| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/18/2014 | US20140367359 Method For Controlling In-Plane Uniformity Of Substrate Processed By Plasma-Assisted Process |
| 12/18/2014 | US20140367254 Co-Cr-Pt-Based Sputtering Target and Method for Producing Same |
| 12/18/2014 | US20140367253 High-Purity Copper Sputtering Target |
| 12/18/2014 | US20140367252 Sputtering Target Assembly |
| 12/18/2014 | US20140367250 Systems for forming photovoltaic cells on flexible substrates |
| 12/18/2014 | US20140367047 Edge ring assembly for plasma etching chambers |
| 12/18/2014 | US20140367046 Enhanced plasma source for a plasma reactor |
| 12/18/2014 | US20140367044 Methods for Automatically Determining Capacitor Values and Systems Thereof |
| 12/18/2014 | US20140367043 Method for fast and repeatable plasma ignition and tuning in plasma chambers |
| 12/18/2014 | US20140367042 Systems for automatically characterizing a plasma |
| 12/18/2014 | US20140367041 Wafer dicing using femtosecond-based laser and plasma etch |
| 12/18/2014 | US20140366968 Coating method for gas delivery system |
| 12/18/2014 | US20140366912 In situ plasma clean for removal of residue from pedestal surface without breaking vacuum |
| 12/17/2014 | CN204029761U 扫描电镜用免导电胶试样座 SEM sample holder with conductive adhesive-free |
| 12/17/2014 | CN204028469U 一种基于ccd的多基色图像处理系统 A multi-color image processing system based ccd |
| 12/17/2014 | CN104221122A 离子束照射装置 Ion beam irradiation means |
| 12/17/2014 | CN104220635A 大面积的光学性能合成多晶金刚石窗口 Synthesis of large-area optical properties of polycrystalline diamond window |
| 12/17/2014 | CN104218187A 用于刻蚀有机层的装置和方法 Apparatus and method for etching the organic layer |
| 12/17/2014 | CN104217981A 半导体制造系统中的离子源清洁方法 Semiconductor manufacturing system ion source cleaning methods |
| 12/17/2014 | CN104217938A 半导体结构的形成方法 The method of forming a semiconductor structure |
| 12/17/2014 | CN104217916A 一种刻蚀装置、刻蚀系统及刻蚀终点探测方法 One kind of etching apparatus, etching etching endpoint detection system and method |
| 12/17/2014 | CN104217915A 等离子体处理装置的包括流动的保护性液体层的室壁 The plasma processing apparatus includes a chamber wall flow protective liquid layer |
| 12/17/2014 | CN104217914A 等离子体处理装置 Plasma processing apparatus |
| 12/17/2014 | CN104217913A 绝缘结构及绝缘方法 Insulation and insulation methods |
| 12/17/2014 | CN104217912A 用于使用聚焦离子束进行半导体器件的平面剥层的前体 Plane for a focused ion beam a semiconductor device precursor delamination |
| 12/17/2014 | CN104217911A 一种侧引出mevva金属离子源 A lateral leads mevva metal ion source |
| 12/17/2014 | CN104217910A 在透射电子显微镜中使用相位片的方法 Phase plate used in the transmission electron microscopy method |
| 12/17/2014 | CN102751399B 采用金属基片制备垂直GaN基LED芯片的设备 Metal substrate preparing vertical GaN-based LED chip device |
| 12/17/2014 | CN102738041B 上部电极板以及基板处理装置 Upper electrode plate and the substrate processing apparatus |
| 12/17/2014 | CN102737928B 磁极组件及具有它的磁控管、滅射室装置和基片处理设备 Pole assembly and has its magnetron injection chamber device off and substrate processing apparatus |
| 12/17/2014 | CN102575900B 用于熔化炉的离子等离子电子发射器 Ions for melting furnace electron emitter |
| 12/17/2014 | CN102522304B 等离子体处理装置和等离子体处理方法 Plasma processing apparatus and plasma processing method |
| 12/17/2014 | CN102460633B 用于光刻系统的图案数据转换器 Pattern data converter for a lithography system |
| 12/17/2014 | CN102446737B 基板处理方法和基板处理设备 Substrate processing method and substrate processing apparatus |
| 12/17/2014 | CN101996839B 粒子束装置、光阑组件及在粒子束装置中改变束流的方法 Particle beam device, diaphragm assembly and change in the particle beam device beam method |
| 12/16/2014 | US8913841 Image processing method for mass spectrum image, program, and apparatus |
| 12/16/2014 | US8913718 Method for identifying nano textile |
| 12/16/2014 | US8912513 Charged particle beam writing apparatus and charged particle beam writing method |
| 12/16/2014 | US8912509 Adjustable cathodoluminescence detection system and microscope employing such a system |
| 12/16/2014 | US8912506 Device for sustaining differential vacuum degrees for electron column |
| 12/16/2014 | US8912491 Method of performing tomographic imaging of a sample in a charged-particle microscope |
| 12/16/2014 | US8912490 Method for preparing samples for imaging |
| 12/16/2014 | US8912489 Defect removal process |
| 12/16/2014 | US8912488 Automated sample orientation |
| 12/16/2014 | US8912487 Charged particle beam device, position specification method used for charged particle beam device, and program |
| 12/16/2014 | US8911675 Discharge cell for ozonizer |
| 12/16/2014 | US8911637 Plasma-enhanced substrate processing method and apparatus |
| 12/16/2014 | US8911590 Integrated capacitive and inductive power sources for a plasma etching chamber |
| 12/16/2014 | US8911589 Edge ring assembly with dielectric spacer ring |
| 12/16/2014 | US8911588 Methods and apparatus for selectively modifying RF current paths in a plasma processing system |
| 12/16/2014 | US8911559 Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning |
| 12/16/2014 | US8910591 Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafers |
| 12/16/2014 | US8910590 Plasma deposition |
| 12/11/2014 | US20140363978 Electron Beam-Induced Etching |
| 12/11/2014 | US20140363678 Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby |
| 12/11/2014 | US20140361690 Plasma processing apparatus |
| 12/11/2014 | US20140361689 Apparatus for generating thermodynamically cold microwave plasma |
| 12/11/2014 | US20140361684 Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus |
| 12/11/2014 | US20140361197 Workpiece carrier |
| 12/11/2014 | US20140361194 Sample holder for electron microscopy for low-current, low-noise analysis |
| 12/11/2014 | US20140361193 Multi charged particle beam writing method, and multi charged particle beam writing apparatus |
| 12/11/2014 | US20140361168 Electron beam apparatus |
| 12/11/2014 | US20140361167 Scanning electron microscope |
| 12/11/2014 | US20140361166 Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope |
| 12/11/2014 | US20140361165 Method for imaging a sample in a charged particle apparatus |
| 12/11/2014 | US20140361102 Gas supply method for semiconductor manufacturing apparatus, gas supply system, and semiconductor manufacturing apparatus |
| 12/11/2014 | US20140360977 Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| 12/11/2014 | US20140360871 Fe-Pt-Ag-C-Based Sputtering Target Having C Grains Dispersed Therein, and Method for Producing Same |
| 12/11/2014 | US20140360870 Ferromagnetic material sputtering target containing chromium oxide |
| 12/11/2014 | US20140360869 High-purity copper-chromium alloy sputtering target |
| 12/11/2014 | US20140360670 Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential |
| 12/11/2014 | US20140360286 Apparatus and Method for Producing Specimens for Electron Microscopy |
| 12/10/2014 | CN204011359U 一种用于磁控溅射机台的新型rf屏蔽罩 A new type of magnetron sputtering machine rf shield |
| 12/10/2014 | CN204011358U 扫描电镜用角度可调多用试样座 Scanning electron microscopy with multi-angle adjustable seat sample |
| 12/10/2014 | CN204008431U 光镜电镜关联成像用光学真空冷台 Light microscopy with electron microscopy imaging optics associated cold vacuum station |
| 12/10/2014 | CN203999797U 一种可变磁通量分布的直流磁控溅射机磁通管 A variable flux distribution of DC magnetron sputtering machine flux tube |
| 12/10/2014 | CN203999796U 用于mb2-830型磁控溅射机台的靶材的磁通管装置 Flux tube device for target mb2-830 type of magnetron sputtering machine |
| 12/10/2014 | CN104203877A 使用等离子体技术制备乙炔的方法和装置 Method and apparatus for preparing acetylene plasma technology |
| 12/10/2014 | CN104201082A 运行脉冲式电弧源的方法 The method of operation of pulsed arc source |
| 12/10/2014 | CN104201081A 一种宽束离子注入机均匀性调节装置 One kind of broad beam ion implanter uniformity adjustment device |
| 12/10/2014 | CN102709145B 等离子体处理装置 Plasma processing apparatus |
| 12/10/2014 | CN102484028B 离子植入系统以及其离子源腔室清净的终点侦测的方法 Clean the ion implantation system and an ion source is the end of the chamber detection method |
| 12/10/2014 | CN102332383B 等离子体刻蚀工艺的终点监控方法 The end of the plasma etching process monitoring method |
| 12/10/2014 | CN102243977B 等离子体处理装置及半导体装置的制造方法 Apparatus and method for manufacturing a semiconductor device of a plasma processing |
| 12/10/2014 | CN102110568B 束流传输系统及方法 Beam transport system and method |
| 12/09/2014 | USRE45280 Segmented coil for generating plasma in plasma processing equipment |
| 12/09/2014 | US8908348 Wafer grounding and biasing method, apparatus, and application |
| 12/09/2014 | US8907554 Assembly and method for reducing foil wrinkles |
| 12/09/2014 | US8907307 Apparatus and method for maskless patterned implantation |
| 12/09/2014 | US8907306 Multi charged particle beam writing apparatus and multi charged particle beam writing method |
| 12/09/2014 | US8907305 Charged particle detector |
| 12/09/2014 | US8907303 Stage device and control method for stage device |
| 12/09/2014 | US8907298 Method for axial alignment of charged particle beam and charged particle beam system |
| 12/09/2014 | US8907296 Charged particle beam system aperture |
| 12/09/2014 | US8907281 System and method for controlling charge-up in an electron beam apparatus |
| 12/09/2014 | US8907280 Fast electron microscopy via compressive sensing |
| 12/09/2014 | US8907279 Electron microscope and image capturing method using electron beam |
| 12/09/2014 | US8907278 Charged particle beam applied apparatus, and irradiation method |
| 12/09/2014 | US8907267 Charged particle beam device |
| 12/09/2014 | US8906808 Etching method |