| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/21/2006 | WO2006135909A1 Confined plasma with adjustable electrode area ratio |
| 12/21/2006 | WO2006135515A1 System and method for analyzing power flow in semiconductor plasma generation systems |
| 12/21/2006 | WO2006135258A1 Moulding |
| 12/21/2006 | WO2006135094A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/21/2006 | WO2006135093A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/21/2006 | WO2006135092A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/21/2006 | WO2006135021A1 Charged particle beam equipment and method for creating charged particle beam image |
| 12/21/2006 | WO2006086300A3 Control of process gases in specimen surface treatment system using plasma |
| 12/21/2006 | WO2006076345A3 Reduced maintenance sputtering chambers |
| 12/21/2006 | US20060284120 Method for correcting electron beam exposure data |
| 12/21/2006 | US20060284118 Process and apparatus for modifying a surface in a work region |
| 12/21/2006 | US20060284117 Charged beam dump and particle attractor |
| 12/21/2006 | US20060284116 Particulate prevention in ion implantation |
| 12/21/2006 | US20060284115 Ion beam apparatus and analysis method |
| 12/21/2006 | US20060284114 Technique for uniformity tuning in an ion implanter system |
| 12/21/2006 | US20060284110 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 12/21/2006 | US20060284108 Apparatus for evacuating a sample |
| 12/21/2006 | US20060284093 Electron beam device |
| 12/21/2006 | US20060284087 Defect inspection and changed particle beam apparatus |
| 12/21/2006 | US20060283835 Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power |
| 12/21/2006 | US20060283553 Plasma chamber insert ring |
| 12/21/2006 | DE112004000573T5 Plasmagleichförmigkeit Plasma uniformity |
| 12/21/2006 | CA2608982A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/21/2006 | CA2608851A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/21/2006 | CA2608548A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 12/20/2006 | EP1734558A1 System for modulating power signals to control sputtering |
| 12/20/2006 | EP1733465A1 Reciprocating drive system for scanning a workpiece |
| 12/20/2006 | EP1733422A1 Plasma chamber having plasma source coil and method for etching the wafer using the same |
| 12/20/2006 | EP1733412A1 A tubular magnet assembly |
| 12/20/2006 | EP1733411A1 Apparatus and method for plasma treating an article |
| 12/20/2006 | EP1733072A2 Remote chamber methods for removing surface deposits |
| 12/20/2006 | EP1733071A2 Remote chamber methods for removing surface deposits |
| 12/20/2006 | EP1218934B1 Method for determining the endpoint of etch process steps |
| 12/20/2006 | CN2849953Y Pneumatic central controlled multi-point safety lock device |
| 12/20/2006 | CN1883037A Plasma processing method and plasma processing apparatus |
| 12/20/2006 | CN1883036A Notch-free etching of high aspect SOI structures using a time division multiplex process and RF bias modulation |
| 12/20/2006 | CN1882712A Replaceable plate expanded thermal plasma apparatus and method |
| 12/20/2006 | CN1882217A 等离子体处理装置 Plasma processing apparatus |
| 12/20/2006 | CN1291460C Plasma processing method and apparatus |
| 12/20/2006 | CN1291451C Device and method for processing plasma |
| 12/20/2006 | CN1291445C Target disc angle controlling and scanning motion mechanism of ion implantation apparatus |
| 12/20/2006 | CN1291062C Vacuum system, film deposition equipment, film deposition method |
| 12/20/2006 | CN1291060C Mobile plating system and method |
| 12/19/2006 | US7151594 Test pattern, inspection method, and device manufacturing method |
| 12/19/2006 | US7151269 Sample inspection apparatus |
| 12/19/2006 | US7151268 Field emission gun and electron beam instruments |
| 12/19/2006 | US7151258 Electron beam system and electron beam measuring and observing methods |
| 12/19/2006 | US7151246 Imaging system and methodology |
| 12/19/2006 | US7150811 Ion beam for target recovery |
| 12/19/2006 | US7150805 Plasma process device |
| 12/14/2006 | WO2006133310A2 Technique for ion beam angle process control |
| 12/14/2006 | WO2006133309A2 Technique for ion beam angle spread control |
| 12/14/2006 | WO2006133041A2 Beam stop and beam tuning methods |
| 12/14/2006 | WO2006133040A2 Charged beam dump and particle attractor |
| 12/14/2006 | WO2006133038A2 Particulate prevention in ion implantation |
| 12/14/2006 | WO2006132421A1 Method and device for modifying surface of work by electron beam |
| 12/14/2006 | WO2006132111A1 Stage mechanism |
| 12/14/2006 | WO2006131128A1 Sputtering magnetron |
| 12/14/2006 | WO2006105775A3 Method and system for stabilizing an operating point of reactive, plasma-enhanced vacuum coating processes |
| 12/14/2006 | WO2005104164A3 Honeycomb optical window deposition shield and method for a plasma processing system |
| 12/14/2006 | US20060279223 Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities |
| 12/14/2006 | US20060278826 Method and apparatus for automated beam optimization in a scanning electron microscope |
| 12/14/2006 | US20060278611 Method and device for flattening surface of solid |
| 12/14/2006 | US20060278610 Method of controlling chamber parameters of a plasma reactor in accordance with desired values of plural plasma parameters, by translating desired values for the plural plasma parameters to control values for each of the chamber parameters |
| 12/14/2006 | US20060278609 Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants |
| 12/14/2006 | US20060278608 Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current |
| 12/14/2006 | US20060278518 Work piece processing by pulsed electric discharges in solid-gas plasma |
| 12/14/2006 | US20060278341 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 12/13/2006 | EP1732107A1 Method for correcting electron beam exposure data |
| 12/13/2006 | EP1732102A2 Method and apparatus for preparing specimen |
| 12/13/2006 | EP1731806A1 Dual gate isolating valve |
| 12/13/2006 | EP1102869A4 Esrf chamber cooling system and process |
| 12/13/2006 | EP1030745A4 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source |
| 12/13/2006 | CN2847523Y Dosage controller for ion injector |
| 12/13/2006 | CN1879189A Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 12/13/2006 | CN1879188A Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 12/13/2006 | CN1878887A Vacuum coating system for coating elongate substrates |
| 12/13/2006 | CN1878722A Device and method for patterning structures on a substrate |
| 12/13/2006 | CN1876894A 离子源 Ion source |
| 12/13/2006 | CN1290157C CVD device and method of cleaning CVD device |
| 12/12/2006 | US7148705 Charging voltage measuring device for substrate and ion beam irradiating device |
| 12/12/2006 | US7148613 Source for energetic electrons |
| 12/12/2006 | US7148496 System and method for proximity effect correction in imaging systems |
| 12/12/2006 | US7148479 Defect inspection apparatus, program, and manufacturing method of semiconductor device |
| 12/12/2006 | US7148478 Electrical measurements in samples |
| 12/12/2006 | US7147900 Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation |
| 12/12/2006 | US7147793 Method of and apparatus for tailoring an etch profile |
| 12/12/2006 | US7147759 High-power pulsed magnetron sputtering |
| 12/12/2006 | US7147749 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| 12/12/2006 | US7147748 Plasma processing method |
| 12/12/2006 | US7147747 Plasma processing apparatus and plasma processing method |
| 12/12/2006 | US7147719 Double slit-valve doors for plasma processing |
| 12/12/2006 | US7146703 Low temperature sputter target/backing plate method and assembly |
| 12/12/2006 | CA2284242C Glow plasma discharge device |
| 12/07/2006 | WO2006130546A2 Plasma resistant seal assembly with replaceable barrier shield |
| 12/07/2006 | WO2006032773A3 Electrode device for plasma treatment of the inner surfaces of a container and treatment method thereby |
| 12/07/2006 | WO2005119729A3 Apparatus for generating and emitting xuv radiation |
| 12/07/2006 | WO2005098895A3 Method and system for ultrafast photoelectron microscope |
| 12/07/2006 | WO2005071716A3 Method of correction for wafer crystal cut error in semiconductor processing |
| 12/07/2006 | WO2005038821A3 Charged particle extraction device and method of design there for |