H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2006
12/07/2006	WO2005001020A3 A multi-stage open ion system in various topologies
12/07/2006	US20060276037 Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof
12/07/2006	US20060272776 Method and apparatus for extracting ions from an ion source for use in ion implantation
12/07/2006	US20060272775 Method and apparatus for extracting ions from an ion source for use in ion implantation
12/07/2006	DE102005025130A1 Micro component manipulation handling device for electron-scanning microscope, has movement mechanisms to carry out movement of tool to workpiece in three translatory and rotary degrees of freedom and have axles for each degree of freedom
12/07/2006	DE102004029525B4 Befestigungseinheit für Zündeinheiten und Vorrichtung zur Kohlenstoffabscheidung Mounting unit for ignition units and apparatus for carbon capture
12/06/2006	EP1729551A1 Plasma generating equipment
12/06/2006	EP1729330A1 Method and equipment for forming crystalline silicon thin film
12/06/2006	EP1729328A1 Substrate processing device
12/06/2006	EP1729323A1 Process for controlling a glow discharge plasma nitriding process and system using the same
12/06/2006	EP1729322A1 Plasma processing device
12/06/2006	EP1729177A1 Electron beam lithography system
12/06/2006	EP1728891A1 Silicon film forming equipment
12/06/2006	EP1728263A1 Arc discharge detection device
12/06/2006	EP1728262A2 In-situ monitoring on a spinning-disk ion implanter
12/06/2006	EP1727924A1 Deposition by magnetron cathodic pulverization in a pulsed mode with preionization
12/06/2006	EP1110234B1 Device and method for coating substrates in a vacuum
12/06/2006	CN1875467A Plasma processing apparatus
12/06/2006	CN1875454A Plasma processing system and plasma treatment process
12/06/2006	CN1875453A Apparatus and method for plasma treating a substrate
12/06/2006	CN1875452A Electron beam treatment apparatus
12/06/2006	CN1875129A Surface treatment method and device
12/06/2006	CN1873919A Air supply system of shower in water cold plasma
12/06/2006	CN1873911A Plasma processing chamber, potential controlling apparatus, method, program and storage medium
12/06/2006	CN1288725C Plasma machining apparatus
12/06/2006	CN1288704C Method of injecting crystal using plasma
12/06/2006	CN1288696C Ion source and its operating method
12/06/2006	CN1288507C Energy beam exposure method and device
12/05/2006	US7145157 Kinematic ion implanter electrode mounting
12/05/2006	US7145156 Image processing method, image processing apparatus and semiconductor manufacturing method
12/05/2006	US7145155 Process for electron sterilization of a container
12/05/2006	US7145154 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor
12/05/2006	US7145140 Method of determining whether a conductive layer of a semiconductor device is exposed through a contact hold
12/05/2006	US7144794 Ion source, ion implanting device, and manufacturing method of semiconductor devices
12/05/2006	US7144521 High aspect ratio etch using modulation of RF powers of various frequencies
12/05/2006	US7144520 Etching method and apparatus
12/05/2006	US7143660 Method and system for processing semiconductor wafers
11/2006
11/30/2006	WO2006127472A1 Deposition chamber desiccation systems and methods of use thereof
11/30/2006	WO2006126997A1 Two dimensional stationary beam profile and angular mapping
11/30/2006	WO2006126872A1 Apparatus for the generation of parallel beamlets
11/30/2006	WO2006058169A3 Power sag detection and control in ion implanting systems
11/30/2006	WO2006057867B1 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
11/30/2006	US20060266957 Technique for uniformity tuning in an ion implanter system
11/30/2006	US20060266953 Method and system for determining a positioning error of an electron beam of a scanning electron microscope
11/30/2006	US20060266291 Thin film forming device and thin film forming method
11/30/2006	DE102006014288A1 Analyseverfahren unter Verwendung eines Energieverlust-Spektrometers und eines mit diesem ausgestatteten Transmissionselektronenmikroskops Analysis method using an energy loss spectrometer and a transmission electron microscope equipped with this
11/30/2006	DE10010766B4 Verfahren und Vorrichtung zur Beschichtung von insbesondere gekrümmten Substraten Method and apparatus for coating in particular curved substrates
11/30/2006	CA2609075A1 Deposition chamber desiccation systems and methods of use thereof
11/29/2006	EP1727406A1 Plasma generator
11/29/2006	EP1727186A1 Plasma chamber with discharge inducing bridge
11/29/2006	EP1727185A1 X-Ray anode
11/29/2006	EP1726314A1 Microwave plasma sterilizing method and device
11/29/2006	EP1726190A2 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
11/29/2006	EP1725697A2 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
11/29/2006	EP1725344A2 System, method and apparatus for self-cleaning dry etch
11/29/2006	EP1419418A4 Electron beam processing
11/29/2006	CN1871695A High aspect ratio etch using modulation of RF powers of various frequencies
11/29/2006	CN1871685A Plasma processing system with locally-efficient inductive plasma coupling
11/29/2006	CN1871684A Method, system and device for microscopic examination employing fib-prepared sample grasping element
11/29/2006	CN1287587C TDI detecting device, feed-through equipment and electrocution beam apparatus. using these devices
11/29/2006	CN1287414C Inductive plasma processor including current sensor for plasma excitation coil
11/29/2006	CN1287148C Powder included water elutriating instrument and its operation process
11/28/2006	US7141809 Method for reciprocating a workpiece through an ion beam
11/28/2006	US7141808 Device and method for maskless AFM microlithography
11/28/2006	US7141800 Non-dispersive charged particle energy analyzer
11/28/2006	US7141790 Defect inspection instrument and positron beam apparatus
11/28/2006	US7141757 Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
11/28/2006	US7141756 Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method
11/28/2006	US7141516 High frequency plasma generator and high frequency plasma generating method
11/28/2006	US7141319 Method for processing the surface of an insulating article, printer head and substrate for recording medium
11/28/2006	US7140374 System, method and apparatus for self-cleaning dry etch
11/28/2006	US7140321 Plasma processing apparatus and method
11/28/2006	CA2380989C Atomic beam generating method and apparatus
11/23/2006	WO2006124734A1 Synchronous undersampling for high-frequency voltage and current measurements
11/23/2006	WO2006123739A1 Method and apparatus for flattening solid surface
11/23/2006	WO2006123447A1 Electron beam exposure device
11/23/2006	WO2006123437A1 Charged particle beam apparatus, contamination removing method and sample observing method
11/23/2006	US20060261824 Semiconductor device test method and semiconductor device tester
11/23/2006	US20060261270 Method for preparing a sample for electron microscopic examinations, and sample supports and transport holders used therefor
11/23/2006	US20060261037 Substrate processing method and substrate processing apparatus
11/23/2006	US20060260748 Plasma processing apparatus and method
11/23/2006	US20060260544 Substrate processing and method of manufacturing device
11/22/2006	EP1724809A1 Particle-optical apparatus for the irradiation of a sample
11/22/2006	EP1723664A2 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
11/22/2006	EP1723663A1 Higher power density downstream plasma
11/22/2006	EP1723463A1 An optical system for producing differently focused images
11/22/2006	EP1695599A4 Neutral particle beam processing apparatus
11/22/2006	EP1224683B1 Method and apparatus for low voltage plasma doping using dual pulses
11/22/2006	EP1057205B1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
11/22/2006	EP0966756B1 Ion implantation process
11/22/2006	EP0902967B1 High flown vacuum chamber including equipment modules such as plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
11/22/2006	CN1868042A Method for manufacturing semiconductor device and substrate processing apparatus
11/22/2006	CN1868029A Kinematic ion implanter electrode mounting
11/22/2006	CN1868028A Ion implanter electrodes
11/22/2006	CN1867692A Modular device for surface coating
11/22/2006	CN1866461A Ion beam transmission control optimizing method
11/22/2006	CN1286350C Microwave plasma source and its producing method
11/22/2006	CN1285761C Injector and method for prolonged introduction of reagents into plasma
11/22/2006	CN1285758C Low contamination plasma chamber components and method for making same
11/22/2006	CN1285755C Cathode sputtering equipment

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