| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/02/2007 | CN1313198C Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| 05/01/2007 | US7212078 Method and assembly for providing impedance matching network and network assembly |
| 05/01/2007 | US7211811 Method for preventing wafer surface from bombardment by micro-dust particles during the ion implantation process |
| 05/01/2007 | US7211810 Method for the protection of an optical element, lithographic apparatus, and device manufacturing method |
| 05/01/2007 | US7211806 Particle beam apparatus |
| 05/01/2007 | US7211805 Liquid metal ion gun |
| 05/01/2007 | US7211804 Chromatic aberration corrector for charged particles and charged-particle optical apparatus using the corrector |
| 05/01/2007 | US7211797 Inspection method and inspection system using charged particle beam |
| 05/01/2007 | US7211796 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device |
| 05/01/2007 | US7210424 High-density plasma processing apparatus |
| 04/26/2007 | WO2007045501A1 Charged particle system |
| 04/26/2007 | WO2007022976A3 Method and device for the plasma treatment of the interior of hollow bodies |
| 04/26/2007 | WO2006018840A3 Electron microscope array for inspection and lithography |
| 04/26/2007 | WO2005098091B1 A method of plasma etch endpoint detection using a v-i probe diagnostics |
| 04/26/2007 | US20070092748 Multilayer film for top-seal |
| 04/26/2007 | US20070091535 Temperature controlled semiconductor processing chamber liner |
| 04/26/2007 | US20070090303 Multilayer detector and method for sensing an electron beam |
| 04/26/2007 | US20070090288 Method and system for enhancing resolution of a scanning electron microscope |
| 04/26/2007 | US20070090032 Plasma treatment apparatus |
| 04/26/2007 | US20070089980 Ion source control system |
| 04/26/2007 | US20070089835 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 04/26/2007 | DE19650680B4 Elektronenmikroskop mit Positronenzusatz Electron positron with additional |
| 04/26/2007 | DE102006041436A1 Electron beam dosage computing method for e.g. electron beam lithographic device, involves utilizing parameter values to create illustration of basic dosages of beams and to prepare illustration of proximity effect correction coefficients |
| 04/26/2007 | DE102005050810A1 Electron optics corrector of third order opening errors and anisotropic azimuthal components of the outer axial coma of the third order uses at least three coaxial hexapolar fields and spherical lenses |
| 04/25/2007 | EP1777731A1 Corrosion resistant multilayer member |
| 04/25/2007 | EP1777730A1 Arrangement and method for compensating emitter tip vibrations |
| 04/25/2007 | EP1777729A1 Scanning type electron microscope |
| 04/25/2007 | EP1777728A1 Lithography system |
| 04/25/2007 | EP1776712A2 Device for producing excited and/or ionised particles in a plasma |
| 04/25/2007 | EP1372897A4 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| 04/25/2007 | EP1166319B1 Multi-electron -beam lithography apparatus with mutually different beam limiting apertures |
| 04/25/2007 | CN2892882Y 真空锁系统 Vacuum lock system |
| 04/25/2007 | CN1954403A In-situ monitoring on a spinning-disk ion implanter |
| 04/25/2007 | CN1953129A Method of operating ion source and ion implanting apparatus |
| 04/25/2007 | CN1312727C Apparatus and method for improving etch rate uniformity |
| 04/25/2007 | CN1312534C Electvonic beam based pattern scanning method and scanning device |
| 04/24/2007 | US7208878 Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode |
| 04/24/2007 | US7208731 Charged particle beam apparatus |
| 04/24/2007 | US7208730 Programmable molecular manipulating devices |
| 04/24/2007 | US7208422 Plasma processing method |
| 04/24/2007 | US7208421 Method and apparatus for production of metal film or the like |
| 04/19/2007 | WO2007044344A2 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths |
| 04/19/2007 | WO2007042394A1 A method to deposit a coating by sputtering |
| 04/19/2007 | WO2007025376A3 Ultraviolet radiation lamp and source module and treatment system containing same |
| 04/19/2007 | WO2006136310A3 Powder-fiber adhesive |
| 04/19/2007 | WO2006124075A3 System and methods for ion beam containment using localized electrostatic fields in an ion beam passageway |
| 04/19/2007 | WO2006114228A3 Process and device for coating substrates |
| 04/19/2007 | WO2006074050A3 Electrically enhancing the confinement of plasma |
| 04/19/2007 | US20070086143 Plasma generator and plasma etching apparatus |
| 04/19/2007 | US20070085242 E-beam active thermoplastic polyestercarbonate |
| 04/19/2007 | US20070085038 Polymer based electrospray nozzle for mass spectrometry |
| 04/19/2007 | US20070085037 Method, system, and apparatus for improving doping uniformity in high-tilt ion implantation |
| 04/19/2007 | US20070085036 Ion generating device |
| 04/19/2007 | US20070085020 Method for controlling charged particle beam, and charged particle beam apparatus |
| 04/19/2007 | US20070084991 Neutral particle beam processing apparatus |
| 04/19/2007 | US20070084715 Method for the production of a substrate |
| 04/19/2007 | US20070084405 Adaptive plasma source for generating uniform plasma |
| 04/19/2007 | DE202005019260U1 Vorrichtung zum Aussenden ionisierender Strahlung Device to emit ionizing radiation |
| 04/19/2007 | DE102006048609A1 Electron discharge window manufacturing method, involves applying vapor depositing layer by vapor depositing process on substrate, and removing substrate with upper surface that is made up of flexible polymer material |
| 04/19/2007 | DE102006048593A1 Electron outlet window for an electron beam accelerator, is formed by reducing the thickness of a titanium or glass film by etching |
| 04/19/2007 | CA2624542A1 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths |
| 04/18/2007 | EP1775634A1 Electron beam drawing device |
| 04/18/2007 | EP1775353A1 Coating apparatus and method for operating a coating apparatus |
| 04/18/2007 | EP1775352A2 Arc ion plating apparatus |
| 04/18/2007 | EP1774839A2 Method and means for generation of a plasma at atmospheric pressure |
| 04/18/2007 | EP1774563A1 Cylindrical target with oscillating magnet from magnetron sputtering |
| 04/18/2007 | EP1774562A1 System for low-energy plasma-enhanced chemical vapor deposition |
| 04/18/2007 | EP1774561A1 Laser atom probe methods |
| 04/18/2007 | EP1774560A1 Electronic beam device |
| 04/18/2007 | EP1774559A2 Electrostatic lens for ion beams |
| 04/18/2007 | EP1774538A2 Multiple gas injection system for charged particle beam instruments |
| 04/18/2007 | EP1774055A2 Ion implanter operating in pulsed plasma mode |
| 04/18/2007 | EP1774054A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 04/18/2007 | EP1670968A4 Apparatus for low temperature semiconductor fabrication |
| 04/18/2007 | CN2891271Y Wafer positioning and control system for ion implantation machine |
| 04/18/2007 | CN2891270Y Heat-insulating and gas-supply apparatus in long-life ion source |
| 04/18/2007 | CN2891269Y Apparatus for insulation between ion source cathode, heating electron gun, and arc chamber |
| 04/18/2007 | CN2890080Y Wide range current detection automatic gearshift device of ion implantation machine |
| 04/18/2007 | CN1950922A Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece |
| 04/18/2007 | CN1950921A Method for the production of a disk-shaped workpiece based on a dielectric substrate, and vacuum processing system therefor |
| 04/18/2007 | CN1950545A Apparatus including showerhead electrode and heater for plasma processing |
| 04/18/2007 | CN1950538A Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 04/18/2007 | CN1950534A MSVD coating process |
| 04/18/2007 | CN1948549A Capping technology for electron beam physical gaseous phase deposition coating using strong flow pulse ionic beam |
| 04/18/2007 | CN1311717C Plasma surface treating method and apparatus therefor |
| 04/18/2007 | CN1311531C Microwave plasma process device |
| 04/18/2007 | CN1311509C Electrostatic trap for particles entrained in ion beam |
| 04/18/2007 | CN1311508C Extraction and deceleration of low energy beam with low beam divergence |
| 04/18/2007 | CN1311392C Method and apparatus for three-dimensional imaging in the Fourier domain |
| 04/18/2007 | CN1311300C Charge beam exposure device, exposure method by charge beam, charge beam controlling method and method for mfg. semiconductor device |
| 04/18/2007 | CN1311100C Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method |
| 04/18/2007 | CN1310687C Ion beam irradiating device for irradiating tumour tissues |
| 04/17/2007 | US7206184 Vacuum plasma processor and method of operating same |
| 04/17/2007 | US7205560 Method and apparatus for processing a micro sample |
| 04/17/2007 | US7205559 Electron beam apparatus and device manufacturing method using same |
| 04/17/2007 | US7205556 Bellows liner for an ion beam implanter |
| 04/17/2007 | US7205555 Defect inspection apparatus and defect inspection method |
| 04/17/2007 | US7205554 Method and apparatus for processing a micro sample |
| 04/17/2007 | US7205552 Monatomic boron ion source and method |
| 04/17/2007 | US7205551 Method of correcting chromatic aberrations in charged-particle beam and charged-particle beam system |