Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2006
11/21/2006US7139632 Enhanced process and profile simulator algorithms
11/21/2006US7139083 Methods and systems for determining a composition and a thickness of a specimen
11/21/2006US7139009 Ion printer
11/21/2006US7138768 Indirectly heated cathode ion source
11/21/2006US7138629 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
11/21/2006US7138628 Method and apparatus for specimen fabrication
11/21/2006US7138343 Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
11/21/2006US7138336 Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof
11/21/2006US7138034 Electrode member used in a plasma treating apparatus
11/21/2006US7137444 Heat-transfer interface device between a source of heat and a heat-receiving object
11/21/2006US7137354 Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage
11/21/2006US7137353 Method and apparatus for an improved deposition shield in a plasma processing system
11/16/2006WO2006121602A1 Ion source with multi-piece outer cathode
11/16/2006WO2006121108A1 Charged particle beam equipment
11/16/2006WO2006120917A1 Sample inspection device
11/16/2006WO2006120239A1 Hf- plasma source with plurality of out - of- phase electrodes
11/16/2006WO2006120005A1 Particle detector for secondary ions and direct and or indirect secondary electrons
11/16/2006WO2005119728A3 Electron stream apparatus and method
11/16/2006WO2005090638A8 Remote chamber methods for removing surface deposits
11/16/2006US20060255896 Constant power and temperature coil
11/16/2006US20060255296 Matching dose and energy of multiple ion implanters
11/16/2006US20060255295 Method and apparatus for preparing specimen
11/16/2006US20060255290 Sample inspection apparatus
11/16/2006US20060255286 Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same
11/16/2006US20060255270 Semiconductor processing method and system
11/16/2006US20060255268 Charged particle beam device with detection unit switch and method of operation thereof
11/16/2006US20060255260 Method and apparatus for process monitoring and control
11/16/2006US20060254521 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening
11/16/2006US20060254519 Locally-efficient inductive plasma coupling for plasma processing system
11/16/2006US20060254512 Apparatus for attachment of semiconductor hardware
11/16/2006DE102006018942A1 Sample processing focused ion beam system for e.g. defect analysis of semiconductor device, has output area fixing settings to data output, and control area controlling condensers, electrodes and lens based on data about settings
11/16/2006DE102006007320A1 Transmission electron microscope to analyze fine structure of materials in science and industry, has inputting device to input distance or spatial size between two points, and calculating device to calculate defocus amount of objective lens
11/16/2006DE102005020815A1 Anordnung für die Regelung der Elektronenstrahlleistung einer Elektronenstrahlkanone Arrangement for controlling the electron beam power of an electron gun
11/16/2006CA2606864A1 Hf- plasma source with plurality of out-of-phase electrodes
11/16/2006CA2606590A1 Ion source with multi-piece outer cathode
11/15/2006EP1722398A1 Deflection Signal Compensation for Charged Particle Beam
11/15/2006EP1722397A1 Device for operating with gas in vacuum or low-pressure environment of electron microscopes and for observation of the operation
11/15/2006EP1722396A2 Method of operating high-pressure chamber in vacuum or low-pressure environment and observing the operation and device therefor
11/15/2006EP1722395A1 Device for operating with gas in vacuum or low-pressure environment of electron microscopes and for observation of the operation
11/15/2006EP1722394A2 Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation
11/15/2006EP1721684A2 Utility enclosure with in situ disinfection device
11/15/2006EP1721329A2 Modulating ion beam current
11/15/2006EP1647054B1 Plasma processing apparatus
11/15/2006EP1224684B1 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
11/15/2006EP1068632B1 Contamination controlling method and plasma processing chamber
11/15/2006CN1864449A Adaptively plasma source for generating uniform plasma
11/15/2006CN1863428A 等离子体激发系统 Plasma excitation system
11/15/2006CN1862766A Method for measuring parallel beam injection angle
11/15/2006CN1862761A Method and apparatus for receiving high stable energy filtering electronic microscopic image
11/15/2006CN1862759A Method and apparatus for operating and observing high voltage cavity in vacuum or low voltage environment
11/15/2006CN1862758A Automatic beam-leading method for ion source
11/15/2006CN1862250A Method and apparatus for operating liquid and observing in vacuum or low pressure environment
11/15/2006CN1861836A Magnet assembly for a planar magnetron
11/15/2006CN1285072C Energy ray radiator
11/15/2006CN1284880C Diamond coatings on reactor wall and method of manufacturing thereof
11/14/2006US7135691 Reciprocating drive for scanning a workpiece through an ion beam
11/14/2006US7135678 Charged particle guide
11/14/2006US7135677 Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
11/14/2006US7135676 Inspection system by charged particle beam and method of manufacturing devices using the system
11/14/2006US7135653 Multi-phase alternating current plasma generator
11/14/2006US7135412 Method to control a management system to control semiconductor manufacturing equipment
11/14/2006US7135089 For generating uniform, low-electron-temperature plasma under a low pressure; comprises a gas supply device, an exhaust device, a high-frequency power source, an electrode, a dielectric, a multiple-vortex-type conductor and a second conductor
11/09/2006WO2006116889A1 Plasma amplifier for plasma treatment plant
11/09/2006US20060252283 Substrate processing apparatus and sustrate processing method
11/09/2006US20060252160 Electron beam exposure device and exposure method
11/09/2006US20060251828 Plasma film-forming method and plasma film-forming apparatus
11/09/2006US20060251340 Method for defect detection and process monitoring based on sem images
11/09/2006US20060250147 Insulating film measuring device, insulating film measuring method, insulating film evaluating device, insulating film evaluating method, substrate for electric discharge display element, and plasma display panel
11/09/2006US20060249697 Method, apparatus and system for specimen fabrication by using an ion beam
11/09/2006US20060249696 Technique for tuning an ion implanter system
11/09/2006US20060249688 Method of operating high-pressure chamber in vacuum or low-pressure environment and observing the operation and device therefor
11/09/2006US20060249687 Device for operating gas in vacuum or low-pressure environment and for observation of the operation
11/09/2006US20060249676 Apparatus and method for wafer pattern inspection
11/09/2006US20060249674 Detector system of secondary and backscattered electrons for a scanning electron microscope
11/09/2006US20060249367 Plasma catalyst
11/09/2006US20060249254 Plasma processing apparatus and plasma processing method
11/09/2006DE10234464B4 Verfahren zum Erzeugen von Daten für die Maskenlithographie A method for generating data for the mask lithography
11/09/2006CA2525737A1 Method of operating high-pressure chamber in vacuum or low-pressure environment and observing the operation and device therefor
11/08/2006EP1720197A1 Plasma processing apparatus and performance validation system therefore
11/08/2006EP1720196A1 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
11/08/2006EP1720195A1 Arc suppression system
11/08/2006EP1720194A1 Projection electron microscope, electron microscope, specimen surface observing method, and micro device producing method
11/08/2006EP1720193A1 Arrangement for regulating the electron beam output of an electron gun
11/08/2006EP1719823A1 Ion implantation system and ion implantation system
11/08/2006EP1490888B1 Device for measuring the emission of x rays produced by an object exposed to an electron beam
11/08/2006EP1301652A4 Improving effectiveness of artificial hip by gcib
11/08/2006EP1203396B1 Method for etching a substrate using an inductively coupled plasma
11/08/2006EP0796355A4 Apparatus for generating plasma by plasma-guided microwave power
11/08/2006CN1860600A Method and apparatus for monitoring a material processing system
11/08/2006CN1860594A 等离子处理系统 Plasma processing system
11/08/2006CN1860381A Ion beam measuring method and ion implanting apparatus
11/08/2006CN1858895A Non-uniform ion implantation apparatus and method thereof
11/08/2006CN1858894A Arrangement for regulating the electron beam output of an electron gun
11/08/2006CN1858299A Microwave plasma device and method for preparing diamond film and etched carbon film
11/08/2006CN1284213C High speed silicon etching method
11/08/2006CN1284209C Plasma processing method and apparatus
11/07/2006US7132996 Plasma production device and method and RF driver circuit
11/07/2006US7132673 Device and method for milling of material using ions
11/07/2006US7132672 Faraday dose and uniformity monitor for plasma based ion implantation
11/07/2006US7132671 Substrate testing device and substrate testing method