| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/27/2007 | US7183514 Helix coupled remote plasma source |
| 02/27/2007 | US7183177 Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement |
| 02/27/2007 | US7182880 Process for reducing particle formation during etching |
| 02/27/2007 | US7182843 Rotating sputtering magnetron |
| 02/27/2007 | US7182842 Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
| 02/27/2007 | US7182816 Particulate reduction using temperature-controlled chamber shield |
| 02/22/2007 | WO2007022144A1 Optical emission interferometry for pecvd using a gas injection hole |
| 02/22/2007 | WO2007021522A1 Thermal management of inductively coupled plasma reactors |
| 02/22/2007 | WO2007021521A2 Two-piece dome with separate rf coils for inductively coupled plasma reactors |
| 02/22/2007 | WO2007021520A2 Substrate support for increasing substrate temperature in plasma reactors |
| 02/22/2007 | WO2007021176A1 Movement platform for carrier with 5 degrees of freedom |
| 02/22/2007 | WO2007021163A1 Detector for electron column and method for detecting electrons for electron column |
| 02/22/2007 | WO2007021162A1 Method for changing energy of electron beam in electron column |
| 02/22/2007 | WO2007020866A1 Detection device and inspection device |
| 02/22/2007 | WO2007020374A1 Method of treating a gas stream |
| 02/22/2007 | WO2007020373A1 Microwave plasma reactor |
| 02/22/2007 | WO2007020212A1 Treatment station for particle bombardment of a patient and a particle therapy installation |
| 02/22/2007 | WO2006135924A9 Improvement of etch rate uniformity using the independent movement of electrode pieces |
| 02/22/2007 | US20070040131 Super alloy ionization chamber for reactive samples |
| 02/22/2007 | US20070040128 Processing apparatus using focused charged particle beam |
| 02/21/2007 | EP1755131A2 Electron beam irradiating apparatus |
| 02/21/2007 | EP1755001A1 Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device |
| 02/21/2007 | EP1754243A1 Device and method for atomising with the aid of a displaceable planar target |
| 02/21/2007 | EP1753891A2 Msvd coating process |
| 02/21/2007 | EP1753549A2 Methods for wet cleaning quartz surfaces of components for plasma processing chambers |
| 02/21/2007 | CN1918484A Beam measuring equipment and beam measuring method using the same |
| 02/21/2007 | CN1917164A Electrostatically clamped edge ring for plasma processing |
| 02/21/2007 | CN1917131A Filament of neutralization cathode in Kaufman ion source, and method |
| 02/20/2007 | US7180317 High resolution analytical probe station |
| 02/20/2007 | US7180231 Electron beam emitter |
| 02/20/2007 | US7180062 Pattern measuring method |
| 02/20/2007 | US7179663 CDA controller and method for stabilizing dome temperature |
| 02/20/2007 | US7179569 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 02/20/2007 | US7179352 Vacuum treatment system and process for manufacturing workpieces |
| 02/20/2007 | US7179350 Reactive sputtering of silicon nitride films by RF supported DC magnetron |
| 02/20/2007 | US7179148 Cathode with improved work function and method for making the same |
| 02/20/2007 | US7178387 Method and apparatus for scanning in scanning probe microscopy and presenting results |
| 02/15/2007 | WO2007017528A1 Cathodic arc evaporation device and method of igniting said arc |
| 02/15/2007 | WO2007017255A1 Particle-optical system |
| 02/15/2007 | WO2006135939A3 Microsystem manipulation apparatus |
| 02/15/2007 | WO2006097804B1 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 02/15/2007 | WO2006089021A3 Ion beam measurement apparatus and method |
| 02/15/2007 | US20070037532 Radio frequency excitation arrangement including a limiting circuit |
| 02/15/2007 | US20070037367 Apparatus for plasma doping |
| 02/15/2007 | US20070037071 Method for removing defect material of a lithography mask |
| 02/15/2007 | US20070036895 Deposition methods utilizing microwave excitation |
| 02/15/2007 | US20070034812 Method of modulating laser-accelerated protons for radiation therapy |
| 02/15/2007 | US20070034797 Electron beam apparatus, and inspection instrument and inspection process thereof |
| 02/15/2007 | US20070034498 Pulsed magnetron sputtering deposition with preionization |
| 02/15/2007 | US20070034497 High-density plasma source |
| 02/15/2007 | US20070034337 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| 02/15/2007 | US20070034157 Plasma processing apparatus and plasma processing method |
| 02/15/2007 | US20070034156 Method and apparatus for precision coating of molecules on the surfaces of materials and devices |
| 02/15/2007 | US20070034154 Plasma source assembly and method of manufacture |
| 02/14/2007 | EP1753122A1 Movement platform for carrier with five degrees of freedom |
| 02/14/2007 | EP1753011A1 Method for providing control signals for high frequency power generators |
| 02/14/2007 | EP1753010A1 Particle-optical system |
| 02/14/2007 | EP1753009A1 Charge neutralizing device |
| 02/14/2007 | EP1752992A1 Apparatus for the adaption of a particle beam parameter of a particle beam in a particle beam accelerator and particle beam accelerator with such an apparatus |
| 02/14/2007 | EP1752558A1 Film forming apparatus |
| 02/14/2007 | EP1752557A1 Vacuum coating apparatus with powered rotating cathode |
| 02/14/2007 | EP1752556A1 Tubular cathode for use in sputtering. |
| 02/14/2007 | EP1751784A2 Apparatus for blanking a charged particle beam |
| 02/14/2007 | EP1751783A1 Charged particle gun |
| 02/14/2007 | EP1266412B1 Method and device for transferring spin-polarized charge carriers |
| 02/14/2007 | EP1125002A4 Systems and methods for two-sided etch of a semiconductor substrate |
| 02/14/2007 | EP0914496A4 Microwave applicator for an electron cyclotron resonance plasma source |
| 02/14/2007 | CN1914716A Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate |
| 02/14/2007 | CN1914714A Substrate processing system and process for fabricating semiconductor device |
| 02/14/2007 | CN1914712A Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 02/14/2007 | CN1914351A Selectable dual position magnetron |
| 02/14/2007 | CN1912175A Vacuum-coating machine with motor-driven rotary cathode |
| 02/14/2007 | CN1300374C Cerium oxide containing ceramic components and coatings in semiconductor processing equipment |
| 02/13/2007 | US7177781 Method and system for electron density measurement |
| 02/13/2007 | US7177020 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process |
| 02/13/2007 | US7176634 Coaxial type impedance matching device and impedance detecting method for plasma generation |
| 02/13/2007 | US7176610 High brightness thermionic cathode |
| 02/13/2007 | US7176471 Electron beam exposure method and electron beam exposure apparatus |
| 02/13/2007 | US7176468 Method for charging substrate to a potential |
| 02/13/2007 | US7176459 Electron beam apparatus |
| 02/13/2007 | US7176458 Method and apparatus for specimen fabrication |
| 02/13/2007 | US7176403 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 02/13/2007 | US7175952 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 02/13/2007 | US7175875 Method and apparatus for plasma processing |
| 02/13/2007 | US7175714 Electrode-built-in susceptor and a manufacturing method therefor |
| 02/13/2007 | US7175713 Apparatus for cyclical deposition of thin films |
| 02/08/2007 | WO2007015445A1 Plasma generator and film forming method employing same |
| 02/08/2007 | WO2007015306A1 Charged particle beam plotting device and method |
| 02/08/2007 | WO2007001321A8 Atom probe electrode treatments |
| 02/08/2007 | WO2006130546A3 Plasma resistant seal assembly with replaceable barrier shield |
| 02/08/2007 | US20070032090 Plasma rapid thermal process apparatus in which supply part of radical source is improved |
| 02/08/2007 | US20070032048 Method for depositing thin film by controlling effective distance between showerhead and susceptor |
| 02/08/2007 | US20070032045 Method for manufacturing semiconductor device and substrate processing apparatus |
| 02/08/2007 | US20070029509 Apparatus for generating a plurality of beamlets |
| 02/08/2007 | US20070029507 Reliability in a maskless lithography system |
| 02/08/2007 | US20070029504 Vacuum conveying apparatus and charged particle beam equipment with the same |
| 02/08/2007 | US20070029503 Grid structure for holding specimen of electron microscopy |
| 02/08/2007 | US20070029499 Apparatus for generating a plurality of beamlets |
| 02/08/2007 | US20070029481 Specimen tip and tip holder assembly |
| 02/08/2007 | US20070029282 Method of processing a workpiece by controlling a set of plasma parameters through a set of chamber parameters using surfaces of constant value |