| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/24/2007 | EP1746181A2 Improved magnetron sputtering system for large-area substrates |
| 01/24/2007 | EP1746178A2 Device for improving plasma activity in PVD-reactors |
| 01/24/2007 | EP1745492A1 Multi-column charged particle optics assembly |
| 01/24/2007 | EP1665324B1 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening |
| 01/24/2007 | EP1222679B1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 01/24/2007 | CN1902737A Substrate processing apparatus |
| 01/24/2007 | CN1902732A Edge flow faceplate for improvement of cvd film properties |
| 01/24/2007 | CN1902728A 离子源控制系统 Ion source control system |
| 01/24/2007 | CN1901136A Multiple cathode pulse arc plasma source device |
| 01/24/2007 | CN1900364A Method for removal of copper oxide film from substrate processing surface |
| 01/24/2007 | CN1296975C Processing apparatus for plasma |
| 01/24/2007 | CN1296925C Displacement detecting method, displacement detecting device and recording device of information recording medium original disk |
| 01/23/2007 | US7166965 Waveguide and microwave ion source equipped with the waveguide |
| 01/23/2007 | US7166854 Uniformity control multiple tilt axes, rotating wafer and variable scan velocity |
| 01/23/2007 | US7166840 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor |
| 01/23/2007 | US7166836 Ion beam focusing device |
| 01/23/2007 | US7166535 Plasma etching of silicon carbide |
| 01/23/2007 | US7166524 Method for ion implanting insulator material to reduce dielectric constant |
| 01/23/2007 | US7166480 Particle control device and particle control method for vacuum processing apparatus |
| 01/23/2007 | US7166233 Introducing process gas into reactor chamber, creating plasma within chamber by establishing an RF electromagnetic field within chamber and allowing the field to interact with the process gas |
| 01/23/2007 | US7166200 Method and apparatus for an improved upper electrode plate in a plasma processing system |
| 01/23/2007 | US7166199 Magnetron sputtering systems including anodic gas distribution systems |
| 01/23/2007 | US7166170 Cylinder-based plasma processing system |
| 01/23/2007 | US7166167 Laser CVD device and laser CVD method |
| 01/23/2007 | US7166166 Method and apparatus for an improved baffle plate in a plasma processing system |
| 01/23/2007 | US7165506 Method and device for plasma-treating the surface of substrates by ion bombardment |
| 01/18/2007 | WO2006097804A3 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 01/18/2007 | WO2006014862A3 Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 01/18/2007 | US20070012659 High aspect ratio etch using modulation of RF powers of various frequencies |
| 01/18/2007 | US20070012657 Plasma spraying liquid crystalline polymer on surface of component by feeding liquid crystalline polymer powder into plasma flame to form molten or heat-softened particles, where liquid crystalline polymer particles form plasma sprayed coating on outermost surface of component; minimizes contamination |
| 01/18/2007 | DE102006030837A1 Method and apparatus for writing a pattern on a work piece for large scale ICs uses a variable shaped electron beam and has selector unit to adjust beam according to input data and a beam writing unit |
| 01/18/2007 | DE102006030555A1 Electron beam drift correction method for semiconductor microlithography, by periodically correcting drift, and correcting whenever value of interference factor exceeds predetermined level |
| 01/17/2007 | EP1744348A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor |
| 01/17/2007 | EP1744347A1 Enhanced magnetron sputtering target |
| 01/17/2007 | EP1744346A1 Magnetron sputtering system for large-area substrates having removable anodes |
| 01/17/2007 | EP1744345A1 Multi chamber plasma process system |
| 01/17/2007 | EP1744344A1 Electric-magnetic field generating element and assembling method for same |
| 01/17/2007 | EP1235945A4 Rotating magnet array and sputter source |
| 01/17/2007 | CN1898783A Plasma processing apparatus |
| 01/17/2007 | CN1898774A Small volume process chamber with hot inner surfaces |
| 01/17/2007 | CN1898767A Dual frequency RF match |
| 01/17/2007 | CN1896315A Ion beam etching method and ion beam etching apparatus |
| 01/17/2007 | CN1896301A Sputtering source, device comprising the sputtering source and method of producing flat panels |
| 01/17/2007 | CN1295754C Method and system for single ion implantation |
| 01/16/2007 | US7164236 Method and apparatus for improved plasma processing uniformity |
| 01/16/2007 | US7164142 Electrical feed-through structure and method |
| 01/16/2007 | US7164141 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device |
| 01/16/2007 | US7164129 Method and device for observing a specimen in a field of view of an electron microscope |
| 01/16/2007 | US7164128 Method and apparatus for observing a specimen |
| 01/16/2007 | US7164127 Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same |
| 01/16/2007 | US7164126 Method of forming a sample image and charged particle beam apparatus |
| 01/16/2007 | US7164125 RF quadrupole systems with potential gradients |
| 01/16/2007 | US7163607 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system |
| 01/16/2007 | US7163603 Plasma source assembly and method of manufacture |
| 01/16/2007 | US7163602 Apparatus for generating planar plasma using concentric coils and ferromagnetic cores |
| 01/16/2007 | US7163585 Method and apparatus for an improved optical window deposition shield in a plasma processing system |
| 01/11/2007 | WO2007003488A1 A module for coating both sides of a substrate in a single pass |
| 01/11/2007 | WO2007003473A1 Reactor for carrying out an etching method for a stack of masked wafers and an etching method |
| 01/11/2007 | US20070010099 Method of pattern etching a silicon-containing hard mask |
| 01/11/2007 | US20070010095 Surface treatment method using ion beam and surface treating device |
| 01/11/2007 | US20070009670 Sputter method or device for the production of natural voltage optimized coatings |
| 01/11/2007 | US20070007660 Mask etch processing apparatus |
| 01/11/2007 | US20070007129 Universal vacuum coupling for cylindrical target |
| 01/11/2007 | US20070007128 Silicon film forming apparatus |
| 01/11/2007 | US20070007124 Back-biased face target sputtering based memory with low oxygen flow rate |
| 01/11/2007 | US20070006971 Plasma generation and control using a dual frequency rf source |
| 01/11/2007 | DE202006008098U1 Irradiation or illumination unit has radiators, especially infrared (IR), UV or other light sources for heating modules for heat treatment of plastics or metals |
| 01/11/2007 | DE19734059B4 Anordnung für Schattenwurflithographie Arrangement of shadows lithography |
| 01/10/2007 | EP1741128A2 Gas distribution system having fast gas switching capabilities |
| 01/10/2007 | EP1741124A2 Segmented baffle plate assembly for a plasma processing system |
| 01/10/2007 | EP1144735A4 Method and apparatus for low energy electron enhanced etching and cleaning of substrates |
| 01/10/2007 | EP1040500A4 A plasma generating apparatus having an electrostatic shield |
| 01/10/2007 | EP0976141B1 Apparatus and method for controlling ion energy and plasma density in a plasma processing system |
| 01/10/2007 | CN1894767A Fault detection and control methodologies for ion implantation processes, and system for performing same |
| 01/10/2007 | CN1894763A Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 01/10/2007 | CN1894590A Method for toolmatching and troubleshooting a plasma processing system |
| 01/10/2007 | CN1894086A Unit for the continuous treatment of the surface of objects, and treatment method |
| 01/10/2007 | CN1892987A Systems and methods for implant dosage control, and wafer implantation method by using ion beam |
| 01/10/2007 | CN1892980A Chamber isolation valve RF grounding |
| 01/10/2007 | CN1891854A Apparatus and method for partial implantation using wide beam |
| 01/10/2007 | CN1294637C Apparatus equiped with clamping chuck and matching box |
| 01/10/2007 | CN1294615C Method of fabricating coated process chamber component |
| 01/10/2007 | CN1294614C Ion source, ion injection equipment, manufacturing method of semiconductor device |
| 01/09/2007 | US7161788 Low voltage modular room ionization system |
| 01/09/2007 | US7161352 Beam current measuring device and apparatus using the same |
| 01/09/2007 | US7161162 Electron beam pattern generator with photocathode comprising low work function cesium halide |
| 01/09/2007 | US7161161 Uniformity control using multiple fixed wafer orientations and variable scan velocity |
| 01/09/2007 | US7161159 Dual beam system |
| 01/09/2007 | US7161158 System and method for fast focal length alterations |
| 01/09/2007 | US7161112 Toroidal low-field reactive gas source |
| 01/09/2007 | US7160742 Methods for integrated implant monitoring |
| 01/09/2007 | US7160655 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 01/09/2007 | US7160616 DLC layer system and method for producing said layer system |
| 01/09/2007 | US7160475 Fabrication of three dimensional structures |
| 01/09/2007 | US7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems |
| 01/09/2007 | US7159536 Device and method for generating a local by micro-structure electrode dis-charges with microwaves |
| 01/04/2007 | WO2007002330A1 Sputtering target with slow-sputter layer under target material |
| 01/04/2007 | WO2007001900A1 System and method for positioning an object |
| 01/04/2007 | WO2007001321A1 Atom probe electrode treatments |
| 01/04/2007 | WO2007001313A1 A method and apparatus for process control in time division multiplexed (tdm) etch processes |