| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/17/2007 | US7205550 Electron beam apparatus and method for production of its specimen chamber |
| 04/17/2007 | US7205543 Auto focusing apparatus and method |
| 04/17/2007 | US7205542 Scanning electron microscope with curved axes |
| 04/17/2007 | US7205540 Electron beam apparatus and device manufacturing method using same |
| 04/17/2007 | US7205534 Method and apparatus for in situ depositing of neutral Cs under ultra-high vacuum to analytical ends |
| 04/17/2007 | US7205078 Determining the backscattering intensity by using the reflection coefficient (rn), the transmission coefficient (tn), and the scatter distribution. |
| 04/17/2007 | US7205034 Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus |
| 04/17/2007 | US7204921 Vacuum apparatus and vacuum processing method |
| 04/17/2007 | US7204912 Method and apparatus for an improved bellows shield in a plasma processing system |
| 04/17/2007 | US7204155 Method and apparatus for pressure control and flow measurement |
| 04/12/2007 | WO2007041444A2 Electron beam column for writing shaped electron beams |
| 04/12/2007 | WO2007041194A2 Hyperthermal neutral beam source and method of operating |
| 04/12/2007 | WO2007041139A2 Electrostatic deflection system with low aberrations and vertical beam incidence |
| 04/12/2007 | WO2007041101A2 Beam exposure writing strategy system and method |
| 04/12/2007 | WO2007041057A2 Electrostatic deflection system with impedance matching for high positioning accuracy |
| 04/12/2007 | WO2007041033A1 Placement effects correction in raster pattern generator |
| 04/12/2007 | WO2007040098A1 Charged particle beam equipment and method for irradiating charged particle beam |
| 04/12/2007 | WO2007038967A1 Down-stream plasma etching with deflectable plasma beam |
| 04/12/2007 | WO2006133040A3 Charged beam dump and particle attractor |
| 04/12/2007 | WO2006131670A3 Gas controlling device |
| 04/12/2007 | US20070080647 Divergence-controlled hybrid multiple electron beam-emitting device |
| 04/12/2007 | US20070080140 Plasma reactor control by translating desired values of m plasma parameters to values of n chamber parameters |
| 04/12/2007 | US20070080139 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure |
| 04/12/2007 | US20070080138 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters |
| 04/12/2007 | US20070080137 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure |
| 04/12/2007 | DE112005000735T5 Siliciumelektrodenplatte für ein Plasmaätzen mit überlegener Haltbarkeit Silicon electrode plate for plasma etching with superior durability |
| 04/11/2007 | EP1772894A2 Method for determining lens errors in a particle-optical device |
| 04/11/2007 | EP1771211A2 Device and method for plasma coating/sterilization |
| 04/11/2007 | EP1183709B1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 04/11/2007 | EP1166322B1 Plasma processing method and apparatus with control of rf bias |
| 04/11/2007 | EP0760109B1 Method for particle wave reconstruction in a particle-optical apparatus |
| 04/11/2007 | CN1947326A Reciprocating drive system for scanning a workpiece |
| 04/11/2007 | CN1947221A Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
| 04/11/2007 | CN1947216A Multi-piece baffle plate assembly for a plasma processing system |
| 04/11/2007 | CN1947215A Method and system for control of processing conditions in plasma processing systems |
| 04/11/2007 | CN1946827A Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device |
| 04/11/2007 | CN1945800A Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 04/11/2007 | CN1945793A Apparatus and method for treating a substrate with plasma, and facility for manufacturing semiconductor devices |
| 04/11/2007 | CN1945782A 微波离子源 Microwave ion source |
| 04/11/2007 | CN1945338A Cluster tool for microscopic processing of samples |
| 04/11/2007 | CN1310292C Vacuum processing device |
| 04/11/2007 | CN1310290C Upper electrode and plasma processing device |
| 04/11/2007 | CN1310283C Correcting method for scanning tool of semiconductor and standard correcting piece thereof |
| 04/11/2007 | CN1310281C Pedestal with integral shield |
| 04/11/2007 | CN1310279C Method and apparatus for improved ion bunching in an ion implantation system |
| 04/11/2007 | CN1310025C Manufacturing method for test apparatus and parts |
| 04/11/2007 | CN1309859C Cylinder-based plasma processing system |
| 04/10/2007 | US7202488 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/10/2007 | US7202475 Rapid defect composition mapping using multiple X-ray emission perspective detection scheme |
| 04/10/2007 | US7200950 Process for monitoring measuring device performance |
| 04/05/2007 | WO2007038416A2 Beam blanker driver system and method |
| 04/05/2007 | WO2007038368A1 Reactive dual magnetron sputtering device with synchronised gas supply |
| 04/05/2007 | WO2007013802B1 Maskless lithography system with improved reliability |
| 04/05/2007 | WO2006072583A3 Method for beam calibration and usage of a calibration body |
| 04/05/2007 | US20070077737 Plasma processing method and plasma processing apparatus |
| 04/05/2007 | US20070075654 Method and Apparatus for Preventing Instabilities in Radio-Frequency Plasma Processing |
| 04/05/2007 | US20070075275 Beam exposure writing strategy system and method |
| 04/05/2007 | US20070075274 Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases |
| 04/05/2007 | US20070075262 Electrostatic deflection system with low aberrations and vertical beam incidence |
| 04/05/2007 | US20070075258 Electrostatic deflector |
| 04/05/2007 | US20070075257 Method of manufacturing electrostatic deflector, and electrostatic deflector |
| 04/05/2007 | US20070075256 Electrostatic deflection system with impedance matching for high positioning accuracy |
| 04/05/2007 | US20070075039 Electrolytic cells; plate dielectric and electrodes; control discharging of gases |
| 04/05/2007 | US20070074813 Method and apparatus for plasma doping |
| 04/05/2007 | DE102005046463A1 Plasmabearbeitungsgerät Plasma processing device |
| 04/05/2007 | DE102005045622A1 Spatially-resolved analysis of electron spin polarization in beam path of parallel-focusing electron microscope, by displaying lateral distribution of degree of spin polarization of electrons on image detector |
| 04/04/2007 | EP1770753A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 04/04/2007 | EP1770752A2 Electron microscope |
| 04/04/2007 | EP1770751A2 Cluster tool for microscopic processing of samples |
| 04/04/2007 | EP1769521A1 Electron beam applying apparatus and drawing apparatus |
| 04/04/2007 | EP1769101A2 Apparatus including gas distribution member supplying process gas and radio frequency (rf) power for plasma processing |
| 04/04/2007 | EP1627412B1 Charged particle beamlet exposure system |
| 04/04/2007 | EP1589567B1 Member for plasma etching device and method for manufacture thereof |
| 04/04/2007 | EP1444717B1 Tunable multi-zone gas injection system |
| 04/04/2007 | EP1332510A4 Real time monitoring for simultaneous imaging and exposure in charged particle beam systems |
| 04/04/2007 | EP1315844A4 Gcib size diagnostics and workpiece processing |
| 04/04/2007 | EP1175695A4 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 04/04/2007 | CN2884873Y A continuous ion-injecting combined processing production equipment for biology |
| 04/04/2007 | CN1943012A Plasma treatment apparatus |
| 04/04/2007 | CN1943003A Method and apparatus for in-situ film stack processing |
| 04/04/2007 | CN1943002A Apparatus and method for plasma treating article |
| 04/04/2007 | CN1942829A Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device |
| 04/04/2007 | CN1940546A Check out test set and apparatus for manufacturing same |
| 04/04/2007 | CN1309280C Plasma processing equipment |
| 04/04/2007 | CN1309002C Magnetron atomisation source and use thereof |
| 04/04/2007 | CN1309001C Method and apparatus for producing uniform process rates |
| 04/04/2007 | CN1309000C Configurable plasma volume etch chamber |
| 04/04/2007 | CN1308999C Apparatus and method for controlling voltage applied to electrostatic shield used in plasma generator |
| 04/04/2007 | CN1308998C Methods and apparatus for ion implantation |
| 04/04/2007 | CN1308885C Optical projection imaging system and method for automatically detecting cells |
| 04/04/2007 | CN1308773C Surface processing apparatus |
| 04/03/2007 | US7199383 Method for reducing particles during ion implantation |
| 04/03/2007 | US7199375 Radiation shielding container that encloses a vial of one or more radioactive seeds |
| 04/03/2007 | US7199373 Particle-optic electrostatic lens |
| 04/03/2007 | US7199365 Electron beam apparatus with aberration corrector |
| 04/03/2007 | US7199328 Apparatus and method for plasma processing |
| 04/03/2007 | US7199327 Method and system for arc suppression in a plasma processing system |
| 03/29/2007 | WO2007035460A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/29/2007 | WO2007035182A2 Field enhanced electrodes for additive-injection non-thermal plasma (ntp) processor |
| 03/29/2007 | WO2007034659A1 Electron beam exposure system, and method for cleaning electron beam exposure system |