H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2006
11/07/2006	US7132621 Plasma catalyst
11/07/2006	US7132618 MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
11/07/2006	US7132222 Magnetic etching process, especially for magnetic or magnetooptic recording
11/07/2006	US7132134 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
11/07/2006	US7132040 Matching unit for semiconductor plasma processing apparatus
11/07/2006	US7132039 Manufacturing apparatus and method for carbon nanotube
11/07/2006	US7131392 Vacuum evaporator
11/02/2006	WO2006116459A1 Tilted plasma doping
11/02/2006	WO2006115453A1 Controlled growth of a nanostructure on a substrate, and electron emission devices based on the same
11/02/2006	WO2006115172A1 Solid ion source
11/02/2006	WO2006115090A1 Processing method by using focused ion beam and focused ion beam processing apparatus
11/02/2006	WO2006114229A1 Magnet system for a spraying cathode
11/02/2006	WO2006010509A3 Device and method for plasma coating/sterilization
11/02/2006	WO2005104634A3 Method and system for performing atomic layer deposition
11/02/2006	US20060243920 Optimization of a utilization of an ion beam in a two-dimensional mechanical scan ion implantation system
11/02/2006	US20060243908 Method of inspecting a circuit pattern and inspecting instrument
11/02/2006	US20060243060 Method and apparatus for pressure control and flow measurement
11/02/2006	EP1718135A1 Plasma generator
11/02/2006	EP1717841A1 Subsurface imaging using an electron beam
11/02/2006	EP1717840A2 Particle-optical appliance provided with aberration-correcting means
11/02/2006	EP1415320B1 Method of measuring the performance of a scanning electron microscope
11/02/2006	EP1277223B1 Electrode apparatus for a plasma reactor
11/01/2006	CN1856859A Method and apparatus for preventing instabilities in radio-frequency plasma processing
11/01/2006	CN1856858A A source of liquid metal ions and a method for controlling the source
11/01/2006	CN1856211A Plasma processing apparatus and method
11/01/2006	CN1855365A Subsurface imaging using an electron beam
11/01/2006	CN1282986C Enhanced resist strip in dielectric ethcher using downstream plasma
11/01/2006	CN1282985C Target tray vertical scanning moving mechanism in ion implantation apparatus
11/01/2006	CN1282763C Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
10/2006
10/31/2006	US7129504 Method and apparatus for generation and frequency tuning of modulated, high current electron beams
10/31/2006	US7129503 Determining emitter beam size for data storage medium
10/31/2006	US7129502 Apparatus for generating a plurality of beamlets
10/31/2006	US7129485 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
10/31/2006	US7129024 Electron beam lithography method
10/31/2006	US7128950 Coating a substrate, e.g., gas turbine engines, by having a ceramic melt in a crucible in a heated and depressurized chamber and projecting the beam at an angle to make the power distribution pattern such that high intensity is at edges of the coating surface and low intensity or none at the center
10/31/2006	US7128806 Mask etch processing apparatus
10/31/2006	US7128805 Multiple elliptical ball plasma apparatus
10/31/2006	US7128804 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
10/26/2006	WO2006113170A2 Sputtering system
10/26/2006	WO2006112602A1 A housing for a micro-column
10/26/2006	WO2006111278A1 Method and device for manipulating particles in plasma
10/26/2006	WO2006065476A8 Imaging device comprising optically coupled fiber optic plate assembly
10/26/2006	WO2004003973A3 Ion implantation device and method
10/26/2006	US20060240586 Image pickup device and method of manufacturing the same
10/26/2006	US20060240330 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
10/26/2006	US20060238133 Ion implantation system and control method
10/26/2006	US20060237659 Imaging system with multi source array
10/26/2006	US20060237646 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample
10/26/2006	US20060237644 Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same
10/26/2006	US20060237641 Method for controlling space charge-driven ion instabilities in electron impact ion sources
10/26/2006	US20060237309 Arc evaporator with a powerful magnetic guide for targets having a large surface area
10/26/2006	US20060236934 Plasma uniformity control by gas diffuser hole design
10/26/2006	US20060236933 Roll-vortex plasma chemical vapor deposition system
10/26/2006	DE19911046B4 Plasmaverfahren Plasma processes
10/26/2006	DE112004002106T5 Fehlerkennungs- und Steuerungsverfahren für Ionenimplantationsprozesse, und System zum Ausführen davon Fehlerkennungs- and control method for ion implantation processes, and system for executing them
10/26/2006	DE102005019100A1 Magnetic system for dissipation cathode, with ferromagnetic yoke plates and several groups of magnets with opposite polarity, magnets of first group forming closed,, while magnets of second group form closed, outer magnet row
10/25/2006	EP1715505A1 Method and device for manipulating particles in plasma
10/25/2006	EP1715504A2 Glow discharge drilling apparatus and glow discharge drilling method
10/25/2006	EP1715362A1 Beam measuring equipment and beam measuring method using the same
10/25/2006	EP1715077A1 Copper or copper alloy target/copper alloy backing plate assembly
10/25/2006	EP1079735B1 Laser soft docking system for medical treatment system
10/25/2006	EP0916154B1 Double window exhaust arrangement for wafer plasma processor
10/25/2006	CN1853254A Method and apparatus for improved baffle plate
10/25/2006	CN1853253A Method and apparatus for improved electrode plate
10/25/2006	CN1852764A Plasma production device and method and RF driver circuit with adjustable duty cycle
10/25/2006	CN1852631A Multi-solenoid plasma source
10/25/2006	CN1852629A Plasma etching device
10/25/2006	CN1851879A Packing device of inductive coupling plasma coil
10/25/2006	CN1851867A Ion injection uniformity control system and control method
10/25/2006	CN1851855A Plasma etching device exhaustring
10/25/2006	CN1851852A Plasma etching device
10/25/2006	CN1851845A Plasma treating coil
10/25/2006	CN1851844A ICP coil capable of adjusting local coupling strength
10/25/2006	CN1851843A Electron beam generating and controlling device
10/25/2006	CN1282399C Method of detecting an arc in a glow discharge device and apparatus for controlling a high-frequency arc discharge
10/25/2006	CN1282221C Ion implantation machine
10/25/2006	CN1282215C An electron beam flux guiding device
10/25/2006	CN1281780C Cylindrical target and method of mfg. same
10/24/2006	US7126231 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
10/24/2006	US7126141 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
10/24/2006	US7126140 Multi-electron beam exposure method and apparatus
10/24/2006	US7126139 Device and method of positionally accurate implantation of individual particles in a substrate surface
10/24/2006	US7126138 Electron flood apparatus and ion implantation system
10/24/2006	US7126120 Electron microscope
10/24/2006	US7126117 Imaging energy filter for electrons and other electrically charged particles and method for energy filtration of the electrons and other electrically charged particles with the imaging energy filter in electro-optical devices
10/24/2006	US7126081 Radial pulsed arc discharge gun for synthesizing nanopowders
10/24/2006	US7125730 Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the same
10/24/2006	US7125588 Plasma vapor deposition using high density plasma generated in presence of magnetic field
10/24/2006	US7125587 Covering the slit with a polymeric sheet to maintain a vacuum within the fixture, allowing the ion beam exiting the vacuum fixture; for alignment of the liquid crystals
10/19/2006	WO2006109564A1 Data processing method for scanning beam device
10/19/2006	WO2006087558A3 Apparatus and method for the application of a material layer to display devices
10/19/2006	WO2006057867A3 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
10/19/2006	WO2006031104A9 Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof
10/19/2006	US20060234512 Plasma processing apparatus and plasma processing method
10/19/2006	US20060232445 Electron beam apparatus and method for production of its specimen chamber
10/19/2006	US20060231776 Method and apparatus for specimen fabrication
10/19/2006	US20060231774 Method and apparatus for controlled manufacturing of nanometer-scale apertures
10/19/2006	US20060231772 Charged particle beam device with cleaning unit and method of operation thereof
10/19/2006	US20060231759 Uniform broad ion beam deposition
10/19/2006	US20060231758 Inspection system, inspection method, and process management method

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