plasma-enhanced cleaning of system components |
| 09/28/2006 | US20060214119 Pattern data creation method, pattern data creation program, computer-readable medium and fabrication process of a semiconductor device |
| 09/28/2006 | US20060214105 Micromachining process, system and product |
| 09/28/2006 | US20060213865 Method and device for plasma-etching organic material film |
| 09/28/2006 | US20060213444 Deposition apparatus and deposition method |
| 09/28/2006 | US20060213436 Substrate processing apparatus |
| 09/28/2006 | DE20321217U1 Sensor, for scanning probe microscopy, has cylindrical shaped nano-structure formed on microstructure designed as substrate, by electron beam or ion beam, in additive and/or subtractive process and arranged perpendicular to base of pyramid |
| 09/28/2006 | DE112004001735T5 Vorrichtung zur schnellen Plasmawärmebehandlung mit verbessertem Zufuhrstutzen der Radikalquelle An apparatus for plasma rapid thermal process with an improved supply port of the free radical source |
| 09/28/2006 | CA2601729A1 Method for operating a pulsed arc vaporizer source as well as a vacuum process installation with pulsed arc vaporization source |
| 09/28/2006 | CA2601722A1 Hard material layer |
| 09/27/2006 | EP1705687A1 Method of Arc Detection |
| 09/27/2006 | EP1705684A1 Stabilized emitter and method for stabilizing same |
| 09/27/2006 | EP1704756A2 Plasma treatment of large-scale components |
| 09/27/2006 | EP1236275A4 Variable load switchable impedance matching system |
| 09/27/2006 | EP1157598A4 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source |
| 09/27/2006 | CN1839459A Control of plasma transitions in sputter processing systems |
| 09/27/2006 | CN1839349A Method for high-resolution processing of thin layers with electron beams |
| 09/27/2006 | CN1839214A Control system for a sputtering system |
| 09/27/2006 | CN1838387A Etching method and apparatus |
| 09/27/2006 | CN1838386A Plasma processing device |
| 09/27/2006 | CN1838381A Method for electrically discharging substrate, substrate processing apparatus and program |
| 09/27/2006 | CN1837965A Method for drawing sub-micron ultraviolet luminous pattern on zinc oxide film |
| 09/27/2006 | CN1277292C Method for reducing impurity content in reaction chamber |
| 09/26/2006 | US7112926 Matching unit and plasma processing system |
| 09/26/2006 | US7112810 Ion implanting apparatus and ion implanting method using the same |
| 09/26/2006 | US7112809 Electrostatic lens for ion beams |
| 09/26/2006 | US7112808 Wafer 2D scan mechanism |
| 09/26/2006 | US7112805 Vacuum processing apparatus and vacuum processing method |
| 09/26/2006 | US7112804 Ion implantation ion source, system and method |
| 09/26/2006 | US7112803 Beam directing system and method for use in a charged particle beam column |
| 09/26/2006 | US7112792 Defect inspection and charged particle beam apparatus |
| 09/26/2006 | US7112791 Method of inspecting pattern and inspecting instrument |
| 09/26/2006 | US7112789 High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams |
| 09/26/2006 | US7112536 Plasma processing system and method |
| 09/26/2006 | US7112533 Plasma etching system and method |
| 09/26/2006 | US7112353 Film deposition apparatus and film deposition method |
| 09/26/2006 | US7112352 Apparatus and method for depositing large area coatings on planar surfaces |
| 09/21/2006 | WO2006099438A1 Profile adjustment in plasma ion implantation |
| 09/21/2006 | WO2006098081A1 Treatment device, treatment device consumable parts management method, treatment system, and treatment system consumable parts management method |
| 09/21/2006 | WO2006097720A1 Sample support with tilting and rotating means for cryogenic applications |
| 09/21/2006 | WO2006097252A1 Laser irradiated hollow cylinder serving as a lens for ion beams |
| 09/21/2006 | WO2006097152A1 Flat end-block for carrying a rotatable sputtering target |
| 09/21/2006 | US20060212978 Apparatus and method for reading bit values using microprobe on a cantilever |
| 09/21/2006 | US20060211153 Photolithographic techniques for producing angled lines |
| 09/21/2006 | US20060208205 Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation |
| 09/21/2006 | US20060208204 Technique for ion beam angle spread control for advanced applications |
| 09/21/2006 | US20060208203 Technique for ion beam angle process control |
| 09/21/2006 | US20060208202 Technique for ion beam angle spread control |
| 09/21/2006 | DE19802409B4 Anordnung zur Korrektur des Öffnungsfehlers dritter Ordnung einer Linse, insbesondere der Objektivlinse eines Elektronenmikroskops Arrangement for the correction of spherical aberration of the third order of a lens, in particular the objective lens of an electron microscope |
| 09/21/2006 | DE10301068B4 Röntgeneinrichtung mit einer Röntgenröhre X-ray device with an X-ray tube |
| 09/21/2006 | DE102005012059A1 Laserbestrahlter Hohlzylinder als Linse für Ionenstrahlen Laserbestrahlter hollow cylinder as a lens for ion beams |
| 09/21/2006 | DE102004055256B4 Hochfrequenz-Elektronenquelle High-frequency electron source |
| 09/21/2006 | CA2597623A1 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 09/20/2006 | EP1703540A1 Plasma reactor |
| 09/20/2006 | EP1703539A1 Electron beam device |
| 09/20/2006 | EP1703538A1 Charged particle beam device for high spatial resolution and multiple perspective imaging |
| 09/20/2006 | EP1703537A1 Analysing system and charged particle beam device |
| 09/20/2006 | EP1703302A1 Ion beam measuring method and ion implanting apparatus |
| 09/20/2006 | EP1702345A2 Divergence-controlled hybrid multiple electron beam -emitting device |
| 09/20/2006 | EP1702344A1 Stabilizing plasma and generator interactions |
| 09/20/2006 | EP1476588B1 Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method |
| 09/20/2006 | CN1836307A Method and design for sputter target attachment to a backing plate |
| 09/20/2006 | CN1836256A Thermography test method and apparatus for bonding evaluation in sputtering targets |
| 09/20/2006 | CN1836063A Method for the production of polymer moulded bodies |
| 09/20/2006 | CN1835205A Substrate mounting table, substrate processing apparatus and substrate processing method |
| 09/20/2006 | CN1835203A Substrate supporting member and substrate processing apparatus |
| 09/19/2006 | US7109788 Apparatus and method of improving impedance matching between an RF signal and a multi- segmented electrode |