| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/15/2007 | US7217925 Scanning electron microscope |
| 05/15/2007 | US7217924 Holey mirror arrangement for dual-energy e-beam inspector |
| 05/15/2007 | US7217649 System and method for stress free conductor removal |
| 05/15/2007 | US7217371 Optical control interface between controller and process chamber |
| 05/15/2007 | US7217337 Plasma process chamber and system |
| 05/15/2007 | US7217336 Directed gas injection apparatus for semiconductor processing |
| 05/10/2007 | WO2007053269A2 Method and system for forming a nitrided germanium-containing layer using plasma processing |
| 05/10/2007 | WO2007052723A1 Phase plate for electron microscope, and its manufacturing method |
| 05/10/2007 | WO2007051917A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 05/10/2007 | WO2007051916A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 05/10/2007 | WO2007051461A1 Redundant anode sputtering method and assembly |
| 05/10/2007 | WO2007051313A1 Methods for performing circuit edit operations with low landing energy electron beams |
| 05/10/2007 | WO2007051312A1 Apparatus and method for surface modification using charged particle beams |
| 05/10/2007 | WO2007024614A3 Selection of wavelenghts for end point in a time division multiplexed process |
| 05/10/2007 | US20070105325 Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions |
| 05/10/2007 | US20070102652 Ion implanter with contaminant collecting surface |
| 05/10/2007 | US20070102651 includes semiconductor substrate and bottom coupled die |
| 05/10/2007 | US20070102291 Plasma-enhanced film deposition |
| 05/10/2007 | US20070102287 Method and apparatus for an improved optical window deposition shield in a plasma processing system |
| 05/10/2007 | US20070102284 Small Scanned Magentron |
| 05/10/2007 | US20070102119 Plasma processing system and plasma processing method |
| 05/10/2007 | US20070101938 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
| 05/10/2007 | DE19848861B4 Herstellungsprozeß einer Halbleitervorrichtung durch Elektronenstrahllithographie Manufacturing process of a semiconductor device by electron beam lithography |
| 05/10/2007 | DE102005020815B4 Anordnung für die Regelung der Elektronenstrahlleistung einer Elektronenstrahlkanone Arrangement for controlling the electron beam power of an electron gun |
| 05/10/2007 | CA2628589A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 05/10/2007 | CA2628586A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 05/09/2007 | EP1783904A1 HF plasma supply system |
| 05/09/2007 | EP1783815A1 Method and arrangement for etching a metallic strip by vacuum magnetron sputtering |
| 05/09/2007 | EP1783814A1 Process and device for magnetron sputtering cleaning a metal strip |
| 05/09/2007 | EP1783813A1 Frequency based controlling of microwave plasma process |
| 05/09/2007 | EP1783812A2 Corrector for the correction of chromatic aberrations in a particle-optical apparatus. |
| 05/09/2007 | EP1783811A2 Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
| 05/09/2007 | EP1783810A2 Electron Gun |
| 05/09/2007 | EP1376669B1 Plasma processing device |
| 05/09/2007 | CN1961402A Plasma processor responsive to multiple RF frequencies |
| 05/09/2007 | CN1961401A Reciprocating drive for scanning a workpiece through an ion beam |
| 05/09/2007 | CN1961400A 离子注入装置 Ion implantation apparatus |
| 05/09/2007 | CN1959416A Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample |
| 05/09/2007 | CN1315150C Apparatus for plasma pulse injection |
| 05/09/2007 | CN1314826C Plasma treatment container internal member, and plasma treatment device having same |
| 05/08/2007 | US7216311 System and method for evaluating a semiconductor device pattern, method for controlling process of forming a semiconductor device pattern and method for monitoring a semiconductor device manufacturing process |
| 05/08/2007 | US7216067 Non-linear test load and method of calibrating a plasma system |
| 05/08/2007 | US7214951 Charged-particle multi-beam exposure apparatus |
| 05/08/2007 | US7214938 Sample observation method and transmission electron microscope |
| 05/08/2007 | US7214937 Electron microscope |
| 05/08/2007 | US7214936 Charged particle beam apparatus and dimension measuring method |
| 05/08/2007 | US7214289 Method and apparatus for wall film monitoring |
| 05/08/2007 | US7214282 Electromagnetic-wave shielding and light transmitting plate, manufacturing method thereof and display panel |
| 05/08/2007 | US7214280 Plasma-assisted decrystallization |
| 05/08/2007 | US7214117 Deflector of a micro-column electron beam apparatus and method for fabricating the same |
| 05/08/2007 | CA2303897C Dual face shower head electrode for a magnetron plasma generating apparatus |
| 05/03/2007 | WO2007050305A1 Sputtering target and means for cooling the target |
| 05/03/2007 | WO2007050304A1 Sputtering target and means for cooling the target |
| 05/03/2007 | WO2007049492A1 Graphite member for beam-line internal member of ion implantation apparatus |
| 05/03/2007 | WO2007048937A1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body |
| 05/03/2007 | WO2007048433A1 Charged particle beam exposure system |
| 05/03/2007 | WO2007022862A3 Method for the production of a multilayer electrostatic lens array |
| 05/03/2007 | WO2007021521A3 Two-piece dome with separate rf coils for inductively coupled plasma reactors |
| 05/03/2007 | WO2006113170A3 Sputtering system |
| 05/03/2007 | WO2006109039A3 Gas bearing spindle |
| 05/03/2007 | WO2006101558A3 Laser atom probes |
| 05/03/2007 | WO2006076740A3 Synchronous raster scanning lithographic system |
| 05/03/2007 | US20070098980 Highly Tetrahedral Amorphous Carbon Coatings and Systems and Methods for Their Production |
| 05/03/2007 | US20070098979 Diamond-like carbon coating supported one a glass substrate; coating has a first tetrahedral amorphous carbon layer having at least 35% sp3 bonds including subplanted carbon bonds and an average density of at least 2.5 gm/cm3; magnetic recording media |
| 05/03/2007 | US20070096658 Method and apparatus for an improved upper electrode plate in a plasma processing system |
| 05/03/2007 | US20070095789 Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring |
| 05/03/2007 | US20070095788 Method of controlling a chamber based upon predetermined concurrent behavoir of selected plasma parameters as a function of selected chamber paramenters |
| 05/03/2007 | US20070095654 Controlled multi-step magnetron sputtering process |
| 05/03/2007 | US20070095477 Plasma processing apparatus |
| 05/03/2007 | US20070095285 Apparatus for cyclical depositing of thin films |
| 05/03/2007 | DE112005001299T5 Magnetron-Sputterverfahren und Magnetron-Sputtervorrichtung Magnetron sputtering and magnetron sputtering apparatus |
| 05/03/2007 | DE112004002810T5 Dünnschichterzeugungsverfahren und Dünnschichterzeugungsvorrichtung Thin film forming method and thin film forming apparatus |
| 05/03/2007 | DE10335718B4 Anodenbauteil für Delayline-Detektoren und Delayline-Detektor Anode component for delay line detectors and delay line detector |
| 05/03/2007 | DE10234859B4 Einrichtung und Verfahren zum Beschichten von Substraten Apparatus and method for coating substrates |
| 05/03/2007 | DE102006050600A1 Spektrometer zur Oberflächenanalyse und Verfahren dafür Spectrometer for surface analysis and method therefor |
| 05/03/2007 | DE102006048974A1 Irradiation process using charged particles for sampling and irradiating using a charged particle beam for observing or treating workpieces |
| 05/03/2007 | DE102006046951A1 Charge carrier beam used for masking uses a measurement of a defective position and a correction is applied |
| 05/03/2007 | DE102004031528B4 Vorrichtung zur Bereitstellung einer Sonderatmosphäre mit einem Medienanschluss An apparatus for providing a special atmosphere with a media connection |
| 05/03/2007 | CA2627407A1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body |
| 05/02/2007 | EP1780777A1 Plasma processing device amd method |
| 05/02/2007 | EP1780766A1 Improved magnetron sputtering system for large-area substrates having removable anodes |
| 05/02/2007 | EP1780765A2 Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating a sample in such an apparatus |
| 05/02/2007 | EP1780764A1 Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating a sample in such an apparatus |
| 05/02/2007 | EP1780763A2 Charged particle beam system with higher-order aberration corrector |
| 05/02/2007 | EP1780762A1 Magnetic energy filter |
| 05/02/2007 | EP1780304A2 PECVD method with modulation of power |
| 05/02/2007 | EP1780303A2 System and method for power function ramping of microwave linear discharge sources |
| 05/02/2007 | EP1779405A2 Cylinder magnetron with self cleaning target and collar |
| 05/02/2007 | EP1779404A2 Ion beam measurement systems and methods for ion implant dose and uniformity control |
| 05/02/2007 | EP1442153A4 Gcib processing to improve interconnection vias and improved interconnection via |
| 05/02/2007 | EP1300057B1 Coil for vacuum plasma processor |
| 05/02/2007 | EP1147242A4 Large area plasma source |
| 05/02/2007 | EP1147241A4 Diffusion bonded sputter target assembly and method of making same |
| 05/02/2007 | EP1119030B1 Plasma reactor |
| 05/02/2007 | EP1027475A4 Large area microwave plasma apparatus with adaptable applicator |
| 05/02/2007 | CN1957437A Vacuum plasma processor including control in response to DC bias voltage |
| 05/02/2007 | CN1956138A Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing system |
| 05/02/2007 | CN1314085C Plasma device |
| 05/02/2007 | CN1314075C Shielding system for plasma chamber |
| 05/02/2007 | CN1314072C Merie plasma reactor with showerhead RF electrode tuned to the plasma with arcing suppression |