| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/29/2007 | WO2006126880A3 Scanning transmission electron microscope |
| 03/29/2007 | WO2006085994A3 Multi-component substances and apparatus for preparation thereof |
| 03/29/2007 | WO2006079741A3 Microelectronic multiple electron beam emitting device |
| 03/29/2007 | WO2006060378A3 Broad energy-range ribbon ion beam collimation using a variable-gradient dipole |
| 03/29/2007 | WO2005111267A3 Gas distribution member supplying process gas and rf power for plasma processing |
| 03/29/2007 | US20070073498 Method of detecting arc discharges in a plasma process |
| 03/29/2007 | US20070071908 high-density plasma-chemical vapor deposition of silicon dioxide films over substrates having grooves on the surfaces; concurrent deposition and sputtering by controlling gas flow rates; films having excellent gap-filling; semiconductors |
| 03/29/2007 | US20070070572 Low voltage modular room ionization system |
| 03/29/2007 | US20070069722 Beam current meter |
| 03/29/2007 | US20070069666 Apparatus for processing an object with high position accurancy |
| 03/29/2007 | US20070069157 Methods and apparatus for plasma implantation with improved dopant profile |
| 03/29/2007 | US20070069156 Ion beam profiler |
| 03/29/2007 | US20070069150 Charged particle beam energy width reduction system for charged particle beam system |
| 03/29/2007 | US20070069148 Beam blanker driver system and method |
| 03/29/2007 | US20070069128 Stress measuring method and system |
| 03/29/2007 | US20070068456 Monitoring processing of a substrate in a processing chamber |
| 03/29/2007 | DE19926601B4 Apertur in einem Halbleitermaterial sowie Herstellung der Apertur und Verwendung Aperture in a semiconductor material and forming the aperture and using |
| 03/29/2007 | CA2622512A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/28/2007 | EP1768163A1 Ion implantation apparatus |
| 03/28/2007 | EP1768162A2 Multiple electron beam device |
| 03/28/2007 | EP1768161A1 Electron microscopic method and electron microscope using the same |
| 03/28/2007 | EP1766656A1 Device for carbon deposition |
| 03/28/2007 | EP1766655A1 Device and method for measurement of beam angle and divergence normal to plane of scanned beam or ribbon beam |
| 03/28/2007 | EP1766654A1 Ion beam scanning systems and methods for improved ion implantation uniformity |
| 03/28/2007 | EP1766653A1 Charged particle beam exposure system |
| 03/28/2007 | EP1766652A2 Non-axisymmmetric charged-particle beam system |
| 03/28/2007 | EP1765540A2 Apparatus and method for fast arc extinction with early shunting of arc current in plasma |
| 03/28/2007 | EP1604049B1 Method and apparatus for treating a substrate |
| 03/28/2007 | EP1352417B1 Device for the plasma-mediated working of surfaces on planar substrates |
| 03/28/2007 | EP1155599A4 Atmospheric steady-state glow-discharge plasma |
| 03/28/2007 | CN1938835A Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film and base material |
| 03/28/2007 | CN1938813A A tubular magnet assembly |
| 03/28/2007 | CN1938812A Method of correction for wafer crystal cut error in semiconductor processing |
| 03/28/2007 | CN1937166A Faraday system and ion implanter used same |
| 03/28/2007 | CN1937165A Field emission electron gun and electron beam apparatus using the same |
| 03/28/2007 | CN1307679C Apparatus and method for improving plasma distribution and performance in inductively coupled plasma |
| 03/28/2007 | CN1307678C Method and appts. for controlling ion implantation during vacuum fluctuation |
| 03/28/2007 | CN1307441C Optical elements, it metal mould and method for processing optical elements |
| 03/28/2007 | CN1307432C Electron beam detector, scanning type electronic microscope, mass spectrometer and ion detector |
| 03/27/2007 | US7196782 Methods and systems for determining a thin film characteristic and an electrical property of a specimen |
| 03/27/2007 | US7196337 Particle processing apparatus and methods |
| 03/27/2007 | US7196328 Nanomachining method and apparatus |
| 03/27/2007 | US7196283 Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface |
| 03/27/2007 | US7195936 Thin film processing method and system |
| 03/27/2007 | US7195673 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same |
| 03/22/2007 | WO2007032671A1 Lithography system and projection method |
| 03/22/2007 | WO2007032670A1 Lithography system, sensor and measuring method |
| 03/22/2007 | WO2007032420A1 Plasma processing apparatus |
| 03/22/2007 | WO2007032418A1 Plasma treating apparatus and electrode member therefor and electrode member manufacturing and recycling method |
| 03/22/2007 | WO2007030850A1 Plant for plasma treatment of endless materials |
| 03/22/2007 | WO2006130838A3 Methods and apparatus for incorporating nitrogen in oxide films |
| 03/22/2007 | US20070063148 Sample holder |
| 03/22/2007 | US20070063146 Electrostatic deflection control circuit and method of electronic beam measuring apparatus |
| 03/22/2007 | US20070062646 Method and apparatus for processing substrates |
| 03/22/2007 | US20070062558 Apparatus and method for surface treatment to substrate |
| 03/22/2007 | US20070062452 Coil and coil support for generating a plasma |
| 03/22/2007 | DE10317894B9 Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Focusing of charged particles, electron microscopy and electron microscopy system method |
| 03/22/2007 | DE102004019834B4 Korrekturlinsen-System für ein Partikelstrahl-Projektionsgerät Correction lens system for a particle beam projection device |
| 03/21/2007 | EP1764822A2 RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition |
| 03/21/2007 | EP1764821A1 Method of adjusting the operating region of a tool component to a pre-determined element |
| 03/21/2007 | EP1763891A1 Ion implanter power supply which is intended to limit the loading effect |
| 03/21/2007 | EP1763707A2 Device and method for producing resist profiled elements |
| 03/21/2007 | EP1763593A1 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 03/21/2007 | EP1763592A1 Fastening unit for ignition units, and device for eliminating carbon |
| 03/21/2007 | EP1393601A4 Method and system for improving the effectiveness of medical devices by adhering drugs to the surface thereof |
| 03/21/2007 | EP0758756B9 Transparent heating plate and transparent heating device |
| 03/21/2007 | CN1934914A Plasma generator |
| 03/21/2007 | CN1934913A Plasma generating equipment |
| 03/21/2007 | CN1934684A Substrate processing apparatus |
| 03/21/2007 | CN1934683A Plasma chamber having plasma source coil and method for etching the wafer using the same |
| 03/21/2007 | CN1934681A Method of impurity introduction, impurity introduction apparatus and semiconductor device produced with use of the method |
| 03/21/2007 | CN1934680A Method and equipment for forming crystalline silicon thin film |
| 03/21/2007 | CN1934674A Ion beam irradiation apparatus and ion beam irradiation method |
| 03/21/2007 | CN1934503A Electron beam lithography system |
| 03/21/2007 | CN1934288A Plasma CVD equipment |
| 03/21/2007 | CN1934285A Silicon film forming equipment |
| 03/21/2007 | CN1306568C Terminal testing method and device |
| 03/21/2007 | CN1306567C Plasma processing apparatus and control method thereof |
| 03/21/2007 | CN1306566C Plasma Processing device |
| 03/20/2007 | US7193369 Method for generating gas plasma |
| 03/20/2007 | US7193339 Positioning apparatus and charged-particle-beam exposure apparatus |
| 03/20/2007 | US7193222 Scanning electron microscpe with electron detector located in a vacuum chamber. Forming a vacuum using an air pump attached to chamber enclosing a diaphragm |
| 03/20/2007 | US7193221 Electronic optical lens barrel and production method therefor |
| 03/20/2007 | US7192505 Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| 03/15/2007 | WO2007030499A2 High-resolution scintillation screen for digital imaging |
| 03/15/2007 | WO2007029777A1 Ion source and plasma processing device |
| 03/15/2007 | WO2007029499A1 Sharp end forming member, apparatus wherein such sharp end forming member is applied and method for forming sharp end forming member |
| 03/15/2007 | WO2007028596A1 Charged particle inspection method and charged particle system |
| 03/15/2007 | WO2007028595A2 Particle -optical component |
| 03/15/2007 | WO2006126133A3 Cascade arc radiation source with oxygen scavenging means |
| 03/15/2007 | WO2005098091A3 A method of plasma etch endpoint detection using a v-i probe diagnostics |
| 03/15/2007 | US20070059334 Ultra high molecular weight polyethylene articles and methods of forming ultra high molecular weight polyethylene articles |
| 03/15/2007 | US20070057203 Apparatus for producing atomic beam |
| 03/15/2007 | US20070057202 Method for making reproducible buried heterostructure semiconductor devices |
| 03/15/2007 | US20070057196 Electron microscope and specimen stage positioning control method for the electron microscope |
| 03/15/2007 | US20070057195 High-resolution scintillation screen for digital imaging |
| 03/15/2007 | US20070057186 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 03/15/2007 | US20070057185 Electron beam device and its control method |
| 03/15/2007 | US20070057184 Method and apparatus for reviewing defects |
| 03/15/2007 | US20070057182 Apparatus and method for inspecting a sample of a specimen by means of an electron beam |