| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/15/2007 | DE10393970T5 Probenbetrachtungsgerät und Probenbetrachtungsverfahren Sample viewer and sample observation method |
| 03/14/2007 | EP1761942A1 Device for coating optical glass by means of plasma-supported chemical vapour deposition (cvd) |
| 03/14/2007 | EP1295316B1 Integrated electronic hardware for wafer processing control and diagnostic |
| 03/14/2007 | EP1243017B1 Linear drive system for use in a plasma processing system |
| 03/14/2007 | CN2879416Y Scanning type ion gun |
| 03/14/2007 | CN1930652A Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source |
| 03/14/2007 | CN1929070A Electron source and surface light source employing same |
| 03/14/2007 | CN1305353C High-frequency power source and its control method, and plasma processor |
| 03/14/2007 | CN1305100C Method of measuring performance of scanning electron microscope |
| 03/14/2007 | CN1304103C Plasma-assisted carbon structure forming |
| 03/13/2007 | US7189982 Focused ion beam apparatus and aperture |
| 03/13/2007 | US7189981 Electromagnetic focusing method for electron-beam lithography system |
| 03/13/2007 | US7189980 Methods and systems for optimizing ion implantation uniformity control |
| 03/13/2007 | US7189979 Electron gun |
| 03/13/2007 | US7189968 Sample measurement method and measurement sample base material |
| 03/13/2007 | US7189940 Plasma-assisted melting |
| 03/13/2007 | US7189436 Flash evaporation-plasma coating deposition method |
| 03/13/2007 | US7189432 Varying conductance out of a process region to control gas flux in an ALD reactor |
| 03/13/2007 | US7189332 Apparatus and method for detecting an endpoint in a vapor phase etch |
| 03/08/2007 | US20070052948 Test pattern, inspection method, and device manufacturing method |
| 03/08/2007 | US20070051888 System and method for determining a cross sectional feature of a structural element using a reference structural element |
| 03/08/2007 | US20070051624 Copper or copper alloy target/copper alloy backing plate assembly |
| 03/08/2007 | DE202006018639U1 Kathode für elektronisches Mikroskop (Rastermikroskop) Cathode for electronic microscope (microscope) |
| 03/08/2007 | DE10303683B4 Verfahren zum Verringern der durch Kontamination hervorgerufenen Prozessfluktuationen während des Ionenimplantierens A method of reducing the contamination caused by process fluctuations during the ion implanting |
| 03/08/2007 | CA2621301A1 Ultraviolet radiation lamp and source module and treatment system containing same |
| 03/07/2007 | EP1760881A2 Methods and apparatus for symmetrical and/or concentric radio frequency matching networks |
| 03/07/2007 | EP1760763A2 Control device for gas species by optical emission spectrometry on a plasma |
| 03/07/2007 | EP1760762A1 Device and method for selecting an emission area of an emission pattern |
| 03/07/2007 | EP1760761A1 Charged particle beam emitting device and method for operating a charged particle beam emitting device |
| 03/07/2007 | EP1759165A1 Calibrating device on a silicon substrate |
| 03/07/2007 | EP1759036A1 Coating device for coating a substrate and coating method |
| 03/07/2007 | EP1758830A1 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating |
| 03/07/2007 | EP1290430A4 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams |
| 03/07/2007 | EP1105914B1 Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current |
| 03/07/2007 | EP0992057B1 Charged-particle source, control system, and process |
| 03/07/2007 | CN2876772Y Electrical control system with dry pump mated with scanning microscope |
| 03/07/2007 | CN1926927A Plasma generation power supply apparatus |
| 03/07/2007 | CN1926714A Distributor and distribution method, plasma handling system and method, and method for manufacturing LCD |
| 03/07/2007 | CN1925322A Methods and apparatus for symmetrical and/or concentric radio frequency matching networks |
| 03/07/2007 | CN1924553A Method for determining lens errors in a particle-optical device |
| 03/07/2007 | CN1303638C Conductive collar surrounding semiconductor workpiece in plasma chamber |
| 03/07/2007 | CN1303245C Sputtering device and its electrode and manufacturing method of the electrode |
| 03/07/2007 | CN1302843C Plasma-assisted carburizing |
| 03/06/2007 | US7186977 Method for non-destructive trench depth measurement using electron beam source and X-ray detection |
| 03/06/2007 | US7186976 Scanning electron microscope |
| 03/06/2007 | US7186975 Scanning charged-particle microscope |
| 03/06/2007 | US7186943 MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
| 03/06/2007 | US7186315 Plasma treatment apparatus |
| 03/06/2007 | US7186314 Plasma processor and plasma processing method |
| 03/06/2007 | US7186313 Plasma chamber wall segment temperature control |
| 03/06/2007 | US7185602 Ion implantation ion source, system and method |
| 03/06/2007 | CA2291041C Diamond marking |
| 03/01/2007 | WO2007024765A1 Non-intrusive plasma monitoring system for arc detection and prevention for blanket cvd films |
| 03/01/2007 | WO2007023489A1 A plasma emitter and methods utilizing the same |
| 03/01/2007 | WO2007023350A1 Method and apparatus for creating a plasma |
| 03/01/2007 | WO2007022976A2 Method and device for the plasma treatment of the interior of hollow bodies |
| 03/01/2007 | WO2007022862A2 Method for the production of a multilayer electrostatic lens array |
| 03/01/2007 | WO2006138417A3 Energy selecting slit and energy selective sample analysis systems utilizing the same |
| 03/01/2007 | WO2006023637A3 In situ surface contaminant removal for ion implanting |
| 03/01/2007 | WO2006015167A3 Tem mems device holder and method of fabrication |
| 03/01/2007 | US20070045571 Method for arranging semiconductor wafer to ion-beam in disk-type implantation |
| 03/01/2007 | US20070045570 Technique for improving ion implanter productivity |
| 03/01/2007 | US20070045569 Ion implant beam angle integrity monitoring and adjusting |
| 03/01/2007 | US20070045568 Method for reducing particles during ion implantation |
| 03/01/2007 | US20070045567 Particle Beam Processing Apparatus and Materials Treatable Using the Apparatus |
| 03/01/2007 | US20070045560 Charged particle beam apparatus |
| 03/01/2007 | US20070045559 Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation |
| 03/01/2007 | US20070045536 Method for inspecting substrate, substrate inspecting system and electron beam apparatus |
| 03/01/2007 | US20070044915 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 03/01/2007 | US20070044906 Multilayer polymeric composites having a layer of dispersed fluoroelastomer in thermoplastic |
| 03/01/2007 | US20070044717 Segmented resonant antenna for radio frequency inductively coupled plasmas |
| 03/01/2007 | DE202006005011U1 Stromzuführung für eine Rohrkathode Power supply for a tube cathode |
| 03/01/2007 | DE19643709B4 Vorrichtung zum Behandeln eines Werkstückes in einer Gasentladung An apparatus for treating a workpiece in a gas discharge |
| 03/01/2007 | DE10351059B4 Verfahren und Vorrichtung zur Ionenstrahlbearbeitung von Oberflächen Method and device for ion beam processing of surfaces |
| 03/01/2007 | DE102005040267A1 Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung A method for producing a multilayer electrostatic lens arrangement |
| 03/01/2007 | DE102004019833B4 Objektivlinse für einen Strahl geladener Partikel und deren Verwendung Objective lens for a beam of charged particles and their use |
| 02/28/2007 | EP1758149A1 Microwave plasma generating apparatus |
| 02/28/2007 | EP1756851A1 Media injector |
| 02/28/2007 | EP1409762A4 A process and apparatus for plasma activated deposition in a vacuum |
| 02/28/2007 | EP1303866A4 System and method for improving thin films by gas cluster ion be am processing |
| 02/28/2007 | EP1247433A4 Enhanced etching/smoothing of dielectric surfaces |
| 02/28/2007 | EP1200980B1 Adaptive gas cluster ion beam for smoothing surfaces |
| 02/28/2007 | EP1159465B1 Method of atomic layer deposition |
| 02/28/2007 | EP1076911B1 Method and apparatus for ionized physical vapor deposition |
| 02/28/2007 | EP1040292B1 Gas panel |
| 02/28/2007 | CN1922709A Ion sources |
| 02/28/2007 | CN1922708A Method for depositing carbide coatings of high-fusion metals |
| 02/28/2007 | CN1922707A Modulating ion beam current |
| 02/28/2007 | CN1921068A Particle sticking prevention apparatus and plasma processing apparatus |
| 02/28/2007 | CN1921063A Film forming liquid for preparing micro-sieve film and method of use thereof |
| 02/28/2007 | CN1302515C Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 02/28/2007 | CN1302512C Electrode member for plasma treating appts., plasma treating appts. and plasma treating method |
| 02/28/2007 | CN1302511C Method for predicting the lifetime of a filament in an ion source and ion source device |
| 02/27/2007 | US7184382 Energy beam irradiating apparatus |
| 02/27/2007 | US7184134 Real-time monitoring apparatus for plasma process |
| 02/27/2007 | US7183716 Charged particle source and operation thereof |
| 02/27/2007 | US7183564 Channel spark source for generating a stable focused electron beam |
| 02/27/2007 | US7183562 Charged-particle-beam mapping projection-optical systems and methods for adjusting same |
| 02/27/2007 | US7183548 Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision |
| 02/27/2007 | US7183547 Element-specific X-ray fluorescence microscope and method of operation |