Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
01/2007
01/04/2007WO2005060602A3 Controlling the flow of vapors sublimated from solids
01/04/2007US20070004111 Method and apparatus for forming a crystalline silicon thin film
01/04/2007US20070003874 Exposing a resist on a substrate to a rectangularly-shaped shot from an electron beam to form a non-angled feature; altering the rotational orientation by a predetermined angle; and forming a 2nd feature by exposing to a 2nd shot from the new angle to form an angled feature
01/04/2007US20070001129 Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanter
01/04/2007US20070000881 Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece
01/04/2007US20070000879 Microwave plasma processing method
01/04/2007US20070000614 Method and apparatus for reducing substrate backside deposition during processing
01/04/2007US20070000611 Plasma control using dual cathode frequency mixing
01/04/2007DE202006017024U1 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates
01/04/2007DE10202311B4 Vorrichtung und Verfahren zur Plasmabehandlung von dielektrischen Körpern Apparatus and method for plasma treatment of dielectric bodies
01/04/2007DE102005029582A1 Apparatus for an ion beam arrangement esp. for processing solid surfaces of optical elements such as lenses and mirrors
01/04/2007CA2611345A1 Sputtering target with slow-sputter layer under target material
01/03/2007EP1739732A1 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film and base material
01/03/2007EP1739718A1 Chamber isolation valve RF grounding
01/03/2007EP1739717A1 Plasma generator with a slot antenna
01/03/2007EP1739716A1 HF plasma process system
01/03/2007EP1739715A2 Sample measuring device
01/03/2007EP1739714A1 Imaging apparatus for high probe currents
01/03/2007EP1739713A2 Charged particle beam instrument and method of detecting information from specimen using charged particle beam
01/03/2007EP1738395A1 Method for depositing carbide coatings of high-fusion metals
01/03/2007EP1738394A2 Method for reciprocating a workpiece through an ion beam
01/03/2007EP1738393A2 Drive sytem for scanning a workpiece through an ion beam
01/03/2007EP1738392A1 Illumination condenser for a particle optical projection system
01/03/2007EP1738391A1 Correction lens system for a particle beam projection device
01/03/2007EP1738388A2 Method and apparatus for improved processing with a gas-cluster ion beam
01/03/2007EP1737998A2 Remote chamber methods for removing surface deposits
01/03/2007EP1629517B1 Device for area-based surface treatment of an article by electric dielectric barrier discharge
01/03/2007EP1079423B1 Apparatus for gas processing
01/03/2007CN1890776A Umbilical cord facilities connection for an ion beam implanter
01/03/2007CN1890399A Mechanism for varying the spacing between sputter magnetron and target
01/03/2007CN1890034A Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
01/03/2007CN1889225A Hollow electrode structure including multi-hole and plasma polymerization processing apparatus utilizing the said structure
01/03/2007CN1888881A Method for charged contrast imaging
01/03/2007CN1293789C Plasma device and plasma generating method
01/03/2007CN1293788C Plasma generation and control device and method
01/03/2007CN1293612C Gaseous diffusion plate used in induction coupling plasma etching apparatus
01/03/2007CN1293596C Chamber components having textured surfaces and method of manufacture
01/03/2007CN1293595C Arc electrodes for synthesis of carbon nanostructures
01/03/2007CN1293592C Electron gun
01/02/2007US7158221 Method and apparatus for performing limited area spectral analysis
01/02/2007US7157857 Stabilizing plasma and generator interactions
01/02/2007US7157720 Multi-mode charged particle beam device
01/02/2007US7157703 Electron beam system
01/02/2007US7157702 High resolution atom probe
01/02/2007US7157659 Plasma processing method and apparatus
01/02/2007US7157123 Substrate coating region and electrode cleaning region; rotatable electrode positioned in deposition chamber having interior cavitiy with magnet systems disposed
01/02/2007US7156960 Method and device for continuous cold plasma deposition of metal coatings
01/02/2007US7156950 Gas diffusion plate for use in ICP etcher
01/02/2007US7156949 Plasma processing apparatus
01/02/2007US7156046 Plasma CVD apparatus
12/2006
12/28/2006WO2005094280A3 High-strength backing plates, target assemblies, and methods of forming high-strength backing plates and target assemblies
12/28/2006US20060292864 Plasma-enhanced cyclic layer deposition process for barrier layers
12/28/2006US20060292709 Method for fabricatiing three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstruture
12/28/2006US20060290301 Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles
12/28/2006US20060290291 Mehtod and apparatus for modifying object with electrons generated from cold cathode electron emitter
12/28/2006US20060289804 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
12/28/2006US20060289803 Apparatus and method for interlocking a power supply to ion implantation equipment, method and apparatus for generating an interlocking signal, method and apparatus for interrupting an ion implantation process, and an interlocking system
12/28/2006US20060289802 Ion beam irradiation apparatus
12/28/2006US20060289801 Focused ion beam system
12/28/2006US20060289800 Implanting a substrate using an ion beam
12/28/2006US20060289799 Profile adjustment in plasma ion implanter
12/28/2006US20060289798 Methods & apparatus for ion beam angle measurement in two dimensions
12/28/2006US20060289793 Method and apparatus for simultaneously depositing and observing materials on a target
12/28/2006US20060289757 Electron beam system and electron beam measuring and observing methods
12/28/2006US20060289756 Standard reference for metrology and calibration method of electron-beam metrology system using the same
12/28/2006US20060289754 Charged particle beam apparatus
12/28/2006US20060289753 Charged particle beam apparatus
12/28/2006US20060289751 Charged particle beam apparatus and automatic astigmatism adjustment method
12/28/2006US20060289401 Microwave plasma processing device and plasma processing gas supply member
12/28/2006US20060289384 Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
12/28/2006US20060289116 Plasma processing apparatus
12/28/2006US20060288938 Systems and Methods for the Production of Highly Tetrahedral Amorphous Carbon Coatings
12/28/2006US20060288797 Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system
12/28/2006DE10329388B4 Faraday-Anordnung als Ionenstrahlmessvorrichtung für eine Ionenimplantationsanlage und Verfahren zu deren Betrieb Faraday arrangement as an ion beam measurement apparatus for an ion implanter and method of operating the
12/28/2006DE102005028729A1 Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability
12/27/2006EP1736524A1 Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device
12/27/2006EP1735812A2 Laser atom probes
12/27/2006EP1735811A2 Method and system for ultrafast photoelectron microscope
12/27/2006EP1735810A1 A large-area shower electron beam irradiator with field emitters as an electron source
12/27/2006EP1735809A2 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
12/27/2006EP1166320B1 Magnetic immersion lense with detection arrangement
12/27/2006CN2851275Y Target chamber cylinder door lifting system
12/27/2006CN1887035A Neutral particle beam processing apparatus
12/27/2006CN1886819A RF metrology characterization for field installation and serviceability for the plasma processing system
12/27/2006CN1886818A Method and device for ion beam processing of surfaces
12/27/2006CN1886817A Ribbon-shaped ion beam with mass separation
12/27/2006CN1885491A Vacuum processing apparatus and method operation thereof
12/27/2006CN1885488A Top electrode, plasma processing device and method
12/27/2006CN1292623C Plasma source coil for generating plasma and plasma chamber using the same
12/26/2006US7154256 Integrated VI probe
12/26/2006US7154106 Composite system of scanning electron microscope and focused ion beam
12/26/2006US7154105 Method of exposing using electron beam
12/26/2006US7154091 Method and system for ultrafast photoelectron microscope
12/26/2006US7154090 Method for controlling charged particle beam, and charged particle beam apparatus
12/26/2006US7154089 Scanning electron microscope
12/26/2006US7153444 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor
12/26/2006US7153387 Plasma processing apparatus and method of plasma processing
12/26/2006US7152549 Vapor deposition system
12/21/2006WO2006135939A2 Microsystem manipulation apparatus
12/21/2006WO2006135924A1 Improvement of etch rate uniformity using the independent movement of electrode pieces